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1. 发明授权

US08814539B2 Hermetic compressor 有权
公开(公告)号：US08814539B2
公开(公告)日：2014-08-26
申请号：US12936588
申请日：2009-05-08
申请人： Ko Inagaki , Akira Nakano , Yoshinori Ishida , Ichiro Morita
发明人： Ko Inagaki , Akira Nakano , Yoshinori Ishida , Ichiro Morita
IPC分类号： F04B39/02 , F04B39/12 , F04B53/16 , F04B53/18 , F04B39/00 , F04B53/00 , F16J1/08
CPC分类号： F04B39/023 , F04B35/04 , F04B39/0005 , F04B39/122 , F04B53/008 , F04B53/18 , F16J1/08
摘要： A hermetic compressor includes a closed vessel for storing lubricating oil, an electric-driving element, and a compressing element driven by the electric-driving element. The compressing element includes a cylinder block forming a compression chamber, a piton that reciprocates inside the compression chamber, and an oiling device for supplying the lubricating oil to an outer circumference of the piston. A first oil groove is concavely formed on the outer circumference of the piston, and a second oil groove is concavely formed on a side opposite to the compression chamber relative to the first oil groove. The second oil groove has a spatial volume same or greater than that of the first oil groove. An expanded clearance portion is provided such that a clearance between the piston and the cylindrical hole portion broadens from a top dead point to a bottom dead point.

2. 发明授权

US08235683B2 Hermetic compressor 有权
标题翻译：气密压缩机
公开(公告)号：US08235683B2
公开(公告)日：2012-08-07
申请号：US12743093
申请日：2008-11-20
申请人： Kenji Kinjo , Akira Nakano , Takahide Nagao
发明人： Kenji Kinjo , Akira Nakano , Takahide Nagao
IPC分类号： F04B39/00
CPC分类号： F04B39/0055 , F04B39/0061 , Y10S181/403
摘要： A Inlet pipe (151) communicating the space inside the hermetic enclosure with sound absorbing space (147) of inlet muffler (145) is provided so as to be inclined downward from inlet-pipe inlet (155) toward inlet-pipe outlet (157). Outlet pipe (153) communicating sound absorbing space (147) with an inlet valve includes outlet-pipe inlet (161) and outlet-pipe outlet (163). Inlet-pipe inlet (155) and outlet-pipe inlet (161) are formed at substantially same height. Herewith, introducing a refrigerant gas to outlet-pipe inlet (161) making efficient use of potential energy of the refrigerant improves the compression efficiency and stabilizes the performance of the compressor.
摘要翻译：将密闭容器内的空间与入口消音器（145）的吸音空间（147）连通的入口管（151）设置成从入口管入口（155）向入口管出口（157）向下倾斜，。将吸音空间（147）与入口阀连通的出口管（153）包括出口管入口（161）和出口管出口（163）。入口管入口（155）和出口管入口（161）以基本相同的高度形成。由此，能够有效地利用制冷剂的能量的出口管入口（161）引入制冷剂气体，能够提高压缩效率，稳定压缩机的性能。

3. 发明申请

US20100239438A1 HERMETIC COMPRESSOR 有权
标题翻译： HERMETIC压缩机
公开(公告)号：US20100239438A1
公开(公告)日：2010-09-23
申请号：US12743093
申请日：2008-11-20
申请人： Kenji Kinjo , Akira Nakano , Takahide Nagao
发明人： Kenji Kinjo , Akira Nakano , Takahide Nagao
IPC分类号： F04B39/00 , F04B35/04
CPC分类号： F04B39/0055 , F04B39/0061 , Y10S181/403
摘要： A Inlet pipe (151) communicating the space inside the hermetic enclosure with sound absorbing space (147) of inlet muffler (145) is provided so as to be inclined downward from inlet-pipe inlet (155) toward inlet-pipe outlet (157). Outlet pipe (153) communicating sound absorbing space (147) with an inlet valve includes outlet-pipe inlet (161) and outlet-pipe outlet (163). Inlet-pipe inlet (155) and outlet-pipe inlet (161) are formed at substantially same height. Herewith, introducing a refrigerant gas to outlet-pipe inlet (161) making efficient use of potential energy of the refrigerant improves the compression efficiency and stabilizes the performance of the compressor.
摘要翻译：将密闭容器内的空间与入口消音器（145）的吸音空间（147）连通的入口管（151）设置成从入口管入口（155）向入口管出口（157）向下倾斜，。将吸音空间（147）与入口阀连通的出口管（153）包括出口管入口（161）和出口管出口（163）。入口管入口（155）和出口管入口（161）以基本相同的高度形成。由此，能够有效地利用制冷剂的能量的出口管入口（161）引入制冷剂气体，能够提高压缩效率，稳定压缩机的性能。

