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71. 发明授权

US06870602B2 Method for forming optical thin film and optical element provided with optical thin film 有权
标题翻译：形成光学薄膜的方法和配有光学薄膜的光学元件
公开(公告)号：US06870602B2
公开(公告)日：2005-03-22
申请号：US10208874
申请日：2002-08-01
申请人： Hitoshi Ishizawa , Tsuyoshi Murata
发明人： Hitoshi Ishizawa , Tsuyoshi Murata
IPC分类号： G02B1/11 , C03C17/00 , C03C17/34 , G02B1/111 , G03F7/20 , G03B27/54 , B28B1/38
CPC分类号： G02B1/115 , C03C17/007 , C03C17/3411 , C03C2217/213 , C03C2217/285 , C03C2217/425 , C03C2218/113 , C03C2218/365 , G02B1/10 , G03F7/70958
摘要： A method for forming an optical thin film on a substrate comprises the steps of preparing a sol solution containing minute particles for an optical element dispersed in a dispersion medium, putting the prepared sol solution in a tightly closable vessel to heat and pressurize the sol solution, and then applying the heated and pressurized sol solution onto an optical substrate. The obtained thin film has a refractive index of 1.16 with respect to a light beam having a wavelength of 193 nm, in which the transmission loss is not more than 0.5%. An optical lens including the optical thin film formed on the surface, and an exposure apparatus including the lens provided for a projection optical system or an illumination system are provided.
摘要翻译：在基板上形成光学薄膜的方法包括以下步骤：制备包含分散在分散介质中的光学元件的微小颗粒的溶胶溶液，将制备的溶胶溶液置于紧密封闭的容器中，以加热和加压溶胶溶液，然后将加热和加压的溶胶溶液施加到光学基底上。所获得的薄膜相对于波长为193nm的光束的折射率为1.16，其中透射损失不大于0.5％。提供了包括形成在表面上的光学薄膜的光学透镜，以及包括用于投影光学系统或照明系统的透镜的曝光装置。

72. 发明申请

US20050044894A1 Deposition of silica coatings on a substrate 审中-公开
标题翻译：在基底上沉积二氧化硅涂层
公开(公告)号：US20050044894A1
公开(公告)日：2005-03-03
申请号：US10652248
申请日：2003-08-29
申请人： Douglas Nelson , Thomas Kemmerley , Michael Remington
发明人： Douglas Nelson , Thomas Kemmerley , Michael Remington
IPC分类号： C03C17/245
CPC分类号： C03C17/245 , C03C2217/213 , C03C2218/152
摘要： A process for the production of a silica coating on a glass substrate provides a precursor mixture of SiH4, NH3, and O2, preferably in the presence of C2H4 and an inert carrier gas. The precursor mixture is directed along a surface of the glass substrate in an atmospheric pressure, on-line, chemical vapor deposition process. The precursor mixture is reacted at the surface of the glass substrate to form a silica coating, essentially devoid of nitrogen, on the glass substrate.
摘要翻译：在玻璃基底上生产二氧化硅涂层的方法提供了SiH 4，NH 3和O 2的前体混合物，优选在C 2 H 4和惰性载气的存在下。前体混合物在大气压，在线，化学气相沉积工艺中沿着玻璃基板的表面引导。前体混合物在玻璃基底的表面反应，在玻璃基底上形成基本上没有氮的二氧化硅涂层。

73. 发明申请

US20040248995A1 Novel hybrid sol for the production of abrasion-resistant sio2 antireflection coatings 失效
标题翻译：用于生产耐磨sio2抗反射涂层的新型混合溶胶
公开(公告)号：US20040248995A1
公开(公告)日：2004-12-09
申请号：US10490310
申请日：2004-03-19
发明人： Walther Glaubitt , Monika Kursawe , Andreas Gombert , Thomas Hofmann
IPC分类号： C01B033/14
CPC分类号： B82Y30/00 , C01B33/145 , C03C17/001 , C03C17/007 , C03C17/25 , C03C2217/213 , C03C2217/425 , C03C2218/113 , C09D183/02 , Y10T428/31612 , C08L2666/54
摘要： Hybrid sol comprising nullSiOx(OH)ynulln particles, where 0
摘要翻译：包含[SiO x（OH）y] n颗粒的杂化溶胶，其中0

