会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 83. 发明授权
    • Floating wordline using a dynamic row decoder and bitline VDD precharge
    • 浮动字线使用动态行解码器和位线VDD预充电
    • US06426914B1
    • 2002-07-30
    • US09839105
    • 2001-04-20
    • Robert H. DennardLouis L. HsuToshiaki K. Kirihata
    • Robert H. DennardLouis L. HsuToshiaki K. Kirihata
    • G11C800
    • G11C8/08G11C7/22G11C8/10G11C11/4076G11C11/4085G11C11/4087
    • A short cycle DRAM use a floating wordline, dynamic row decoder and bitline VDD precharge, which improves the array efficiency of the short cycle DRAM (3-6 ns) without compromising its performance. A small size wordline driver circuit is provided to reduce the row size of the short cycle DRAM without compromising row access timing. A dynamic decoding operation is implemented which intentionally allows some of the deselected wordlines to float during row access. A Vdd bitline precharge/sensing technique avoids a detrimental (or positive) coupling effect to the floating wordlines during row accessing. A Vdd data-line (or DQ) precharge for a read operation, and control of incoming data timing avoids a detrimental (or positive) coupling effect for a write operation.
    • 短周期DRAM使用浮动字线,动态行解码器和位线VDD预充电,这提高了短周期DRAM(3-6ns)的阵列效率,而不损害其性能。 提供了一种小尺寸字线驱动器电路,以减少短周期DRAM的行大小,而不会影响行访问时序。 实现动态解码操作,其有意地允许一些未选择的字线在行访问期间浮动。 Vdd位线预充电/感测技术在行访问期间避免了对浮动字线的有害(或正)耦合效应。 用于读取操作的Vdd数据线(或DQ)预充电以及输入数据时序的控制避免了写入操作的有害(或正)耦合效应。
    • 85. 发明授权
    • High performance semiconductor memory device with low power consumption
    • 高性能半导体存储器件,功耗低
    • US06307805B1
    • 2001-10-23
    • US09745227
    • 2000-12-21
    • John E. AndersenTerence B. HookLouis L. HsuWei HwangStephen V. KosonockyLi-Kong Wang
    • John E. AndersenTerence B. HookLouis L. HsuWei HwangStephen V. KosonockyLi-Kong Wang
    • G11C700
    • G11C8/08G11C11/418H01L27/11
    • A semiconductor memory device accessed with wordlines and bitlines has memory cells which operate at high performance with lower power consumption and have a high density. Each of the memory cells has pass transistors connected to a corresponding wordline and a corresponding pair of bitlines, and the pass transistors are gated by a signal of the corresponding wordline. The semiconductor memory device includes a wordline drive unit for selectively driving the wordlines in response to a row address. A wordline driver in the wordline drive unit boosts a corresponding wordline in a positive direction when the corresponding wordline is activated to access the memory cell and boosts the corresponding wordline in a negative direction when the corresponding wordline is inactive. By boosting the wordline in the positive direction, the performance of the memory cells is enhanced, and by boosting the wordline in the negative direction, a leakage current in the pass transistors with a low-threshold voltage is prevented.
    • 用字线和位线访问的半导体存储器件具有以较低的功耗以高密度工作的高性能的存储单元。 每个存储单元具有连接到相应字线和相应的一对位线的传输晶体管,并且通过晶体管由相应字线的信号选通。 半导体存储器件包括用于响应于行地址选择性地驱动字线的字线驱动单元。 当对应的字线不活动时,字线驱动单元中的字线驱动器在相应的字线被激活以访问存储器单元并且在相反的方向上升高相应的字线时以正方向提升相应的字线。 通过在正方向上升压字线,增强了存储单元的性能,并且通过在负方向上升高字线,防止具有低阈值电压的通过晶体管中的漏电流。
    • 87. 发明授权
    • Selective reduction of sidewall slope on isolation edge
    • 隔离边缘侧壁倾斜的选择性减小
    • US06228745B1
    • 2001-05-08
    • US09460134
    • 1999-12-13
    • Donald C. WheelerLouis L. HsuJack A. MandelmanRebecca D. Mih
    • Donald C. WheelerLouis L. HsuJack A. MandelmanRebecca D. Mih
    • H01L2176
    • H01L21/76232Y10S438/947
    • Disclosed is a semiconductor structure which comprises a transistor having a source implantation and a drain implantation formed in a semiconductor substrate. The transistor further comprises a gate electrode, a gate oxide, and an active area. The source implantation and drain implantation are situated on opposite sides of said active area, and said gate oxide and gate electrode are situated on top of said active region. The transistor further comprises two trench isolations adjacent to said active area, wherein said trench isolations are situated on opposite sides of said active area such that a sidewall of each trench serves as interface to said active area, at least one of said sidewalls of said trench isolations which serves as interface to said active area being sloped having a slope between 90° and 150°, said trench isolations and source implantation and drain implantation enclosing said active area on four sides.
    • 公开了一种半导体结构,其包括在半导体衬底中形成的源极注入和漏极注入的晶体管。 晶体管还包括栅电极,栅极氧化物和有源区。 源极注入和漏极注入位于所述有源区的相对侧,并且所述栅极氧化物和栅电极位于所述有源区的顶部。 晶体管还包括与所述有源区相邻的两个沟槽隔离,其中所述沟槽隔离位于所述有源区的相对侧,使得每个沟槽的侧壁用作与所述有源区的界面,所述沟槽的至少一个侧壁 用作与所述有源区的界面的隔离具有倾斜的90°至150°之间的斜率,所述沟槽隔离和源极注入和漏极注入在四个侧面上包围所述有源区。
    • 89. 发明授权
    • DRAM cell having an annular signal transfer region
    • DRAM单元具有环形信号传送区域
    • US06144054A
    • 2000-11-07
    • US205934
    • 1998-12-04
    • Farid AgahiLouis L. HsuJack A. Mandelman
    • Farid AgahiLouis L. HsuJack A. Mandelman
    • H01L21/8242H01L27/108H01L29/76H01L29/94H01L31/119
    • H01L27/10864H01L27/10841
    • A memory device formed in a substrate having a trench with side walls formed in the substrate. The device includes a bit line conductor and a word line conductor. A signal storage node has a first electrode, a second electrode formed within the trench, and a node dielectric formed between the first and second electrodes. A signal transfer device has: (i) an annular signal transfer region with an outer surface adjacent the side walls of the trench, an inner surface, a first end, and a second end; (ii) a first diffusion region coupling the first end of the signal transfer region to the. second electrode of the signal storage node; (iii) a second diffusion region coupling the second end of the signal transfer region to the bit line conductor; (iv) a gate insulator coating the inner surface of the signal transfer region; and (v) a gate conductor coating the gate insulator and coupled to the word line. A conductive connecting member couples the signal transfer region to a reference voltage to reduce floating body effects.
    • 一种存储器件,形成在具有形成在衬底中的侧壁的沟槽的衬底中。 该器件包括位线导体和字线导体。 信号存储节点具有形成在沟槽内的第一电极,第二电极和形成在第一和第二电极之间的节点电介质。 信号传递装置具有:(i)环形信号传递区域,其外表面邻近沟槽的侧壁,内表面,第一端和第二端; (ii)将信号传送区域的第一端耦合到第一扩散区域。 信号存储节点的第二电极; (iii)将信号传输区域的第二端耦合到位线导体的第二扩散区域; (iv)涂覆信号传送区域的内表面的栅极绝缘体; 和(v)涂覆栅极绝缘体并耦合到字线的栅极导体。 导电连接构件将信号传递区域耦合到参考电压以减少浮体效应。