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    • 86. 发明申请
    • Low switching current MTJ element for ultra-high STT-RAM and a method for making the same
    • 用于超高STT-RAM的低开关电流MTJ元件及其制造方法
    • US20090256220A1
    • 2009-10-15
    • US12082155
    • 2008-04-09
    • Cheng T. HorngRu-Ying TongYimin Guo
    • Cheng T. HorngRu-Ying TongYimin Guo
    • H01L29/82H01L21/00
    • H01L43/08H01L43/12Y10S977/883
    • A STT-RAM MTJ that minimizes spin-transfer magnetization switching current (Jc) while achieving a high dR/R is disclosed. The MTJ has a MgO tunnel barrier formed by natural oxidation to achieve a low RA, and a CoFeB/FeSiO/CoFeB composite free layer with a middle nanocurrent channel layer to minimize Jc0. There is a thin Ru capping layer for a spin scattering effect. The reference layer has a shape anisotropy and Hc substantially greater than that of the free layer to establish a “self-pinned” state. The free layer, capping layer and hard mask are formed in an upper section of a nanopillar that has an area substantially less than a lower pedestal section which includes a bottom electrode, reference layer, seed layer, and tunnel barrier layer. The reference layer is comprised of an enhanced damping constant material that may be an insertion layer, and the free layer has a low damping constant.
    • 公开了一种在实现高dR / R的同时使自旋转移磁化开关电流(Jc)最小化的STT-RAM MTJ。 MTJ具有通过自然氧化形成的MgO隧道势垒以实现低RA,以及具有中间纳米通道层的CoFeB / FeSiO / CoFeB复合自由层以使Jc0最小化。 有一个薄的Ru覆盖层用于自旋散射效应。 参考层具有形状各向异性,并且Hc基本上大于自由层的Hc以形成“自固定”状态。 自由层,覆盖层和硬掩模形成在纳米柱的上部,其具有基本上小于包括底部电极,参考层,种子层和隧道势垒层的下基座部分的面积。 参考层由增强的阻尼常数材料组成,其可以是插入层,并且自由层具有低阻尼常数。