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1. 发明申请

US20070017635A1 Device for controlling dispensing error in photo spinner equipment 失效
标题翻译：用于控制光学旋转设备中分配误差的装置
公开(公告)号：US20070017635A1
公开(公告)日：2007-01-25
申请号：US11454843
申请日：2006-06-19
申请人： Jong-Hwa Lee , Chan-Hoon Park , Ki-Hyun Chyun
发明人： Jong-Hwa Lee , Chan-Hoon Park , Ki-Hyun Chyun
IPC分类号： C23F1/00
CPC分类号： H01L21/67253 , G03F7/162 , H01L21/6708 , Y10S134/902
摘要： A chemical solution dispensing device adapted for use with photo spinner equipment is disclosed. The device includes a nozzle adapted to spray chemical solution onto a wafer, a pressure sensor associated with the nozzle and adapted to sense a spraying pressure and generate a pressure value corresponding to the sensed spraying pressure, and a controller adapted to receive the pressure value, compare the received pressure value to a predetermined threshold pressure value, and generate an interlock signal when the received pressure value exceeds the predetermined threshold pressure value.
摘要翻译：公开了一种适用于光旋转设备的化学溶液分配装置。该装置包括适于将化学溶液喷射到晶片上的喷嘴，与喷嘴相关联的适于感测喷射压力并产生对应于所感测的喷射压力的压力值的压力传感器，以及适于接收压力值的控制器，将接收到的压力值与预定的阈值压力值进行比较，并且当所接收的压力值超过预定阈值压力值时产生互锁信号。

2. 发明授权

US07012670B2 Method and apparatus for adjusting a photo-exposure time 有权
标题翻译：调整曝光时间的方法和装置
公开(公告)号：US07012670B2
公开(公告)日：2006-03-14
申请号：US10968291
申请日：2004-10-20
申请人： Chan-Hoon Park
发明人： Chan-Hoon Park
IPC分类号： G03B27/52 , G03D5/00
CPC分类号： G03F7/70558
摘要： A system is provided for adjusting a photo-exposure time of a manufacturing apparatus for semiconductor devices. The system for adjusting the photo-exposure time includes a photo-exposure unit whose photo-exposure time is adjustable according to one or more adjustment signals, a pre-exposure step influence prediction unit that obtains pre-exposure step processing information and extracts parameters that may influence a resulting pattern during photo-exposure, and provides this information as feed forward data, an inspection unit that checks processed steps during a certain period after photo-exposure and provides an inspection value as a feed back data, and a central processing unit that receives the feed forward and feedback data and, by means of a predetermined calculation method, generates the one or more adjustment signals, which are used to adjust the photo-exposure time.
摘要翻译：提供一种用于调整用于半导体器件的制造装置的曝光时间的系统。用于调整照相曝光时间的系统包括其曝光时间根据一个或多个调节信号可调的照相曝光单元，预曝光步骤影响预测单元，其获得预曝光步骤处理信息并提取参数，可以在照相曝光期间影响所得到的图案，并且将该信息提供为前馈数据，检查单元在照相曝光之后的特定时段期间检查处理的步骤并提供检查值作为反馈数据，以及中央处理单元其接收前馈和反馈数据，并且通过预定的计算方法产生用于调整曝光时间的一个或多个调整信号。

3. 发明授权

US06883759B2 Front panel operating apparatus and method 有权
标题翻译：前面板操作装置及方法
公开(公告)号：US06883759B2
公开(公告)日：2005-04-26
申请号：US10372122
申请日：2003-02-25
申请人： Chan Hoon Park , Sang Jin Youn , Jung Sik Kim
发明人： Chan Hoon Park , Sang Jin Youn , Jung Sik Kim
IPC分类号： B60R11/00 , B60R11/02 , G01C19/00 , G01C21/16 , G01C21/26 , G11B31/00 , G11B33/02 , H04B1/08
CPC分类号： B60R11/0205 , B60R11/0211 , B60R11/0235 , B60R11/0264 , B60R2011/0082 , B60R2011/0085 , B60R2011/0092 , B60R2011/0094 , G01C21/26 , G11B31/003 , G11B33/027 , H04B1/082
摘要： A front panel operating apparatus and method of a vehicle display device such as a car audio can include a main chassis for accommodating an audio device, a front panel provided in the front side of the main chassis that opens or closes to allow access to a record medium for the audio device. The front panel can have a display part in the front side thereof. A supporting panel can be hinge-coupled to a lower side of the front panel to move a lower end of the front panel forward and backward by sliding from a prescribed location of the main chassis in forward and backward directions of the main chassis. A vertical guide can be formed at the front side of the main chassis, and a protrusion formed on the front panel can be inserted into the vertical guide for controllably moving an upper portion of the front panel up and down.
摘要翻译：诸如汽车音响的车载显示装置的前面板操作装置和方法可以包括用于容纳音频装置的主机箱，设置在主机箱的前侧的前面板，其打开或关闭以允许访问记录介质用于音频设备。前面板可以在其前侧具有显示部分。支撑面板可以铰链连接到前面板的下侧，以通过从主机箱的规定位置沿主机架的前后方向滑动而向前和向后移动前板的下端。可以在主底盘的前侧形成垂直导向件，并且可以将形成在前面板上的突起插入垂直导向件中，以可控制地前后移动前面板的上部。

