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1. 发明申请

US20150286149A1 EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING ARTICLE 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20150286149A1
公开(公告)日：2015-10-08
申请号：US14670490
申请日：2015-03-27
申请人： CANON KABUSHIKI KAISHA
发明人： Nozomu Izumi , Kouhei Nagano
IPC分类号： G03F7/20
CPC分类号： G03F9/70 , G03F7/70141 , G03F9/7088
摘要： An exposure apparatus comprises a first detector detecting substrate-side marks via an original-side mark and a projection optical system; second detectors arranged in a larger number than the first detector and detecting the substrate-side marks not via the projection optical system; a reference plate having reference marks; and a control unit configured to obtain a first detection result of the plurality of reference marks by the second detectors, obtain first information relating to a first distance between the plurality of second detectors based on the first detection result, obtain a second detection result of the identical substrate-side mark by the first detector and the second detectors, obtain second information relating to a second distance between the first detector and the second detectors based on the second detection result, and control the alignment of the original and the substrate based on the first information and the second information.
摘要翻译：曝光装置包括：第一检测器，经由原边标记和投影光学系统检测基板侧标记; 第二检测器布置成比第一检测器多的数量，并且不经由投影光学系统检测基板侧标记; 具有参考标记的参考板; 以及控制单元，被配置为通过所述第二检测器获得所述多个参考标记的第一检测结果，基于所述第一检测结果获得与所述多个第二检测器之间的第一距离有关的第一信息，获得所述第二检测结果通过第一检测器和第二检测器相同的基板侧标记，基于第二检测结果获得与第一检测器和第二检测器之间的第二距离有关的第二信息，并基于第二检测器控制原稿和基板的对准第一信息和第二信息。

2. 发明授权

US09285691B2 Exposure apparatus and method for manufacturing article 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US09285691B2
公开(公告)日：2016-03-15
申请号：US14670490
申请日：2015-03-27
申请人： CANON KABUSHIKI KAISHA
发明人： Nozomu Izumi , Kouhei Nagano
IPC分类号： G03B27/52 , G03B27/54 , G03F9/00 , G03F7/20
CPC分类号： G03F9/70 , G03F7/70141 , G03F9/7088
摘要： An exposure apparatus comprises a first detector detecting substrate-side marks via an original-side mark and a projection optical system; second detectors arranged in a larger number than the first detector and detecting the substrate-side marks not via the projection optical system; a reference plate having reference marks; and a control unit configured to obtain a first detection result of the plurality of reference marks by the second detectors, obtain first information relating to a first distance between the plurality of second detectors based on the first detection result, obtain a second detection result of the identical substrate-side mark by the first detector and the second detectors, obtain second information relating to a second distance between the first detector and the second detectors based on the second detection result, and control the alignment of the original and the substrate based on the first information and the second information.
摘要翻译：曝光装置包括：第一检测器，经由原边标记和投影光学系统检测基板侧标记; 第二检测器布置成比第一检测器多的数量，并且不经由投影光学系统检测基板侧标记; 具有参考标记的参考板; 以及控制单元，被配置为通过所述第二检测器获得所述多个参考标记的第一检测结果，基于所述第一检测结果获得与所述多个第二检测器之间的第一距离有关的第一信息，获得所述第二检测结果通过第一检测器和第二检测器相同的基板侧标记，基于第二检测结果获得与第一检测器和第二检测器之间的第二距离有关的第二信息，并基于第二检测器控制原稿和基板的对准第一信息和第二信息。

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