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71. 发明申请

US20110292365A1 Calibration Method, Inspection Method and Apparatus, Lithographic Apparatus, and Lithographic Processing Cell 有权
标题翻译：校准方法，检验方法和装置，平版印刷设备和平版印刷加工单元
公开(公告)号：US20110292365A1
公开(公告)日：2011-12-01
申请号：US13132011
申请日：2009-12-01
申请人： Hugo Augustinus Joseph Cramer , Maurits Van Der Schaar
发明人： Hugo Augustinus Joseph Cramer , Maurits Van Der Schaar
IPC分类号： G03B27/54 , G01N21/00
CPC分类号： G03F7/70633 , G01N21/4785 , G03F7/70516 , G03F7/70616 , G03F7/70625
摘要： Disclosed are methods, apparatuses, and lithographic systems for calibrating an inspection apparatus. Radiation is projected onto a pattern in a target position of a substrate. By making a plurality of measurements of the pattern and comparing the measured first or higher diffraction orders of radiation reflected from the pattern of different measurements, a residual error indicative of the error in a scatterometer may be calculated. This error is an error in measurements of substrate parameters caused by irregularities of the scatterometer. The residual error may manifest itself as an asymmetry in the diffraction spectra.
摘要翻译：公开了用于校准检查装置的方法，装置和光刻系统。辐射被投影到基板的目标位置的图案上。通过对图案进行多次测量并比较从不同测量图案反射的辐射的测量的第一或更高的衍射级数，可以计算指示散射仪中的误差的残差。该误差是由散射仪的不规则引起的衬底参数的测量误差。残余误差可能表现为衍射光谱中的不对称性。

72. 发明申请

US20110255066A1 Apparatus and Method for Inspecting a Substrate 有权
标题翻译：用于检查基板的装置和方法
公开(公告)号：US20110255066A1
公开(公告)日：2011-10-20
申请号：US12996211
申请日：2009-06-04
申请人： Andreas Fuchs , Maurits Van Der Schaar
发明人： Andreas Fuchs , Maurits Van Der Schaar
IPC分类号： G03B27/74 , G03B27/32 , G01B11/14
CPC分类号： G03F7/70633
摘要： An apparatus measures properties, such as overlay error, of a substrate divided into a plurality of fields. The apparatus includes a radiation source configured to direct radiation onto a first target of each field of the substrate. Each first target (T4G) has at least a first grating and a second grating having respective predetermined offsets, the predetermined offset (+d) of the first grating being in a direction opposite the predetermined offset (−d) of the second grating. A detector is configured to detect the radiation reflected from each first target and to obtain an asymmetry value for each first target from the detected radiation. Further, a module is configured to determine an overlay value for each first target based on at least the obtained asymmetry value and the predetermined offsets and determine a polynomial fit across a plurality of first targets of a corresponding plurality of fields of the substrate for a relationship between the obtained asymmetry value and determined overlay value of each first target.
摘要翻译：一种装置测量分成多个场的衬底的性质，例如覆盖误差。该装置包括被配置为将辐射引导到衬底的每个场的第一靶上的辐射源。每个第一目标（T4G）具有至少第一光栅和具有相应预定偏移的第二光栅，第一光栅的预定偏移（+ d）在与第二光栅的预定偏移（-d）相反的方向上。检测器被配置为检测从每个第一目标反射的辐射，并且从检测到的辐射获得每个第一目标的不对称值。此外，模块被配置为基于至少所获得的不对称值和预定偏移来确定每个第一目标的覆盖值，并且确定跨越衬底的相应多个场的多个第一目标的多项式拟合，以获得关系在获得的不对称值和确定的每个第一目标的覆盖值之间。

73. 发明申请

US20110141444A1 Inspection Apparatus for Lithography 有权
标题翻译：光刻检验仪
公开(公告)号：US20110141444A1
公开(公告)日：2011-06-16
申请号：US12933481
申请日：2009-04-08
申请人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
发明人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
IPC分类号： G03B27/54 , G01N21/55
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/9501
摘要： A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.
摘要翻译：配置成测量衬底性质的散射仪包括被配置为提供辐射束的辐射源; 以及检测器，其被配置为检测从所述基板（W）的表面上的目标（30）反射的所述辐射束的光谱，并产生表示所述光谱的测量信号。该装置包括插入在辐射源和检测器之间的辐射路径中的光束整形器（51,53），光束整形器被配置为根据目标的形状和/或尺寸来调节光束的横截面。

74. 发明授权

US07916276B2 Lithographic apparatus and device manufacturing method with double exposure overlay control 有权
公开(公告)号：US07916276B2
公开(公告)日：2011-03-29
申请号：US12705050
申请日：2010-02-12
申请人： Maurits Van Der Schaar , Richard Johannes Franciscus Van Haren
发明人： Maurits Van Der Schaar , Richard Johannes Franciscus Van Haren
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/0035 , G03B27/42 , G03F7/70466 , G03F9/7084
摘要： A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; andin a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.