4. 发明授权

US06445443B1 Lithography system including mechanism for setting optimal process parameters and method of operating the same 有权
标题翻译：平版印刷系统包括设置最佳工艺参数的机理和操作方法
公开(公告)号：US06445443B1
公开(公告)日：2002-09-03
申请号：US09606156
申请日：2000-06-29
申请人： Chan-hoon Park , Hee-sun Chae
发明人： Chan-hoon Park , Hee-sun Chae
IPC分类号： G03B2732
CPC分类号： G03F7/70483 , G03B27/32
摘要： A lithography system includes a spinner, a first controller, a stepper and a second controller. The spinner coats a photoresist film on a semiconductor substrate. The first controller sets a first optimal process parameter according to external information regarding the semiconductor wafer and controls the spinner according to the first optimal process parameter, when the semiconductor wafer is loaded into the spinner. The stepper exposes the semiconductor wafer, which is coated with the photoresist film, to light of a predetermined wavelength. The second controller sets a second optimal process parameter according to the external information regarding the semiconductor wafer and controls the stepper according to the second optimal process parameter, when the semiconductor wafer coated with the photoresist film is loaded into the stepper.
摘要翻译：光刻系统包括旋转器，第一控制器，步进器和第二控制器。旋涂器在半导体衬底上涂覆光致抗蚀剂膜。当半导体晶片装载到旋转器中时，第一控制器根据关于半导体晶片的外部信息设置第一最佳工艺参数并根据第一最佳工艺参数控制旋转器。步进器将涂覆有光致抗蚀剂膜的半导体晶片暴露于预定波长的光。第二控制器根据关于半导体晶片的外部信息设置第二最佳工艺参数，并且当涂覆有光致抗蚀剂膜的半导体晶片被装入步进器时，根据第二最佳工艺参数控制步进器。

5. 发明授权

US07908105B2 Measurement system for correcting overlay measurement error 有权
标题翻译：用于校正覆盖测量误差的测量系统
公开(公告)号：US07908105B2
公开(公告)日：2011-03-15
申请号：US12039479
申请日：2008-02-28
申请人： Moon-Sang Lee , Bong-Jin Yum , Hong-Seok Kim , Kwan-Woo Kim , Seung-Hyun Kim , Chan-Hoon Park
发明人： Moon-Sang Lee , Bong-Jin Yum , Hong-Seok Kim , Kwan-Woo Kim , Seung-Hyun Kim , Chan-Hoon Park
IPC分类号： G06F11/00
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70508
摘要： A measurement system and a measurement method, which can obtain a measurement value close to a true value considering an overlay measurement error according to a higher order regression analysis model, is disclosed. The measurement system and the measurement method provide a technique for determining optimal positions of shots to be measured using an optimal experimental design. When the regression analysis model and the number of shots to be measured are determined in advance, a method is used for determining an optimal number of shots to be measured according to the regression analysis model and process dispersion using a confidence interval estimating method.
摘要翻译：公开了考虑到根据高阶回归分析模型的覆盖测量误差，可以获得接近真实值的测量值的测量系统和测量方法。测量系统和测量方法提供了一种用于使用最佳实验设计确定要测量的拍摄的最佳位置的技术。当回归分析模型和要测量的拍摄数量预先确定时，使用一种方法根据回归分析模型和使用置信区间估计方法的处理色散来确定要测量的最佳拍摄张数。

