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71. 发明授权

US09304408B2 Projection objective for microlithography 有权
标题翻译：微光刻的投影目标
公开(公告)号：US09304408B2
公开(公告)日：2016-04-05
申请号：US14104211
申请日：2013-12-12
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Zellner , Hans-Juergen Mann , Martin Endres
IPC分类号： G03B27/32 , G03B27/54 , G03F7/20 , G02B17/06
CPC分类号： G03F7/70316 , G02B17/0663 , G03F7/702 , G03F7/70233
摘要： A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.
摘要翻译：用于微光刻的投影物镜用于将物平面中的物体场成像到图像平面中的图像场中。投影物镜包括至少六个反射镜，其中至少一个反射镜具有自由形反射表面。投影物镜的总长（T）与物体像偏移（dOIS）之间的比例可以小于12.像平面是物平面下游的投影物镜的第一场平面。投影物镜可以具有多个反射镜，其中总长度（T）和物体图像偏移（dOIS）之间的比率小于2。

72. 发明授权

US09304407B2 Catoptric objectives and systems using catoptric objectives 有权
公开(公告)号：US09304407B2
公开(公告)日：2016-04-05
申请号：US14104180
申请日：2013-12-12
申请人： Carl Zeiss SMT GmbH
发明人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/10 , G03B27/54 , G03F7/20 , G02B13/14 , G02B17/06
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

73. 发明授权

US09304403B2 System and method for lithography alignment 有权
标题翻译：光刻对准的系统和方法
公开(公告)号：US09304403B2
公开(公告)日：2016-04-05
申请号：US13732913
申请日：2013-01-02
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Yu-Hsien Lin , Hung-Chang Hsieh , Feng-Jia Shiu , Chun-Yi Lee
IPC分类号： G03B27/42 , G03B27/54 , G03B27/32 , G03F7/20 , G03F9/00 , G03B27/58
CPC分类号： G03F7/70141 , G03F9/7084
摘要： The present disclosure provides one embodiment of a lithography system for integrated circuit making. The system includes a substrate stage designed to secure a substrate and being operable to move the substrate; an alignment module that includes a tunable light source being operable to generate an infrared light with a wavelength tunable; and a detector to receive the light; and an exposing module integrated with the alignment module and designed to performing an exposing process to a resist layer coated on the substrate.
摘要翻译：本公开提供了用于集成电路制造的光刻系统的一个实施例。该系统包括设计成固定基板并可操作以移动基板的基板台; 对准模块，其包括可调谐光源，其可操作以产生具有波长可调谐的红外光; 和接收光的检测器; 以及与所述对准模块集成并被设计为对涂覆在所述基板上的抗蚀剂层进行曝光处理的曝光模块。

74. 发明授权

US09285691B2 Exposure apparatus and method for manufacturing article 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US09285691B2
公开(公告)日：2016-03-15
申请号：US14670490
申请日：2015-03-27
申请人： CANON KABUSHIKI KAISHA
发明人： Nozomu Izumi , Kouhei Nagano
IPC分类号： G03B27/52 , G03B27/54 , G03F9/00 , G03F7/20
CPC分类号： G03F9/70 , G03F7/70141 , G03F9/7088
摘要： An exposure apparatus comprises a first detector detecting substrate-side marks via an original-side mark and a projection optical system; second detectors arranged in a larger number than the first detector and detecting the substrate-side marks not via the projection optical system; a reference plate having reference marks; and a control unit configured to obtain a first detection result of the plurality of reference marks by the second detectors, obtain first information relating to a first distance between the plurality of second detectors based on the first detection result, obtain a second detection result of the identical substrate-side mark by the first detector and the second detectors, obtain second information relating to a second distance between the first detector and the second detectors based on the second detection result, and control the alignment of the original and the substrate based on the first information and the second information.
摘要翻译：曝光装置包括：第一检测器，经由原边标记和投影光学系统检测基板侧标记; 第二检测器布置成比第一检测器多的数量，并且不经由投影光学系统检测基板侧标记; 具有参考标记的参考板; 以及控制单元，被配置为通过所述第二检测器获得所述多个参考标记的第一检测结果，基于所述第一检测结果获得与所述多个第二检测器之间的第一距离有关的第一信息，获得所述第二检测结果通过第一检测器和第二检测器相同的基板侧标记，基于第二检测结果获得与第一检测器和第二检测器之间的第二距离有关的第二信息，并基于第二检测器控制原稿和基板的对准第一信息和第二信息。

