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1. 发明授权

US06742884B2 Apparatus for printing etch masks using phase-change materials 失效
标题翻译：使用相变材料印刷蚀刻掩模的设备
公开(公告)号：US06742884B2
公开(公告)日：2004-06-01
申请号：US09838685
申请日：2001-04-19
申请人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak , Raj B. Apte
发明人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak , Raj B. Apte
IPC分类号： E03F100
CPC分类号： B41J2/14008 , H01L21/0271 , H01L21/0332 , H01L21/0337
摘要： A method and system for masking a surface to be etched is described. A droplet source ejects droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze upon contact with the thin-film or substrate surface. The thin-film or substrate is then etched. After etching the masking material is removed.
摘要翻译：描述用于掩蔽待蚀刻表面的方法和系统。液滴源喷射掩模材料的液滴以沉积在待蚀刻的薄膜或其它衬底表面上。控制薄膜或基板表面的温度，使得液滴在与薄膜或基板表面接触时快速冷冻。然后蚀刻薄膜或衬底。蚀刻后，去除掩模材料。

2. 发明授权

US07033516B2 Inexpensive fabrication of large-area pixel arrays for displays and sensors 有权
公开(公告)号：US07033516B2
公开(公告)日：2006-04-25
申请号：US10334595
申请日：2002-12-30
申请人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak
发明人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak
IPC分类号： B44C1/22
CPC分类号： G03F7/2018 , B41C1/025 , B41M3/006 , B41M5/0011 , G02F1/1303 , H01L27/1292
摘要： A method and system for fabricating an array of electronic devices, typically a display or sensor is described. In the method, a droplet source ejects droplets of a masking material for deposit on a thin film or substrate surface to mask an element of the array of electronic devices. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze upon contact with the thin-film or substrate surface. The thin-film or substrate is then etched. After etching the masking material is removed.

3. 发明授权

US06872320B2 Method for printing etch masks using phase-change materials 有权
标题翻译：使用相变材料印刷蚀刻掩模的方法
公开(公告)号：US06872320B2
公开(公告)日：2005-03-29
申请号：US09838684
申请日：2001-04-19
申请人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak , Raj B. Apte
发明人： William S. Wong , Robert A. Street , Stephen D. White , Robert Matusiak , Raj B. Apte
IPC分类号： C23F1/00 , B44C1/22
CPC分类号： G03F7/2018 , B41C1/025 , B41M3/006 , B41M5/0011 , G02F1/1303 , H01L27/1292
摘要： A method and system for masking a surface to be etched is described. A droplet source ejects droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze upon contact with the thin-film or substrate surface. The thin-film or substrate is then etched. After etching the masking material is removed.
摘要翻译：描述用于掩蔽待蚀刻表面的方法和系统。液滴源喷射掩模材料的液滴以沉积在待蚀刻的薄膜或其它衬底表面上。控制薄膜或基板表面的温度，使得液滴在与薄膜或基板表面接触时快速冷冻。然后蚀刻薄膜或衬底。蚀刻后，去除掩模材料。

4. 发明申请

US20060132893A1 OPTICAL MODULATOR WITH A TRAVELING SURFACE RELIEF PATTERN 有权
标题翻译：具有旅行表面救援模式的光学调制器
公开(公告)号：US20060132893A1
公开(公告)日：2006-06-22
申请号：US11017402
申请日：2004-12-20
申请人： Uma Srinivasan , Eric Shrader , Robert Matusiak
发明人： Uma Srinivasan , Eric Shrader , Robert Matusiak
IPC分类号： G02B26/00
CPC分类号： G02B26/0825
摘要： A variable modulator assembly includes a deformable layer adhered to a compliant layer surface, and an n-phase electrode configuration, n>2, adhered to an opposite surface of the compliant layer. A controller is configured to selectively apply a variable signal to the selected electrodes of the electrode configuration. Application of the variable signal causes the deformable layer to reconfigure to an alternated shape having distinct peaks and valleys. The distance between the peaks and valleys being determined by the value of the applied variable signal, wherein the alternated shape travels in a preferred direction. An optical modulating method includes positioning the variable modulator assembly to receive and reflect light from a light source, monitoring the reflected light, and altering the variable signal to maintain a desired output intensity.
摘要翻译：可变调制器组件包括粘附到顺应性层表面的可变形层和粘附到柔顺层的相对表面上的n相电极构型n> 2。控制器被配置为选择性地将可变信号施加到所选择的电极配置的电极。可变信号的应用使可变形层重新配置成具有不同峰和谷的交替形状。峰值和谷之间的距离由施加的可变信号的值确定，其中交替形状沿优选方向行进。光调制方法包括定位可变调制器组件以接收和反射来自光源的光，监测反射光，以及改变可变信号以保持期望的输出强度。

