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81. 发明申请

US20060193055A1 Method and apparatus for polarizing electromagnetic radiation 有权
标题翻译：用于偏振电磁辐射的方法和装置
公开(公告)号：US20060193055A1
公开(公告)日：2006-08-31
申请号：US11386496
申请日：2006-03-21
申请人： David Williams , James Kardach , Michael Goldstein
发明人： David Williams , James Kardach , Michael Goldstein
IPC分类号： G02B27/12
CPC分类号： G02B27/286 , G02B27/283 , G02F1/0136 , G02F1/09 , G03F7/70058 , G03F7/7055 , G03F7/70566
摘要： According to one aspect of the invention, a method and apparatus for polarizing electromagnetic radiation is provided. The electromagnetic radiation may be divided into first and second portions, substantially all of the first portion may be linearly polarized in a first direction and substantially all of the second portion may be linearly polarized in a second direction, the first direction being substantially orthogonal to the second direction. The linear polarization of at least one of the first and second portions may be changed such that substantially all of both of the first and second portions are linearly polarized in a third direction. At least one of the first and second portions may be redirected such that substantially all of both the first and second portions are propagating in a fourth direction.
摘要翻译：根据本发明的一个方面，提供了一种用于偏振电磁辐射的方法和装置。电磁辐射可以被分成第一和第二部分，基本上所有的第一部分可以在第一方向上线性偏振，并且基本上所有的第二部分可以在第二方向上线性偏振，第一方向基本上与第二个方向可以改变第一和第二部分中的至少一个的线性极化，使得第一和第二部分的基本上全部都在第三方向上线性偏振。第一部分和第二部分中的至少一个可以被重定向，使得第一部分和第二部分基本上全部都在第四方向上传播。

82. 发明申请

US20060137969A1 Method of manufacturing alloy sputtering targets 审中-公开
标题翻译：制造合金溅射靶的方法
公开(公告)号：US20060137969A1
公开(公告)日：2006-06-29
申请号：US11026644
申请日：2004-12-29
申请人： Gerald Feldewerth , John Barnak , Michael Goldstein
发明人： Gerald Feldewerth , John Barnak , Michael Goldstein
IPC分类号： C23C14/00
CPC分类号： H01J37/3429 , C23C14/3407 , H01J37/3491
摘要： The present invention relates to a composite sputtering target comprising a plurality of bonded metal pieces. The composite sputtering target further comprises a bonded region between the metal pieces. The bonded region may comprise an inter-metallic region upon bonding. The composite sputter target of the present invention may be used in conjunction with an apparatus for sputtering alloy films on substrates.
摘要翻译：复合溅射靶技术领域本发明涉及一种复合溅射靶，其包括多个接合金属片。复合溅射靶还包括金属片之间的接合区域。接合区域在结合时可以包括金属间区域。本发明的复合溅射靶可以与用于在基板上溅射合金膜的装置结合使用。

83. 发明授权

US07057262B2 High reflector tunable stress coating, such as for a MEMS mirror 有权
公开(公告)号：US07057262B2
公开(公告)日：2006-06-06
申请号：US10782297
申请日：2004-02-18
申请人： Michael Goldstein
发明人： Michael Goldstein
IPC分类号： H01L23/58
CPC分类号： B81C1/00666 , B81B2201/042 , B81C2201/0167 , G02B5/0833 , G02B26/0833 , Y10S438/954
摘要： An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

84. 发明申请

US20060093972A1 Active hardmask for lithographic patterning 失效
公开(公告)号：US20060093972A1
公开(公告)日：2006-05-04
申请号：US11293594
申请日：2005-12-02
申请人： Michael Goldstein , Manish Chandhok , Eric Panning , Robert Bristol , Bryan Rice
发明人： Michael Goldstein , Manish Chandhok , Eric Panning , Robert Bristol , Bryan Rice
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , G03F7/11
摘要： In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

85. 发明授权

US07033739B2 Active hardmask for lithographic patterning 失效
公开(公告)号：US07033739B2
公开(公告)日：2006-04-25
申请号：US10423466
申请日：2003-04-24
申请人： Michael Goldstein , Manish Chandhok , Eric Panning , Robert Bristol , Bryan J. Rice
发明人： Michael Goldstein , Manish Chandhok , Eric Panning , Robert Bristol , Bryan J. Rice
IPC分类号： G03F7/20
CPC分类号： G03F7/091 , G03F7/11
摘要： In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

