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81. 发明授权

US06543080B1 Apparatus and method for cleaning semiconductor substrate 有权
标题翻译：用于清洁半导体衬底的装置和方法
公开(公告)号：US06543080B1
公开(公告)日：2003-04-08
申请号：US09635848
申请日：2000-08-11
申请人： Hiroshi Tomita , Soichi Nadahara , Mitsuhiko Shirakashi , Kenya Ito , Yuki Inoue
发明人： Hiroshi Tomita , Soichi Nadahara , Mitsuhiko Shirakashi , Kenya Ito , Yuki Inoue
IPC分类号： B08B312
CPC分类号： B08B3/12
摘要： A semiconductor substrate cleaning apparatus and method are capable of efficiently removing contamination from both the obverse and reverse sides of a semiconductor substrate. A single cleaning liquid supply nozzle for supplying a cleaning liquid to both the obverse and reverse sides of a semiconductor substrate to be cleaned is placed at a distance from the outer peripheral edge of the substrate. An ultrasonic vibrator applies ultrasonic waves to both the obverse and reverse sides of the substrate. Four driving rollers are disposed in contact with the outer peripheral edge of the substrate. The driving rollers are adapte to rotate while being engaged with the outer peripheral edge of the substrate thereby drivingly rotating the substrate.
摘要翻译：半导体衬底清洁装置和方法能够有效地去除半导体衬底的正面和反面两侧的污染物。将待清洗的半导体衬底的正面和反面两侧的清洗液供给单个清洗液供给喷嘴设置在与衬底的外周边缘一定距离处。超声波振动器对基板的正反面施加超声波。四个驱动辊设置成与基板的外周边缘接触。驱动辊适于旋转，同时与基板的外周边缘接合，从而驱动旋转基板。

82. 发明授权

US06494220B1 Apparatus for cleaning a substrate such as a semiconductor wafer 有权
标题翻译：用于清洁诸如半导体晶片的基板的装置
公开(公告)号：US06494220B1
公开(公告)日：2002-12-17
申请号：US09584091
申请日：2000-05-31
申请人： Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
发明人： Naoki Matsuda , Kenya Ito , Mitsuhiko Shirakashi
IPC分类号： B08B304
CPC分类号： H01L21/67051 , B08B1/04 , B08B3/02 , Y10S134/902
摘要： A cleaning apparatus comprises a holder for holding a substrate such as a semiconductor wafer horizontally and rotating the substrate about its central axis, while conducting a cleaning operation of the substrate by supplying a cleaning liquid thereto. The apparatus further comprises a cleaning vessel including a side wall encircling the substrate rotated by the holder to intercept the cleaning liquid supplied to and scattered from the rotating substrate and then finally drain the cleaning liquid. There is provided a vent duct for carrying gas from the inside of the cleaning vessel to the outside of the same. The vent duct includes an inlet provided at substantially the same level as that of the substrate for introducing the gas into the vent duct. The side wall may include an inner surface along which the cleaning liquid scattered from the substrate flows downward in a spiral manner, with the inner surface, being of a construction which impedes the spiral movement of the liquid in a circumferential or peripheral direction.
摘要翻译：清洁装置包括用于水平地保持诸如半导体晶片的基板并且使基板围绕其中心轴旋转的保持器，同时通过向其提供清洁液体进行清洁操作。该装置还包括一个清洁容器，该清洁容器包括围绕由保持器旋转的基板的侧壁，以拦截供应到旋转基板并从旋转基板散射的清洗液体，然后最终排出清洗液体。设置有用于将气体从清洁容器的内部输送到其外部的通风管道。排气管道包括与基板基本相同的水平设置的入口，用于将气体引入通风管道。侧壁可以包括内表面，从衬底散射的清洁液体沿着内表面以螺旋方式向下流动，内表面具有阻止液体在周向或周向上的螺旋运动的结构。