5. 发明授权

US07054054B1 Optical modulator with a traveling surface relief pattern 有权
标题翻译：具有行进表面浮雕图案的光学调制器
公开(公告)号：US07054054B1
公开(公告)日：2006-05-30
申请号：US11017402
申请日：2004-12-20
申请人： Uma Srinivasan , Eric J. Shrader , Robert Matusiak
发明人： Uma Srinivasan , Eric J. Shrader , Robert Matusiak
IPC分类号： G02B26/00
CPC分类号： G02B26/0825
摘要： A variable modulator assembly includes a deformable layer adhered to a compliant layer surface, and an n-phase electrode configuration, n>2, adhered to an opposite surface of the compliant layer. A controller is configured to selectively apply a variable signal to the selected electrodes of the electrode configuration. Application of the variable signal causes the deformable layer to reconfigure to an alternated shape having distinct peaks and valleys. The distance between the peaks and valleys being determined by the value of the applied variable signal, wherein the alternated shape travels in a preferred direction. An optical modulating method includes positioning the variable modulator assembly to receive and reflect light from a light source, monitoring the reflected light, and altering the variable signal to maintain a desired output intensity.
摘要翻译：可变调制器组件包括粘附到顺应性层表面的可变形层和粘附到柔顺层的相对表面上的n相电极构型n> 2。控制器被配置为选择性地将可变信号施加到所选择的电极配置的电极。可变信号的应用使可变形层重新配置成具有不同峰和谷的交替形状。峰值和谷之间的距离由施加的可变信号的值确定，其中交替形状沿优选方向行进。光调制方法包括定位可变调制器组件以接收和反射来自光源的光，监测反射光，以及改变可变信号以保持期望的输出强度。

6. 发明授权

US07771580B2 Particle extraction methods and systems for a particle concentrator 有权
标题翻译：粒子浓缩器的粒子提取方法和系统
公开(公告)号：US07771580B2
公开(公告)日：2010-08-10
申请号：US11468523
申请日：2006-08-30
申请人： Jurgen H. Daniel , Meng H. Lean , Robert Matusiak , Armin R. Volkel , Gregory P. Schmitz , Huangpin B. Hsieh , Ashutosh Kole
发明人： Jurgen H. Daniel , Meng H. Lean , Robert Matusiak , Armin R. Volkel , Gregory P. Schmitz , Huangpin B. Hsieh , Ashutosh Kole
IPC分类号： G01N27/447 , G01N27/453 , B01D29/00 , B01D29/50 , B01D36/00 , C02F9/00
CPC分类号： B03C5/028
摘要： Method and Systems for extracting a concentrated sample of particles include priming a concentrate reservoir by passing a fluid through the concentrate reservoir to remove air. The concentrate reservoir has a first end with an opening and second end with an opening. The second end of the concentrate reservoir is closed off, and particles are accumulated within the concentrate reservoir by use of a particle concentrator. Thereafter, the first end of the concentrate reservoir is closed off, isolating the concentrate reservoir from particle concentrator, from which the particles were obtained. The second end of the concentrate reservoir is thereafter opened, and the particles of the concentrated sample in the concentrate reservoir are extracted to a sample capture reservoir through the second end opening of the concentrate reservoir.
摘要翻译：用于提取浓缩的颗粒样品的方法和系统包括通过使流体通过浓缩物储存器以排出空气来灌注浓缩物储存器。浓缩物储存器具有带有开口的第一端和具有开口的第二端。浓缩池的第二端被封闭，并且通过使用颗粒聚集器将颗粒积聚在浓缩池中。此后，关闭浓缩物储存器的第一端，将浓缩物储存器从颗粒浓缩器中分离出来，从中获得颗粒。然后将浓缩物储存器的第二端打开，浓缩物储存器中的浓缩样品的颗粒通过浓缩物储存器的第二端开口被提取到样品捕获储存器。

