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    • 74. 发明授权
    • Enhanced scanner throughput system and method
    • 增强扫描仪吞吐量系统和方法
    • US08906599B2
    • 2014-12-09
    • US13473695
    • 2012-05-17
    • Yu-Mei LiuChin-Hsiang LinHeng-Hsin LiuHeng-Jen LeeI-Hsiung HuangChih-Wei Lin
    • Yu-Mei LiuChin-Hsiang LinHeng-Hsin LiuHeng-Jen LeeI-Hsiung HuangChih-Wei Lin
    • G03F7/20
    • G03F7/70358
    • A method and system to improve scanner throughput is provided. An image from a reticle is projected onto a substrate using a continuous linear scanning procedure in which an entire column of die or cells of die is scanned continuously, i.e. without stepping to a different location. Each scan includes translating a substrate with respect to a fixed beam. While the substrate is translated, the reticle is also translated. When a first die or cell of die is projected onto the substrate, the reticle translates along a direction opposite the scan direction and as the scan continues along the same direction, the reticle then translates in the opposite direction of the substrate thereby forming an inverted pattern on the next die or cell. The time associated with exposing the substrate is minimized as the stepping operation only occurs after a complete column of cells is scanned.
    • 提供了一种提高扫描仪吞吐量的方法和系统。 使用连续线性扫描程序将来自掩模版的图像投影到基板上,其中连续扫描整列管芯或裸片的单元,即不进入不同的位置。 每个扫描包括相对于固定光束平移衬底。 当底物被翻译时,掩模版也被翻译。 当模具的第一裸片或裸片投影到衬底上时,标线沿着与扫描方向相反的方向平移,并且随着扫描沿着相同的方向继续,标线片然后沿着衬底的相反方向平移,从而形成倒置图案 在下一个死亡或细胞。 与曝光底物相关的时间最小化,因为步进操作仅在扫描完整的单元格列之后才发生。
    • 77. 发明申请
    • Methods for optimizing die placement
    • 优化模具放置的方法
    • US20070027567A1
    • 2007-02-01
    • US11222374
    • 2005-09-08
    • Chih-Wei LinHong-Hsing ChouYeh-Jye WangChen-Fu ChienJen-Hsin WangChih-Wei Hsiao
    • Chih-Wei LinHong-Hsing ChouYeh-Jye WangChen-Fu ChienJen-Hsin WangChih-Wei Hsiao
    • G06F19/00G06F17/50
    • G03F7/70433H01L22/20H01L2924/0002H01L2924/00
    • A method of optimizing die placement on a wafer having an alignment mark with a computing system includes arranging a plurality of fields on the wafer in a first position. Dummies are inserted between at least one arranged field and the alignment mark and inserted adjacent to the wafer edge. The total number of dies manufacturable on the wafer at the first position is determined. The wafer position is shifted to a second position relative to the position of the plurality of fields, and the total number of dies manufacturable on the wafer at the second position is determined. The total number of manufacturable dies from each of the first and the second positions is compared, and the positions having the higher number of manufacturable die are candidates of optimal die placement position. Then the total number of fields, the total number of dummies, and the total number of shared dummies are evaluated to decide the optimal die placement position.
    • 在具有计算系统的对准标记的晶片上优化管芯放置的方法包括在第一位置上在晶片上布置多个场。 傻瓜插入在至少一个布置的场和对准标记之间并且相邻于晶片边缘插入。 确定在第一位置在晶片上可制造的模具的总数。 晶片位置相对于多个场的位置移动到第二位置,并且确定在第二位置处在晶片上可制造的模具的总数。 比较了从第一和第二位置中的每一个的可制造模具的总数,并且具有较高数量的可制造模具的位置是最佳模具放置位置的候选者。 然后评估总场数,虚拟人总数以及共享虚拟人总数,以确定最佳管桩位置。
    • 79. 发明授权
    • Display device and method of measuring surface structure thereof
    • 显示装置及其表面结构的测量方法
    • US08605235B2
    • 2013-12-10
    • US12779915
    • 2010-05-13
    • Chih-Wei LinMin-Cheng WangYung-Cheng ChenHung-Min Liu
    • Chih-Wei LinMin-Cheng WangYung-Cheng ChenHung-Min Liu
    • G02F1/1335
    • G01B11/24G01B5/061G01B11/00G01B11/02G01B11/0608G01B11/08G01B17/02G02F1/133512G02F1/13394G03F7/70625
    • A display device and a method of measuring a surface structure of the same are provided. The display device includes first and second substrates, first and second patterned light-shielding layers, and first and second pixel units. The first patterned light-shielding layer disposed on a surface of the first substrate includes first openings. The second patterned light-shielding layer disposed on the surface of the first substrate in the first patterned light-shielding layer includes second openings. The first pixel unit includes first and second protrusions. The first protrusion correspondingly covers the first openings and a portion of the first patterned light-shielding layer. The second protrusion is disposed in the first and second patterned light-shielding layers. The second pixel unit includes a third protrusion correspondingly covering the second openings and a portion of the second patterned light-shielding layer, wherein sizes of the second openings are smaller than sizes of the first openings.
    • 提供显示装置和测量其表面结构的方法。 显示装置包括第一和第二基板,第一和第二图案化遮光层以及第一和第二像素单元。 设置在第一基板的表面上的第一图案化遮光层包括第一开口。 设置在第一图案化遮光层中的第一基板的表面上的第二图案遮光层包括第二开口。 第一像素单元包括第一和第二突起。 第一突起相应地覆盖第一开口和第一图案化遮光层的一部分。 第二突起设置在第一和第二图案化的遮光层中。 第二像素单元包括对应地覆盖第二开口的第三突起和第二图案化遮光层的一部分,其中第二开口的尺寸小于第一开口的尺寸。
    • 80. 发明授权
    • Frame cell for shot layout flexibility
    • 帧单元,用于拍摄布局灵活性
    • US08239788B2
    • 2012-08-07
    • US12537836
    • 2009-08-07
    • Chih-Wei LinYung-Cheng ChenHeng-Jen Lee
    • Chih-Wei LinYung-Cheng ChenHeng-Jen Lee
    • G06F17/50G03C5/00
    • G03F7/70433
    • A method includes receiving an integrated circuit chip size and determining a frame structure segment size based on the chip size. The frame structure segment size is less than the chip size. An initial shot layout having a chip count is established in which a number of shots, each including at least one frame structure segment and at least one chip, are arranged in vertically and horizontally aligned columns and rows. At least one additional shot layout is established in which at least one of a row or column of shots is offset from an adjacent row or column of shots. The initial shot layout is compared to the at least one additional shot layout, and a final shot layout is selected based in part on the total number of shots in the shot layout and has a final chip count that is greater than or equal to the initial chip count.
    • 一种方法包括接收集成电路芯片尺寸并基于芯片尺寸确定帧结构段大小。 帧结构段大小小于芯片大小。 建立具有芯片数量的初始照片布局,其中每个包括至少一个框架结构段和至少一个芯片的镜头排列在垂直和水平排列的列和行中。 建立至少一个额外的镜头布局,其中一列或一列镜头中的至少一个从相邻的行或镜头列偏移。 将初始照片布局与至少一个附加镜头布局进行比较,并且部分地基于镜头布局中的总镜头数量选择最终镜头布局,并且具有大于或等于初始镜头布局的最终​​裁片数量 芯片数量