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71. 发明授权

US07058107B2 Line selected F2 two chamber laser system 失效
标题翻译：线选F2双腔激光系统
公开(公告)号：US07058107B2
公开(公告)日：2006-06-06
申请号：US10804281
申请日：2004-03-18
申请人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
发明人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
IPC分类号： H01S3/22
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门设计用作集成电路光刻的光源的F 2 N 2激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有用于选择最强的F 2/2谱线的线选择包。

72. 发明申请

US20060060571A1 Laser apparatus 失效
标题翻译：激光设备
公开(公告)号：US20060060571A1
公开(公告)日：2006-03-23
申请号：US11230653
申请日：2005-09-21
申请人： Atsushi Mori , Ryoma Okazaki , Minoru Ando
发明人： Atsushi Mori , Ryoma Okazaki , Minoru Ando
IPC分类号： B23K26/00
CPC分类号： H01S3/134 , B23K26/702 , B23K26/705 , H01S3/036 , H01S3/041 , H01S3/073 , H01S3/0975 , H01S3/10069
摘要： A laser apparatus (100) for performing the laser machining operation by condensing the laser light output from a laser oscillator (3) is disclosed. A laser output value calculation unit calculates a laser output value (L1) based on a command value (L0) issued to a laser oscillator (2). A temperature change estimating unit (31) estimates the temperature change or the temperature (Te) of specified component element(s) (7a, 7b) of the laser apparatus based on the elapsed time (t) and the laser output value calculated by the laser output value calculation unit. An adjusting unit (32) adjusts the conditions for controlling the laser or the conditions for laser machining based on the temperature change or the temperature of the specified component element estimated by the temperature change estimating unit. A stable laser machining operation is performed without a temperature sensor. The laser output value (L1) may be measured by a laser power sensor (5).
摘要翻译：公开了一种通过使从激光振荡器（3）输出的激光聚光来进行激光加工的激光装置（100）。激光输出值计算单元基于发出到激光振荡器（2）的指令值（L 0）来计算激光输出值（L 1）。温度变化推定部（31）基于经过时间（t）和计算出的激光输出值，来估计激光装置的规定成分（7a，7b）的温度变化或温度（Te）由激光输出值计算单元。调整单元（32）基于由温度变化推定部估计出的规定成分要素的温度变化或温度来调整激光控制条件或激光加工条件。在不使用温度传感器的情况下进行稳定的激光加工。激光输出值（L 1）可以由激光功率传感器（5）测量。

73. 发明授权

US06985508B2 Very narrow band, two chamber, high reprate gas discharge laser system 有权
标题翻译：非常窄带，二室，高重复气体放电激光系统
公开(公告)号：US06985508B2
公开(公告)日：2006-01-10
申请号：US10627215
申请日：2003-07-24
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Meyers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Meyers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S3/22
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

74. 发明授权

US06973112B2 Passive gas flow management and filtration device for use in an excimer or transverse discharge laser 有权
标题翻译：用于准分子激光或横向放电激光器的无源气体流量管理和过滤装置
公开(公告)号：US06973112B2
公开(公告)日：2005-12-06
申请号：US10632686
申请日：2003-07-31
申请人： Brian Bliven , David Turnquist
发明人： Brian Bliven , David Turnquist
IPC分类号： H01S20060101 , H01S3/036 , H01S3/22 , H01S3/223
CPC分类号： H01S3/036
摘要： The present invention provides systems and methods for filtering particles and assisting gas flow management within laser systems. In one embodiment, a laser apparatus (100) includes an elongate laser chamber defining a chamber cavity (130) and an electrode structure (140) disposed therein. The electrode structure includes an anode (148) spaced apart from a cathode (146). The laser includes an elongate baffle (174) disposed in the laser chamber. The baffle is adapted to arrest a plurality of particles generated within the chamber. In this manner, the baffle operates as a passive filtration system to help filter particles generated within the chamber during laser operation, and may further provide gas flow management capabilities.
摘要翻译：本发明提供了用于过滤颗粒并辅助激光系统内的气体流量管理的系统和方法。在一个实施例中，激光装置（100）包括限定室腔（130）和设置在其中的电极结构（140）的细长激光室。电极结构包括与阴极（146）间隔开的阳极（148）。激光器包括设置在激光室中的细长挡板（174）。挡板适于阻止在室内产生的多个颗粒。以这种方式，挡板用作无源过滤系统，以帮助在激光操作期间过滤在室内产生的颗粒，并且还可以提供气体流量管理能力。