83. 发明授权

US6141812A Cleaning apparatus and cleaning member rinsing apparatus 有权
标题翻译：清洁装置和清洁构件冲洗装置
公开(公告)号：US6141812A
公开(公告)日：2000-11-07
申请号：US189985
申请日：1998-11-12
申请人： Naoki Matsuda , Kenya Ito
发明人： Naoki Matsuda , Kenya Ito
IPC分类号： B24B55/12 , B08B3/04 , H01L21/00
CPC分类号： H01L21/67051 , B08B1/007 , B08B3/04 , H01L21/67046
摘要： A rinsing apparatus comprising a rinsing sink for rinsing an article brought thereinto with a rinsing liquid which is continuously supplied thereinto, and a carrier for carrying an article to be rinsed. The rinsing sink is provided with a drain hole in the bottom wall of the sink. The carrier is adapted to move between a rinsing position where the article is positioned close to an inlet of the drain hole, thereby restricting a flow path from the sink to the drain hole so that the rinsing liquid continuously supplied into the sink fills and then overflows from the sink while a flow of the rinsing liquid through the restricted flow path is maintained, and a retracted position where the article is positioned out of the sink to allow the rinsing liquid to flow through the flow path into the drain hole without the restriction by the article.
摘要翻译：一种漂洗装置，包括用于冲洗其中连续供应的冲洗液体的物品的冲洗槽和用于承载要冲洗的物品的载体。冲洗槽在水槽底壁设有排水孔。载体适于在物品靠近排水孔的入口定位的冲洗位置之间移动，从而限制从水槽到排水孔的流动路径，使得连续供应到水槽中的冲洗液体填满然后溢出从冲洗液体流过限制流路的同时保持冲洗液体的流动以及物品位于水槽外的缩回位置，以使冲洗液体能够通过流路流入排水孔，而不受文章。

84. 发明授权

US6116994A Polishing apparatus 失效
标题翻译：抛光设备
公开(公告)号：US6116994A
公开(公告)日：2000-09-12
申请号：US58163
申请日：1998-04-10
申请人： Kenya Ito , Hideo Aizawa
发明人： Kenya Ito , Hideo Aizawa
IPC分类号： B24B37/34 , B24B47/20 , B24B5/00
CPC分类号： B24B37/345 , B24B47/20
摘要： A compact polishing apparatus has been developed which can be installed in a relatively small space, and is highly rigid without increasing the weight of the apparatus. The polishing apparatus comprises a polishing table, a top ring head for rotatably holding a substrate, a substrate transfer device for transferring the substrate to and from a substrate storage section, a substrate delivery device for delivery of the substrate between the top ring head and the substrate transfer device at a delivery position outside of the polishing table. A guide rail device is laid between the polishing table and the substrate delivery device, and a carriage device movable along the guide rail device is provided for carrying the top ring device thereon.
摘要翻译：已经开发了一种紧凑的抛光装置，其可以安装在相对较小的空间中，并且高度刚性，而不增加装置的重量。抛光装置包括抛光台，用于可旋转地保持基板的顶环头，用于将基板转移到基板存储部分的基板转移装置，用于将基板输送到顶环头部和在抛光台外的输送位置处的基板转印装置。导轨装置被放置在抛光台和基板输送装置之间，并且可沿着导轨装置移动的支架装置用于在其上承载顶环装置。

