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1. 发明授权

US07910270B2 Reticle constructions 有权
标题翻译：标线结构
公开(公告)号：US07910270B2
公开(公告)日：2011-03-22
申请号：US12797474
申请日：2010-06-09
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/29 , G03F1/34
摘要： The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over the base. A thickness of the relatively opaque material of the main-field region is reduced relative to a thickness of the relatively opaque material of the boundary region. A reticle construction of the present invention can comprise a relatively transparent base, and a relatively opaque material over the base. The construction can have a defined main-field region and a defined boundary region, and the relatively opaque material of the main-field region can have a reduced thickness relative to the relatively opaque material of the boundary region.
摘要翻译：本发明包括掩模版结构和形成掩模版结构的方法。在特定方面，形成掩模版的方法包括提供具有限定的主场区域和限定的边界区域的掩模版衬底。基底在基底上具有相对透明的基部和相对不透明的材料。主场区域的相对不透明材料的厚度相对于边界区域的相对不透明材料的厚度减小。本发明的掩模版结构可以包括相对透明的基底和在基底上的相对不透明的材料。该结构可以具有限定的主场区域和限定的边界区域，并且主场区域的相对不透明的材料可以相对于边界区域的相对不透明的材料具有减小的厚度。

2. 发明授权

US07432025B2 Methods of forming reticles 有权
公开(公告)号：US07432025B2
公开(公告)日：2008-10-07
申请号：US11453425
申请日：2006-06-14
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/29 , G03F1/34
摘要： The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over the base. A thickness of the relatively opaque material of the main-field region is reduced relative to a thickness of the relatively opaque material of the boundary region. A reticle construction of the present invention can comprise a relatively transparent base, and a relatively opaque material over the base. The construction can have a defined main-field region and a defined boundary region, and the relatively opaque material of the main-field region can have a reduced thickness relative to the relatively opaque material of the boundary region.

3. 发明授权

US07147973B2 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect 失效
公开(公告)号：US07147973B2
公开(公告)日：2006-12-12
申请号：US10391708
申请日：2003-03-19
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03F9/00
CPC分类号： G03F1/50 , G03F7/039 , G03F7/168
摘要： Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask are provided. The method is useful for recovering the exposure sensitivity of a chemically amplified resist disposed on a photomask blank from a post-coat delay effect.

4. 发明申请

US20060035156A1 Reticle constructions and methods of forming reticles 有权
标题翻译：标线结构和形成标线的方法
公开(公告)号：US20060035156A1
公开(公告)日：2006-02-16
申请号：US10915936
申请日：2004-08-10
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/32 , G03F1/29 , G03F1/34
摘要： The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over the base. A thickness of the relatively opaque material of the main-field region is reduced relative to a thickness of the relatively opaque material of the boundary region. A reticle construction of the present invention can comprise a relatively transparent base, and a relatively opaque material over the base. The construction can have a defined main-field region and a defined boundary region, and the relatively opaque material of the main-field region can have a reduced thickness relative to the relatively opaque material of the boundary region.
摘要翻译：本发明包括掩模版结构和形成掩模版结构的方法。在特定方面，形成掩模版的方法包括提供具有限定的主场区域和限定的边界区域的掩模版衬底。基底在基底上具有相对透明的基部和相对不透明的材料。主场区域的相对不透明材料的厚度相对于边界区域的相对不透明材料的厚度减小。本发明的掩模版结构可以包括相对透明的基底和在基底上的相对不透明的材料。该结构可以具有限定的主场区域和限定的边界区域，并且主场区域的相对不透明的材料可以相对于边界区域的相对不透明的材料具有减小的厚度。