74. 发明授权

US06805903B2 Method of forming optical thin film 失效
标题翻译：光学薄膜的形成方法
公开(公告)号：US06805903B2
公开(公告)日：2004-10-19
申请号：US10362361
申请日：2003-08-01
申请人： Kunio Yoshida
发明人： Kunio Yoshida
IPC分类号： G02B111
CPC分类号： G02B1/113 , C03C17/007 , C03C17/22 , C03C17/245 , C03C17/3452 , C03C2217/213 , C03C2217/285 , C03C2217/425 , C03C2217/732 , C03C2218/15 , C03C2218/32 , C03C2218/355 , C23C14/0694 , C23C14/5873 , G02B1/10
摘要： A method for forming an optical thin film used for optical elements of laser systems including high-energy lasers and an optical element of optical apparatuses is provided. The optical thin film can be easily formed on a desired substrate with reproducibility by vapor-depositing a porous fluoride layer for preventing reflection in the deep ultraviolet region, and can be easily removed in a short time to reuse the substrate if the thin film damaged. A water-insoluble material (2) for preventing reflection is vapor-deposited onto an optical element substrate (1). A water-soluble material (3) having a higher particle energy is vapor-deposited onto the surface of the water-insoluble material (2). The water-soluble material (3) permeates deep into the water-insoluble material (2) to form a mixed film on the surface of the substrate (1). Then, the water-soluble material (3) is dissolved and removed to form a porous thin film (5) comprising the water-insoluble material (2).
摘要翻译：提供了一种形成用于包括高能激光器和光学装置的光学元件的激光系统的光学元件的光学薄膜的方法。通过气相沉积用于防止深紫外区域反射的多孔氟化物层，可以通过再现性容易地在期望的基板上形成光学薄膜，并且如果薄膜损坏，则可以在短时间内容易地去除重新使用基板。将用于防止反射的水不溶性材料（2）气相沉积到光学元件基板（1）上。将具有较高颗粒能的水溶性材料（3）气相沉积在水不溶性材料（2）的表面上。水溶性物质（3）深入到水不溶性材料（2）中，在基材（1）的表面形成混合膜。然后，将水溶性物质（3）溶解除去，形成包含水不溶性物质（2）的多孔薄膜（5）。

75. 发明申请

US20040129557A1 Method of forming non-oxide thin films using negative sputter ion beam source 审中-公开
标题翻译：使用负溅射离子束源形成非氧化物薄膜的方法
公开(公告)号：US20040129557A1
公开(公告)日：2004-07-08
申请号：US10695485
申请日：2003-10-29
申请人： Plasmion Corporation
发明人： Namwoong Paik , Minho Sohn , Dae-Il Kim
IPC分类号： C23C014/32
CPC分类号： C23C14/14 , C03C17/002 , C03C17/245 , C03C17/2456 , C03C2217/212 , C03C2217/213 , C03C2217/214 , C03C2217/218 , C03C2218/154 , C23C14/0036 , C23C14/08 , C23C14/10 , C23C14/34 , C23C14/3442 , C23C14/35
摘要： A method of forming an non-oxide thin film includes introducing a work function reducing agent onto a surface of a sputter target facing into a substrate in a process chamber, providing an inert gas into the process chamber, ionizing the inert gas, thereby generating a plurality of electrons, disintegrating a plurality of negatively charged ions from the sputter target, and forming the non-oxide thin film on the substrate from the negatively charged ions.
摘要翻译：形成非氧化物薄膜的方法包括将功函数还原剂引入到处理室中面向基板的溅射靶的表面上，向处理室提供惰性气体，使惰性气体电离，从而产生多个电子，从溅射靶分解多个带负电荷的离子，以及从负电荷的离子在衬底上形成非氧化物薄膜。