6. 发明申请

US20080230929A1 OVERLAY MARK OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE INCLUDING THE OVERLAY MARK 审中-公开
标题翻译：半导体器件和半导体器件的覆盖标记，包括覆盖标记
公开(公告)号：US20080230929A1
公开(公告)日：2008-09-25
申请号：US12042377
申请日：2008-03-05
申请人： Jang-ho Shin , Chan-hoon Park , Jung-Hyeon Lee , Suk-joo Lee , Hyun-tae Kang , Jeong-hee Cho , Young-hoon Song
发明人： Jang-ho Shin , Chan-hoon Park , Jung-Hyeon Lee , Suk-joo Lee , Hyun-tae Kang , Jeong-hee Cho , Young-hoon Song
IPC分类号： H01L23/544
CPC分类号： H01L23/544 , H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： Provided are an overlay mark of a semiconductor device and a semiconductor device including the overlay mark. The overlay mark includes: reference marks formed in rectangular shapes comprising sides in which fine patterns are formed; and comparison marks formed as rectangular shapes which are smaller than the rectangular shapes of the reference marks and formed of fine patterns, wherein the number of comparison marks is equal to the number of reference marks, wherein the reference marks and the comparison marks are formed on different thin films formed on a semiconductor substrate to be used to inspect alignment states of the different thin films, and the overlay mark reflects an effect of aberration of patterns of memory cells through the fine patterns during a calculation of MR (mis-registration).
摘要翻译：提供半导体器件的覆盖标记和包括覆盖标记的半导体器件。覆盖标记包括：形成为包括形成精细图案的侧面的矩形形状的参考标记; 和形成为小于参考标记的矩形形状并由精细图案形成的矩形形状的比较标记，其中比较标记的数量等于参考标记的数量，其中参考标记和比较标记形成在在半导体衬底上形成的用于检测不同薄膜的取向状态的不同薄膜，并且叠加标记反映了在计算MR（误对准）期间通过精细图案的存储器单元的图案的像差的影响。

7. 发明授权

US06826743B2 Method for automatically correcting overlay alignment of a semiconductor wafer 有权
标题翻译：用于自动校正半导体晶片的覆盖排列的方法
公开(公告)号：US06826743B2
公开(公告)日：2004-11-30
申请号：US10233556
申请日：2002-09-04
申请人： Chan-Hoon Park , Bong-Su Cho , Hyun-Tae Kang
发明人： Chan-Hoon Park , Bong-Su Cho , Hyun-Tae Kang
IPC分类号： G06F1750
CPC分类号： G03F7/70633
摘要： A semiconductor wafer overlay correction method for an exposure process in a semiconductor fabricating stepper incorporates variations in equipment characteristics with time. The wafer overlay correction method includes measuring an overlay error correction value of a semiconductor wafer that is exposed by the stepper, calculating an overlay error correction value by summing the measured overlay error correction value, a variation in the stepper characteristics that is obtained through an empirical characterization of input changes, and a weighting value obtained from a predetermined plurality of wafer lots, and providing the calculated overlay error correction value to the semiconductor fabricating stepper to control an exposure process of a subsequent wafer lot.
摘要翻译：用于半导体制造步进机中的曝光处理的半导体晶片覆盖校正方法包括设备特性随时间的变化。晶片覆盖校正方法包括测量由步进器曝光的半导体晶片的覆盖误差校正值，通过将测量的叠加误差校正值相加来计算叠加误差校正值，通过经验值获得的步进器特性的变化输入变化的表征以及从预定的多个晶片批次获得的加权值，并将计算出的重叠误差校正值提供给半导体制造步进器，以控制随后的晶片批次的曝光处理。