4. 发明申请

US20100125059A1 1-BIARYLAZETIDINONE DERIVATIVE 审中-公开
公开(公告)号：US20100125059A1
公开(公告)日：2010-05-20
申请号：US12527013
申请日：2008-03-04
申请人： Akira Nakano , Ryota Nakajima , Masanobu Kanou , Seiichi Hisamatsu , Masayuki Kurokawa , Yasumi Nishiwaki
发明人： Akira Nakano , Ryota Nakajima , Masanobu Kanou , Seiichi Hisamatsu , Masayuki Kurokawa , Yasumi Nishiwaki
IPC分类号： A61K31/397 , C07D205/06 , C07D401/10 , C07D403/10
CPC分类号： C07D401/10 , C07D401/14 , C07D403/10 , C07D405/14 , C07D409/14
摘要： The object of the present invention is to provide a compound having an excellent cholesterol-lowering effect and to provide a drug for the treatment, prevention of onset, or prevention of progress of lipid metabolism disorder, hyperlipidemia, or atherosclerosis.A compound represented by formula (I) or a pharmaceutically acceptable salt thereof; or a medicament or a pharmaceutical composition, which contain the compound or the salt as an active ingredient.
摘要翻译：本发明的目的是提供具有优异的降低胆固醇的效果的化合物，并提供用于治疗，预防发作或预防脂质代谢障碍，高脂血症或动脉粥样硬化进展的药物。由式（I）表示的化合物或其药学上可接受的盐; 或含有化合物或盐作为活性成分的药物或药物组合物。

5. 发明申请

US20070131596A1 OXYGEN-SUPPLY-CAPABLE COOLING WATER EQUIPMENT, FILTRATION EQUIPMENT AND FILTRATION-FUNCTION-EQUIPPED COOLING WATER EQUIPMENT INCORPORATED WITH THESE EQUIPMENT 审中-公开
标题翻译：氧气供应冷却水设备，过滤设备和过滤功能设备冷却水设备与这些设备合并
公开(公告)号：US20070131596A1
公开(公告)日：2007-06-14
申请号：US11457915
申请日：2006-07-17
申请人： Hisashi Miyamoto , Akira Nakano
发明人： Hisashi Miyamoto , Akira Nakano
IPC分类号： C02F3/04
CPC分类号： A01K63/045 , A01K63/042 , F28C1/02
摘要： Filtration-function-equipped cooling water equipment that includes: filtration equipment connected to water-purifying, oxygen-supply-capable cooling water equipment, wherein the filtration equipment includes a filtration space for a filter, wherein the water-purifying, oxygen-supply-capable cooling water equipment comprises a cooling oxidation unit disposed inside of a tank body, and comprising a honeycombed or latticed porous material, wherein the filtration-function-equipped cooling water equipment operates to enlarge a contact area between water and air when untreated water drips onto the cooling oxidation unit and flows through the cooling oxidation unit while forced air flows in a counter current against the flow of water in the cooling oxidation unit, thereby facilitating solubility of oxygen in the untreated water and augmenting a cooling capability due to evaporation provided by the water-purifying, oxygen-supply-capable cooling water equipment.
摘要翻译：具有过滤功能的冷却水设备，包括：与净水，供氧能力的冷却水设备连接的过滤设备，其中过滤设备包括用于过滤器的过滤空间，其中净水，供氧 - 能够使用的冷却水设备包括设置在罐体内部的冷却氧化单元，并且包括蜂窝状或网状多孔材料，其中，过滤功能配备的冷却水设备用于当未处理的水滴入到其上时扩大水和空气之间的接触面积冷却氧化单元，并且在强制空气以相反的流动相对于冷却氧化单元中的水流动流动时流过冷却氧化单元，从而促进氧在未处理水中的溶解度，并增加由于所提供的蒸发提供的蒸发的冷却能力净水，供氧能力的冷却水设备。

