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71. 发明授权

US06973111B2 Injection locking type or MOPA type of gas laser device 有权
标题翻译：注射锁定型或MOPA型气体激光装置
公开(公告)号：US06973111B2
公开(公告)日：2005-12-06
申请号：US10348154
申请日：2003-01-21
申请人： Toshio Yamashita , Osamu Wakabayashi
发明人： Toshio Yamashita , Osamu Wakabayashi
IPC分类号： H01S3/0971 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/08 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： H01S3/2366 , G03F7/70975 , H01S3/025 , H01S3/03 , H01S3/034 , H01S3/08009 , H01S3/225 , H01S3/2258 , H01S3/2308
摘要： An injection locking type or MOPA type of gas laser device which requires only a small installation area and allows easy maintenance. For this purpose, the laser device includes a seed laser unit (11) for exciting a laser gas inside a laser chamber (12) and oscillating seed laser light (21) and an amplifier (111) for exciting a laser gas inside an amplifying chamber (112) and amplifying pulse energy of the seed laser light (21), and allows the laser chamber (12) and the amplifying chamber (112) to be evacuated to the same side with respect to an optical axis of the seed laser light (21).
摘要翻译：注射锁定型或MOPA型气体激光装置，其仅需要较小的安装面积并且容易维护。为此，激光装置包括用于激发激光室（12）内的激光气体和振荡晶种激光（21）的激光单元（11）和用于激发放大室内的激光气体的放大器（112）并且放大种子激光（21）的脉冲能量，并且允许激光室（12）和放大室（112）相对于种子激光的光轴被抽空到同一侧（ 21）。

72. 发明申请

US20050094698A1 Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control 有权
标题翻译：多室准分子或分子氟气放电激光氟注射控制
公开(公告)号：US20050094698A1
公开(公告)日：2005-05-05
申请号：US10953100
申请日：2004-09-29
申请人： Herve Besaucele , Wayne Dunstan , Toshihiko Ishihara , Robert Jacques , Fedor Trintchouk
发明人： Herve Besaucele , Wayne Dunstan , Toshihiko Ishihara , Robert Jacques , Fedor Trintchouk
IPC分类号： H01S3/036 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.
摘要翻译：一种多腔准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法其中可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个振荡器的至少一个振荡器的至少第一操作参数来估计在所述至少一个振荡器腔室中的一个中消耗的卤素气体的量室和至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，并且估计至少在另一个中消耗的卤素气体的量基于所述至少一个的另一个的至少第三操作参数，所述至少一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗量的输出和所述至少一个放大器室中的卤素气体消耗量，以及卤素气体注入控制器确定基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体喷射量。

73. 发明授权

US06872479B2 Coated optics to improve durability 有权
标题翻译：涂层光学以改善耐用性
公开(公告)号：US06872479B2
公开(公告)日：2005-03-29
申请号：US10718356
申请日：2003-11-18
申请人： Robert L. Maier , Robert W. Sparrow , Paul M. Then
发明人： Robert L. Maier , Robert W. Sparrow , Paul M. Then
IPC分类号： B32B9/00 , B32B9/04 , B32B19/00 , G02B1/02 , G02B1/10 , H01S3/034 , H01S3/08 , H01S3/225 , H01S5/028
CPC分类号： G02B1/14 , G02B1/02 , G02B1/105 , H01S3/034 , H01S3/0346 , H01S3/225 , H01S3/2251 , Y10T428/265
摘要： The invention is directed to a coated metal fluoride crystals that are resistant to laser-induced damage by a below 250 nm UV laser beam; methods of making such coated crystals, and the use of such coated crystals. The method includes the steps of providing an uncoated metal fluoride crystal of general formula MF2, where M is beryllium, magnesium, calcium, strontium and barium, and mixtures thereof, and coating the uncoated metal fluoride crystal with a coating of a selected material to thereby form a coated metal material resistant to laser induced damage. Preferred coating materials include MgF2, MgF2 doped fused silica and fluorine doped fused silica.
摘要翻译：本发明涉及一种涂覆的金属氟化物晶体，其通过低于250nm的UV激光束对激光诱发的损伤具有抗性; 制造这种涂覆的晶体的方法，以及使用这种涂覆的晶体。该方法包括以下步骤：提供通式为MF2的未涂覆的金属氟化物晶体，其中M是铍，镁，钙，锶和钡及其混合物，并用所选材料的涂层涂覆未涂覆的金属氟化物晶体形成耐受激光损伤的涂层金属材料。优选的涂层材料包括MgF 2，掺杂MgF 2的熔融石英和氟掺杂的熔融二氧化硅。

