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1. 发明申请

US20050263723A1 Source multiplexing in lithography 失效
公开(公告)号：US20050263723A1
公开(公告)日：2005-12-01
申请号：US11196191
申请日：2005-08-02
申请人： Michael Goldstein , Peter Silverman
发明人： Michael Goldstein , Peter Silverman
IPC分类号： G03F7/20 , G21G5/00
CPC分类号： G03F7/7005 , G03F7/201
摘要： An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

2. 发明申请

US20070159611A1 Source Multiplexing in Lithography 审中-公开
标题翻译：光刻中的光源多路复用
公开(公告)号：US20070159611A1
公开(公告)日：2007-07-12
申请号：US11685646
申请日：2007-03-13
申请人： Michael Goldstein , Peter Silverman
发明人： Michael Goldstein , Peter Silverman
IPC分类号： G03B27/42
CPC分类号： G03F7/7005 , G03F7/201
摘要： An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
摘要翻译：用于极紫外（EUV）光刻系统的照明系统可以包括多个EUV光源。当照射面罩时，系统可以组合来自多个源的光。

3. 发明申请

US20050263725A1 Source multiplexing in lithography 失效
公开(公告)号：US20050263725A1
公开(公告)日：2005-12-01
申请号：US11196570
申请日：2005-08-02
申请人： Michael Goldstein , Peter Silverman
发明人： Michael Goldstein , Peter Silverman
IPC分类号： G03F7/20 , G01J1/00 , A61N5/00 , G21G5/00
CPC分类号： G03F7/7005 , G03F7/201
摘要： An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

4. 发明申请

US20060237668A1 Dual hemispherical collectors 失效
公开(公告)号：US20060237668A1
公开(公告)日：2006-10-26
申请号：US11411971
申请日：2006-04-25
申请人： Peter Silverman , Michael Goldstein
发明人： Peter Silverman , Michael Goldstein
IPC分类号： G21G5/00
CPC分类号： G03F7/70175
摘要： A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.

5. 发明申请

US20050263724A1 Source multiplexing in lithography 有权
标题翻译：光刻中的光源复用
公开(公告)号：US20050263724A1
公开(公告)日：2005-12-01
申请号：US11196231
申请日：2005-08-02
申请人： Michael Goldstein , Peter Silverman
发明人： Michael Goldstein , Peter Silverman
IPC分类号： G03F7/20 , G01J1/00
CPC分类号： G03F7/7005 , G03F7/201
摘要： An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
摘要翻译：用于极紫外（EUV）光刻系统的照明系统可以包括多个EUV光源。当照射面罩时，系统可以组合来自多个源的光。

6. 发明授权

US08068129B2 Optical device 有权
标题翻译：光学装置
公开(公告)号：US08068129B2
公开(公告)日：2011-11-29
申请号：US11932502
申请日：2007-10-31
申请人： Mark Schechterman , Michael Goldstein , Nadav Horesh , Avi Yaron , Martin Abraham
发明人： Mark Schechterman , Michael Goldstein , Nadav Horesh , Avi Yaron , Martin Abraham
IPC分类号： H04N13/00
CPC分类号： H04N9/045 , A61B1/00193 , A61B1/041 , G02B21/22 , G02B23/2415 , G02B27/2214 , G03B35/00 , H04N5/23248 , H04N13/10 , H04N13/161 , H04N13/189 , H04N13/194 , H04N13/207 , H04N13/211 , H04N13/214 , H04N13/218 , H04N13/225 , H04N13/229 , H04N13/232 , H04N13/239 , H04N13/254 , H04N13/257 , H04N13/296 , H04N13/305 , H04N13/307 , H04N13/324 , H04N13/334 , H04N13/337 , H04N13/339 , H04N13/341 , H04N13/344 , H04N13/365 , H04N13/398 , H04N2005/2255 , H04N2013/0081
摘要： Stereoscopic device including an image directing assembly, an image differentiator and an image detector, the image directing assembly having a first light inlet for receiving a first image and a second light inlet for receiving a second image, the first light inlet being spaced apart from the second light inlet, the image differentiator differentiating between the first image and the second image, wherein the image directing assembly directs the first image to the image detector via a common path, and wherein the image directing assembly directs the second image to the image detector via the common path.
摘要翻译：所述立体设备包括图像引导组件，图像微分器和图像检测器，所述图像引导组件具有用于接收第一图像的第一光入口和用于接收第二图像的第二光入口，所述第一光入口与第二光入口，区分第一图像和第二图像之间的图像微分器，其中图像引导组件经由公共路径将第一图像引导到图像检测器，并且其中图像引导组件将第二图像引导到图像检测器，经由共同的道路。