8. 发明授权

US06825912B2 System for adjusting a photo-exposure time 有权
标题翻译：调整曝光时间的系统
公开(公告)号：US06825912B2
公开(公告)日：2004-11-30
申请号：US09826838
申请日：2001-04-06
申请人： Chan-Hoon Park
发明人： Chan-Hoon Park
IPC分类号： G03B2732
CPC分类号： G03F7/70558
摘要： A system is provided for adjusting a photo-exposure time of a manufacturing apparatus for semiconductor devices. The system for adjusting the photo-exposure time includes a photo-exposure unit whose photo-exposure time is adjustable according to one or more adjustment signals, a pre-exposure step influence prediction unit that obtains pre-exposure step processing information and extracts parameters that may influence a resulting pattern during photo-exposure, and provides this information as feed forward data, an inspection unit that checks processed steps during a certain period after photo-exposure and provides an inspection value as a feed back data, and a central processing unit that receives the feed forward and feedback data and, by means of a predetermined calculation method, generates the one or more adjustment signals, which are used to adjust the photo-exposure time.
摘要翻译：提供一种用于调整用于半导体器件的制造装置的曝光时间的系统。用于调整照相曝光时间的系统包括其曝光时间根据一个或多个调节信号可调的照相曝光单元，预曝光步骤影响预测单元，其获得预曝光步骤处理信息并提取参数，可以在照相曝光期间影响所得到的图案，并且将该信息提供为前馈数据，检查单元在照相曝光之后的特定时段期间检查处理的步骤并提供检查值作为反馈数据，以及中央处理单元其接收前馈和反馈数据，并且通过预定的计算方法产生用于调整曝光时间的一个或多个调整信号。

9. 发明授权

US08671094B2 System and method for providing document based on personal network 有权
标题翻译：基于个人网络提供文档的系统和方法
公开(公告)号：US08671094B2
公开(公告)日：2014-03-11
申请号：US13239102
申请日：2011-09-21
申请人： In Ho Kang , Soo Hyun Kim , Chan Hoon Park
发明人： In Ho Kang , Soo Hyun Kim , Chan Hoon Park
IPC分类号： G06F17/30
CPC分类号： G06F17/30011 , G06Q10/10
摘要： Provided are a system and method for providing a document based on a personal network. The document providing system may include a community searching unit to search for a community associated with a first document prepared by a first user, a document registration unit to register the first document in the searched community, and to receive a second document, associated with the first document, registered by a second user included in the community, and a document providing unit to provide the second document associated with the first document. According to embodiments of the present invention, a response that the first user may desire may be provided by receiving a response, registered by the second user included in the community associated with the first user, with respect to the document prepared by the first user.
摘要翻译：提供了一种用于提供基于个人网络的文档的系统和方法。文档提供系统可以包括：社区搜索单元，用于搜索与由第一用户准备的第一文档相关联的社区，文档注册单元，用于在搜索到的社区中注册第一文档，以及接收与第一文档相关联的第二文档第一文件，由包括在社区中的第二用户注册，以及文档提供单元，用于提供与第一文档相关联的第二文档。根据本发明的实施例，可以通过从第一用户准备的文档接收包括在与第一用户相关联的社区中的第二用户注册的响应来提供第一用户可能希望的响应。

10. 发明授权

US08612433B2 System and method for providing search result based on personal network 有权
标题翻译：基于个人网络提供搜索结果的系统和方法
公开(公告)号：US08612433B2
公开(公告)日：2013-12-17
申请号：US13239161
申请日：2011-09-21
申请人： In Ho Kang , Soo Hyun Kim , O Shik Kwon , Chan Hoon Park
发明人： In Ho Kang , Soo Hyun Kim , O Shik Kwon , Chan Hoon Park
IPC分类号： G06F17/30
CPC分类号： G06Q30/0282 , G06F17/30867
摘要： A system and method for providing a search result based on a personal network are disclosed. The search result providing system may include a search term reception unit, a personal network extraction unit, and a search result providing unit which may receive a search term from a user. The personal network extraction unit may extract at least one of a personal network associated with the search term, and a personal network associated with the user. The search result providing unit may provide documents associated with the personal networks as a search result of the search term. A search result optimized for the user may be provided to the user by searching for information corresponding to the search term from communities joined by another user having similar interests to that of the user, or communities joined by the user, based on personal networks of the user.
摘要翻译：公开了一种用于提供基于个人网络的搜索结果的系统和方法。搜索结果提供系统可以包括搜索项接收单元，个人网络提取单元和可以从用户接收搜索项的搜索结果提供单元。个人网络提取单元可以提取与搜索词相关联的个人网络和与用户相关联的个人网络中的至少一个。搜索结果提供单元可以提供与个人网络相关联的文档作为搜索项的搜索结果。针对用户优化的搜索结果可以通过搜索与来自具有与用户相关联的兴趣的另一用户（或者由用户加入的社区）加入的社区的搜索词相对应的信息来提供给用户，该社区基于个人网络用户。

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