74. 发明授权

US06865212B2 Method for energy control of pulsed driven, gas discharged-coupled beam sources 有权
标题翻译：脉冲驱动，气体放电耦合光束源的能量控制方法
公开(公告)号：US06865212B2
公开(公告)日：2005-03-08
申请号：US10360067
申请日：2003-02-07
申请人： Juergen Kleinschmidt
发明人： Juergen Kleinschmidt
IPC分类号： H01S3/134 , H01S3/225 , H01S3/22
CPC分类号： H01S3/134 , H01S3/225 , H01S3/2258
摘要： The invention is directed to a method for energy regulation of pulsed-operation gas discharge-coupled radiation sources, particularly of excimer lasers, F2 lasers and EUV radiation sources. The object of the invention is to find a novel possibility for energy regulation of pulsed-operation gas discharge-coupled radiation sources which permits a control of the charging voltage while taking into account the aging of gas discharge components (particularly of the work gas) without recalibration of the system. This object is met in that the pulse energy is measured for each individual pulse, at least the charging voltage is detected as influencing variable on the pulse energy for each individual pulse, the error of the current pulse energy is determined for that pulse in relation to a predetermined target value of the pulse energy, the set energy ES, the mean square deviation from the set energy is calculated by time-average over a large quantity of pulses, and the pulse energy is controlled for every pulse by a proportional regulation of the charging voltage, wherein the proportional regulation is carried out with an adapted regulating factor which is determined by minimizing the mean square deviation of the current pulse energy.
摘要翻译：本发明涉及一种用于脉冲操作气体放电耦合辐射源，特别是准分子激光器，F2激光器和EUV辐射源的能量调节方法。本发明的目的是找到一种新颖的脉冲操作气体放电耦合辐射源的能量调节的可能性，其允许控制充电电压，同时考虑到气体放电部件（特别是工作气体）的老化而没有重新校准系统。满足这个目的在于针对每个单个脉冲测量脉冲能量，至少将充电电压检测为对于每个脉冲对脉冲能量的影响变量，确定当前脉冲能量的误差相对于脉冲能量的预定目标值，设定能量ES，与设定能量的均方偏差通过大量脉冲上的时间平均来计算，并且脉冲能量通过比例调节来控制每个脉冲充电电压，其中所述比例调节是通过使当前脉冲能量的均方差最小来确定的适应调节因子进行的。

75. 发明授权

US06839372B2 Gas discharge ultraviolet laser with enclosed beam path with added oxidizer 有权
标题翻译：气体放电紫外线激光器带有附加氧化剂的封闭光路
公开(公告)号：US06839372B2
公开(公告)日：2005-01-04
申请号：US10141201
申请日：2002-05-07
申请人： Xiaojiang Pan , Holger K. Glatzel , John T. Melchior , Raymond Cybulski
发明人： Xiaojiang Pan , Holger K. Glatzel , John T. Melchior , Raymond Cybulski
IPC分类号： G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： The present invention provides a gas discharge ultraviolet laser capable of producing a high quality pulsed ultraviolet laser beam at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater and having an enclosed beam path at least a portion of which comprises an oxidation agent. In a preferred embodiment a portion of the beam path comprises a sealed chamber containing a gas comprising a small concentration of oxygen. In one preferred embodiment the sealed chamber is an etalon chamber and the contained gas is nitrogen with an oxygen concentration of between 1.6 and 2.4 percent. In another preferred embodiments a small concentration of oxygen is added to the purge gas of a special purge compartment containing optical components exposed to high intensity output laser beam.
摘要翻译：本发明提供一种气体放电紫外线激光器，其能够以5mJ以上的脉冲能量产生高于2000Hz的脉冲率的高质量脉冲紫外激光束，并且具有封闭的光束路径，其至少一部分包含氧化剂。在优选实施例中，光束路径的一部分包括含有包含少量氧气的气体的密封室。在一个优选实施例中，密封室是标准室，并且所含有的气体是氧浓度在1.6和2.4％之间的氮气。在另一个优选的实施方案中，将小浓度的氧气加入到包含暴露于高强度输出激光束的光学部件的特殊净化室的净化气体中。

