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71. 发明授权

US08723144B2 Apparatus for sample formation and microanalysis in a vacuum chamber 有权
标题翻译：用于真空室中样品形成和微量分析的装置
公开(公告)号：US08723144B2
公开(公告)日：2014-05-13
申请号：US11119230
申请日：2005-04-28
申请人： Eitan Kidron , Dror Shemesh
发明人： Eitan Kidron , Dror Shemesh
IPC分类号： H01J37/08
CPC分类号： G01N1/32 , H01J37/185 , H01J37/20 , H01J37/28 , H01J37/3056 , H01J2237/20278 , H01J2237/20292 , H01J2237/204 , H01J2237/208 , H01J2237/31745 , H01J2237/31749
摘要： An apparatus is disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a means is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.
摘要翻译：公开了一种用于形成物体样品的装置，从物体中提取样品，并对该样品进行微量分析，包括真空室中的表面分析和电子透过度分析。在一些实施例中，提供了用于对提取的样品的物体横截面进行成像的装置。任选地，将样品迭代地稀释并在真空室内成像。在一些实施例中，样品位于包括任选孔的样品支架上。可选地，样品位于样品载体的表面上，使得物体横截面基本上平行于样品载体的表面。一旦安装在样品支架上，样品就可以在真空室中进行微量分析，或者加载到装载站上。在一些实施例中，用基本上正常地入射到物体横截面表面的电子束成像样品。

72. 发明申请

US20140034831A1 INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM 有权
标题翻译：通过充电颗粒束检查系统和使用系统制造设备的方法
公开(公告)号：US20140034831A1
公开(公告)日：2014-02-06
申请号：US13732897
申请日：2013-01-02
申请人： Ebara Corporation , Kabushiki Kaisha Toshiba
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： G01N23/225 , G01N23/227
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在迷你环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

73. 发明授权

US08604428B2 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system 有权
标题翻译：控制由带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法
公开(公告)号：US08604428B2
公开(公告)日：2013-12-10
申请号：US13236108
申请日：2011-09-19
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： H01J37/26
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample and charged particle beam imaging system thereof prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制晶片样品和带电粒子束成像系统上的颗粒吸收的方法通过在晶片样品中接地而防止颗粒吸收，并在转移和转移过程中保持电中性。

74. 发明授权

US08598524B2 Slider bearing for use with an apparatus comprising a vacuum chamber 有权
标题翻译：用于与包括真空室的设备一起使用的滑块轴承
公开(公告)号：US08598524B2
公开(公告)日：2013-12-03
申请号：US12303715
申请日：2007-04-26
申请人： Johannes Antonius Hendricus Wilhelmus Gerardus Persoon , Andreas Theodorus Engelen , Siegfried Lichtenegger , Petrus Henricus Joannes Van Dooren
发明人： Johannes Antonius Hendricus Wilhelmus Gerardus Persoon , Andreas Theodorus Engelen , Siegfried Lichtenegger , Petrus Henricus Joannes Van Dooren
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/185 , H01J37/20 , H01J2237/166 , H01J2237/184 , H01J2237/2006 , H01J2237/204
摘要： An apparatus for loading a sample into a particle-optical instrument that includes a slider bearing having a base plate in contact with the vacuum chamber at one side, said base plate showing a first through-hole in contact with the vacuum chamber, and a second plate, one side of the second plate in contact with the base plate, said second plate also showing a through-hole, where the faces of the base plate and the second plate facing each other are sufficiently smooth to form a non-elastomeric vacuum seal and where the second plate is a flexible plate and the face of the flexible plate opposite to the base plate is equipped to seal against a cup equipped to hold a sample. Preferably the through-hole in the base plate shows a rim facing the flexible plate with a controlled curvature, the curvature of the rim formed such that the vacuum seal between the base plate and the flexible plate forms on a pre-defined contour and that the Hertzian contact pressure is smaller than a pre-defined maximum contact pressure, the pre-determined maximum contact pressure chosen to minimize particle generation. By forming the second plate as a flexible plate the pressure with which the base plate and the second plate are pressed together is better reproducible than when both plates are rigid. By forming the rim with a controlled radius, particle generation is minimized.
摘要翻译：一种用于将样品装载到包括滑动轴承的颗粒光学仪器的装置，该滑动轴承具有与一侧的真空室接触的基板，所述基板显示与真空室接触的第一通孔，第二通孔板，与基板接触的第二板的一侧，所述第二板还显示通孔，其中基板和第二板的面彼此面对是足够光滑的，以形成非弹性真空密封件并且其中第二板是柔性板，并且与基板相对的柔性板的表面被装备以密封装备以保持样品的杯。优选地，基板中的通孔显示出具有受控曲率的面向柔性板的边缘，所述边缘的曲率形成为使得基板和柔性板之间的真空密封形成预定义的轮廓，并且赫兹接触压力小于预定义的最大接触压力，选择预定的最大接触压力以最小化颗粒产生。通过将第二板形成为柔性板，将基板和第二板压在一起的压力比两个板刚性时的压力更好。通过以受控的半径形成轮辋，使颗粒的产生最小化。