75. 发明授权

US07897058B2 Device manufacturing method and computer program product 有权
标题翻译：设备制造方法和计算机程序产品
公开(公告)号：US07897058B2
公开(公告)日：2011-03-01
申请号：US11435296
申请日：2006-05-17
申请人： Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar , Ewoud Vreugdenhil , Harry Sewell
发明人： Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar , Ewoud Vreugdenhil , Harry Sewell
IPC分类号： C23F1/00 , G06F19/00 , B44C1/22 , G01L21/30
CPC分类号： H01L21/76816 , H01L21/0337 , H01L21/0338 , H01L21/31144
摘要： A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process. Also, the method may be repeated to create arrays at even higher densities.
摘要翻译：形成特征的方法，例如以比常规光刻技术更高的密度接触孔包括形成牺牲性特征阵列，从而保形地沉积牺牲层，使得负特征与正特征交错形成，定向蚀刻牺牲层并去除牺牲特征。结果是以比原始牺牲特征更高的密度的孔阵列。然后可以使用所需的方法将这些物质转移到下面的基底中。此外，可以重复该方法以以更高的密度创建阵列。

76. 发明授权

US07565219B2 Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby 失效
标题翻译：光刻设备，确定模型参数的方法，器件制造方法以及由此制造的器件
公开(公告)号：US07565219B2
公开(公告)日：2009-07-21
申请号：US10730254
申请日：2003-12-09
申请人： Maurits Van Der Schaar , Jeroen Huijbregstse , Sicco Ian Schets , Bart Luc Swinnen
发明人： Maurits Van Der Schaar , Jeroen Huijbregstse , Sicco Ian Schets , Bart Luc Swinnen
IPC分类号： G06F19/00
CPC分类号： G03F9/7092
摘要： A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
摘要翻译：根据本发明的一个实施例的方法涉及确定提供关于对象的位置的信息的模型的至少一个参数。物体具有多个已知位置的对准标记。该方法包括测量每个对准标记的多个位置参数。基于所测量的多个位置参数，其被称重系数加权，确定对象的模型的至少一个参数。每个称重系数的数值与模型的至少一个参数一起确定。

77. 发明授权

US07460231B2 Alignment tool for a lithographic apparatus 失效
标题翻译：光刻设备对准工具
公开(公告)号：US07460231B2
公开(公告)日：2008-12-02
申请号：US11389494
申请日：2006-03-27
申请人： Sami Musa , Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar
发明人： Sami Musa , Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： G03F9/7049 , G03F9/7015 , G03F9/7088
摘要： An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.
摘要翻译：用于光刻设备的对准工具用对准光照射衬底上的对准标记并测量反射光谱。将反射光谱与参考标记进行比较，以确定任何未对准。使用闪耀的亚波长光栅来将通过将对准光束从对准标记衍射衍射到参考标记而产生的子光束偏转。

78. 发明申请

US20080148875A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 审中-公开
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US20080148875A1
公开(公告)日：2008-06-26
申请号：US11641944
申请日：2006-12-20
申请人： Thomas Leo Maria Hoogenboom , Reinder Teun Plug , Maurits Van Der Schaar
发明人： Thomas Leo Maria Hoogenboom , Reinder Teun Plug , Maurits Van Der Schaar
IPC分类号： G01M19/00
CPC分类号： G03F7/70616
摘要： Two drive systems are responsible for moving a substrate beneath, for example, an illumination system or a measurement radiation beam. A first drive system drives a substrate in a X direction and a second drive system drives the substrate in a Y direction. In order to make a measurement of a feature of the substrate surface, targets are arranged in a lattice. Rather than having the lattice aligned with the X and Y directions such that only one drive system operates at a time to step between the targets, the lattice of targets is arranged at an angle with respect to the X and Y axes such that both drive systems operate simultaneously in order to move between the targets. The targets (or sub-targets within the targets) may also be arranged with respect to each other so as to save scribelane space and to create a most economical path between them.
摘要翻译：两个驱动系统负责在例如照明系统或测量辐射束之下移动衬底。第一驱动系统沿X方向驱动基板，第二驱动系统沿Y方向驱动基板。为了测量衬底表面的特征，靶被布置成格子。不是使格子与X和Y方向对准，使得只有一个驱动系统一次在目标之间步进操作，目标的格子相对于X和Y轴以一定角度布置，使得两个驱动系统同时操作，以便在目标之间移动。目标（或目标内的子目标）也可以相对于彼此布置，以便节省scribelane空间并且在它们之间创建最经济的路径。

79. 发明申请

US20070222960A1 Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement 有权
标题翻译：平版印刷设备和器件制造方法，具有减少基片测量的划线通道用途
公开(公告)号：US20070222960A1
公开(公告)日：2007-09-27
申请号：US11384836
申请日：2006-03-21
申请人： Maurits Van Der Schaar , Arie Den Boef , Richard Johannes Van Haren , Everhardus Mos
发明人： Maurits Van Der Schaar , Arie Den Boef , Richard Johannes Van Haren , Everhardus Mos
IPC分类号： G03B27/54
CPC分类号： G03F7/70433 , G03F7/70625 , G03F7/70633 , G03F9/7049 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： In a device manufacturing method and lithographic apparatus wherein a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process enabling execution of a substrate measurement using radiation of a first wavelength. Subsequently the measurement target is transformed in a grid of conducting material, the grid having grid openings which are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.
摘要翻译：在其中将图案从图案形成装置转印到基板上的装置制造方法和光刻设备中，在能够使用第一波长的辐射执行基板测量的处理中，在基板上提供测量目标。随后，将测量目标变换为导电材料的栅格，栅格具有比第一波长小的栅格开口。测量目标的划线中的空间现在被屏蔽，并且可以再次用于基板的更多层或处理步骤。

80. 发明授权

US07084955B2 Lithographic apparatus 有权
公开(公告)号：US07084955B2
公开(公告)日：2006-08-01
申请号：US10803104
申请日：2004-03-18
申请人： Cheng-Qun Gui , Henricus Van Buel , Maurits Van Der Schaar , Arie Den Boef
发明人： Cheng-Qun Gui , Henricus Van Buel , Maurits Van Der Schaar , Arie Den Boef
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70216 , G03F9/7084
摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.

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