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71. 发明授权

US08559108B2 Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system 有权
标题翻译： EUV辐射光栅，光栅制造方法及波前测量系统
公开(公告)号：US08559108B2
公开(公告)日：2013-10-15
申请号：US12809744
申请日：2008-12-19
申请人： Borgert Kruizinga , Martijn Gerard Dominique Wehrens , Michiel David Nijkerk , Kornelis Frits Feenstra
发明人： Borgert Kruizinga , Martijn Gerard Dominique Wehrens , Michiel David Nijkerk , Kornelis Frits Feenstra
IPC分类号： G02B5/18 , G06K7/10
CPC分类号： G02B5/1838 , G02B5/1857 , G02B5/1861 , G03F7/70316 , G03F7/706 , G21K1/06 , G21K1/067
摘要： A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.
摘要翻译：用于EUV辐射的光栅包括多条反射线。每个反射线包括多个第一反射点和彼此之间布置的多个第二反射点。第一反射点和第二反射点被配置为反映相互相位差为180±10度±360度的EUV辐射。

72. 发明授权

US08259290B2 Diffractive optical device, and aligner comprising that device 有权
$Diffractive optical device, and aligner comprising that device$
标题翻译：衍射光学器件和包括该器件的对准器
公开(公告)号：US08259290B2
公开(公告)日：2012-09-04
申请号：US12091926
申请日：2007-04-10
申请人： Nobuhito Toyama , Ryuji Horiguchi
发明人： Nobuhito Toyama , Ryuji Horiguchi
IPC分类号： G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G02B5/18 , G02B5/1838 , G03F7/70108 , G03F7/70158
摘要： The invention relates to a pupil filter used for the illumination optical system of a semiconductor aligner or the like that can prevent a decrease in the quantity of light having transmitted through it, enhance the efficiency of semiconductor exposure, reduce loads of correction by the optical proximity effect and yield a stable yet high-resolution optical image without engendering size fluctuations of a pattern imaged on a wafer depending on a mask pattern pitch. Specifically, the invention provides a diffractive optical device for the formation of a pupil filter used for the illumination optical system of an aligner adapted to direct light emanating from a light source to a mask via an illumination optical system and project a pattern on the mask onto an alignment substrate and exposing it to light via a projection optical system. The pupil filter formed by the diffractive optical device is a dipole pupil comprising two light transmissive areas (11). The two light transmissive areas (11) are in a fan-form configuration symmetric at a given distance from the center of the pupil filter, between them there is an area (12) of low light transmittance, and outside the two light transmissive areas (11) and the area (12) of low light transmittance there is a light block area (13).
摘要翻译：本发明涉及一种用于半导体对准器等的照明光学系统的光瞳滤波器，其可以防止透射通过的光的量的减少，提高半导体曝光的效率，减少光学邻近的校正负载影响并产生稳定的高分辨率光学图像，而不会导致根据掩模图案间距在晶片上成像的图案的尺寸波动。具体地，本发明提供一种用于形成用于对准器的照明光学系统的瞳孔滤光器的衍射光学装置，其适于将经由照明光学系统将从光源发出的光引导到掩模，并将掩模上的图案投影到对准基板，并通过投影光学系统将其曝光。由衍射光学器件形成的光瞳滤光器是包括两个透光区域（11）的偶极瞳孔。两个透光区域（11）处于与光瞳滤光器中心一定距离对称的扇形结构，它们之间存在低透光率的区域（12），并且在两个透光区域（ 11），并且低透光率的区域（12）存在光阻挡区域（13）。

73. 发明申请

US20100278297A1 GRATING WITH A LARGE ASPECT RATIO, IN PARTICULAR TO BE USED AS AN X-RAY OPTICAL GRATING IN A CT SYSTEM, PRODUCED BY A LITHOGRAPHY METHOD 有权
标题翻译：具有大的纵横比特征，特别是用作CT系统中的X光学光刻，由光刻方法
公开(公告)号：US20100278297A1
公开(公告)日：2010-11-04
申请号：US12768052
申请日：2010-04-27
申请人： Martin Börner , Eckhard Hempel , Hartmut Kumm , Jürgen Mohr , Elena Reznikova
发明人： Martin Börner , Eckhard Hempel , Hartmut Kumm , Jürgen Mohr , Elena Reznikova
IPC分类号： G21K1/10 , G02B5/18
CPC分类号： G21K1/06 , A61B6/032 , A61B6/4291 , A61B6/484 , G02B5/1838 , G21K2201/067
摘要： A grating with a large aspect ratio is disclosed, in particular to be used as an X-ray optical grating in a CT system and in particular produced by a lithography method. In at least one embodiment, the grating includes a multiplicity of recurring alternating grating webs and grating gaps with a height, and a multiplicity of filler beams, respectively arranged in the grating gaps with a spacing from one another in the direction of the gaps, which beams connect respectively adjacent grating webs over their height. In at least one embodiment, the grating webs and the grating gaps run from a first to a second side of the grating, and a filler beam has a width in the direction of the gaps and this width is at most 10% of the spacing between two adjacent filler beams. In at least one embodiment, the spacings between respective adjacent filler beams in a grating gap do not vary by more than 10% in the entire grating. At least one embodiment of the invention furthermore relates to a CT system containing at least one grating according to at least one embodiment of the invention.
摘要翻译：公开了具有大纵横比的光栅，特别是用作CT系统中的X射线光栅，特别是通过光刻方法制造。在至少一个实施例中，光栅包括多个重复交替的光栅幅和高度的光栅间隙，以及分别布置在光栅间隙中的多个填充光束，沿间隙方向彼此间隔开。梁在其高度上分别连接相邻的格栅网。在至少一个实施例中，光栅幅材和光栅间隙从光栅的第一侧延伸到第二侧，并且填充光束在间隙的方向上具有宽度，并且该宽度至多为10％两个相邻的填充梁。在至少一个实施例中，光栅间隙中各个相邻填充光束之间的间距在整个光栅中不变化大于10％。本发明的至少一个实施例还涉及根据本发明的至少一个实施例的至少一个光栅的CT系统。