7. 发明申请

US20080053828A1 PARTICLE EXTRACTION METHODS AND SYSTEMS FOR A PARTICLE CONCENTRATOR 有权
标题翻译：颗粒萃取方法和颗粒浓缩体系
公开(公告)号：US20080053828A1
公开(公告)日：2008-03-06
申请号：US11468523
申请日：2006-08-30
申请人： Jurgen H. Daniel , Meng H. Lean , Robert Matusiak , Armin R. Volkel , Gregory P. Schmitz , Huangpin B. Hsieh , Ashutosh Kole
发明人： Jurgen H. Daniel , Meng H. Lean , Robert Matusiak , Armin R. Volkel , Gregory P. Schmitz , Huangpin B. Hsieh , Ashutosh Kole
IPC分类号： B03C5/02
CPC分类号： B03C5/028
摘要： Method and Systems for extracting a concentrated sample of particles include priming a concentrate reservoir by passing a fluid through the concentrate reservoir to remove air. The concentrate reservoir has a first end with an opening and second end with an opening. The second end of the concentrate reservoir is closed off, and particles are accumulated within the concentrate reservoir by use of a particle concentrator. Thereafter, the first end of the concentrate reservoir is closed off, isolating the concentrate reservoir from particle concentrator, from which the particles were obtained. The second end of the concentrate reservoir is thereafter opened, and the particles of the concentrated sample in the concentrate reservoir are extracted to a sample capture reservoir through the second end opening of the concentrate reservoir.
摘要翻译：用于提取浓缩的颗粒样品的方法和系统包括通过使流体通过浓缩物储存器以排出空气来灌注浓缩物储存器。浓缩物储存器具有带有开口的第一端和具有开口的第二端。浓缩池的第二端被封闭，并且通过使用颗粒聚集器将颗粒积聚在浓缩池中。此后，关闭浓缩物储存器的第一端，将浓缩物储存器从颗粒浓缩器中分离出来，从中获得颗粒。然后将浓缩物储存器的第二端打开，浓缩物储存器中的浓缩样品的颗粒通过浓缩物储存器的第二端开口被提取到样品捕获储存器。

8. 发明授权

US07116613B2 Optical beam position active sensing and control using satellite beams 有权
标题翻译：使用卫星光束的光束位置主动感测和控制
公开(公告)号：US07116613B2
公开(公告)日：2006-10-03
申请号：US10443184
申请日：2003-05-22
申请人： David L. Hecht , Uma Srinivasan , Robert Matusiak , Robert P. Kowalski , Eric J. Shrader
发明人： David L. Hecht , Uma Srinivasan , Robert Matusiak , Robert P. Kowalski , Eric J. Shrader
IPC分类号： G11B5/09
CPC分类号： G02B7/003 , G02B27/64 , G02F2001/291 , G11B7/08558
摘要： A beam position control system controls a position of a beam directed from a beam source. The beam position control system includes a beam position sensing system that generates one or more satellite beams which are used to determine the position of a main beam. A beam offset computation block determines a relative position of the main beam with respect to a desired main beam position and provides beam offset information to a controller that generates a compensation signal used to adjust the main beam position to the desired main beam position via a beam actuation system.
摘要翻译：光束位置控制系统控制从光束源引导的光束的位置。波束位置控制系统包括波束位置检测系统，其产生用于确定主波束位置的一个或多个卫星波束。波束偏移计算块确定主波束相对于期望的主波束位置的相对位置，并将波束偏移信息提供给控制器，该控制器产生用于经由波束将主波束位置调整到期望主波束位置的补偿信号驱动系统。

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