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1. 发明申请

US20180046071A1 PELLICLE MANUFACTURING METHOD AND METHOD FOR MANUFACTURING PHOTOMASK WITH PELLICLE 审中-公开
公开(公告)号：US20180046071A1
公开(公告)日：2018-02-15
申请号：US15794420
申请日：2017-10-26
申请人： MITSUI CHEMICALS, INC. , TAZMO CO., LTD.
发明人： Kazuo KOHMURA , Daiki TANEICHI , Yosuke ONO , Hisako ISHIKAWA , Tsuneaki BIYAJIMA , Yasuyuki SATO , Toshiaki HIROTA
IPC分类号： G03F1/24 , G03F1/54 , C09J7/02 , G03F1/80 , G03F1/64 , G03F1/60
CPC分类号： G03F1/24 , B23K26/0006 , B23K26/53 , B23K2101/40 , B23K2103/52 , B23K2103/56 , C09J7/38 , G03F1/54 , G03F1/60 , G03F1/62 , G03F1/64 , G03F1/76 , G03F1/80 , G03F1/82
摘要： A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.

2. 发明授权

US07601945B2 Position detecting device for detecting the absolute value of a position of a movable member which has a sensor mounted thereon 有权
标题翻译：位置检测装置，用于检测安装有传感器的可动构件的位置的绝对值
公开(公告)号：US07601945B2
公开(公告)日：2009-10-13
申请号：US12025804
申请日：2008-02-05
申请人： Shinji Nagata , Kosuke Sakata , Shinichi Kageshita
发明人： Shinji Nagata , Kosuke Sakata , Shinichi Kageshita
IPC分类号： H01J40/14
CPC分类号： G01D5/34746 , G01D5/36
摘要： A position detecting devices includes a scale, a sensor, and a control section. The scale has a plurality of light emitting elements located at spacings along a direction in which a movable member is moved. Mounted on the member, the sensor detects light from at least one of the elements within a predetermined detection range longer than a largest one of the spacings, and outputs a light reception signal according to a position where the light is received within the range. Upon receipt of the signal, the control section retrieves from the storage section information on a located position of one of the light emitting elements that is being driven, and calculates a position of the member based on the retrieved information and the received signal.
摘要翻译：位置检测装置包括刻度尺，传感器和控制部。该刻度具有位于沿可移动部件移动的方向的间隔处的多个发光元件。传感器安装在构件上，检测来自至少一个元件的光，该预定检测范围比预定的检测范围的长度大于间隔的最大值，并根据在该范围内接收光的位置输出光接收信号。在接收到信号时，控制部从存储部检索关于被驱动的发光元件之一的定位位置的信息，并且基于检索到的信息和接收信号来计算成员的位置。

3. 发明公开

US20240009769A1 JOINING APPARATUS 审中-公开
公开(公告)号：US20240009769A1
公开(公告)日：2024-01-11
申请号：US18035133
申请日：2021-09-06
申请人： TAZMO CO., LTD.
发明人： Yoshinori IKAGAWA
IPC分类号： B23K26/21 , B23K20/02 , B23K37/04
CPC分类号： B23K26/21 , B23K20/021 , B23K37/0461 , B23K2103/56
摘要： A joining apparatus includes a table, a pressurizing mechanism, a laser light source that emits laser light, and a controller. The table has permeability to the laser light. Two joining targets are to be placed on the table while a first metal layer and a second metal layer face each other. The pressurizing mechanism includes a diaphragm, and is capable of applying pressure to a back surface of the joining target using the diaphragm from an opposite side to the table. The controller brings the first metal layer and the second metal layer into contact with each other by applying pressure to the back surface of the joining target while the two joining targets are placed on the table, and while maintaining the resultant state, applies the laser light to a place of contact between the first metal layer and the second metal layer through the table.

