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    • 9. 发明授权
    • Impedance matching apparatus
    • 阻抗匹配装置
    • US08884520B2
    • 2014-11-11
    • US13571167
    • 2012-08-09
    • Jae Hyun KimSang Won LeeYong Gwan Lee
    • Jae Hyun KimSang Won LeeYong Gwan Lee
    • H01J19/78H05H1/46H03H7/40H01J37/32
    • H05H1/46H01J37/32091H01J37/32183H03H7/40H05H2001/4682
    • Provided is an impedance matching apparatus for matching impedance to a plasma load. The impedance matching apparatus includes a first frequency impedance matching circuit unit that transfers an output of a first frequency RF power source unit, operating at a first frequency, to the plasma load; and a second frequency impedance matching circuit unit that transfers an output of a second frequency RF power source unit, operating at a second frequency higher than the first frequency, to the plasma load. The first frequency impedance matching circuit unit includes a T-type matching circuit, and the second frequency impedance matching circuit unit includes a standard L-type matching circuit or Π-type matching circuit.
    • 提供了一种用于将阻抗匹配到等离子体负载的阻抗匹配装置。 阻抗匹配装置包括第一频率阻抗匹配电路单元,其将以第一频率工作的第一频率RF电源单元的输出传送到等离子体负载; 以及第二频率阻抗匹配电路单元,其将以比第一频率高的第二频率工作的第二频率RF电源单元的输出传送到等离子体负载。 第一频率阻抗匹配电路单元包括T型匹配电路,第二频率阻抗匹配电路单元包括标准L型匹配电路或“P”型匹配电路。