专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明申请

US20130115110A1 PROCESSING CHAMBER INTEGRATED PRESSURE CONTROL 有权
标题翻译：加工室综合压力控制
公开(公告)号：US20130115110A1
公开(公告)日：2013-05-09
申请号：US13606689
申请日：2012-09-07
申请人： Merritt Funk , Lee Chen
发明人： Merritt Funk , Lee Chen
IPC分类号： F04B49/06 , H01L21/203 , H01L21/306
CPC分类号： F04B49/06 , C23C16/4412 , F04D19/042 , F04D27/0246 , H01L21/67017 , H01L21/67253
摘要： An apparatus and method for controlling pumping characteristics within a semiconductor processing chamber are provided. The apparatus includes levitation of a hollow shaft turbo pump or pump elements, and is configured to control pumping by including adjustments for orientation, position, geometries, and other aspects of the turbo pump. The method includes adjusting design and operational parameters, to control pumping characteristics within the processing chamber.
摘要翻译：提供一种用于控制半导体处理室内的泵浦特性的装置和方法。该装置包括悬挂空心轴涡轮泵或泵元件，并且构造成通过包括对涡轮泵的取向，位置，几何形状和其它方面的调整来控制泵送。该方法包括调整设计和操作参数，以控制处理室内的泵送特性。

82. 发明授权

US08291487B1 System and method for distributed multi-processing security gateway 有权
标题翻译：分布式多处理安全网关的系统和方法
公开(公告)号：US08291487B1
公开(公告)日：2012-10-16
申请号：US13397718
申请日：2012-02-16
申请人： Lee Chen , Ronald Wai Lun Szeto
发明人： Lee Chen , Ronald Wai Lun Szeto
IPC分类号： G06F9/00
CPC分类号： H04L63/0236 , H04L63/0227 , H04L63/0281 , H04L63/20 , H04L67/28
摘要： A system and method for a distributed multi-processing security gateway establishes a host side session, selects a proxy network address for a server, uses the proxy network address to establish a server side session, receives a data packet, assigns a central processing unit core from a plurality of central processing unit cores in a multi-core processor of the security gateway to process the data packet, processes the data packet according to security policies, and sends the processed data packet. The proxy network address is selected such that a same central processing unit core is assigned to process data packets from the server side session and the host side session. By assigning central processing unit cores in this manner, higher capable security gateways are provided.
摘要翻译：用于分布式多处理安全网关的系统和方法建立主机侧会话，为服务器选择代理网络地址，使用代理网络地址建立服务器端会话，接收数据包，分配中央处理单元核心从安全网关的多核处理器中的多个中央处理单元核心处理数据分组，根据安全策略处理数据分组，并发送处理后的数据分组。代理网络地址被选择为使得相同的中央处理单元核心被分配以处理来自服务器端会话和主机侧会话的数据分组。通过以这种方式分配中央处理单元核心，提供了更高能力的安全网关。

83. 发明申请

US20120248311A1 ION ENERGY ANALYZER AND METHODS OF MANUFACTURING THE SAME 有权
标题翻译：离子能分析仪及其制造方法
公开(公告)号：US20120248311A1
公开(公告)日：2012-10-04
申请号：US13433088
申请日：2012-03-28
申请人： Merritt Funk , Lee Chen , Barton Lane , Jianping Zhao , Radha Sundararajan
发明人： Merritt Funk , Lee Chen , Barton Lane , Jianping Zhao , Radha Sundararajan
IPC分类号： G01T1/16 , B23K31/02 , H01S4/00
CPC分类号： H01J37/32935 , H01J49/488 , H05H1/0081 , Y10T29/49002
摘要： A process by which an ion energy analyzer is manufactured includes processing a first substrate to form an entrance grid having a first channel and a first plurality of openings extending therethrough. A second substrate is processed to form a selection grid having a second channel therein and a second plurality of openings extending therethrough. A third substrate is processed to form an ion collector having a third channel therein. The entrance grid is operably coupled to, and electrically isolated from, the selection grid, which is, in turn, operably coupled to, and electrically isolated from, the ion collector.
摘要翻译：制造离子能量分析器的过程包括处理第一基底以形成具有第一通道和延伸穿过其中的第一多个开口的入口格栅。处理第二衬底以形成其中具有第二通道的选择栅格和延伸穿过其中的第二多个开口。处理第三衬底以形成其中具有第三通道的离子收集器。入口栅格可操作地耦合到选择栅格并与之电隔离，所述选择栅格又可操作地耦合到离子收集器并与电离隔离。