75. 发明授权

US09280058B2 Projection objective for a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影物镜
公开(公告)号：US09280058B2
公开(公告)日：2016-03-08
申请号：US14506992
申请日：2014-10-06
申请人： Carl Zeiss SMT GmbH
发明人： Norbert Wabra , Robert Eder
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54 , G03B27/68 , G03F7/20 , G02B27/00
CPC分类号： G03F7/706 , G02B27/0025 , G03F7/7015 , G03F7/70191 , G03F7/70225 , G03F7/70241 , G03F7/70308 , G03F7/70591 , G03F7/70975
摘要： A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>−2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k−j| being an odd number.
摘要翻译：微光刻投影曝光装置的投影物镜包含配置在投影物镜的N≥2个连续部分A1〜AN中的多个光学元件，这些光学元件通过光瞳平面或中间像平面彼此分开。根据本发明，为了校正波前变形，至少两个光学元件各自具有非球面地局部再加工的光学活性表面。在这种情况下，第一光学元件被布置在一个部分Aj，j = 1中。。。 N和第二光学元件布置在另一部分Ak，k = 1中。。。 N，幅度差| k-j | 是奇数。

76. 发明授权

US09261802B2 Lithography apparatus, alignment method, and method of manufacturing article 有权
标题翻译：平版印刷设备，对准方法和制造方法
公开(公告)号：US09261802B2
公开(公告)日：2016-02-16
申请号：US14456192
申请日：2014-08-11
申请人： CANON KABUSHIKI KAISHA
发明人： Kazuhiko Mishima , Shinichiro Koga
IPC分类号： G03B27/54 , G03B27/42 , G03F9/00 , G03F7/20 , G03F7/00
CPC分类号： G03F9/7042 , G03F7/0002 , G03F7/70141
摘要： The present invention provides a lithography apparatus for transferring a pattern formed on an original to each of a plurality of shot regions on a substrate, comprising a detection unit configured to detect a mark provided in the shot region and a mark provided on the original, and a control unit configured to control alignment between a target shot region and the pattern of the original such that the mark in the target region detected by the detection unit and the mark on the original are shifted by a positional shift amount which is generated between each mark in the shot region and each mark on the original when an overlay error between the shot region and the pattern of the original falls within an allowable range.
摘要翻译：本发明提供了一种光刻设备，用于将形成在原稿上的图案转印到基板上的多个照射区域中的每一个上，包括：检测单元，被配置为检测设置在拍摄区域中的标记和设置在原稿上的标记;以及控制单元，被配置为控制目标拍摄区域和原稿的图案之间的对准，使得由检测单元检测到的目标区域中的标记和原稿上的标记偏移在每个标记之间产生的位置偏移量在拍摄区域和原稿的图案之间的重叠误差落在容许范围内时，在拍摄区域和原稿上的每个标记。

77. 发明授权

US09250541B2 Exposure apparatus and device fabrication method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US09250541B2
公开(公告)日：2016-02-02
申请号：US14138425
申请日：2013-12-23
申请人： CANON KABUSHIKI KAISHA
发明人： Ryo Sasaki
IPC分类号： G03B27/54 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70558 , G03F7/70933
摘要： The present invention provides an exposure apparatus which expose a substrate, the apparatus including an illumination optical system configured to illuminate a mask using light from a light source, a projection optical system configured to irradiate the substrate with light from a pattern on the mask, an adjustment unit configured to adjust an oxygen concentration in a space between the projection optical system and the substrate, an obtaining unit configured to obtain data of illuminance of light applied to the substrate, and a control unit configured to control the adjustment unit so as to set the oxygen concentration in the space to a predetermined concentration value based on the data of illuminance obtained by the obtaining unit.
摘要翻译：本发明提供一种曝光基板的曝光装置，该装置包括配置为使用来自光源的光来照亮掩模的照明光学系统，被配置为从掩模上的图案的光照射基板的投影光学系统，调整单元，被配置为调整投影光学系统和基板之间的空间中的氧浓度，获得单元，被配置为获得施加到基板的光的照度的数据;以及控制单元，被配置为控制调整单元以设置基于由所述获取单元获得的照度的数据，将所述空间中的氧浓度设定为预定浓度值。