7. 发明授权

US07760431B2 Method of and apparatus for modifying polarity of light 失效
标题翻译：修改光的极性的方法和装置
公开(公告)号：US07760431B2
公开(公告)日：2010-07-20
申请号：US11123562
申请日：2005-05-05
申请人： David L. Williams , Michael Goldstein , James P. Kardach
发明人： David L. Williams , Michael Goldstein , James P. Kardach
IPC分类号： G02B27/28
CPC分类号： G02B27/286
摘要： A method of modifying polarity of light is provided. The light propagates through a first transverse plane and has known polarization states in respective cells of the first transverse plane. A first retardation compensator having respective waveplates matching the cells then changes the polarity of the light so that light propagating through a second transverse plane is circularly polarized across the entire second transverse plane. A second retardation compensator includes a plurality of quarter waveplates that change the polarization of the circularly polarized light, so that light passing through a third transverse plane is linearly polarized. The crystal alignment of the quarter waveplates and their shape and configuration are selected so that the direction of the polarization is normal to a radius from a single point.
摘要翻译：提供了改变光的极性的方法。光通过第一横向平面传播并且在第一横向平面的相应单元中具有已知的偏振状态。具有与单元匹配的各个波片的第一延迟补偿器然后改变光的极性，使得通过第二横向平面传播的光在整个第二横向平面上被圆偏振。第二延迟补偿器包括改变圆偏振光的偏振的多个四分之一波片，使得穿过第三横向平面的光线性偏振。选择四分之一波片的晶体对准及其形状和结构，使得偏振方向垂直于单个点的半径。

8. 发明申请

US20070196575A1 Composite metal films and carbon nanotube fabrication 有权
标题翻译：复合金属薄膜和碳纳米管制作
公开(公告)号：US20070196575A1
公开(公告)日：2007-08-23
申请号：US11359165
申请日：2006-02-21
申请人： Juan Dominguez , Valery Dubin , Florian Gstrein , Michael Goldstein
发明人： Juan Dominguez , Valery Dubin , Florian Gstrein , Michael Goldstein
IPC分类号： C23C16/00 , C01B31/02
CPC分类号： B82Y40/00 , B82Y30/00 , C01B32/162 , Y10S977/742
摘要： Embodiments of the present invention provide methods for the fabrication of carbon nanotubes using composite metal films. A composite metal film is fabricated to provide uniform catalytic sites to facilitate the uniform growth of carbon nanotubes. Further embodiments provide embedded nanoparticles for carbon nanotube fabrication. Embodiments of the invention are capable of maintaining the integrity of the catalytic sites at temperatures used in carbon nanotube fabrication processes, 600 to 1100° C.
摘要翻译：本发明的实施例提供了使用复合金属膜制造碳纳米管的方法。制造复合金属膜以提供均匀的催化位点以促进碳纳米管的均匀生长。另外的实施方案提供用于碳纳米管制造的嵌入式纳米颗粒。本发明的实施方案能够在碳纳米管制造工艺中使用的温度下维持催化部位的完整性，其温度为600至1100℃

9. 发明授权

US07154527B1 Optical device 有权
标题翻译：光学装置
公开(公告)号：US07154527B1
公开(公告)日：2006-12-26
申请号：US09699624
申请日：2000-10-30
申请人： Michael Goldstein , Abraham Yaron , Shay Ghilai
发明人： Michael Goldstein , Abraham Yaron , Shay Ghilai
IPC分类号： H04N13/00
CPC分类号： A61B1/041 , G02B21/22 , G02B23/2415 , G02B27/2214 , H04N9/045 , H04N13/10 , H04N13/161 , H04N13/189 , H04N13/194 , H04N13/207 , H04N13/211 , H04N13/229 , H04N13/232 , H04N13/239 , H04N13/254 , H04N13/257 , H04N13/296 , H04N13/305 , H04N13/307 , H04N13/324 , H04N13/334 , H04N13/337 , H04N13/339 , H04N13/341 , H04N13/344 , H04N13/365 , H04N13/398 , H04N2013/0081
摘要： Stereoscopic device including at least two apertures, each including a light valve, a multi wavelength light sensor array and a controllable multi wavelength illumination unit, producing at least two alternating beams of light, each of the beams of light is characterized as being in a different range of wavelengths, wherein each light valve is operative to open at a different predetermined timing and wherein the multi wavelength light sensor array detects a plurality of images, each of the images corresponding to a predetermined combination of an open state of a selected one of the light valves and a selected one of the modes.
摘要翻译：立体设备包括至少两个孔，每个孔包括光阀，多波长光传感器阵列和可控多波长照明单元，产生至少两个交替的光束，每个光束的特征在于是不同的波长范围，其中每个光阀可操作以在不同的预定定时打开，并且其中所述多波长光传感器阵列检测多个图像，每个所述图像对应于所选择的一个中的所选择的一个的打开状态的预定组合光阀和选择的一种模式。

10. 发明授权

US07022443B2 Compensation of reflective mask effects in lithography systems 失效
标题翻译：光刻系统中反射掩模效应的补偿
公开(公告)号：US07022443B2
公开(公告)日：2006-04-04
申请号：US10366583
申请日：2003-02-12
申请人： Manish Chandhok , Michael Goldstein
发明人： Manish Chandhok , Michael Goldstein
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70283 , G03F7/70425 , G03F7/706
摘要： Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.
摘要翻译：可以在使用反射掩模的光刻系统中使用的镜面中引入像差，以补偿与反射掩模相关的不利的光学效应。可以引入球面像差以补偿最佳聚焦位置的偏移。可以引入彗形像差以补偿图案偏移。

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