84. 发明授权

US08276540B2 Method and system for introducing process fluid through a chamber component 失效
标题翻译：通过腔室部件引入工艺流体的方法和系统
公开(公告)号：US08276540B2
公开(公告)日：2012-10-02
申请号：US13343877
申请日：2012-01-05
申请人： Lee Chen , Merritt Funk
发明人： Lee Chen , Merritt Funk
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67069 , H01J37/32192 , H01J37/3244
摘要： A method and system for introducing a process fluid through a chamber component in a processing system is described. The chamber component comprises a chamber element having a first surface on a supply side of the chamber element and a second surface on a process side of the chamber element, wherein the process side is opposite the supply side. Furthermore, the chamber component comprises a conduit extending through the chamber element from the supply side to the process side, wherein the conduit comprises an inlet configured to receive a process fluid and an outlet configured to distribute the process fluid.
摘要翻译：描述了一种通过处理系统中的腔室部件引入过程流体的方法和系统。腔室部件包括腔室元件，腔室元件具有在腔室元件的供应侧上的第一表面和腔室元件的过程侧上的第二表面，其中处理侧与供给侧相对。此外，腔室部件包括从供应侧延伸穿过腔室元件到管道侧的管道，其中管道包括被配置为接收过程流体的入口和被配置为分配过程流体的出口。

85. 发明申请

US20120084419A1 SYSTEM AND METHOD TO BALANCE SERVERS BASED ON SERVER LOAD STATUS 有权
标题翻译：基于服务器负载状态平衡服务器的系统和方法
公开(公告)号：US20120084419A1
公开(公告)日：2012-04-05
申请号：US12894142
申请日：2010-09-30
申请人： Lalgudi Narayanan KANNAN , Ronald Wai Lun Szeto , Lee Chen , Feilong Xu , Rajkumar Jalan
发明人： Lalgudi Narayanan KANNAN , Ronald Wai Lun Szeto , Lee Chen , Feilong Xu , Rajkumar Jalan
IPC分类号： G06F15/16
CPC分类号： H04L67/1008 , H04L67/02 , H04L67/1002
摘要： A method, system, and computer program product for balancing servers based on server load status, include: receiving from a server a service response to a service request, the service response including a result from a processing of the service request and a server status indicating a computing load status of the server; obtaining the server status from the service response; receiving a next service request from a host, the next service request comprising a Uniform Resource Locator (URL); determining that the server is configured to process the URL; determining whether the server status indicates that the server is available to process the next service request; and in response to determining that the server status indicates that the server is available to process the next service request, sending the next service request to the server.
摘要翻译：一种用于基于服务器负载状态平衡服务器的方法，系统和计算机程序产品，包括：从服务器接收对服务请求的服务响应，所述服务响应包括来自所述服务请求的处理的结果和指示服务器的计算负载状态; 从服务响应获取服务器状态; 从主机接收下一服务请求，所述下一服务请求包括统一资源定位符（URL）; 确定服务器被配置为处理URL; 确定服务器状态是否指示服务器可用于处理下一个服务请求; 并且响应于确定服务器状态指示服务器可用于处理下一服务请求，将下一服务请求发送到服务器。