74. 发明申请

US20100053611A1 Ultra-high Density Diffraction Grating 有权
$Ultra-high Density Diffraction Grating$
标题翻译：超高密度衍射光栅
公开(公告)号：US20100053611A1
公开(公告)日：2010-03-04
申请号：US12510900
申请日：2009-07-28
申请人： Howard A. Padmore , Dmytro L. Voronov , Rossana Cambie , Valeriy V. Yashchuk , Eric M. Gullikson
发明人： Howard A. Padmore , Dmytro L. Voronov , Rossana Cambie , Valeriy V. Yashchuk , Eric M. Gullikson
IPC分类号： G01J3/18 , B29D11/00 , C23C14/00 , C23C14/34 , B05D5/06 , C23C14/35 , G02B5/18
CPC分类号： G02B5/1838 , B29D11/0073 , B29D11/00769 , B82Y10/00 , G01J3/1809 , G21K1/06 , G21K1/062 , G21K2201/061 , G21K2201/067
摘要： A diffraction grating structure having ultra-high density of grooves comprises an echellette substrate having periodically repeating recessed features, and a multi-layer stack of materials disposed on the echellette substrate. The surface of the diffraction grating is planarized, such that layers of the multi-layer stack form a plurality of lines disposed on the planarized surface of the structure in a periodical fashion, wherein lines having a first property alternate with lines having a dissimilar property on the surface of the substrate. For example, in one embodiment, lines comprising high-Z and low-Z materials alternate on the planarized surface providing a structure that is suitable as a diffraction grating for EUV and soft X-rays. In some embodiments, line density of between about 10,000 lines/mm to about 100,000 lines/mm is provided.
摘要翻译：具有超高密度凹槽的衍射光栅结构包括具有周期性重复的凹陷特征的薄片基片和设置在薄片基片上的多层材料堆叠。衍射光栅的表面被平坦化，使得多层叠层的层以周期的方式形成布置在结构的平坦化表面上的多条线，其中具有第一属性的线与具有不同性质的线交替衬底的表面。例如，在一个实施例中，包括高Z和低Z材料的线在平坦化表面上交替，提供适合作为EUV和软X射线的衍射光栅的结构。在一些实施例中，提供约10,000线/ mm至约100,000线/ mm之间的线密度。

75. 发明申请

US20100020400A1 DIFFRACTIVE OPTICAL ELEMENT, METHOD FOR MANUFACTURING DIFFRACTIVE OPTICAL ELEMENT, AND LASER BEAM MACHINING METHOD 审中-公开
标题翻译：衍射光学元件，制造衍射光学元件的方法和激光束加工方法
公开(公告)号：US20100020400A1
公开(公告)日：2010-01-28
申请号：US12265761
申请日：2008-11-06
申请人： Jun AMAKO
发明人： Jun AMAKO
IPC分类号： G02B5/18 , G03F7/20
CPC分类号： B23K26/0673 , B23K26/0622 , B23K26/0853 , B23K26/40 , B23K2101/40 , B23K2103/50 , G02B5/1838 , G02B5/1861
摘要： A diffractive optical element includes: a substrate having a first face and a second face; a diffractive structure section that is formed on the first face of the substrate, shaped in a rectangular form in a cross-sectional view of the diffractive structure section, and having an upper face and a plurality of protuberance portions; and a grid section that is formed of a dielectric material, formed on at least one of the upper face of the diffractive structure section and the second face of the substrate, and including micro protuberance portions that are smaller than each of the protuberance portions.
摘要翻译：衍射光学元件包括：具有第一面和第二面的基板; 衍射结构部分，其形成在所述基板的第一面上，在所述衍射结构部分的横截面视图中成形为矩形，并且具有上表面和多个突起部分; 以及形成在所述衍射结构部分的上表面和所述基板的第二面中的至少一个上的介电材料形成的格栅部分，并且包括比每个所述突起部分小的微突起部分。