5. 发明申请

US20050170266A1 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect 失效
标题翻译：从后期涂层延迟效应中回收化学扩增树脂的曝光灵敏度的方法
公开(公告)号：US20050170266A1
公开(公告)日：2005-08-04
申请号：US11092370
申请日：2005-03-29
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03F1/00 , G03F7/039 , G03F7/16 , G03F9/00
CPC分类号： G03F1/50 , G03F7/039 , G03F7/168
摘要： Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask are provided. The method is useful for recovering the exposure sensitivity of a chemically amplified resist disposed on a photomask blank from a post-coat delay effect.
摘要翻译：提供了制造光掩模的方法，处理化学放大抗蚀剂涂布的光掩模坯料的方法，由该方法产生的光掩模坯料以及用于制造光掩模的系统。该方法对于从后期延迟效应中恢复设置在光掩模坯料上的化学放大抗蚀剂的曝光灵敏度是有用的。

6. 发明授权

US06373976B1 Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems 失效
标题翻译：准确地关联光掩模检查和维修系统之间的缺陷坐标的方法和装置
公开(公告)号：US06373976B1
公开(公告)日：2002-04-16
申请号：US09122252
申请日：1998-07-24
申请人： Christophe Pierrat , Baorui Yang
发明人： Christophe Pierrat , Baorui Yang
IPC分类号： G06K900
CPC分类号： G03F1/42 , G03F1/72 , G03F1/84 , G03F7/70425 , G03F7/70616 , G03F7/7065 , G03F9/70
摘要： A method and apparatus for calibrating the coordinate systems of photomask processing machines improves processing efficiency and the quality of resulting photomasks. A test pattern is printed on an unproductive area of the photomask. The test pattern is used to calibrate the coordinate system of each processing machine on which the photomask is mounted. Using the test pattern as a common reference point enables points located using one processing machine to be quickly and accurately found on a second processing machine. The test pattern is also used as a reference for other metrology measurements.
摘要翻译：用于校准光掩模处理机的坐标系的方法和装置提高了处理效率和所得光掩模的质量。测试图案印在光掩模的非生产区域上。测试图案用于校准安装光掩模的每个加工机器的坐标系。使用测试图案作为公共参考点使得使用一个处理机器定位的点能够在第二处理机器上快速准确地找到。测试模式也可用作其它度量测量的参考。

7. 发明授权

US6114073A Method for repairing phase shifting masks 有权
标题翻译：修复相移掩模的方法
公开(公告)号：US6114073A
公开(公告)日：2000-09-05
申请号：US220892
申请日：1998-12-28
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03F1/26 , G03F1/74 , G03F9/00 , C23C14/00 , C23C14/32
CPC分类号： G03F1/74 , G03F1/26
摘要： A method of repairing opaque defects on a phase shifting template such as a mask or reticle that includes the steps of directing a focused ion beam (FIB) to scan a small region including an opaque defect. By monitoring a change in the intensity of a secondary signal, the end of the etching process is detected, and the template is exposed to a strongly basic solution to remove ion stains and repair residue produced by the FIB sputtering process. Suitable bases include sodium hydroxide, potassium hydroxide, ammonium hydroxide, tetramethyl ammonium hydroxide, and the like. According to this method, an opaque defect is removed with high accuracy of edge placement and high quality of geometry reconstruction, and the phase shifting amount and the transmission of the opaque defect area are adjusted to their proper levels with high precision.
摘要翻译：在诸如掩模或掩模版的相移模板上修复不透明缺陷的方法包括以下步骤：引导聚焦离子束（FIB）扫描包括不透明缺陷的小区域。通过监测次级信号的强度变化，检测蚀刻过程的结束，并将模板暴露于强碱性溶液以除去离子污渍并修复由FIB溅射工艺产生的残留物。合适的碱包括氢氧化钠，氢氧化钾，氢氧化铵，四甲基氢氧化铵等。根据该方法，以高精度的边缘放置和高质量的几何重建去除不透明缺陷，并且将不透明缺陷区域的相移量和透射率以高精度调整到其适当的水平。