4. 发明授权

US11462428B2 Alignment mechanism, chuck device, and bonder 有权
公开(公告)号：US11462428B2
公开(公告)日：2022-10-04
申请号：US16463847
申请日：2017-11-14
申请人： TAZMO CO., LTD.
发明人： Masaaki Tanabe , Kosaku Saino
IPC分类号： H01L21/68 , B65G47/91 , H01L21/683 , H01L23/00 , F16H35/00
摘要： An alignment mechanism comprises a rotary unit 61 with a first rotary axis 61c, three power transmission mechanisms 62, and three alignment action units 63. Each power transmission mechanism 62 comprises a first arm 621 and a second arm 622. The first arm 621 includes a first end 621a pivotably supported at a corresponding one of three different positions P11 to P13, and a second end 621b on the opposite side of the first end 621a. The second arm 622 includes a second rotary axis 622c and is pivotably supported on the second end 621b of the first arm 621 at a position different from the second rotary axis 622c. The alignment action units 63 are connected to corresponding second arms. The second rotary axes 622c are at three positions P21 to P23 separated from the rotary unit 61 toward three different directions centered on the first rotary axis 61c.

5. 发明授权

US09305736B2 Phosphor for dispersion-type EL, dispersion-type EL device, and method of manufacturing the same 有权
标题翻译：用于分散型EL的荧光体，分散型EL器件及其制造方法
公开(公告)号：US09305736B2
公开(公告)日：2016-04-05
申请号：US14131754
申请日：2012-07-11
申请人： Koichi Wani , Tatsuya Kanda , Emi Hashimoto , Kazushi Kawakami , Sadahiro Yagishita , Fumitaka Iwakura , Taku Nishikawa
发明人： Koichi Wani , Tatsuya Kanda , Emi Hashimoto , Kazushi Kawakami , Sadahiro Yagishita , Fumitaka Iwakura , Taku Nishikawa
IPC分类号： C09K11/00 , C09K11/08 , C09K11/56 , H05B33/10 , H05B33/14 , H01J7/02 , C09K11/64 , C09K11/58 , C09K11/61 , B29C43/00 , B29C43/52
CPC分类号： H01J7/02 , B29C43/003 , B29C43/52 , C09K11/584 , C09K11/612 , C09K11/642
摘要： Provided is a phosphor for a dispersion-type EL that may be manufactured in a simple process and may provide stable, high brightness and light emission efficiency. The phosphor for a dispersion-type EL according to the present invention includes a mixture of an electron-accepting phosphor particle (4A) and an electron-donating phosphor particle (4B). The electron-accepting phosphor particle (4A) includes a base particle and an acceptor element added thereto, and the electron-donating phosphor particle (4B) includes a base particle and a donor element added thereto. For example, the base particle is a ZnS particle, the acceptor element is Cu, and the donor element is Cl or Al.
摘要翻译：提供了可以以简单的方法制造的分散型EL的荧光体，并且可以提供稳定的高亮度和发光效率。根据本发明的分散型EL的荧光体包括电子接受荧光体颗粒（4A）和供电子荧光体颗粒（4B）的混合物。受电子荧光体颗粒（4A）包括添加到其中的基础颗粒和受体元素，并且供电子荧光体颗粒（4B）包括添加到其中的基础颗粒和施主元件。例如，基础颗粒是ZnS颗粒，受主元素是Cu，供体元素是Cl或Al。

