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    • 1. 发明申请
    • OPTICAL IMAGING LENS AND ELECTRONIC DEVICE COMPRISING THE SAME
    • 光学成像镜头和包含该镜片的电子设备
    • US20160216479A1
    • 2016-07-28
    • US14695052
    • 2015-04-24
    • Shih-Han ChenBaina ChenBo Chong
    • Shih-Han ChenBaina ChenBo Chong
    • G02B13/00H04N5/225G02B9/62
    • G02B13/0045H04N5/2254
    • An optical imaging lens includes: a first, second, third, fourth, fifth and sixth lens element. The first lens element has positive refracting power, an object-side surface with a convex part in a vicinity of the optical axis, and a convex part in a vicinity of its periphery, the second lens element has negative refracting power, an image-side surface with a convex part in a vicinity of its periphery, the third lens element has an image-side surface with a concave part in a vicinity of the optical axis, the fourth lens has an image-side surface with a convex part in a vicinity of the optical axis, the fifth lens element has object-side surface with a concave part in a vicinity of the optical axis, and the sixth lens element has an image-side surface with a concave part in a vicinity of the optical axis.
    • 光学成像透镜包括:第一,第二,第三,第四,第五和第六透镜元件。 第一透镜元件具有正折射力,在光轴附近具有凸部的物体侧表面和其周边附近的凸部,第二透镜元件具有负折射率,图像侧 表面在其周边附近具有凸部,第三透镜​​元件具有在光轴附近具有凹部的图像侧表面,第四透镜具有附近具有凸部的图像侧表面 第五透镜元件具有在光轴附近具有凹部的物体侧表面,并且第六透镜元件具有在光轴附近具有凹部的图像侧表面。
    • 7. 发明授权
    • Method for removing a film on a silicon layer surface
    • 去除硅层表面上的膜的方法
    • US5022961A
    • 1991-06-11
    • US557550
    • 1990-07-24
    • Akira IzumiKeiji ToeiNobuatsu WatanabeYong-Bo Chong
    • Akira IzumiKeiji ToeiNobuatsu WatanabeYong-Bo Chong
    • C04B41/53H01L21/306H01L21/311
    • H01L21/02049C04B41/5346H01L21/31116Y10S438/906
    • A method for removing a film on a silicon layer formed on a surface of a substrate includes the steps of: (a) placing a substrate in a reaction chamber to be isolated hermetically from the outside air, and (b) feeding anhydrous hydrogen fluoride and alcohol simultaneously into the reaction chamber. Preferably, the method further includes the step of feeding only alcohol into the reaction chamber prior to and/or subsequent to the step (b). An alcohol layer is formed on the substrate surface, whereby the film can be removed uniformly by anhydrous hydrogen fluoride. A by-product of the reaction is taken out from the system of reaction by means of the alcohol on the substrate. No by-product remains on the substrate after the reaction. Since the silicon layer after the reaction is covered with alcohol, re-growth of a native oxide film thereon is also suppressed and on ionic contamination such as fluorine remains on the substrate surface.
    • 一种除去形成在基板表面上的硅层上的膜的方法,包括以下步骤:(a)将基板放置在反应室内,与外部空气密封隔离,(b)供给无水氟化氢和 酒精同时进入反应室。 优选地,该方法还包括在步骤(b)之前和/或之后仅将醇进料到反应室中的步骤。 在基板表面上形成醇层,由此可以通过无水氟化氢均匀地除去膜。 反应的副产物通过基体上的醇从反应体系中取出。 反应后基板上不会残留副产物。 由于反应后的硅层被醇覆盖,其上的自然氧化膜的再生长也被抑制,并且离子污染如氟残留在基材表面上。