75. 发明授权

US08530856B2 Beam device system comprising a particle beam device and an optical microscope 有权
标题翻译：光束装置系统，包括粒子束装置和光学显微镜
公开(公告)号：US08530856B2
公开(公告)日：2013-09-10
申请号：US12734613
申请日：2008-11-11
申请人： Bernd Spruck , Martin Edelmann , John Craven , Robert Taylor , Martin Kühner
发明人： Bernd Spruck , Martin Edelmann , John Craven , Robert Taylor , Martin Kühner
IPC分类号： H01J37/26 , G21K5/04
CPC分类号： H01J37/20 , G02B21/0004 , H01J37/18 , H01J37/228 , H01J37/26 , H01J2237/2003 , H01J2237/2006 , H01J2237/204 , H01J2237/2608
摘要： A beam device, in particular a particle beam device, for analyzing an object is provided, as well as a system comprising a particle beam device and an optical microscope for optically analyzing an object. The beam device simplifies the exchange and reduces the time of the exchange of objects to be examined. The beam device includes at least one beam generator that generates a beam, at least one objective lens that focuses the beam on an object arranged in a holding element. The objective lens comprises at least one connecting element. The holding element may be connected to the connecting element so that the holding element is removable from the connecting element for modification of the object. Alternatively, the holding element may be mounted to a beam column.
摘要翻译：提供了用于分析物体的光束装置，特别是粒子束装置，以及包括用于光学分析物体的粒子束装置和光学显微镜的系统。光束装置简化了交换并减少了被检查物体交换的时间。光束装置包括产生光束的至少一个光束发生器，将光束聚焦在布置在保持元件中的物体上的至少一个物镜。物镜包括至少一个连接元件。保持元件可以连接到连接元件，使得保持元件可从连接元件移除以便对象的修改。或者，保持元件可以安装到梁柱。