6. 发明申请

US20140348622A1 WAFER TRANSPORT APPARATUS 审中-公开
标题翻译： WAFER运输设备
公开(公告)号：US20140348622A1
公开(公告)日：2014-11-27
申请号：US14365419
申请日：2011-12-15
申请人： Katsuhiro Yamazoe , Shinichi Imai , Kosuke Sakata , Yoshiki Nishijima , Hiroaki Tsukimoto
发明人： Katsuhiro Yamazoe , Shinichi Imai , Kosuke Sakata , Yoshiki Nishijima , Hiroaki Tsukimoto
IPC分类号： H01L21/67 , B25J11/00
CPC分类号： H01L21/67265 , B25J11/0095 , H01L21/67259 , H01L21/67742 , H01L21/67754 , H01L21/68
摘要： An object is to make it possible to adequately reduce the wafer transport time and to contribute to size-reduction of the semiconductor processing system.Two wafer supports (3, 4) on which wafers (100) are placed are arranged to be apart from each other by a distance (D) in a vertical direction . To transport two wafers (100) to respective loading stages (200A, 200B), first a wafer (100) placed on the lower wafer support (3) is subjected to correction of its position in its main plane, and the wafer supports (3, 4) are descended. After the wafer (100) placed on the wafer support (3) is loaded onto pins (211-213), another wafer (100) placed on the upper wafer support (4) is subjected to correction of its position in its main plane, and the wafer supports (3, 4) are descended.
摘要翻译：目的是使得可以充分地减少晶片传送时间并有助于半导体处理系统的尺寸减小。在其上放置晶片（100）的两个晶片支撑（3,4）被布置成在垂直方向上彼此分开一段距离（D）。为了将两个晶片（100）传输到相应的加载级（200A，200B），首先将放置在下晶片支撑件（3）上的晶片（100）进行其主平面中的位置的校正，并且将晶片支撑件，4）下降。将放置在晶片支架（3）上的晶片（100）装载到引脚（211-213）上之后，放置在上晶片支架（4）上的另一个晶片（100）在其主平面中进行其位置的校正，并且晶片支撑件（3,4）下降。

7. 发明申请

US20130252432A1 PATTERNING METHOD 审中-公开
标题翻译：绘图方法
公开(公告)号：US20130252432A1
公开(公告)日：2013-09-26
申请号：US13992932
申请日：2011-12-16
申请人： Masaru Nakamura , Takashi Kawaguchi , Yoshinori Ikagawa , Chisato Nagahata
发明人： Masaru Nakamura , Takashi Kawaguchi , Yoshinori Ikagawa , Chisato Nagahata
IPC分类号： H01L21/306
CPC分类号： H01L21/306 , H01L31/022425 , H01L31/0392 , H01L31/1884 , H01L51/0017 , Y02E10/50
摘要： Provided is a patterning method that can greatly reduce process costs and environmental load. The patterning method includes: a film forming step of forming a functional film (2) on a substrate (1) ; and an etching step of irradiating the substrate with vacuum ultraviolet light (12) from above a mask (4) that is placed on the functional film (2) and has an arbitrarily-defined opening (4A) so as to dry etch the functional film (2) positioned below the opening (4A). The dry etching step can be carried out in an atmosphere containing oxygen. For example, dry air can be used as process gas. In addition, N2 may be supplied as an inert gas to the substrate (1) placed in the atmosphere.
摘要翻译：提供了可以大大降低工艺成本和环境负荷的图案化方法。图案形成方法包括：在基板（1）上形成功能膜（2）的成膜工序; 以及蚀刻步骤，从放置在功能膜（2）上的掩模（4）的上方以真空紫外线（12）照射基板，并具有任意限定的开口（4A），从而干燥蚀刻功能膜（2）定位在开口（4A）的下方。干蚀刻步骤可以在含氧的气氛中进行。例如，干燥空气可以用作工艺气体。此外，可以将N 2作为惰性气体供给到放置在大气中的基板（1）。

