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    • 84. 发明授权
    • Gallium nitride based diodes with low forward voltage and low reverse current operation
    • 具有低正向电压和低反向电流操作的氮化镓基二极管
    • US07476956B2
    • 2009-01-13
    • US10445130
    • 2003-05-20
    • Primit ParikhUmesh Mishra
    • Primit ParikhUmesh Mishra
    • H01L27/095H01L29/812H01L31/108
    • H01L29/475H01L29/2003H01L29/872H01L29/88
    • New Group III based diodes are disclosed having a low on state voltage (Vf) and structures to keep reverse current (Irev) relatively low. One embodiment of the invention is Schottky barrier diode made from the GaN material system in which the Fermi level (or surface potential) of is not pinned. The barrier potential at the metal-to-semiconductor junction varies depending on the type of metal used and using particular metals lowers the diode's Schottky barrier potential and results in a Vf in the range of 0.1-0.3V. In another embodiment a trench structure is formed on the Schottky diodes semiconductor material to reduce reverse leakage current. and comprises a number of parallel, equally spaced trenches with mesa regions between adjacent trenches. A third embodiment of the invention provides a GaN tunnel diode with a low Vf resulting from the tunneling of electrons through the barrier potential, instead of over it. This embodiment can also have a trench structure to reduce reverse leakage current.
    • 公开了具有低导通状态电压(Vf)和保持反向电流(Irev)相对较低的结构的新的基于III族的二极管。 本发明的一个实施例是由GaN材料系统制成的肖特基势垒二极管,其中费米能级(或表面电位)不被固定。 金属对半导体结的势垒电位根据所使用的金属类型而变化,并且使用特定的金属降低二极管的肖特基势垒电位,并导致Vf在0.1-0.3V的范围内。 在另一个实施例中,在肖特基二极管半导体材料上形成沟槽结构以减少反向漏电流。 并且包括多个平行的等间距的沟槽,其间具有相邻沟槽之间的台面区域。 本发明的第三实施例提供了一种具有低Vf的GaN隧道二极管,其由电子穿过势垒电位而不是在其上引起。 该实施例还可以具有沟槽结构以减少反向漏电流。
    • 86. 发明授权
    • Transistors and method for making ohmic contact to transistors
    • 用于与晶体管欧姆接触的晶体管和方法
    • US08878245B2
    • 2014-11-04
    • US11904064
    • 2007-09-25
    • Primit ParikhSten Heikman
    • Primit ParikhSten Heikman
    • H01L29/66H01L29/45H01L29/778H01L29/20
    • H01L29/7787H01L29/2003H01L29/452H01L29/66462
    • A transistor device having non-alloyed ohmic contacts formed by a process that improves the contact morphology and reduces metal spiking into the semiconductor layers. During fabrication, a regrowth mask is deposited on the semiconductor device. A portion of the regrowth mask and the epitaxial semiconductor layers is removed, defining areas for selective regrowth of a highly-doped semiconductor material. The remaining portion of the regrowth mask forms a regrowth mask residual layer. After regrowth, ohmic contacts are formed on the regrowth structures without the use of a high-temperature annealing process. The regrowth mask residual layer does not need to be removed, but rather remains on the device throughout fabrication and can function as a passivation layer and/or a spacer layer.
    • 具有非合金欧姆接触的晶体管器件,其通过改善接触形态并减少金属掺入半导体层的工艺形成。 在制造期间,再生长掩模沉积在半导体器件上。 去除再生长掩模和外延半导体层的一部分,限定用于高掺杂半导体材料的选择性再生长的区域。 再生长掩模的剩余部分形成再生长掩模残留层。 在再生后,在再生长结构上形成欧姆接触,而不使用高温退火工艺。 再生长掩模残留层不需要去除,而是整个制造中保留在器件上,并且可以用作钝化层和/或间隔层​​。