85. 发明授权

US6083599A Perpendicular magnetic recording media and magnetic recording and reproducing apparatus using the same 失效
标题翻译：垂直磁记录介质和使用其的磁记录和再现设备
公开(公告)号：US6083599A
公开(公告)日：2000-07-04
申请号：US922763
申请日：1997-09-03
申请人： Yoshiyuki Hirayama , Masaaki Futamoto , Yukio Honda , Kazusuke Yamanaka , Kenya Ito
发明人： Yoshiyuki Hirayama , Masaaki Futamoto , Yukio Honda , Kazusuke Yamanaka , Kenya Ito
IPC分类号： G11B5/64 , G11B5/66
CPC分类号： G11B5/656 , G11B5/64 , G11B5/66 , Y10S428/90 , Y10T428/265
摘要： A perpendicular magnetic recording medium is provided by using a ferromagnetic polycrystalline thin film having main components of cobalt and chromium in which the coercivity is 1500 oersted or more and the fluctuation field of magnetic viscosity is 30 oersted or more; the film thickness is controlled within a range from 30 nm to 100 nm. A perpendicular magnetic recording medium with low noise and high output which is suited for high density recording can be obtained and a large capacity magnetic recording and reproducing apparatus can be provided by using this medium.
摘要翻译：通过使用其中矫顽力为1500奥斯特或更高矫顽磁力的主要成分为钴和铬的铁磁性多晶薄膜，并且磁粘度的波动场为30奥斯特或更高，提供垂直磁记录介质; 膜厚控制在30nm至100nm的范围内。可以获得适合于高密度记录的具有低噪声和高输出的垂直磁记录介质，并且可以通过使用该介质来提供大容量磁记录和再现装置。

86. 发明授权

US5923485A Storage device for reliably maintaining data in a reproducible state for a long period of time 失效
公开(公告)号：US5923485A
公开(公告)日：1999-07-13
申请号：US811570
申请日：1997-03-05
申请人： Kenya Ito
发明人： Kenya Ito
IPC分类号： G11B5/027 , G06F12/08 , G11B5/012 , G11B5/86 , G11B19/04 , G11B19/06 , G11B19/12 , G11B20/00 , G11B20/18 , G11B27/36 , G11B33/14
CPC分类号： G06F12/0866 , G11B19/04 , G11B19/06 , G11B19/12 , G11B20/00 , G11B27/36 , G11B5/012 , G06F2212/312 , G11B20/18 , G11B33/14
摘要： A time counting device, a cache memory and a copy control circuit are added to a conventional disk drive so that recorded information is copied periodically and automatically. Alternatively, a cache memory, a copy control circuit, a reference control circuit, a first time counting device and a second time counting device are added to the conventional disk drive so that information which remains recorded for a predetermined period of time after its last recording date is automatically copied. According to another embodiment, a reference signal is recorded in advance and a reproduced output is periodically measured. If the reproduced output is lower than a reference value, recorded information is automatically copied. According to yet another embodiment, the temperature in the disk drive is measured by a thermometer 18, and if the temperature is higher than a reference value, information is automatically copied at shorter intervals than when the temperature is less than the reference value. Other embodiments are also disclosed with the aim of ensuring that information recorded on a magnetic media can always be reproduced reliably, even in the case of high density recording.

87. 发明授权

US07964692B2 Polymer obtained by addition-polymerization initiated by a silicon compound 有权
标题翻译：通过硅化合物引发的加成聚合得到的聚合物
公开(公告)号：US07964692B2
公开(公告)日：2011-06-21
申请号：US12318733
申请日：2009-01-07
申请人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
发明人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
IPC分类号： C08G77/04
CPC分类号： C08G77/04 , C07F7/21 , C08F10/00 , C08F30/08 , C08F2500/03
摘要： A polymer represented by Formula (7): wherein all variables are defined in the specification, including P1 which is a polymer chain obtained by polymerizing an addition-polymerizable monomer, which makes it possible to control the structure of the polymer as a molecular aggregate.
摘要翻译：由式（7）表示的聚合物：其中所有变量在本说明书中定义，包括P1是通过聚合可加聚单体获得的聚合物链，其可以将聚合物的结构控制为分子聚集体。