75. 发明申请

US20050226301A1 Gas discharge laser chamber improvements 有权
公开(公告)号：US20050226301A1
公开(公告)日：2005-10-13
申请号：US10815387
申请日：2004-03-31
申请人： William Partlo , Yoshiho Amada , James Carmichael , Timothy Dyer , Walter Gillespie , Bryan Moosman , Richard Morton , Curtis Rettig , Brian Strate , Thomas Steiger , Fedor Trintchouk , Richard Ujazdowski
发明人： William Partlo , Yoshiho Amada , James Carmichael , Timothy Dyer , Walter Gillespie , Bryan Moosman , Richard Morton , Curtis Rettig , Brian Strate , Thomas Steiger , Fedor Trintchouk , Richard Ujazdowski
IPC分类号： H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/22 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

76. 发明申请

US20050206918A1 Laser unit 审中-公开
标题翻译：激光单元
公开(公告)号：US20050206918A1
公开(公告)日：2005-09-22
申请号：US11083303
申请日：2005-03-18
申请人： Akira Egawa , Kazuhiro Suzuki , Motohiko Sato
发明人： Akira Egawa , Kazuhiro Suzuki , Motohiko Sato
IPC分类号： H01S3/13 , H01S3/036 , H01S3/041 , H01S3/07 , H01S3/097 , H01S3/104 , H01S3/134 , G06F15/00 , G03F3/08
CPC分类号： H01S3/09705 , H01S3/036 , H01S3/041 , H01S3/073 , H01S3/09702 , H01S3/1305 , H01S3/134
摘要： A laser unit capable of suitably updating a correction coefficient for correcting a laser output command for a laser oscillator. Validation of input of an update activation signal for the correction coefficient (F1=1) or waiting is carried out by operation of a display, a keyboard or a switch or by inputting an external signal. Flag F2 indicating automatic running, flag F3 indicating laser beam output and flag F4 indicating a shutter condition are checked. The correction coefficient is set to “1” only when flags F2, F3 and F4 are all equal to zero. Further, a laser output reference command value is outputted and the correction coefficient is updated after a predetermined time. Otherwise, a message indicating a reason for prohibition of update of the correction coefficient is displayed on an indicator, flag F1 is set to zero and the process is terminated.
摘要翻译：一种能够适当地更新用于校正激光振荡器的激光输出命令的校正系数的激光单元。通过显示器，键盘或开关的操作或通过输入外部信号来执行用于校正系数（F 1 = 1）或等待的更新激活信号的输入的验证。标志F 2表示自动运行，标志F 3表示激光束输出，标志F 4表示快门条件。仅当标志F 2，F 3和F 4都等于零时，校正系数才被设置为“1”。此外，输出激光输出参考指令值，并且在预定时间之后更新校正系数。否则，在指示符上显示指示禁止更新校正系数的原因的消息，标志F 1被设置为零并且处理结束。

77. 发明授权

US06944200B2 Laser oscillator 失效
标题翻译：激光振荡器
公开(公告)号：US06944200B2
公开(公告)日：2005-09-13
申请号：US10680243
申请日：2003-10-08
申请人： Hiroyuki Hayashikawa , Hitoshi Hongu
发明人： Hiroyuki Hayashikawa , Hitoshi Hongu
IPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/038 , H01S3/07 , H01S3/08 , H01S3/086 , H01S3/22 , H01S3/223
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/038 , H01S3/073 , H01S3/086
摘要： A support unit for supporting an OPM holder so as to be perpendicular to a laser beam axis is disposed in the lower part of the OPM holder. A rotary shaft is inserted into the support unit and rotary shaft support unit, and the OPM holder and DT base are assembled together. Thus, a rotation support unit is composed. The rotation support unit has a degree of freedom in the rotating direction. On the other hand, in the lower part of an RM holder, a support bar is provided. At the DT base, a rotating element and a rotating element support unit supporting the rotating element are composed so as to support the support bar. Thus, a slider structure slidable in the optical axis direction is formed.
摘要翻译：用于支撑OPM夹持器以垂直于激光束轴线的支撑单元设置在OPM夹持器的下部。旋转轴插入支撑单元和旋转轴支撑单元中，并将OPM支架和DT基座组装在一起。因此，构成旋转支撑单元。旋转支撑单元具有旋转方向的自由度。另一方面，在RM支架的下部设有支撑杆。在DT基座上，支撑旋转元件的旋转元件和旋转元件支撑单元被构成为支撑支撑杆。因此，形成可在光轴方向上滑动的滑块结构。