8. 发明申请

US20100248093A1 Reticle Constructions 有权
标题翻译：标线结构
公开(公告)号：US20100248093A1
公开(公告)日：2010-09-30
申请号：US12797474
申请日：2010-06-09
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/29 , G03F1/34
摘要： The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over the base. A thickness of the relatively opaque material of the main-field region is reduced relative to a thickness of the relatively opaque material of the boundary region. A reticle construction of the present invention can comprise a relatively transparent base, and a relatively opaque material over the base. The construction can have a defined main-field region and a defined boundary region, and the relatively opaque material of the main-field region can have a reduced thickness relative to the relatively opaque material of the boundary region.
摘要翻译：本发明包括掩模版结构和形成掩模版结构的方法。在特定方面，形成掩模版的方法包括提供具有限定的主场区域和限定的边界区域的掩模版衬底。基底在基底上具有相对透明的基部和相对不透明的材料。主场区域的相对不透明材料的厚度相对于边界区域的相对不透明材料的厚度减小。本发明的掩模版结构可以包括相对透明的基底和在基底上的相对不透明的材料。该结构可以具有限定的主场区域和限定的边界区域，并且主场区域的相对不透明的材料可以相对于边界区域的相对不透明的材料具有减小的厚度。

9. 发明授权

US07759660B2 Electron beam lithography system 有权
标题翻译：电子束光刻系统
公开(公告)号：US07759660B2
公开(公告)日：2010-07-20
申请号：US11646787
申请日：2006-12-28
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： H01J37/20 , H01L21/68 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J2237/31764 , Y10S430/143
摘要： Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam may be relatively altered such that the substrate is exposed to the electron beam to form the angled features as if they were non-angled features. In another exemplary embodiment, the electron beam lithography system determines whether it is necessary to relatively alter the orientation of the substrate and a path of the generally rectangular-shaped shot from the electron beam to form the angled features based on the number of angled features and the time required for relatively altering the orientation. Electron beam lithography systems employing a rotatable stage, rotatable apertures, or both, are also disclosed.
摘要翻译：公开了减少使用电子束光刻形成具有成角度和非角度特征的掩模图案的写入时间的方法。在一个示例性实施例中，通过暴露于电子束来形成掩模图案的非倾斜特征。基板的取向和来自电子束的大致矩形的射线的路径可以相对改变，使得基板暴露于电子束以形成倾斜的特征，就好像它们是非角度特征。在另一个示例性实施例中，电子束光刻系统确定是否需要相对地改变基板的取向和基本上矩形的射线从电子束的路径，以基于成角度的特征的数量形成角度特征，相对改变方向所需的时间。还公开了采用可旋转台，可旋转孔或两者的电子束光刻系统。

10. 发明申请

US20080305413A1 Methods of Forming Reticles 失效
标题翻译：形成网格的方法
公开(公告)号：US20080305413A1
公开(公告)日：2008-12-11
申请号：US12196144
申请日：2008-08-21
申请人： Baorui Yang
发明人： Baorui Yang
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/29 , G03F1/34
摘要： The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over the base. A thickness of the relatively opaque material of the main-field region is reduced relative to a thickness of the relatively opaque material of the boundary region. A reticle construction of the present invention can comprise a relatively transparent base, and a relatively opaque material over the base. The construction can have a defined main-field region and a defined boundary region, and the relatively opaque material of the main-field region can have a reduced thickness relative to the relatively opaque material of the boundary region.
摘要翻译：本发明包括掩模版结构和形成掩模版结构的方法。在特定方面，形成掩模版的方法包括提供具有限定的主场区域和限定的边界区域的掩模版衬底。基底在基底上具有相对透明的基部和相对不透明的材料。主场区域的相对不透明材料的厚度相对于边界区域的相对不透明材料的厚度减小。本发明的掩模版结构可以包括相对透明的基底和在基底上的相对不透明的材料。该结构可以具有限定的主场区域和限定的边界区域，并且主场区域的相对不透明的材料可以相对于边界区域的相对不透明的材料具有减小的厚度。

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