6. 发明授权

US06795796B2 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level 有权
公开(公告)号：US06795796B2
公开(公告)日：2004-09-21
申请号：US09957684
申请日：2001-09-20
申请人： Akira Nakano , Tadahiro Ohmi
发明人： Akira Nakano , Tadahiro Ohmi
IPC分类号： G06F1900
CPC分类号： H01J37/32082 , H01J37/32935
摘要： The performance of a plasma processing apparatus which is disassembled, transferred, and reassembled is evaluated. The plasma processing apparatus has a plasma processing chamber having an electrode for exciting a plasma, a radiofrequency generator connected to the electrode, and an impedance matching circuit for performing the impedance matching between the plasma processing chamber and the radiofrequency generator. The performance of the apparatus is evaluated whether or not three times the first series resonant frequency of the plasma processing chamber is larger than the power frequency supplied to the plasma processing chamber.

7. 发明授权

US06714833B2 Performance evaluation method for plasma processing apparatus 有权
标题翻译：等离子体处理装置的性能评估方法
公开(公告)号：US06714833B2
公开(公告)日：2004-03-30
申请号：US10033343
申请日：2001-11-02
申请人： Akira Nakano , Tadahiro Ohmi
发明人： Akira Nakano , Tadahiro Ohmi
IPC分类号： G06F1130
CPC分类号： H01J37/32082 , C23C16/505 , C23C16/52 , H01J37/32935
摘要： A plasma processing apparatus includes a plurality of plasma processing units. Each of the plasma processing units has a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit which matches the impedance between the radiofrequency generator and the plasma processing unit. The absolute value |&Dgr;RA| of the difference &Dgr;RA between the AC resistance RA0 at a time t0 and the AC resistance RA1 at a later time t1 and the absolute value |&Dgr;RB| of the difference &Dgr;RB between the AC resistance RB0 at the time t0 and the AC resistance RB1 at the later time t1 are maintained at a value less than an upper limit. Based on these values, whether or not the plasma processing apparatus which is reassembled or used at a user site maintains a required level of performance is evaluated.
摘要翻译：等离子体处理装置包括多个等离子体处理单元。每个等离子体处理单元具有等离子体激励电极，连接到等离子体激励电极的射频发生器和与射频发生器和等离子体处理单元之间的阻抗匹配的匹配电路。绝对值| DeltaRA | 在时间t0的交流电阻RA0与时间t1之后的交流电阻RA1与绝对值|ΔRB|之间的差值DeltaRA 在时刻t0的交流电阻RB0与后期时刻t1的交流电阻RB1之间的差值ΔRB保持在小于上限的值。基于这些值，评价在用户现场重新组装或使用的等离子体处理装置是否保持所需的性能水平。

8. 发明授权

US06274040B1 Apparatus for removing electrostatic charge from high resistivity liquid 失效
标题翻译：用于从高电阻率液体中去除静电荷的装置
公开(公告)号：US06274040B1
公开(公告)日：2001-08-14
申请号：US08811800
申请日：1997-03-06
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
IPC分类号： C02F148
CPC分类号： C02F1/48 , C02F2103/04 , Y10S210/90
摘要： There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.
摘要翻译：提供了一种从高电阻率液体中去除静电电荷的方法和装置。在与高电阻率液体接触的导电元件的表面上形成绝缘膜，其中绝缘膜具有使隧道电流可以流过绝缘膜的厚度，从而防止高度纯化的高电阻率液体污染，以及变酸。因此，用高电阻率液体处理的物体没有静电电荷而没有任何污染。

