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71. 发明授权

US07234214B2 Methods for making thick film elements 有权
标题翻译：制作厚膜元件的方法
公开(公告)号：US07234214B2
公开(公告)日：2007-06-26
申请号：US11084579
申请日：2005-03-18
申请人： Baomin Xu , Steven A. Buhler , Michael C. Weisberg , William S. Wong , Scott E. Solberg , Karl A. Littau , John S. Fitch , Scott A. Elrod
发明人： Baomin Xu , Steven A. Buhler , Michael C. Weisberg , William S. Wong , Scott E. Solberg , Karl A. Littau , John S. Fitch , Scott A. Elrod
IPC分类号： H04R17/00
CPC分类号： B41J2/161 , B41J2/1623 , B41J2/1632 , B41J2/1634 , B41J2/1637 , B41J2/1646 , H01L41/313 , H01L41/314 , H01L41/331 , H01L2221/68368 , Y10T29/42 , Y10T29/435 , Y10T29/49128 , Y10T29/4913 , Y10T29/49133 , Y10T29/49155 , Y10T29/4981
摘要： A method of producing at least one thick film element, including depositing a material on a surface of at least one first substrate to form at least one thick film element structure having a thickness of approximately greater than 10 μm to 100 μm. Then, then the at least one thick film element structure is bonded to a second substrate, and the at least one first substrate is removed from the at least one thick film element structure using a lift-off process employing radiation energy. The lift-off process including emitting, from a radiation source, a radiation beam through the first substrate to an attachment interface formed between the first substrate and the at least one thick film element structure at the first surface of the first substrate. The first substrate being substantially transparent at the wavelength of the radiation beam, permitting the radiation beam to generate sufficient energy at the interface to break the attachment.
摘要翻译：一种生产至少一个厚膜元件的方法，包括在至少一个第一基底的表面上沉积材料以形成至少一个厚度大约在10至100μm的厚膜元件结构。然后，将至少一个厚膜元件结构接合到第二基板，并且使用采用辐射能的剥离工艺将至少一个第一基板从至少一个厚膜元件结构移除。剥离过程包括从辐射源将辐射束从第一衬底发射到在第一衬底的第一表面处形成在第一衬底和至少一个厚膜元件结构之间的附接界面。第一衬底在辐射束的波长处基本上是透明的，允许辐射束在界面处产生足够的能量以破坏附件。

72. 发明授权

US07091650B2 Piezoelectric ceramic thick film element, array of elements, and devices 有权
标题翻译：压电陶瓷厚膜元件，元件阵列和器件
公开(公告)号：US07091650B2
公开(公告)日：2006-08-15
申请号：US11017494
申请日：2004-12-20
申请人： Baomin Xu , Steven A. Buhler , Michael C. Weisberg , William S. Wong , Scott E. Solberg , Karl A. Littau , John S. Fitch , Scott A. Elrod
发明人： Baomin Xu , Steven A. Buhler , Michael C. Weisberg , William S. Wong , Scott E. Solberg , Karl A. Littau , John S. Fitch , Scott A. Elrod
IPC分类号： H01L41/08
CPC分类号： B41J2/161 , B41J2/1623 , B41J2/1632 , B41J2/1634 , B41J2/1637 , B41J2/1646 , H01L41/313 , H01L41/314 , H01L41/331 , H01L2221/68368 , Y10T29/42 , Y10T29/435 , Y10T29/49128 , Y10T29/4913 , Y10T29/49133 , Y10T29/49155 , Y10T29/4981
摘要： A piezoelectric thick film element array includes at least one piezoelectric element structure having a thickness between 10 μm to 100 μm formed by a deposition process. The at least one piezoelectric element is patterned during the deposition process, and includes a first electrode deposited on a first surface of the piezoelectric elements structure, and a second electrode deposited on a second surface of the piezoelectric element structure. In a further embodiment, several devices are provided using a piezoelectric element or an array having a piezoelectric element structure with a thickness of between 10 μm to 100 μm formed by a deposition process. These devices include microfluidic ejectors, transducer arrays and catheters.
摘要翻译：压电厚膜元件阵列包括通过沉积工艺形成的至少一个压电元件结构，其厚度在10um至100μm之间。所述至少一个压电元件在所述沉积工艺期间被图案化，并且包括沉积在所述压电元件结构的第一表面上的第一电极和沉积在所述压电元件结构的第二表面上的第二电极。在另一实施例中，使用压电元件或具有通过沉积工艺形成的厚度在10um至100μm之间的压电元件结构的阵列来提供若干器件。这些装置包括微流体喷射器，换能器阵列和导管。

73. 发明授权

US07033516B2 Inexpensive fabrication of large-area pixel arrays for displays and sensors 有权
公开(公告)号：US07033516B2
公开(公告)日：2006-04-25
申请号：US10334595
申请日：2002-12-30
申请人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak
发明人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak
IPC分类号： B44C1/22
CPC分类号： G03F7/2018 , B41C1/025 , B41M3/006 , B41M5/0011 , G02F1/1303 , H01L27/1292
摘要： A method and system for fabricating an array of electronic devices, typically a display or sensor is described. In the method, a droplet source ejects droplets of a masking material for deposit on a thin film or substrate surface to mask an element of the array of electronic devices. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze upon contact with the thin-film or substrate surface. The thin-film or substrate is then etched. After etching the masking material is removed.