88. 发明授权

US07868112B2 Fluorine-containing polymer and resin composition 有权
标题翻译：含氟聚合物和树脂组合物
公开(公告)号：US07868112B2
公开(公告)日：2011-01-11
申请号：US12519347
申请日：2007-12-17
申请人： Hisao Oikawa , Koji Ohguma , Kenya Ito , Minoru Nakayama , Shin Koga , Mikio Yamahiro , Hiroyuki Sato
发明人： Hisao Oikawa , Koji Ohguma , Kenya Ito , Minoru Nakayama , Shin Koga , Mikio Yamahiro , Hiroyuki Sato
IPC分类号： C08F30/08
CPC分类号： C08F290/06 , C08F283/12 , C08F290/068 , C08F290/14 , C08F290/148 , C08G77/04 , C08G77/24 , C08G77/385
摘要： A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable monomer and has a group having a polymerizable unsaturated bond on a side chain, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer having a functional group capable of introducing a group having a polymerizable unsaturated bond.
摘要翻译：含有：分子内具有一个加成聚合官能团的氟代倍半硅氧烷的结构单元A的聚合物; 衍生自具有可加聚官能团的有机聚硅氧烷的结构单元B; 和由可加成聚合单体衍生的具有在侧链上具有聚合性不饱和键的基团的结构单元C，并且任选地含有来自除了具有一个可加聚可聚合的氟代倍半硅氧烷之外的可加聚单体的结构单元D 分子中的官能团，具有加聚性官能团的有机聚硅氧烷和具有能够引入具有聚合性不饱和键的基团的官能团的加成聚合性单体。

89. 发明授权

US07863396B2 Silicon compounds 有权
标题翻译：硅化合物
公开(公告)号：US07863396B2
公开(公告)日：2011-01-04
申请号：US10548365
申请日：2004-03-05
申请人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
发明人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
IPC分类号： C08F130/08
CPC分类号： C08G77/04 , C07F7/21 , C08F10/00 , C08F30/08 , C08F2500/03
摘要： The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH═CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH═CH—; and A1 is a group having an α-haloester group.
摘要翻译：本发明提供由式（1）表示的硅化合物和使用它的聚合物，不仅可以获得具有不同结构的有机 - 无机复合材料，而且可以控制上述结构聚合物作为分子聚集体。其中R1是独立地选自氢，碳原子数为1至40的烷基，取代或未取代的芳基和取代或未取代的芳基烷基的基团; 在该碳原子数为1至40的烷基中，任选的氢可以被氟取代，并且任选的-CH 2 - 可以被-O - ， - CH = CH-，亚环烷基或环亚烯基取代; 在该芳烷基中的亚烷基中，任选的氢可以被氟取代，并且任选的-CH 2 - 可以被-O-或-CH = CH-取代; A1为具有α-卤代基团的基团。

90. 发明申请

US20100136886A1 POLISHING APPARATUS AND SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：抛光设备和基板加工设备
公开(公告)号：US20100136886A1
公开(公告)日：2010-06-03
申请号：US12699318
申请日：2010-02-03
申请人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
发明人： Akihisa Hongo , Kenya Ito , Kenji Yamaguchi , Masayuki Nakanishi
IPC分类号： B24B49/04 , B24B49/12 , B24B21/18 , B24B9/02
CPC分类号： B24B37/02 , B24B9/065 , B24B21/002
摘要： The present invention relates to a polishing apparatus for removing surface roughness produced at a peripheral portion of a substrate, or for removing a film formed on a peripheral portion of a substrate. The polishing apparatus includes a housing for forming a polishing chamber therein, a rotational table for holding and rotating a substrate, a polishing tape supply mechanism for supplying a polishing tape into the polishing chamber and taking up the polishing tape which has been supplied to the polishing chamber, a polishing head for pressing the polishing tape against a bevel portion of the substrate, a liquid supply for supplying a liquid to a front surface and a rear surface of the substrate, and a regulation mechanism for making an internal pressure of the polishing chamber being set to be lower than an external pressure of the polishing chamber.
摘要翻译：本发明涉及一种用于去除在基板的周边部分产生的表面粗糙度或用于去除形成在基板的周边部分上的膜的抛光装置。抛光装置包括：用于在其中形成抛光室的壳体，用于保持和旋转基板的旋转台;抛光带供给机构，用于将研磨带供给到抛光室中并且吸收已经被供给到抛光的研磨带用于将抛光带压靠在基板的斜面部分上的抛光头，用于将液体供应到基板的前表面和后表面的液体供应源，以及用于使抛光室的内部压力的调节机构被设定为低于抛光室的外部压力。

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