78. 发明申请

US20050174576A1 Gas discharge MOPA laser spectral analysis module 有权
公开(公告)号：US20050174576A1
公开(公告)日：2005-08-11
申请号：US11075973
申请日：2005-03-08
申请人： Rajasekhar Rao , John Melchior , Holger Glatzel
发明人： Rajasekhar Rao , John Melchior , Holger Glatzel
IPC分类号： G01B9/02 , G01J1/42 , G01J9/02 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G01J1/4257 , G01J1/429 , G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/024 , G01J3/027 , G01J3/26 , G01J9/02 , G01J9/0246 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0[DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemeter may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

79. 发明授权

US06898229B2 Gas circulation fan for excimer laser apparatus 失效
标题翻译：准分子激光装置气体循环风机
公开(公告)号：US06898229B2
公开(公告)日：2005-05-24
申请号：US10222999
申请日：2002-08-19
申请人： Yuuji Yada
发明人： Yuuji Yada
IPC分类号： F04D29/056 , F04D29/00 , F04D29/04 , F04D29/05 , F04D29/058 , F16C32/04 , F16C39/06 , H01S3/036 , H01S3/225 , H01S2/22
CPC分类号： F16C32/0444 , F16C2360/44 , H01S3/036 , H01S3/225
摘要： In a gas circulation fan, a main shaft is supported in a non-contact manner, by magnetic bearings. Between each of the magnetic bearings and a controller, a relay is provided. Each relay includes a position detection sensor circuit, an offset adjuster, a feedback gain adjuster and a filter circuit. Thus, compatibility between a mechanical body unit and the controller is attained.
摘要翻译：在气体循环风扇中，主轴通过磁性轴承以非接触的方式支撑。在每个磁性轴承和控制器之间，提供继电器。每个继电器包括位置检测传感器电路，偏移调整器，反馈增益调节器和滤波器电路。因此，实现机械主体单元与控制器之间的兼容性。

80. 发明申请

US20050105579A1 Laser output light pulse stretcher 有权
公开(公告)号：US20050105579A1
公开(公告)日：2005-05-19
申请号：US10847799
申请日：2004-05-18
申请人： Scot Smith , Alexander Ershov , Alexei Lukashev
发明人： Scot Smith , Alexander Ershov , Alexei Lukashev
IPC分类号： H01S3/00 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An apparatus and method for providing a high peak power short pulse duration gas discharge laser output pulse is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and comprising; a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic. The plurality of confocal resonators comprises four confocal resonators comprising a twelve pass four mirror arrangement. Each of the plurality of confocal resonators may comprise a first concave spherical mirror having a radius of curvature and a second concave spherical mirror having the same radius of curvature and separated by the radius of curvature. The pulse stretcher may comprise a first confocal resonator cell which may comprise: a first concave spherical mirror having a radius of curvature receiving an input beam from the laser output pulse optical delay initiating optic comprising the portion of the output laser pulse at a first point on a face of the first concave spherical mirror and generating a first reflected beam; a second concave spherical mirror having the same radius of curvature and separated from the first concave spherical mirror by the radius of curvature and receiving the first reflected beam at a first point on a face of the second concave spherical mirror and generating a second reflected beam incident on a second point on the face of the first concave spherical mirror, the second reflected beam being reflected by the first concave spherical mirror from the second point on the first mirror to form an output beam from the first confocal resonator cell; and, a second confocal resonator cell receiving the output beam of the first confocal resonator cell as an input beam of the second confocal resonator cell. The apparatus and method may form part of a beam delivery unit and may be part of an integrated circuit lithography lights source or an integrated circuit lithography tool. The apparatus and method may comprise a plurality, e.g., two pulse stretchers in series and may include spatial coherency metrology.

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