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    • 1. 发明授权
    • Fluoride crystal, optical article, and production method
    • 氟化物晶体,光学制品和制造方法
    • US6270570B2
    • 2001-08-07
    • US4884598
    • 1998-03-27
    • CANON KK
    • OHBA TOMORUICHIZAKI TOSHIO
    • C01B9/08C01F11/22C03C3/32C30B11/00C30B29/12G02B1/02G03F7/20H01S3/034H01S3/0979H01S3/225C30B11/04
    • H01S3/034C30B11/00C30B29/12G02B1/02G03F7/70958H01S3/0979H01S3/225
    • An object of the present invention is to provide a fluoride crystal having a high transmittance with respect to an excimer laser and an excellent resistance with respect to a high output laser, and a production method therefore. The fluoride crystal of the present invention contains at least one kind of atom selected from the group consisting of Zn, Cd, Pb, Li, Bi and Na with a content of 10 ppm or less, and has an internal transmittance of 70% or more with respect to 135 nm wavelength light. The method of the present invention of producing a fluoride crystal comprises conducting a refining step of adding a scavenger to a calcium fluoride raw material and refining the raw material at least once, and a crystal growth step of further adding the scavenger to the refined raw material and growing a crystal by using a crucible lowering method, wherein the amount of the scavenger to be added in the first refining step is 0.04 to 0.1 mol % based on the raw material, and the total amount of the scavenger to be added in the subsequent refining steps and the crystal growth step is 10% to 50% based on the amount of the scavenger to be added in the first refining step.
    • 本发明的目的是提供一种相对于准分子激光器具有高透射率和相对于高输出激光器的优异电阻的氟化物晶体及其制造方法。 本发明的氟化物晶体含有选自Zn,Cd,Pb,Li,Bi和Na中的至少一种原子,含量为10ppm以下,内透射率为70%以上 相对于135nm波长的光。 本发明的氟化物晶体的制造方法包括进行将清除剂添加到氟化钙原料中并将原料精炼至少一次的精制工序,以及进一步向澄清原料添加清除剂的晶体生长步骤 并且通过使用坩埚降低方法生长晶体,其中在第一精炼步骤中添加的清除剂的量相对于原料为0.04〜0.1摩尔%,并且在随后的添加量中的清除剂的总量 精炼步骤和晶体生长步骤基于在第一精制步骤中添加的清除剂的量为10%至5​​0%。