8. 发明授权

US4889069A Substrate coating equipment 失效
标题翻译：基材涂布设备
公开(公告)号：US4889069A
公开(公告)日：1989-12-26
申请号：US274882
申请日：1988-11-22
申请人： Kazushi Kawakami
发明人： Kazushi Kawakami
IPC分类号： B05C11/08 , B05C11/10 , G03F7/16 , H01L21/027
CPC分类号： B05C11/1039 , B05C11/08 , G03F7/162
摘要： This invention relates to a coating equipment to be used for coating a coating solution (coating diffusion agent, photo-resist agent, etc.) on a film which forms patterns of photo mask substrates (hereinafter merely called "substrates") used for production of reticle and photo masks or of glass substrates used for liquid crystal display. It features that said coating equipment comprises of a substrate table (spin head) having vacuum suction holes to set and fix said substrates being formed on the upper part of the spindle, a vessel for wrapping said spin head consisting of a vessel body having a peripheral side wall of a certain fixed height and its coverlid means, and both said vessel body and coverlid being able to be separated, a plurality of small holes and tubes being provided at the lower part of said peripheral side wall with a prompt interval, a doughnut-like cup being arranged and placed so that said doughnut-like cut can wrap said vessel of the above structure inside the center portion of said cup, an air suction hole whose height is a little larger than the outer diameter of said small holes or tubes being drilled and provided on the internal periphery of said cup, and the bottom portion of said cup being interconnected to a pipe furnished with an exhaust fan.
摘要翻译：本发明涉及一种涂覆设备，用于在形成用于生产的光掩模基板（以下简称为“基板”）的图案的膜上涂覆涂布溶液（涂层扩散剂，光致抗蚀剂等）掩模版和光掩模或用于液晶显示的玻璃基板。其特征在于，所述涂覆设备包括具有真空抽吸孔的衬底台（旋转头），以设置和固定形成在心轴的上部的所述衬底，用于包裹所述旋转头的容器，所述容器主体包括具有周边具有一定固定高度的侧壁和其盖板装置，并且所述容器主体和盖板都能够分离，多个小孔和管被提供在所述周边侧壁的下部，具有提示间隔，环形圈配置和放置，使得所述环状切口可以将上述结构的容器包裹在所述杯的中心部分内，空气吸入孔的高度比所述小孔或管的外径稍大被钻孔并设置在所述杯的内周上，并且所述杯的底部与配备有排风扇的管道互连。

9. 发明授权

US10895805B2 Pellicle manufacturing method and method for manufacturing photomask with pellicle 有权
公开(公告)号：US10895805B2
公开(公告)日：2021-01-19
申请号：US15794420
申请日：2017-10-26
申请人： MITSUI CHEMICALS, INC. , TAZMO CO., LTD.
发明人： Kazuo Kohmura , Daiki Taneichi , Yosuke Ono , Hisako Ishikawa , Tsuneaki Biyajima , Yasuyuki Sato , Toshiaki Hirota
IPC分类号： G03F1/62 , G03F1/60 , G03F1/64 , C09J7/38 , G03F1/80
摘要： A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.

10. 发明授权

US10046356B2 Coating apparatus and coating method 有权
公开(公告)号：US10046356B2
公开(公告)日：2018-08-14
申请号：US14361906
申请日：2012-10-17
申请人： TAZMO CO., LTD.
发明人： Yoshinori Ikagawa , Naoki Tsuo
IPC分类号： B05C11/10 , B05D1/02 , B05B1/34 , B05C5/02 , B05D1/26
摘要： This coating device according to the present invention comprises a slit nozzle (30); a liquid supply path (10) for a coating liquid; a pneumatic transportation device (20) for transporting the coating liquid pneumatically; a liquid supply valve (50) for opening/shutting the liquid supply path (10); a pump (40) configured so as to be capable of suctioning the coating liquid inside the slit nozzle (30); a residual-pressure removal means (80) for removing the residual pressure inside the slit nozzle (30); and a control section (70) for controlling the operation of the liquid supply valve (50), the pump (40), and the residual-pressure removal means (80); wherein the coating liquid remaining inside the slit nozzle (30) is suctioned at the end of coating after pumping of the coating liquid is stopped and the residual pressure inside the slit nozzle (30) is removed. With this configuration the coating device improves responsive at the end of the coating without a complicated control procedure.

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