76. 发明申请

US20130200262A1 INSPECTION APPARATUS AND REPLACEABLE DOOR FOR A VACUUM CHAMBER OF SUCH AN INSPECTION APPARATUS AND A METHOD FOR OPERATING AN INSPECTION APPARATUS 有权
标题翻译：这种检查装置的真空室的检查装置和可更换的门以及操作检查装置的方法
公开(公告)号：US20130200262A1
公开(公告)日：2013-08-08
申请号：US13809685
申请日：2011-07-14
申请人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
发明人： Pieter Kruit , Jacob Pieter Hoogenboom , Aernout Christiaan Zonnevylle
IPC分类号： H01J37/22 , H01J37/26 , G01N21/62
CPC分类号： H01J37/22 , G01N21/62 , G01N2021/625 , H01J37/226 , H01J37/228 , H01J37/256 , H01J37/26 , H01J37/28 , H01J2237/204 , H01J2237/2445 , H01J2237/2482 , H01J2237/2808
摘要： An inspection apparatus is provided comprising in combination at least an optical microscope (2, 3, 4) and an ion- or electron microscope (7, 8) equipped with a source (7) for emitting a primary beam (9) of radiation to a sample (10) in a sample holder. The apparatus may comprise a detector (8) for detection of secondary radiation (11) backscattered from the sample and induced by the primary beam. The optical microscope is equipped with an light collecting device (2) to receive in use luminescence light (12) emitted by the sample and to focus it on a photon-detector (4).
摘要翻译：提供一种检查装置，其至少包括光学显微镜（2,3,4）和配备有用于发射辐射的主光束（9）的源（7）的离子或电子显微镜（7,8）的组合，在样品架中的样品（10）。该装置可包括检测器（8），用于检测从样品反向散射并由主光束引发的次级辐射（11）。光学显微镜配备有光收集装置（2），以使用由样品发射的发光（12）接收并将其聚焦在光子检测器（4）上。

77. 发明申请

US20130082193A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：充电颗粒光束写字装置和充电颗粒光束写字方法
公开(公告)号：US20130082193A1
公开(公告)日：2013-04-04
申请号：US13625231
申请日：2012-09-24
申请人： NuFlare Technology, Inc
发明人： Michihiro KAWAGUCHI , Kazuhiro SHIBA , Keisuke YAMAGUCHI , Kiminobu AKENO , Yoshinori KAGAWA
IPC分类号： G21K5/08
CPC分类号： G21K5/08 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F9/7096 , H01J37/3045 , H01J37/3174 , H01J2237/2007 , H01J2237/204 , H01L21/00
摘要： A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.
摘要翻译：根据本发明的一个方面的带电粒子束写入装置包括：基板盖安装/拆卸单元，用于将覆盖作为书写目标的基板的整个周边的基板盖从上部附接到所述基板盖基板，写入单元，以基板盖子附着于基板的状态，通过带电粒子束，位置测量单元，在写入单元写入之前和之后，在基板上写入图案，以测量位置在相对于与基板盖相连接的基板的位置上的预定测量位置处的基板覆盖物的状态和校正单元，校正位于基板盖的位置之间的位置偏差量写入后测量的基板盖和写入前测量的基板盖的位置。

78. 发明授权

US08198603B2 Sample preparing device and sample posture shifting method 有权
标题翻译：样品制备装置和样品姿态转换方法
公开(公告)号：US08198603B2
公开(公告)日：2012-06-12
申请号：US12290397
申请日：2008-10-29
申请人： Haruo Takahashi , Ikuko Nakatani , Junichi Tashiro
发明人： Haruo Takahashi , Ikuko Nakatani , Junichi Tashiro
IPC分类号： H01J37/20 , G21K5/10 , G01N1/28
CPC分类号： H01J37/20 , H01J37/023 , H01J37/3056 , H01J2237/202 , H01J2237/204 , H01J2237/2062 , H01J2237/208 , H01J2237/31745 , H01J2237/31749
摘要： A sample preparing device has a sample stage that supports a sample and undergoes rotation about a first rotation axis to bring a preselected direction of the sample piece into coincidence with an intersection line between a first plane formed by a surface of the sample piece and a second plane. A manipulator holds sample piece of the sample and undergoes rotation about a second rotation axis independently of the sample stage to rotate the sample piece to a preselected position in the state in which the preselected direction of the sample piece coincides with the intersection line. The manipulator is disposed relative to the sample stage so that an angle between the second rotation axis and the surface of the sample is in the range of 0° to 45°. The second plane corresponds to a plane obtained by rotating around the second rotation axis a line segment which is vertical to the surface of the sample and of which one end corresponds to an intersection between the surface of the sample and the second rotation axis.
摘要翻译：样品制备装置具有样品台，其支撑样品并围绕第一旋转轴线旋转以使样品片的预选方向与由样品片的表面形成的第一平面和第二面之间的交线相符，飞机操纵器保持样品的样品并且独立于样品台绕第二旋转轴旋转，以在样品的预选方向与交叉线重合的状态下将样品片旋转到预选位置。操纵器相对于样品台设置，使得第二旋转轴与样品表面之间的角度在0°至45°的范围内。第二平面对应于通过围绕第二旋转轴旋转垂直于样品表面的线段并且其一端对应于样品表面和第二旋转轴线之间的交叉而获得的平面。