76. 发明申请

US20090289205A1 MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE 有权
标题翻译：超级紫外线镜，超大紫外线镜和远紫外光源装置的制造方法
公开(公告)号：US20090289205A1
公开(公告)日：2009-11-26
申请号：US12469140
申请日：2009-05-20
申请人： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
发明人： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
IPC分类号： H05G2/00 , G02B5/08 , G03F7/20
CPC分类号： G02B5/1838 , G02B5/0891 , G02B5/1857 , G03F7/70575 , G21K1/065 , G21K2201/064
摘要： The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.
摘要翻译： EUV光源装置除去其发射的光之外的EUV辐射以外的辐射，并且仅将EUV辐射提供给曝光装置。在EUV收集镜的前表面上设置由多个Mo / Si对层构成的复合层，在该复合层中形成闪耀槽。从等离子体发射的辐射入射到该EUV收集镜上，并被反射或衍射。反射的EUV辐射（包括衍射的EUV）进行到中间焦点IF。由于其反射角或衍射角不同，其他波长的辐射进入除了该焦点IF之外的某个位置。具有开口部分的SPF屏蔽设置在焦点IF处。因此，只有EUV辐射通过开口部分并被提供给曝光装置，而另一辐射被屏蔽件遮挡。

77. 发明授权

US07602503B2 Methods for measuring a wavefront of an optical system 有权
标题翻译：用于测量光学系统的波前的方法
公开(公告)号：US07602503B2
公开(公告)日：2009-10-13
申请号：US11708618
申请日：2007-02-21
申请人： Sherman K. Poultney
发明人： Sherman K. Poultney
IPC分类号： G01B9/02
CPC分类号： G01J9/0215 , G01J2009/0219 , G02B5/1838 , G03F7/70591 , G03F7/706 , G03F7/7085
摘要： A method for measuring a wavefront of an optical system. A first step of the method includes directing electromagnetic radiation uniformly at an object plane having a first grating positioned therein. Lines of the first grating comprise a plurality of dots. A second step of the method includes projecting an image of the first grating onto a focal plane having a second grating positioned therein. A third step of the method includes measuring the wavefront of the optical system based on a fringe pattern produced by the second grating.
摘要翻译：一种用于测量光学系统的波前的方法。该方法的第一步包括将电磁辐射均匀地引导到具有位于其中的第一光栅的物平面。第一光栅的线包括多个点。该方法的第二步骤包括将第一光栅的图像投影到具有定位在其中的第二光栅的焦平面上。该方法的第三步骤包括基于由第二光栅产生的条纹图案来测量光学系统的波前。

78. 发明申请

US20090011368A1 Exposure Method and Apparatus, and Electronic Device Manufacturing Method 审中-公开
标题翻译：曝光方法和装置以及电子装置制造方法
公开(公告)号：US20090011368A1
公开(公告)日：2009-01-08
申请号：US11884891
申请日：2006-02-23
申请人： Yutaka Ichihara , Ayako Nakamura , Naomasa Shiraishi , Akikazu Tanimoto , Yuji Kudo
发明人： Yutaka Ichihara , Ayako Nakamura , Naomasa Shiraishi , Akikazu Tanimoto , Yuji Kudo
IPC分类号： G03F7/22 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70408 , G02B5/1838 , G02B5/1866 , G02B13/143 , G02B27/4222 , G02B27/4272 , G02B27/4277 , G03B27/42 , G03F7/70283 , G03F7/7035
摘要： An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.
摘要翻译：目的是提供一种适合用于形成用于构成电子设备的精细图案的高分辨率和经济的曝光方法。两个衍射光栅（P1，P2）串联在光路中; 用于构成电子设备的两个衍射光栅（P1，P2）和晶片等（W）以预定间隔布置; 由衍射光栅（P1，P2）产生的干涉条纹的暗暗图案被转印到晶片等（W）上以进行曝光。在根据需要改变晶片等（W）和衍射光栅（P1，P2）之间的位置关系的同时进行曝光。

79. 发明授权

US07411687B2 Speckle reduction method and system for EUV interferometry 有权
标题翻译：用于EUV干涉测量的斑点还原法和系统
公开(公告)号：US07411687B2
公开(公告)日：2008-08-12
申请号：US11391378
申请日：2006-03-29
申请人： Richard A. Gontin , Yuli Vladimirsky
发明人： Richard A. Gontin , Yuli Vladimirsky
IPC分类号： G01B9/02
CPC分类号： G01J9/0215 , G02B5/1838 , G03F7/706
摘要： A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.
摘要翻译：波前测量系统具有电磁辐射源。成像系统将电磁辐射聚焦在物体平面。第一光栅位于物平面内并具有多个具有随机高度的刻线。舞台将第一光栅平行于刻线。投影光学系统将第一光栅的图像投影到图像平面上。第二个光栅位于图像平面。第二光栅后面的检测器接收由第二光栅产生的条纹图案。

80. 发明申请

US20060256349A1 Speckle reduction method and system for EUV interferometry 有权
公开(公告)号：US20060256349A1
公开(公告)日：2006-11-16
申请号：US11391378
申请日：2006-03-29
申请人： Richard Gontin , Yuli Vladimirsky
发明人： Richard Gontin , Yuli Vladimirsky
IPC分类号： G01B9/02
CPC分类号： G01J9/0215 , G02B5/1838 , G03F7/706
摘要： A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.

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