78. 发明授权

US09244368B2 Particle control near reticle and optics using showerhead 有权
标题翻译：使用喷头在光罩附近进行粒子控制
公开(公告)号：US09244368B2
公开(公告)日：2016-01-26
申请号：US14033929
申请日：2013-09-23
申请人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
发明人： Gildardo R. Delgado , Frank Chilese , Rudy Garcia , John R. Torczynski , Anthony S. Geller , Daniel J. Rader , Leonard E. Klebanoff , Michail A. Gallis
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , G03F1/00
CPC分类号： G03F7/70841 , G03F1/0092 , G03F1/84 , G03F7/70916 , G03F7/70933
摘要： A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal diffusers in the form of showerheads to provide a continual flow of clean gas. The main showerhead bathes the reticle surface to be inspected in smoothly flowing, low pressure gas, isolating it from particles coming from surrounding volumes. The secondary showerhead faces away from the reticle and toward the EUV illumination and projection optics, supplying them with purge gas while at the same time creating a buffer zone that is kept free of any particle contamination originating from those optics.
摘要翻译：介绍了一种保护标线片免受光化性EUV标线检查工具中的颗粒和化学物质的方法和设备。该方法和装置利用一对淋浴喷头形式的多孔金属扩散器来提供清洁气体的连续流动。主喷头用平滑流动的低压气体将掩模版表面沐浴，将其与周围体积的颗粒隔离。二次淋浴头面向远离掩模版并朝向EUV照明和投影光学元件，为其提供吹扫气体，同时创建一个缓冲区，保持没有源自这些光学元件的任何颗粒污染。

79. 发明授权

US09244361B2 Imaging optical system 有权
标题翻译：成像光学系统
公开(公告)号：US09244361B2
公开(公告)日：2016-01-26
申请号：US13681088
申请日：2012-11-19
申请人： Carl Zeiss SMT GmbH
发明人： Ralf Mueller , Hans-Juergen Mann
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20 , G02B17/06
CPC分类号： G03F7/702 , G02B17/0657 , G03F7/70233 , G03F7/70275
摘要： An imaging optical system for EUV projection lithography has a plurality of mirrors for imaging an object field in an object plane into an image field in an image plane. An image-side numerical aperture of the imaging optical system is at least 0.3. The imaging optical system has a pupil obscuration which is greater than 0.40 and an image filed size of at least 1 mm×10 mm. The imaging optical system can provide high quality imaging of the object.
摘要翻译：用于EUV投影光刻的成像光学系统具有多个用于将物平面中的物场成像成像面中的图像场的反射镜。成像光学系统的图像侧数值孔径至少为0.3。成像光学系统具有大于0.40的瞳孔遮蔽和至少1mm×10mm的图像尺寸。成像光学系统可以提供物体的高质量成像。

80. 发明授权

US09235133B2 Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method 有权
标题翻译：照明光学装置，照明光学装置的调节方法，曝光系统和曝光方法
公开(公告)号：US09235133B2
公开(公告)日：2016-01-12
申请号：US11660387
申请日：2005-08-03
申请人： Hirohisa Tanaka , Koji Shigematsu
发明人： Hirohisa Tanaka , Koji Shigematsu
IPC分类号： G03B27/72 , G03B27/54 , G03B27/68 , G03F7/20 , G02B19/00 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70108 , G02B19/0014 , G02B19/0047 , G03F7/70133 , G03F7/70191
摘要： An illumination optical apparatus is able to adjust each of pupil luminance distributions at respective points on a surface to be illuminated to being almost uniform, while maintaining or adjusting an illuminance distribution on the surface to be illuminated to being almost uniform. The illumination optical apparatus illuminates the surface to be illuminated (M, W), with a light beam from a light source (1). The apparatus is provided with a pupil distribution forming device (1-4) for forming a pupil luminance distribution with a predetermined luminance distribution on an illumination pupil plane; and an adjuster (8, 9) for independently adjusting each of pupil luminance distributions about respective points on the surface to be illuminated. The adjuster has a plurality of adjustment surfaces each of which is disposed in an optical path between the pupil distribution forming device and the surface to be illuminated and has a predetermined transmittance distribution or reflectance distribution.
摘要翻译：照明光学装置能够将要被照射的表面上的各个点的每个瞳孔亮度分布调整为几乎均匀，同时保持或调整被照射表面上的照度分布几乎均匀。照明光学装置用来自光源（1）的光束照射被照射的表面（M，W）。该装置设置有用于在照明光瞳平面上形成具有预定亮度分布的光瞳亮度分布的光瞳分布形成装置（1-4）以及用于独立地调整关于待照射表面上的各个点的每个瞳孔亮度分布的调节器（8,9）。调整器具有多个调整面，每个调整面设置在光瞳分布形成装置和被照射面之间的光路中，并且具有预定的透射率分布或反射率分布。

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