79. 发明授权

US08191168B2 Method of preparing a transmission electron microscope sample and a sample piece for a transmission electron microscope 有权
标题翻译：制备透射电子显微镜样品的方法和透射电子显微镜的样品片
公开(公告)号：US08191168B2
公开(公告)日：2012-05-29
申请号：US12264750
申请日：2008-11-04
申请人： Xin Man , Kouji Iwasaki , Tatsuya Asahata
发明人： Xin Man , Kouji Iwasaki , Tatsuya Asahata
IPC分类号： G01N13/10
CPC分类号： H01J37/3056 , B82Y15/00 , G01N1/286 , H01J37/20 , H01J37/26 , H01J2237/2007 , H01J2237/202 , H01J2237/204 , H01J2237/206 , H01J2237/2067 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749
摘要： Provided is a method of preparing a sample piece for a transmission electron microscope, the sample piece for a transmission electron microscope including a substantially planar finished surface which can be observed with the transmission electron microscope and a grabbing portion which microtweezers can grab without contacting the finished surface. The method of preparing a sample piece for a transmission electron microscope is characterized by including: a first step of cutting out the sample piece from a sample body Wa with a charged particle beam, the sample piece being coupled to the sample body at a coupling portion; a second step of grabbing with the microtweezers the grabbing portion of the sample piece with the finished surface of the sample piece cut out in the first step being covered with the microtweezers; a third step of detaching the sample piece grabbed with the microtweezers in the second step from the sample body by cutting the coupling portion with the charged particle beam with a grabbed state of the sample piece being maintained; and a fourth step of transferring and fixing with the microtweezers the sample piece detached in the third step onto a sample holder.
摘要翻译：提供了一种制备透射电子显微镜样品的方法，用于透射电子显微镜的样品片，其包括可透射电子显微镜观察的基本上平面的成品表面，以及微型加工者可以在不接触成品的情况下抓取的抓取部分表面。制备透射电子显微镜样品的方法的特征在于包括：第一步骤，利用带电粒子束从样品体Wa切出样品片，样品片以耦合部分 ; 第二步骤是用微型加湿器抓住样品的抓取部分，其中在第一步骤中切出的样品的成品表面被微型加工机覆盖; 第三步骤，通过用保持样品的抓取状态的带电粒子束切割耦合部分，将样品从第二步骤中剥离出来; 以及第四步骤，用微型加工机将第三步骤中拆卸的样品片转移和固定到样品架上。

80. 发明申请

US20120006984A1 METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING INSPECTED BY A CHARGED PARTICLE BEAM IMAGING SYSTEM 有权
标题翻译：通过充电颗粒光束成像系统检测的波形样品控制颗粒吸收的方法
公开(公告)号：US20120006984A1
公开(公告)日：2012-01-12
申请号：US13236108
申请日：2011-09-19
申请人： You-Jin WANG , Chung-Shih PAN
发明人： You-Jin WANG , Chung-Shih PAN
IPC分类号： H01J37/26 , H01J37/20
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample and charged particle beam imaging system thereof prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制晶片样品和带电粒子束成像系统上的颗粒吸收的方法通过在晶片样品中接地而防止颗粒吸收，并在转移和转移过程中保持电中性。

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