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    • 81. 发明授权
    • Color correction for wafer level white LEDs
    • 晶圆级白光LED的色彩校正
    • US07897419B2
    • 2011-03-01
    • US12317528
    • 2008-12-23
    • Matthew Donofrio
    • Matthew Donofrio
    • H01L21/00H01L33/00
    • H01L33/005H01L33/44H01L33/508H01L2933/0041
    • A method for fabricating a plurality of LED chips comprises providing a plurality of LEDs and forming a plurality of spacers each of which is on at least one of the LEDs. Coating the LEDs with a conversion material, each of the spacers reducing the amount of conversion material over its one of the LEDs. This reduction causes the plurality of LED chips to emit a wavelength of light in response to an electrical signal that is within a standard deviation of a target wavelength. LEDs, LED chips and LED chip wafers are fabricated using the method according to the present invention. One embodiment of an LED chip wafer according to the present invention comprises a plurality of LEDs on a wafer and a plurality of a spacers, each of which is on a respective one of the LEDs. A conversion material at least partially covers the LEDs and spacers, with at least some light from the LEDs passing through the conversion material and is converted. The spacers cause the LED chips to emit light having a wavelength within a standard deviation compared to the similar LED chips without the spacers where at least some of the LED chips emit light a wavelength of light outside the standard deviation.
    • 一种用于制造多个LED芯片的方法包括提供多个LED并且形成多个间隔件,每个衬垫位于至少一个LED上。 用转换材料涂覆LED,每个间隔物减少其一个LED上的转换材料的量。 这种减少使得多个LED芯片响应于在目标波长的标准偏差内的电信号而发出波长的光。 使用根据本发明的方法制造LED,LED芯片和LED芯片晶片。 根据本发明的LED芯片晶片的一个实施例包括晶片上的多个LED和多个间隔件,每个间隔件在相应的一个LED上。 转换材料至少部分地覆盖LED和间隔物,其中来自LED的至少一些光通过转换材料并被转换。 间隔物导致LED芯片发射具有标准偏差波长的光,与没有间隔物的类似LED芯片相比,其中至少一些LED芯片发射出超出标准偏差的波长的光。
    • 83. 发明申请
    • METHODS OF PROCESSING SEMICONDUCTOR WAFERS HAVING SILICON CARBIDE POWER DEVICES THEREON
    • 加工具有硅碳膜电源器件的半导体晶体管的方法
    • US20070066039A1
    • 2007-03-22
    • US11531975
    • 2006-09-14
    • Anant AgarwalSei-Hyung RyuMatthew Donofrio
    • Anant AgarwalSei-Hyung RyuMatthew Donofrio
    • H01L21/425
    • H01L21/0485H01L21/0495H01L21/268H01L29/6606Y10S438/931
    • Methods of forming a silicon carbide semiconductor device are disclosed. The methods include forming a semiconductor device at a first surface of a silicon carbide substrate having a first thickness, and mounting a carrier substrate to the first surface of the silicon carbide substrate. The carrier substrate provides mechanical support to the silicon carbide substrate. The methods further include thinning the silicon carbide substrate to a thickness less the first thickness, forming a metal layer on the thinned silicon carbide substrate opposite the first surface of the silicon carbide substrate, and locally annealing the metal layer to form an ohmic contact on the thinned silicon carbide substrate opposite the first surface of the silicon carbide substrate. The silicon carbide substrate is singulated to provide a singulated semiconductor device.
    • 公开了形成碳化硅半导体器件的方法。 所述方法包括在具有第一厚度的碳化硅衬底的第一表面上形成半导体器件,以及将载体衬底安装到碳化硅衬底的第一表面上。 载体衬底为碳化硅衬底提供机械支撑。 所述方法还包括将碳化硅衬底减薄至小于第一厚度的厚度,在与碳化硅衬底的第一表面相对的稀薄的碳化硅衬底上形成金属层,并局部退火金属层以在其上形成欧姆接触 薄碳化硅衬底与碳化硅衬底的第一表面相对。 将碳化硅衬底分离以提供单片半导体器件。