86. 发明申请

US20050263724A1 Source multiplexing in lithography 有权
标题翻译：光刻中的光源复用
公开(公告)号：US20050263724A1
公开(公告)日：2005-12-01
申请号：US11196231
申请日：2005-08-02
申请人： Michael Goldstein , Peter Silverman
发明人： Michael Goldstein , Peter Silverman
IPC分类号： G03F7/20 , G01J1/00
CPC分类号： G03F7/7005 , G03F7/201
摘要： An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
摘要翻译：用于极紫外（EUV）光刻系统的照明系统可以包括多个EUV光源。当照射面罩时，系统可以组合来自多个源的光。

87. 发明授权

US06923394B2 Reeling device for a hoisting system 有权
标题翻译：起重系统的卷取装置
公开(公告)号：US06923394B2
公开(公告)日：2005-08-02
申请号：US10412809
申请日：2003-04-11
申请人： Michael Goldstein
发明人： Michael Goldstein
IPC分类号： B62D43/04 , B66D1/34 , B66D1/00
CPC分类号： B62D43/045 , B66D1/34
摘要： The invention provides a reeling device for a hoisting system, including a flexible member having a lower end and an upper end, a rotatable drum on which the flexible member is windable, disk means rotatably mounted on said drum, to which disk means the upper end of the flexible member is anchored, and a stop mechanism activated by the disk means once the flexible member has completely unreeled from the drum.
摘要翻译：本发明提供了一种用于起重系统的卷取装置，其包括具有下端和上端的柔性构件，可旋转滚筒，柔性构件可卷绕在其上，盘装置可旋转地安装在所述滚筒上，盘装置为上端所述柔性构件被固定，并且一旦所述柔性构件从所述滚筒完全退出，则由所述盘装置启动的止动机构。

88. 发明授权

US06884361B2 Method for making a mirror for photolithography 失效
标题翻译：制造光刻镜的方法
公开(公告)号：US06884361B2
公开(公告)日：2005-04-26
申请号：US09964876
申请日：2001-09-26
申请人： Michael Goldstein
发明人： Michael Goldstein
IPC分类号： C03C17/27 , C03C17/36 , G03F7/20 , G21K1/06 , C23F1/00
CPC分类号： C03C17/3636 , C03C17/27 , C03C17/36 , C03C17/3663 , C03C2217/213 , C03C2218/31 , C03C2218/322 , C03C2218/33 , G03F7/70958 , G21K1/06 , G21K2201/067
摘要： A method for making a substrate for a mirror used in photolithography is described. That method comprises forming a crystalline layer on a first layer, which has a low coefficient of thermal expansion. Part of the crystalline layer is then removed to form on the first layer a second layer that has a high quality surface finish.
摘要翻译：描述了制造用于光刻中的反射镜用基板的方法。该方法包括在具有低热膨胀系数的第一层上形成晶体层。然后去除部分晶体层以在第一层上形成具有高质量表面光洁度的第二层。

89. 发明授权

US06801298B2 Light condenser 有权
公开(公告)号：US06801298B2
公开(公告)日：2004-10-05
申请号：US10206779
申请日：2002-07-25
申请人： Michael Goldstein
发明人： Michael Goldstein
IPC分类号： G03B2754
CPC分类号： G03F7/702 , G03B27/42
摘要： A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.

90. 发明授权

US06700700B2 Reflective spectral filtering of high power extreme ultra-violet radiation 有权
标题翻译：大功率极紫外辐射的反射光谱滤波
公开(公告)号：US06700700B2
公开(公告)日：2004-03-02
申请号：US10408033
申请日：2003-04-03
申请人： Michael Goldstein
发明人： Michael Goldstein
IPC分类号： F21V906
CPC分类号： G03F7/70575 , G03F7/70158 , G03F7/70191 , G03F7/702
摘要： In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.
摘要翻译：在本发明的一个实施例中，蚀刻在镜面基板上的光栅结构具有光栅周期，从而在光路内衍射围绕第一波长的第一波段内的第一入射辐射。沉积在光栅结构上的多层涂层反射在光路内的第一入射辐射在第一波段内，第二入射辐射在第二波段内反射第二波长。在另一个实施例中，沉积在反射镜基板上的第一多层涂层在围绕第二波长的第二波段内围绕第一波长和第二入射辐射在第一波段内反射第一入射辐射。光栅结构沉积在第一多层涂层上。光栅结构被蚀刻以具有光栅周期，从而使光路中的第二入射辐射在第二波段内衍射。

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