86. 发明申请

US20110239289A1 System and Method to Associate a Private User Identity with a Public User Identity 有权
标题翻译：将私人用户身份与公共用户身份相关联的系统和方法
公开(公告)号：US20110239289A1
公开(公告)日：2011-09-29
申请号：US13153385
申请日：2011-06-03
申请人： Xin Wang , Lee Chen , John Chiong
发明人： Xin Wang , Lee Chen , John Chiong
IPC分类号： G06F15/173 , G06F21/00
CPC分类号： H04L63/102 , H04L12/66 , H04L29/06 , H04L61/6022 , H04L61/6068 , H04L63/02 , H04L63/0281 , H04L63/04 , H04L63/08 , H04L63/0853 , H04L63/10 , H04L63/30 , H04L63/308 , H04L65/1003 , H04L65/1006 , H04L65/1069 , H04L65/4007 , H04L67/14 , H04L67/141 , H04L67/146
摘要： The inventive system includes a host, a network including a security gateway, and a public application. Established are an access session between the network and the host and an application session between the public application and the network. An application session record is created for the application session, and includes the user's public user identity used to access the public application, the user's private user identity used to access the network, a host identity, and an application session time. To determine the private user identity for the application session, the security gateway sends a query with the host identity and the application session time. These are compared with the host identity and access session time in an access session record. If they match, then the private user identity in the access session record is returned, and it is stored as the private user identity in the application session record.
摘要翻译：本发明的系统包括主机，包括安全网关的网络和公共应用。建立在网络和主机之间的访问会话以及公共应用程序和网络之间的应用程序会话。为应用会话创建应用会话记录，并且包括用于访问公共应用的用户的公共用户标识，用于访问网络的用户的私有用户标识，主机标识和应用会话时间。为了确定应用程序会话的私有用户身份，安全网关发送具有主机标识和应用程序会话时间的查询。这些与访问会话记录中的主机身份和访问会话时间进行比较。如果匹配，则返回访问会话记录中的私有用户身份，并将其作为私有用户身份存储在应用程序会话记录中。

87. 发明申请

US20110177694A1 Switchable Neutral Beam Source 审中-公开
标题翻译：可切换中性光源
公开(公告)号：US20110177694A1
公开(公告)日：2011-07-21
申请号：US12688721
申请日：2010-01-15
申请人： Lee Chen , Merritt Funk
发明人： Lee Chen , Merritt Funk
IPC分类号： H01L21/467
CPC分类号： H01L21/32139 , H01J37/321 , H01J37/32357 , H01J37/32422 , H01L21/0273 , H01L21/0337 , H01L21/28123
摘要： The invention can provide apparatus and methods of processing a substrate in real-time using a switchable quasi-neutral beam system to improve the etch resistance of photoresist layer. In addition, the improved photoresist layer can be used in an etch procedure to more accurately control gate and/or spacer critical dimensions (CDs), to control gate and/or spacer CD uniformity, and to eliminate line edge roughness (LER) and line width roughness (LWR).
摘要翻译：本发明可以提供使用可切换的准中性束系统实时地处理衬底以提高光致抗蚀剂层的耐蚀刻性的装置和方法。此外，改进的光致抗蚀剂层可以用于蚀刻过程中以更准确地控制栅极和/或间隔物临界尺寸（CD），以控制栅极和/或间隔区CD均匀性，并且消除线边缘粗糙度（LER）和线宽度粗糙度（LWR）。