76. 发明申请

US20040112274A1 Reinforcing process of silica glass substance and reinforced silica glass crucible 审中-公开
标题翻译：石英玻璃物质和增强石英玻璃坩埚的加强过程
公开(公告)号：US20040112274A1
公开(公告)日：2004-06-17
申请号：US10673180
申请日：2003-09-30
申请人： JAPAN SUPER QUARTZ CORPORATION
发明人： Toshio Tsujimoto , Hiroya Ishizuka , Naotaka Fumoto
IPC分类号： C30B001/00
CPC分类号： C30B35/002 , C03C17/004 , C03C17/005 , C03C17/02 , C03C17/04 , C03C2217/213 , C03C2218/11 , C03C2218/113 , C03C2218/17 , C30B15/10 , Y10T117/1032
摘要： A process reinforcing a silica glass substance, such as a silica glass crucible, is provided without intermixing an impurity. The process comprises forming a silica glass powder layer on a surface of the silica glass substance, and crystallizing said silica glass powder layer under high temperature. As for a silica glass crucible, the process for reinforcing the silica glass crucible and the reinforced silica glass crucible are provided, wherein the silica glass powder layer on the whole or a part of the surface of the crucible is formed and then, crystallized under a temperature at the melting of a silicon raw material being charged into said quartz glass crucible.
摘要翻译：提供加强二氧化硅玻璃物质如石英玻璃坩埚的方法，而不混合杂质。该方法包括在石英玻璃物质的表面上形成二氧化硅玻璃粉末层，并在高温下使所述二氧化硅玻璃粉末层结晶。对于石英玻璃坩埚，提供了用于增强石英玻璃坩埚和增强石英玻璃坩埚的方法，其中形成坩埚表面全部或一部分上的二氧化硅玻璃粉末层，然后在将硅原料熔化的温度加入到所述石英玻璃坩埚中。

77. 发明申请

US20040062504A1 Using deuterated source gasses to fabricate low loss GeSiON SiON waveguides 失效
标题翻译：使用氘化源气体制造低损耗GeSiON SiON波导
公开(公告)号：US20040062504A1
公开(公告)日：2004-04-01
申请号：US10608432
申请日：2003-06-30
申请人： Corning Incorporated
发明人： Robert Bellman , Ikerionwu A. Akwani , Paul A. Sachenik , Thomas P. Grandi
IPC分类号： G02B006/10
CPC分类号： C03C4/0042 , C03C17/225 , C03C17/3435 , C03C2217/213 , C03C2217/228 , C03C2217/24 , C03C2217/281 , C03C2218/152 , C23C16/308 , G02B6/122 , G02B6/132
摘要： The present invention provides a method of manufacturing optical devices which includes the steps of providing a substrate and forming at least one optical layer on the substrate. The optical layer is formed by a CVD process which includes a deuterated source gas. The present invention also provides an optical device which includes a substrate and an optical layer including deuterium.
摘要翻译：本发明提供了一种制造光学器件的方法，其包括以下步骤：提供衬底并在衬底上形成至少一个光学层。光学层由包括氘代源气体的CVD工艺形成。本发明还提供一种光学装置，其包括基板和包括氘的光学层。

78. 发明申请

US20040031778A1 Laser processing method to a class substrate and an optical diffraction element obtained thereby, and a method for manufacturing optical elements 失效
$Laser processing method to a class substrate and an optical diffraction element obtained thereby, and a method for manufacturing optical elements$
标题翻译：激光加工方法和由此获得的光学衍射元件，以及制造光学元件的方法
公开(公告)号：US20040031778A1
公开(公告)日：2004-02-19
申请号：US10622517
申请日：2003-07-18
申请人： Nippon Sheet Glass Co., Ltd.
发明人： Tadashi Koyama , Keiji Tsunetomo
IPC分类号： B23K026/40 , B23K026/00 , B23K026/14
CPC分类号： C03C23/0025 , B23K26/066 , C03C17/23 , C03C17/3417 , C03C17/3452 , C03C2217/212 , C03C2217/213 , C03C2218/32 , C03C2218/328 , Y10T428/24273 , Y10T428/2457
摘要： In a laser processing method for accurately forming a convexo-concave structure on the surface of a glass substrate, a periodic optical intensity distribution of a laser beam is obtained by an interference between diffracted light beams of null1 degree and null1 degree emitted from a phase mask, onto which the laser beam is irradiated, in the vicinity of the emission side of the phase mask, and a glass substrate, on which a thin film is formed, is set in the area where the periodic optical intensity distribution is provided. As a result, the thin film is evaporated or ablated depending on the periodic optical intensity, thereby a diffraction grating, which has the same period as that of the varying optical intensity, is formed on the glass substrate.
摘要翻译：在用于在玻璃基板的表面上精确地形成凸凹结构的激光加工方法中，激光束的周期性的光强度分布是通过从从...发射的+1度-1度的衍射光束在相位掩模的发射侧附近照射激光束的相位掩模，在其上形成有薄膜的玻璃基板设置在设置周期性光强度分布的区域中。结果，根据周期光强度，薄膜被蒸发或消融，由此在玻璃基板上形成与变化的光强度相同的周期的衍射光栅。

