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    • 75. 发明申请
    • SILICATE PHOSPHOR AND ITS MANUFACTURE METHOD AS WELL AS LIGHT-EMITTING DEVICE USING THE SAME
    • 硅酸盐及其制造方法作为使用其的发光装置
    • US20080031797A1
    • 2008-02-07
    • US11754432
    • 2007-05-29
    • Wei XiaJing XuGuangxu LinXifeng WangZhiguo Xiao
    • Wei XiaJing XuGuangxu LinXifeng WangZhiguo Xiao
    • C01F17/00
    • C09K11/774C09K11/7734C09K11/7792C09K11/7796C09K11/7797Y02B20/181
    • The invention relates to an ultraviolet to green light region silicate phosphor capable of being excited by radiation light source and its manufacturing method, particularly to white and multicolor systems light-emitting device. The material has luminous color in the range from blue to red color system. The essential composition of the phosphor is aMO.bM′O.SiO2.cR:xEu.yLn.zLv.δLm, wherein M is an element or a combination of elements selected from the group consisting of Sr, Ca, Ba and Zn; M′ is an element or a combination of elements selected from the group consisting of Mg, Cd and Be; R is one or two of B2O3 and P2O5; Ln is an element or a combination of elements selected from the group consisting of Nd, Dy, Ho, Tm, La, Ce, Er, Pr, Bi, Sm, Sn, Y, Lu, Ga, Sb, Tb, Mn and Pb; Lv is an element or a combination of elements selected from the group consisting of Cl, F, Br, I and S; Lm is an element or a combination of elements selected from the group consisting of Li, Na and K
    • 本发明涉及能够被辐射光源激发的紫外至绿光区域硅酸盐荧光体及其制造方法,特别涉及白色和多色系统的发光装置。 该材料具有从蓝色到红色系统范围内的发光颜色。 荧光体的基本组成是M 1,M 2 SiO 2,cR:xEu.yLn.zLv.deltaLm,其中M是元素或选自Sr ,Ca,Ba和Zn; M'是选自Mg,Cd和Be的元素或元素的组合; R是B 2 O 3和P 2 O 5 5中的一个或两个; Ln是选自Nd,Dy,Ho,Tm,La,Ce,Er,Pr,Bi,Sm,Sn,Y,Lu,Ga,Sb,Tb,Mn和Pb中的元素或元素的组合 ; Lv是选自Cl,F,Br,I和S的元素或元素的组合; Lm是选自Li,Na和K的元素或元素的组合
    • 76. 发明授权
    • Limiting concurrent viewing sessions on multiple user devices
    • 限制多个用户设备上的并发查看会话
    • US09405887B2
    • 2016-08-02
    • US13314233
    • 2011-12-08
    • Fenglin YinJack Jianxiu HaoZhiying JinWei Xia
    • Fenglin YinJack Jianxiu HaoZhiying JinWei Xia
    • G06F21/00G06F21/10
    • G06F21/10G06F21/105
    • System devices include network interfaces to communicate with user devices associated with a user, memories for storing instructions to be executed by processors, and the processors. The processors are configured to execute the instructions to receive, from a first user device, among the user devices, a request for content; initiate an upload of the requested content to the first user device in response to the request; receive a request for a license key from the first user device in response to the initiation of the upload; determine whether a number of concurrent sessions with the user devices exceeds a maximum number; and send the license key to the first user device when the processors determine that the number of concurrent sessions does not exceed the maximum number.
    • 系统设备包括用于与与用户相关联的用户设备通信的网络接口,用于存储要由处理器执行的指令的存储器和处理器。 处理器被配置为执行从第一用户设备在用户设备之间接收对内容的请求的指令; 响应于该请求,开始将所请求的内容上传到第一用户设备; 响应于上传的开始,从第一用户设备接收许可证密钥的请求; 确定与用户设备的并发会话数是否超过最大数量; 并且当处理器确定并发会话的数量不超过最大数量时,将许可证密钥发送到第一用户设备。
    • 79. 发明申请
    • METHOD FOR APPLYING POWER TO TARGET MATERIAL, POWER SUPPLY FOR TARGET MATERIAL, AND SEMICONDUCTOR PROCESSING APPARATUS
    • 将电力应用于目标材料的方法,目标材料的电源和半导体处理装置
    • US20130256119A1
    • 2013-10-03
    • US13378936
    • 2010-12-17
    • Bai YangWei Xia
    • Bai YangWei Xia
    • C23C14/34
    • C23C14/3485C23C14/35H01J37/3408H01J37/3467
    • A method for applying power to target material in a magnetron sputtering process is provided. The method includes: 10) connecting a main power supply and a maintaining power supply to the target material (2) respectively; 20) applying a particular main power in the form of pulses to the target material (2) by the main power supply; applying a particular maintaining power which is smaller than the main power to the target material (2) by the maintaining power supply at least during the pulse interval time (t2) of the main power supply, so as to maintain a glow discharge procedure of the sputtering process during the purse interval time (t2) of the main power supply. The method for applying power to target material can obviously enhance the metal ionization rate while the process stability and controllability are guaranteed. A power supply for target material (8) which includes a main power module (81) and a maintaining power module (82), and a semiconductor processing apparatus using the method for applying power to target material or the power supply for target material are also provided.
    • 提供了一种在磁控溅射工艺中对靶材施加功率的方法。 该方法包括:10)分别将主电源和维持电源连接到目标材料(2); 20)通过主电源向目标材料(2)施加脉冲形式的特定主电源; 至少在主电源的脉冲间隔时间(t2)期间,通过保持电源向目标材料(2)施加小于主功率的特定维持功率,以保持主电源的辉光放电过程 在主电源的钱包间隔时间(t2)期间进行溅射处理。 对目标材料施加电力的方法可以显着提高金属电离率,同时保证工艺的稳定性和可控性。 包括主电源模块(81)和保持功率模块(82)的目标材料(8)的电源,以及使用将目标材料或目标材料的电源供电的方法的半导体处理装置也是 提供。