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    • 82. 发明申请
    • PHYSICAL UNCLONABLE FUNCTION CELL AND ARRAY
    • 物理不可靠功能单元和阵列
    • US20130222013A1
    • 2013-08-29
    • US13403339
    • 2012-02-23
    • Kai D. FengHailing WangPing-Chuan WangZhijian Yang
    • Kai D. FengHailing WangPing-Chuan WangZhijian Yang
    • H03D13/00
    • H03K5/156H03K5/1534
    • A function cell comprising a first field effect transistor (FET) device, a second FET device, a first node connected to a gate terminal of the first FET device and a gate terminal of the second FET device, wherein the first node is operative to receive a voltage signal from an alternating current (AC) voltage source, an amplifier portion connected to the first FET device and the second FET device, the amplifier portion operative to receive a signal from the first FET device and the second FET device, a phase comparator portion having a first input terminal connected to an output terminal of the amplifier and a second input terminal operative to receive the voltage signal from the AC voltage source, the phase comparator portion operative to output a voltage indicative of a bit of a binary value.
    • 一种功能单元,包括第一场效应晶体管(FET)器件,第二FET器件,连接到第一FET器件的栅极端子的第一节点和第二FET器件的栅极端子,其中第一节点可操作以接收 来自交流(AC)电压源的电压信号,连接到第一FET器件和第二FET器件的放大器部分,用于接收来自第一FET器件和第二FET器件的信号的放大器部分,相位比较器 部分具有连接到放大器的输出端子的第一输入端子和用于从AC电压源接收电压信号的第二输入端子,该相位比较器部分用于输出指示二进制值的位的电压。
    • 84. 发明申请
    • NONCONTACT ELECTRICAL TESTING WITH OPTICAL TECHNIQUES
    • 非接触式电气测试与光学技术
    • US20130027051A1
    • 2013-01-31
    • US13191555
    • 2011-07-27
    • Xu OuyangTso-Hui TingPing-Chuan WangYongchun Xin
    • Xu OuyangTso-Hui TingPing-Chuan WangYongchun Xin
    • G01R31/3187
    • G01R31/31728
    • An on-chip technique for noncontact electrical testing of a test structure on a chip is provided. On-chip photodiodes receives pump light from a pump light source, where the on-chip photodiodes are electrically connected to the test structure and are configured to generate power for the test structure. An on-chip coupling unit receives probe light from a probe light source, where the on-chip coupling unit is optically connected to on-chip waveguides through which the probe light is transferred. On-chip switches open in response to receiving voltage output from the test structure, and the on-chip switches remain closed when the voltage output is not received from the test structure. The on-chip switches pass the probe light when opened by the voltage output from the test structure. The on-chip switches block the probe light by remaining closed, when the voltage output is not received from the test structure.
    • 提供了芯片上测试结构的非接触电测试的片上技术。 片上光电二极管从泵浦光源接收泵浦光,其中片上光电二极管电连接到测试结构,并且被配置为产生用于测试结构的电力。 片上耦合单元接收来自探针光源的探测光,其中片上耦合单元光学连接到传输探针光的片上波导。 响应于测试结构的接收电压输出,片内开关打开,并且当没有从测试结构接收到电压输出时,片上开关保持闭合。 当由测试结构输出的电压打开时,片上开关通过探测灯。 当没有从测试结构接收到电压输出时,片内开关通过保持关闭来阻止探测光。
    • 86. 发明授权
    • Test structure for determination of TSV depth
    • 用于测定TSV深度的测试结构
    • US08232115B2
    • 2012-07-31
    • US12566726
    • 2009-09-25
    • Hanyi DingKai D. FengPing-Chuan WangZhijian Yang
    • Hanyi DingKai D. FengPing-Chuan WangZhijian Yang
    • H01L21/66
    • H01L22/34H01L21/76898
    • A test structure for a through-silicon-via (TSV) in a semiconductor chip includes a first contact, the first contact being electrically connected to a first TSV; and a second contact, wherein the first contact, second contact, and the first TSV form a first channel, and a depth of the first TSV is determined based on a resistance of the first channel. A method of determining a depth of a through-silicon-via (TSV) in a semiconductor chip includes etching a first TSV into the semiconductor chip; forming a first channel, the first channel comprising the first TSV, a first contact electrically connected to the first TSV, and a second contact; connecting a current source to the second contact; determining a resistance across the first channel; and determining a depth of the first TSV based on the resistance of the first channel.
    • 半导体芯片中的贯穿硅通孔(TSV)的测试结构包括:第一触点,第一触点电连接到第一TSV; 以及第二触点,其中所述第一触点,所述第二触点和所述第一TSV形成第一通道,并且基于所述第一通道的电阻来确定所述第一TSV的深度。 确定半导体芯片中的硅通孔(TSV)的深度的方法包括将第一TSV蚀刻到半导体芯片中; 形成第一通道,所述第一通道包括所述第一TSV,电连接到所述第一TSV的第一触点和第二触点; 将电流源连接到第二触点; 确定跨越第一通道的电阻; 以及基于所述第一通道的电阻确定所述第一TSV的深度。