79. 发明申请

US20040028918A1 Thermally tempered glasscomprising a non-abrasive, porous, sio2 antireflection layer 失效
标题翻译：热硬化玻璃，包含非磨料，多孔，sio2抗反射层
公开(公告)号：US20040028918A1
公开(公告)日：2004-02-12
申请号：US10399439
申请日：2003-09-03
发明人： Hans-Joachim Becker , Armin Dauwalter , Andreas Gombert , Walter Glaubitt , Thomas Hofmann , Monika Kursawe
IPC分类号： B05D003/02 , C03C017/00 , B32B009/04
CPC分类号： C03C17/25 , C03C1/008 , C03C17/006 , C03C17/007 , C03C2217/213 , C03C2217/425 , C03C2218/113
摘要： The invention relates to thermally tempered safety glass comprising an non-abrasive and porous SiO2 layer which is stable during sintering and has a refractive index of between 1.25 and 1.40. The inventive safety glass can be obtained by coating standard soda-lime glass with an aqueous coating solution having a pH value of between 3 and 8 and containing between 0.5 and 5.0 wt. % of nullSiOx(OH)ynulln particles (0
摘要翻译：本发明涉及一种热回火安全玻璃，其包括非磨料和多孔SiO 2层，其在烧结期间是稳定的并且折射率在1.25至1.40之间。本发明的安全玻璃可以通过用pH值在3和8之间并含有0.5至5.0重量％的含水涂层溶液涂覆标准钠钙玻璃来获得。具有10至60nm粒度的[SiO x（OH）y] n颗粒（0

80. 发明申请

US20030207028A1 Substrate with a photocatalytic coating 审中-公开
公开(公告)号：US20030207028A1
公开(公告)日：2003-11-06
申请号：US10419872
申请日：2003-04-22
申请人： SAINT-GOBAIN GLASS FRANCE
发明人： Philippe Boire , Xavier Talpaert
IPC分类号： C23C016/40
CPC分类号： C04B41/009 , C03C17/002 , C03C17/007 , C03C17/256 , C03C17/3417 , C03C17/3441 , C03C2217/211 , C03C2217/212 , C03C2217/213 , C03C2217/214 , C03C2217/22 , C03C2217/23 , C03C2217/24 , C03C2217/45 , C03C2217/477 , C03C2217/479 , C03C2217/71 , C03C2217/94 , C03C2218/113 , C04B41/4562 , C04B41/52 , C04B41/81 , C04B41/89 , C04B2111/80 , G02F1/1333 , G02F1/133502 , G02F1/1533 , G02F1/157 , Y10T428/12611 , Y10T428/12993 , Y10T428/24802 , Y10T428/24975 , Y10T428/25 , Y10T428/252 , Y10T428/256 , Y10T428/265 , Y10T428/31841 , Y10T428/31938 , C04B41/0072 , C04B41/5027 , C04B41/5041 , C04B41/51 , C04B2111/00818 , C04B41/5105 , C04B35/00
摘要： The subject of the invention is a glass-, ceramic- or vitroceramic-based substrate (1) provided on at least part of at least one of its faces with a coating (3) with a photocatalytic property containing at least partially crystalline titanium oxide. It also relates to the applications of such a substrate and to its method of preparation.

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