76. 发明授权

US6414978B2 Discharge unit for a high repetition rate excimer or molecular fluorine laser 有权
标题翻译：用于高重复率准分子或分子氟激光的放电单元
公开(公告)号：US6414978B2
公开(公告)日：2002-07-02
申请号：US82629601
申请日：2001-04-03
申请人： LAMBDA PHYSIK AG
发明人： BRAGIN IGOR , BERGER VADIM , STAMM UWE , REBHAN ULRICH
IPC分类号： H01S3/032 , H01S3/036 , H01S3/038 , H01S3/097 , H01S3/0971 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036 , H01S3/038 , H01S3/0971 , H01S3/225
摘要： A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.
摘要翻译：用于准分子或分子氟激光的激光器包括与气体流动容器连接并具有一对主电极和预电离单元的电极室，每个主电极连接到放电电路。扰流器设置在电极室内，并且被成形为提供通过主电极之间的放电区域的更均匀的气流，以便将一个预电离单元与其中一个主电极隔离，并且反射在放电中产生的声波区域进入气流容器，用于吸收。扰流器单元可以在放电区域的任一侧上包括一对相对的扰流器元件。一个或两个主电极包括基部和可以是从基部突出的接头的中心部分。中心部分基本上承载周期性放电电流，使得放电宽度可以明显小于基部的宽度。两个主电极的曲率可以符合通过放电室的气流的曲率，以进一步提高空气动力性能。多个低电感性导电肋连接到接地的主电极并成形为提供更均匀的气体流通过限定在相邻肋之间的开口。

77. 发明授权

US6270570B2 Fluoride crystal, optical article, and production method 失效
标题翻译：氟化物晶体，光学制品和制造方法
公开(公告)号：US6270570B2
公开(公告)日：2001-08-07
申请号：US4884598
申请日：1998-03-27
申请人： CANON KK
发明人： OHBA TOMORU , ICHIZAKI TOSHIO
IPC分类号： C01B9/08 , C01F11/22 , C03C3/32 , C30B11/00 , C30B29/12 , G02B1/02 , G03F7/20 , H01S3/034 , H01S3/0979 , H01S3/225 , C30B11/04
CPC分类号： H01S3/034 , C30B11/00 , C30B29/12 , G02B1/02 , G03F7/70958 , H01S3/0979 , H01S3/225
摘要： An object of the present invention is to provide a fluoride crystal having a high transmittance with respect to an excimer laser and an excellent resistance with respect to a high output laser, and a production method therefore. The fluoride crystal of the present invention contains at least one kind of atom selected from the group consisting of Zn, Cd, Pb, Li, Bi and Na with a content of 10 ppm or less, and has an internal transmittance of 70% or more with respect to 135 nm wavelength light. The method of the present invention of producing a fluoride crystal comprises conducting a refining step of adding a scavenger to a calcium fluoride raw material and refining the raw material at least once, and a crystal growth step of further adding the scavenger to the refined raw material and growing a crystal by using a crucible lowering method, wherein the amount of the scavenger to be added in the first refining step is 0.04 to 0.1 mol % based on the raw material, and the total amount of the scavenger to be added in the subsequent refining steps and the crystal growth step is 10% to 50% based on the amount of the scavenger to be added in the first refining step.
摘要翻译：本发明的目的是提供一种相对于准分子激光器具有高透射率和相对于高输出激光器的优异电阻的氟化物晶体及其制造方法。本发明的氟化物晶体含有选自Zn，Cd，Pb，Li，Bi和Na中的至少一种原子，含量为10ppm以下，内透射率为70％以上相对于135nm波长的光。本发明的氟化物晶体的制造方法包括进行将清除剂添加到氟化钙原料中并将原料精炼至少一次的精制工序，以及进一步向澄清原料添加清除剂的晶体生长步骤并且通过使用坩埚降低方法生长晶体，其中在第一精炼步骤中添加的清除剂的量相对于原料为0.04〜0.1摩尔％，并且在随后的添加量中的清除剂的总量精炼步骤和晶体生长步骤基于在第一精制步骤中添加的清除剂的量为10％至50％。

78. 发明授权

US6163559A Beam expander for ultraviolet lasers 失效
标题翻译：用于紫外线激光器的光束扩展器
公开(公告)号：US6163559A
公开(公告)日：2000-12-19
申请号：US102241
申请日：1998-06-22
申请人： Tom A. Watson
发明人： Tom A. Watson
IPC分类号： G02B5/18 , G02B17/06 , G02B26/06 , G02B26/08 , G02B27/00 , G03F7/20 , H01S3/08 , H01S3/225 , H01S3/098 , H01S3/22
CPC分类号： G03F7/70575 , G02B5/1828 , G02B19/0023 , G02B19/0033 , G02B19/0095 , G02B26/06 , G02B26/0825 , G02B27/0081 , H01S3/08009 , H01S3/225
摘要： A line narrowed ultraviolet laser having a line narrowing system which includes a grating and an all reflective beam expander. In a preferred embodiment, the beam expander consists of a relatively small circular cylindrical mirror and relatively larger elliptical cylindrical mirror and the grating is an eschelle grating mounted in a Littrow configuration.
摘要翻译：具有包括光栅和全反射光束扩展器的线窄系统的线变窄的紫外激光器。在优选实施例中，光束扩展器由相对小的圆柱形反射镜和相对较大的椭圆柱形反射镜组成，并且光栅是安装在Littrow配置中的光阑光栅。

