专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120003438A1 GRAPHENE PROCESSING FOR DEVICE AND SENSOR APPLICATIONS 审中-公开
标题翻译：用于设备和传感器应用的石墨加工
公开(公告)号：US20120003438A1
公开(公告)日：2012-01-05
申请号：US13202136
申请日：2010-02-19
申请人： Bill R. Appleton , Brent P. Gila
发明人： Bill R. Appleton , Brent P. Gila
IPC分类号： B32B3/10 , B05D3/10 , B05D3/04 , B05D3/06 , H01L21/30 , B05D5/12
CPC分类号： H01L29/78684 , H01L21/26506 , H01L29/16 , H01L29/1606 , H01L29/7781 , H01L29/78603 , Y10T428/24802
摘要： A supported graphene device comprises at least one graphene feature of 1 to about 10 graphene layers having a predetermined shape and pattern, with at least a portion of each graphene feature being supported on a substrate. In some embodiments the device comprises graphene features supported on crystalline semiconductor substrate, such as silicon or germanium. The graphene features on a crystalline semiconductor substrate can be fabricated by forming an amorphous carbon doped semiconductor on the crystalline semiconductor substrate and then epitaxially crystallizing the amorphous semiconductor with carbon migration to the surface to form a graphene feature of one or more graphene layers. The epitaxy can be promoted by heating the device or by irradiation with a laser. Methods for fabricating graphene on a variety of substrates, over large areas with controlled thicknesses employ ion implantation or other doping techniques followed by pulsed laser annealing or other annealing techniques that result in solid phase regrowth are presented.
摘要翻译：支撑石墨烯装置包括具有预定形状和图案的1至约10个石墨烯层的至少一个石墨烯特征，每个石墨烯特征的至少一部分被支撑在基底上。在一些实施例中，该器件包括支撑在晶体半导体衬底（例如硅或锗）上的石墨烯特征。晶体半导体衬底上的石墨烯特征可以通过在晶体半导体衬底上形成无定形碳掺杂半导体，然后通过碳迁移到表面来外延结晶非晶半导体来形成一个或多个石墨烯层的石墨烯特征来制造。可以通过加热装置或通过用激光照射来促进外延。提出了在各种基板上制造石墨烯的方法，在具有受控厚度的大面积上采用离子注入或其它掺杂技术，随后进行脉冲激光退火或导致固相再生的其它退火技术。

2. 发明申请

US20080303121A1 Integrated Electronic Circuitry and Heat Sink 审中-公开
标题翻译：集成电路和散热器
公开(公告)号：US20080303121A1
公开(公告)日：2008-12-11
申请号：US11916910
申请日：2006-05-31
申请人： Jenshan Lin , Fan Ren , Stephen J. Pearton , Travis J. Anderson , Brent P. Gila
发明人： Jenshan Lin , Fan Ren , Stephen J. Pearton , Travis J. Anderson , Brent P. Gila
IPC分类号： H01L23/34 , H01L23/50
CPC分类号： H01L23/552 , H01L23/367 , H01L23/3735 , H01L23/50 , H01L2924/0002 , H01L2924/3011 , H01L2924/00
摘要： A multi-layer heatsink module for effecting temperature control in a three-dimensional integrated chip is provided. The module includes a high thermal conductivity substrate having first and second opposing sides, and a gallium nitride (GaN) layer disposed on the first side of the substrate. An integrated array of passive and active elements defining electronic circuitry is formed in the GaN layer. A metal ground plane having first and second opposing sides is disposed on the second side of the substrate, with the first side of the ground plane being adjacent to the second side of the substrate. A dielectric layer of low thermal dielectric material is deposited on the back side of the ground plane, and a metal heatsink is bonded to the dielectric layer. A via extends through the dielectric layer from the metal heatsink to the metal ground plane.
摘要翻译：提供了一种用于在三维集成芯片中实现温度控制的多层散热模块。该模块包括具有第一和第二相对侧的高导热性衬底和设置在衬底的第一侧上的氮化镓（GaN）层。在GaN层中形成限定电子电路的无源和有源元件的集成阵列。具有第一和第二相对侧的金属接地平面设置在基板的第二侧上，接地平面的第一侧与基板的第二侧相邻。在接地面的背面侧沉积有低介电常数的电介质层，金属散热片与电介质层接合。通孔从金属散热器延伸穿过电介质层到金属接地平面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式