88. 发明申请

US20110174606A1 Apparatus and Method for Improving Photoresist Properties Using a Quasi-Neutral Beam 有权
标题翻译：使用准中性光束改善光刻胶性能的装置和方法
公开(公告)号：US20110174606A1
公开(公告)日：2011-07-21
申请号：US12688755
申请日：2010-01-15
申请人： Merritt Funk , Lee Chen , Radha Sundararajan
发明人： Merritt Funk , Lee Chen , Radha Sundararajan
IPC分类号： B01J19/08
CPC分类号： H01J37/3244 , H01J37/32009 , H01J37/3233 , H01J37/32357 , H01J37/32422 , H01J37/32449 , H01J37/32458 , H01J37/32532 , H01J2237/338
摘要： The invention can provide apparatus and methods of processing a substrate in real-time using a Quasi-Neutral Beam (Q-NB) curing system to improve the etch resistance of photoresist layer. In addition, the improved photoresist layer can be used to more accurately control gate and/or spacer critical dimensions (CDs), to control gate and/or spacer CD uniformity, and to eliminate line edge roughness (LER) and line width roughness (LWR).
摘要翻译：本发明可以提供使用准中性束（Q-NB）固化系统实时处理衬底以提高光致抗蚀剂层的耐蚀刻性的设备和方法。此外，改进的光致抗蚀剂层可用于更精确地控制栅极和/或间隔物临界尺寸（CD），以控制栅极和/或间隔区CD均匀性，并且消除线边缘粗糙度（LER）和线宽粗糙度（LWR ）。

89. 发明申请

US20110081500A1 Method of providing stable and adhesive interface between fluorine-based low-k material and metal barrier layer 审中-公开
标题翻译：在氟基低k材料和金属阻挡层之间提供稳定和粘合界面的方法
公开(公告)号：US20110081500A1
公开(公告)日：2011-04-07
申请号：US12574101
申请日：2009-10-06
申请人： Jianping Zhao , Lee Chen
发明人： Jianping Zhao , Lee Chen
IPC分类号： B05D3/04 , B05D3/06 , B05D5/12 , B05C11/00
CPC分类号： H01L21/76877 , B05D1/62 , B05D3/148 , H01L21/76801 , H01L21/76814 , H01L21/76825 , H01L21/76829 , H01L21/76831 , H01L21/76832 , H01L21/76834 , H01L21/76841 , H01L21/76843
摘要： A method of integrating a fluorine-based dielectric with a metallization scheme is described. The method includes forming a fluorine-based dielectric layer on a substrate, forming a metal-containing layer on the substrate, and adding a buffer layer or modifying a composition of the fluorine-based dielectric layer proximate an interface between the fluorine-based dielectric layer and the metal-containing layer.
摘要翻译：描述了一种将氟基电介质与金属化方案集成的方法。该方法包括在基板上形成氟基电介质层，在基板上形成含金属层，并在氟基介电层之间的界面附近添加缓冲层或修饰氟基电介质层的组成和含金属层。

90. 发明申请

US20110039355A1 Plasma Generation Controlled by Gravity-Induced Gas-Diffusion Separation (GIGDS) Techniques 有权
标题翻译：通过重力诱导气体扩散分离（GIGDS）技术控制的等离子体发生
公开(公告)号：US20110039355A1
公开(公告)日：2011-02-17
申请号：US12853771
申请日：2010-08-10
申请人： Jianping Zhao , Lee Chen , Merritt Funk , Toshihisa Nozawa
发明人： Jianping Zhao , Lee Chen , Merritt Funk , Toshihisa Nozawa
IPC分类号： H01L21/66
CPC分类号： H01J37/3244 , H01J37/32192 , H01L21/31116 , H01L21/32137
摘要： The invention can provide apparatus and methods of processing a substrate using plasma generation by gravity-induced gas-diffusion separation techniques. By adding or using gases including inert and process gases with different gravities (i.e., ratio between the molecular weight of a gaseous constituent and a reference molecular weight), a two-zone or multiple-zone plasma can be formed, in which one kind of gas can be highly constrained near a plasma generation region and another kind of gas can be largely separated from the aforementioned gas due to differential gravity induced diffusion and is constrained more closer to a wafer process region than the aforementioned gas.
摘要翻译：本发明可以提供使用通过重力引起的气体扩散分离技术的等离子体生成来处理衬底的装置和方法。通过添加或使用气体，包括不同重量的惰性气体和工艺气体（即气态成分的分子量与参考分子量之间的比例），可以形成两区或多区等离子体，其中一种气体可以在等离子体产生区域附近被高度约束，并且由于差分重力感应扩散，另一种气体可以与上述气体大大分离，并且比上述气体更受限于更接近于晶片工艺区域。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式