79. 发明授权

US6154470A Molecular fluorine (F.sub.2) laser with narrow spectral linewidth 失效
标题翻译：具有窄光谱线宽的分子氟（F2）激光
公开(公告)号：US6154470A
公开(公告)日：2000-11-28
申请号：US317527
申请日：1999-05-24
申请人： Dirk Basting , Sergei V. Govorkov , Uwe Stamm
发明人： Dirk Basting , Sergei V. Govorkov , Uwe Stamm
IPC分类号： H01S3/223 , H01S3/03 , H01S3/08 , H01S3/098 , H01S3/106 , H01S3/137 , H01S3/225
CPC分类号： H01S3/225 , H01S3/08004 , H01S3/08036 , H01S3/1062 , H01S3/2258
摘要： A molecular fluorine (F.sub.2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates, preferably uncoated, comprise a material that is transparent at 157 nm, such as CaF.sub.2, MgF.sub.2, LiF.sub.2, BaF.sub.2, SrF.sub.2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur.RTM., ultra low expansion glass, and quartz. A gas such as helium or a solid such as CaF.sub.2 that does not absorb radiation 157 nm fills the gap between the etalon plates, or the gap is evacuated. The gas mixture preferably further includes neon as a buffer gas. Another etalon may be used for line narrowing. One or more of a highly reflective mirror, a high finesse etalon or a prism with a highly reflective back surface may serve as a highly reflective resonator reflector. Any of one or more etalons, a prism, a brewster plate and a highly or partially reflective mirror may seal the laser discharge chamber.
摘要翻译：提供分子氟（F2）激光器，其中气体混合物包含用于产生包括在157nm附近的两个或三个紧密间隔的线的光谱发射的分子氟。标准具提供线选择，使得输出光束仅包括这些线之一。标准具还可用于将光束外耦合和/或使所选择的线变窄。或者，棱镜提供线选择并且标准具缩小所选行。标准具可以是也选择一条线的谐振器反射器，而另一个元件将光束耦合。优选未涂覆的标准具板包括在157nm下透明的材料，例如CaF 2，MgF 2，LiF 2，BaF 2，SrF 2，石英和氟掺杂的石英。标准具板由包括具有低热膨胀常数的材料的间隔物分离，例如invar，zerodur TM，超低膨胀玻璃和石英。诸如氦气或诸如CaF 2的不吸收辐射的固体的气体157nm填充了标准具板之间的间隙，或间隙被排空。气体混合物优选还包括作为缓冲气体的氖。另一种标准具可用于线窄。高反射镜，高精度标准具或具有高反射背面的棱镜中的一个或多个可以用作高反射谐振器反射器。一个或多个标准具，棱镜，布鲁斯特板和高度或部分反射镜中的任何一个可以密封激光放电室。

80. 发明授权

US6141081A Stepper or scanner having two energy monitors for a laser 失效
标题翻译：具有两个用于激光的能量监视器的步进或扫描器
公开(公告)号：US6141081A
公开(公告)日：2000-10-31
申请号：US908862
申请日：1997-08-08
申请人： Palash P. Das , Igor V. Fomenkov
发明人： Palash P. Das , Igor V. Fomenkov
IPC分类号： G03F7/20 , H01L21/027 , H01S3/225 , G03B27/42 , G03B27/74 , G03C5/00 , G21G5/00
CPC分类号： G03F7/70358 , G03F7/70558 , H01S3/225
摘要： A first laser light intensity detector is positioned within a stepper or scanner proximate to a reticle so that attenuation due to stepper optics has already occurred prior to the laser light impinging upon the light intensity detector. Preferably, the first light intensity detector is mounted as closed to the wafer as practical. A second light intensity detector is located at the output of the laser. The light intensity detected from the outputs of the first and second light intensity detectors, in conjunction, forms part of a feedback mechanism which adjusts the light output of the laser, during wafer fabrication, so that the light intensity detected by the first light intensity detector is an optimum value.
摘要翻译：第一激光强度检测器位于靠近光罩的步进器或扫描仪内，使得在激光照射在光强度检测器之前已经发生由步进光学器件引起的衰减。优选地，第一光强度检测器被实际地安装在晶片上。第二个光强度检测器位于激光器的输出端。从第一和第二光强度检测器的输出检测到的光强度一起形成反馈机构的一部分，该反馈机构在晶片制造期间调节激光器的光输出，使得由第一光强度检测器检测的光强度是最佳值。

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