9. 发明授权

US6148762A Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US6148762A
公开(公告)日：2000-11-21
申请号：US246245
申请日：1999-02-08
申请人： Koichi Fukuda , Sung Chul Kim , Akira Nakano
发明人： Koichi Fukuda , Sung Chul Kim , Akira Nakano
IPC分类号： H05H1/46 , C23C16/458 , C23C16/50 , C23C16/509 , C23F4/00 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/687 , C23C16/00
CPC分类号： H01L21/68742 , C23C16/4581 , C23C16/4586 , C23C16/5096 , H01L21/67069 , H01L21/68757 , Y10S414/135
摘要： A plasma processing apparatus for stably and uniformly performing various kinds of processing by preventing unnecessary plasma discharge in the processing comprises a susceptor pin for supporting a substance to be processed, the susceptor pin being disposed to pass through a hole formed to a susceptor, projecting from the upper surface of the susceptor when the susceptor falls and falling by its own weight when the susceptor rises so as to be buried in the hole, and a guide for guiding the rising and falling directions of the susceptor pin, wherein the susceptor pin and the guide are composed of ceramics.
摘要翻译：一种用于通过在处理中防止不必要的等离子体放电来稳定均匀地执行各种处理的等离子体处理装置包括用于支撑被处理物质的基座销，所述基座销设置成穿过形成于基座的孔，当基座上升时，基座落下并且被埋在孔中时基座的上表面，以及用于引导基座销的上升和下降方向的引导件，其中，基座销和指南由陶瓷组成。

10. 发明授权

US5837559A Method of producing an electro-optical device 失效
标题翻译：电光装置的制造方法
公开(公告)号：US5837559A
公开(公告)日：1998-11-17
申请号：US745904
申请日：1996-11-07
申请人： Ken Kawahata , Akira Nakano , Hirofumi Fukui , Hiroyuki Hebiguchi , Kenji Yamamoto , Chisato Iwasaki
发明人： Ken Kawahata , Akira Nakano , Hirofumi Fukui , Hiroyuki Hebiguchi , Kenji Yamamoto , Chisato Iwasaki
IPC分类号： G02F1/136 , G02F1/1368 , H01L21/336 , H01L21/77 , H01L21/84 , H01L29/78 , H01L29/786
CPC分类号： H01L27/1214
摘要： A method for producing an electro-optical device comprising a first photolithographic step of forming a transparent pixel electrode, a second photolithographic of forming a gate electrode and a gate wiring, a third photolithographic step of forming a contact holes in an insulator film leading to the pixel electrode and the gate wiring, a fourth photolithographic step of forming a source electrode and a drain electrode and a channel portion above the gate electrode, and a fifth photolithographic step of forming a contact hole in a passivation film and isolating the semiconductor active film below the source electrode, the drain electrode and the source wiring from other adjacent portions. The number of photolithographic steps can be reduced, to improve the yield and decrease the production cost, adjacent thin film transistors.
摘要翻译：一种用于制造电光装置的方法，包括形成透明像素电极的第一光刻步骤，形成栅电极的第二光刻和栅极布线;第三光刻步骤，在导致所述绝缘膜的绝缘膜中形成接触孔像素电极和栅极布线;在栅电极上方形成源电极和漏电极以及沟道部分的第四光刻步骤，以及在钝化膜中形成接触孔并将半导体活性膜隔离在第五光刻步骤的第五光刻步骤源电极，漏电极和源极布线。可以减少光刻步骤的数量，以提高相邻薄膜晶体管的产量并降低生产成本。

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