74. 发明授权

US06872320B2 Method for printing etch masks using phase-change materials 有权
标题翻译：使用相变材料印刷蚀刻掩模的方法
公开(公告)号：US06872320B2
公开(公告)日：2005-03-29
申请号：US09838684
申请日：2001-04-19
申请人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak , Raj B. Apte
发明人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak , Raj B. Apte
IPC分类号： C23F1/00 , B44C1/22
CPC分类号： G03F7/2018 , B41C1/025 , B41M3/006 , B41M5/0011 , G02F1/1303 , H01L27/1292
摘要： A method and system for masking a surface to be etched is described. A droplet source ejects droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze upon contact with the thin-film or substrate surface. The thin-film or substrate is then etched. After etching the masking material is removed.
摘要翻译：描述用于掩蔽待蚀刻表面的方法和系统。液滴源喷射掩模材料的液滴以沉积在待蚀刻的薄膜或其它衬底表面上。控制薄膜或基板表面的温度，使得液滴在与薄膜或基板表面接触时快速冷冻。然后蚀刻薄膜或衬底。蚀刻后，去除掩模材料。

75. 发明授权

US06441950B1 Distributed raman amplifier systems with transient control 有权
标题翻译：具有瞬态控制功能的分布式拉曼放大器系统
公开(公告)号：US06441950B1
公开(公告)日：2002-08-27
申请号：US09727776
申请日：2000-12-04
申请人： Chien-Jen Chen , William S. Wong , Jun Ye
发明人： Chien-Jen Chen , William S. Wong , Jun Ye
IPC分类号： H04B1012
CPC分类号： H04B10/0777 , H04B10/2916 , H04B10/296
摘要： Distributed Raman amplifier systems are provided in which gain transients are controlled. Signal taps may be used to monitor optical signal powers at network nodes. A telemetry channel may be used to share information between nodes. Information on the output power of a given node may be passed to a subsequent node using the telemetry channel. The subsequent node may use feed-forward and feedback control schemes to control Raman gain transients in the preceding transmission fiber span based on the output power information received over the telemetry channel.
摘要翻译：提供分布式拉曼放大器系统，其中增益瞬变被控制。信号抽头可用于监视网络节点的光信号功率。可以使用遥测信道在节点之间共享信息。关于给定节点的输出功率的信息可以使用遥测信道传递到后续节点。后续节点可以使用前馈和反馈控制方案来基于在遥测通道上接收的输出功率信息来控制前述传输光纤跨段中的拉曼增益瞬变。

76. 发明授权

US06417961B1 Optical amplifiers with dispersion compensation 有权
标题翻译：具有色散补偿的光放大器
公开(公告)号：US06417961B1
公开(公告)日：2002-07-09
申请号：US09727775
申请日：2000-12-04
申请人： Yan Sun , Chien-Jen Chen , William S. Wong
发明人： Yan Sun , Chien-Jen Chen , William S. Wong
IPC分类号： H01S300
CPC分类号： H01S3/302 , H01S3/06754 , H01S3/094011 , H01S3/10023
摘要： Optical amplifiers are provided that have dispersion-compensating fiber that is pumped with an optical source to produce Raman gain. Removable modules of dispersion-compensating fiber, which may be separate from the Raman-pumped dispersion-compensating fiber, may be used to adjust the amount of dispersion compensation provided by a given amplifier. The Raman pump may be formed using fiber-Bragg-grating-stabilized diode lasers or other suitable pump sources. Two cross-polarized diode lasers may be used for the Raman pump to reduce the dependence of the Raman gain on the polarization of the pump. If desired, the dispersion-compensating fiber may be Raman pumped using a two-pass configuration in which pump light reflects off of a reflector to produce additional gain. The reflector may be a Faraday rotator to minimize polarization-dependent pump effects.
摘要翻译：提供光放大器，其具有用光源泵浦以产生拉曼增益的色散补偿光纤。可以与拉曼泵浦色散补偿光纤分离的色散补偿光纤的可移除模块可用于调整由给定放大器提供的色散补偿量。拉曼泵可以使用光纤 - 布拉格光栅稳定的二极管激光器或其他合适的泵浦源来形成。两个交叉极化二极管激光器可用于拉曼泵，以减少拉曼增益对泵极化的依赖性。如果需要，色散补偿光纤可以是使用泵浦光从反射器反射以产生附加增益的双通配置泵浦的拉曼。反射器可以是法拉第旋转器，以最小化偏振相关的泵效应。

77. 发明授权

US06396623B1 Wide-band optical amplifiers with interleaved gain stages 有权
标题翻译：具有交错增益级的宽带光放大器
公开(公告)号：US06396623B1
公开(公告)日：2002-05-28
申请号：US09772847
申请日：2001-01-31
申请人： Paul F. Wysocki , William S. Wong
发明人： Paul F. Wysocki , William S. Wong
IPC分类号： H01S300
CPC分类号： H04B10/291 , H04B10/2916 , H04B2210/003
摘要： Amplifiers having multiple gain stages are provided. Some of the gain stages provide gain in a first wavelength band and some of the gain stages provide gain in a second wavelength band. The gain stages that provide gain in the first band are interleaved with the gain stages that provide gain in the second band. The gain stages may be based on rare-earth-doped fiber amplifiers, Raman-pumped fiber amplifiers, or other suitable optical amplifiers. Gain stages may be used that include parallel amplifier branches. Each of the parallel branches may handle a separate wavelength range.
摘要翻译：提供具有多个增益级的放大器。一些增益级在第一波长带中提供增益，并且一些增益级在第二波长带中提供增益。在第一频带中提供增益的增益级与在第二频带中提供增益的增益级交错。增益级可以基于稀土掺杂光纤放大器，拉曼泵浦光纤放大器或其他合适的光放大器。可以使用包括并联放大器分支的增益级。每个平行分支可以处理单独的波长范围。

78. 发明授权

US08560979B2 Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby 有权
标题翻译：用于光刻处理方法中的光学邻近校正的局部多变量求解器，以及由此制造的器件
公开(公告)号：US08560979B2
公开(公告)日：2013-10-15
申请号：US13541638
申请日：2012-07-03
申请人： William S. Wong , Fei Liu , Been-Der Chen , Yen-Wen Lu
发明人： William S. Wong , Fei Liu , Been-Der Chen , Yen-Wen Lu
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix.
摘要翻译：用于近程校正的多变量求解器使用雅可比矩阵近似设计循环的连续迭代中的段位置的扰动效应。该问题被形成为具有框，线性等式和线性不等式约束的约束最小化问题。为了提高计算效率，忽略非局部相互作用，这导致了稀疏的雅可比矩阵。

79. 发明授权

US07997680B2 Method for the printing of homogeneous electronic material with a multi-ejector print head 有权
标题翻译：使用多重喷射打印头打印均质电子材料的方法
公开(公告)号：US07997680B2
公开(公告)日：2011-08-16
申请号：US12787371
申请日：2010-05-25
申请人： Steven E. Ready , William S. Wong
发明人： Steven E. Ready , William S. Wong
IPC分类号： B41J29/393
CPC分类号： H05K3/125 , H01L21/288 , H01L21/76838 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Printing systems are disclosed that produce homogenous, smooth edged printed patterns (such as integrated circuit (IC) patterns) by separating pattern layouts into discrete design layers having only parallel layout features, and by printing each design layer using individual print solution droplets deposited onto the substrate. A printhead alignment operation includes positioning the printhead and printing a spot onto the substrate from each ejector, determining a vertical offset between an expected location of each spot along a vertical axis and the actual location of the spot along the vertical axis, calculating a linear fit line for the vertical offset of each spot plotted against an expected location of the spot along a horizontal axis, calculating the slope of the linear fit line, and rotating the printhead relative to the substrate according to an angle defined by the slope of the linear fit line.
摘要翻译：打印系统被公开，通过分离图案布局成离散的设计层仅具有平行布局特征产生均匀，平滑边缘的印刷图案（诸如集成电路（IC）图案），并且通过使用沉积到各个打印溶液液滴打印每个设计层基质。打印头对准操作包括定位打印头并从每个喷射器将斑点印刷到基板上，确定沿着垂直轴线的每个光点的预期位置与光点沿着垂直轴的实际位置之间的垂直偏移，计算线性拟合每个点的垂直偏移的线对应于点沿水平轴的预期位置，计算线性拟合线的斜率，并且根据由线性拟合的斜率限定的角度相对于基底旋转打印头线。

80. 发明授权

US07992958B2 Method for the printing of homogeneous electronic material with a multi-ejector print head 有权
公开(公告)号：US07992958B2
公开(公告)日：2011-08-09
申请号：US12787367
申请日：2010-05-25
申请人： Steven E. Ready , William S. Wong
发明人： Steven E. Ready , William S. Wong
IPC分类号： B41J29/393
CPC分类号： H05K3/125 , H01L21/288 , H01L21/76838 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Printing systems are disclosed that produce homogenous, smooth edged printed patterns (such as integrated circuit (IC) patterns) by separating pattern layouts into discrete design layers having only parallel layout features, and by printing each design layer using individual print solution droplets deposited onto the substrate. A printhead alignment operation includes printing a first spot from a first printhead ejector on a first substrate location, positioning a second ejector over the first substrate location and printing a second spot, measuring a distance between the first spot and the second spot, adjusting a rotational orientation between the print head and the substrate to reduce the distance between the first spot and the second spot, and then repeating the printing, measuring and adjusting processes until the first and second spots are separated by a predefined threshold value apart. The design layers are then printed.

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