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71. 发明授权

US06399507B1 Stable plasma process for etching of films 失效
标题翻译：用于蚀刻膜的稳定等离子体工艺
公开(公告)号：US06399507B1
公开(公告)日：2002-06-04
申请号：US09401603
申请日：1999-09-22
申请人： Padmapani Nallan , John Holland , Valentin Todorov , Thorsten Lill
发明人： Padmapani Nallan , John Holland , Valentin Todorov , Thorsten Lill
IPC分类号： H01L21302
CPC分类号： H01J37/321
摘要： In accordance with the present invention, process parameters are controlled to provide a stable etch plasma. We have discovered that it is possible to operate a stable plasma with a portion of the power deposited to the plasma being a capacitive contribution and a portion of the power deposited being an inductive contribution. In particular, a stable plasma may be obtained within two process regions. In the first region, the gradient of the capacitive power to the power applied to the inductively coupled source for plasma generation [∂Pcap/∂PRF] is greater than 0. In the second region, plasma stability is controlled so that [∂Pcap/∂PRF] is less than 0 and so that Pcap
摘要翻译：根据本发明，控制工艺参数以提供稳定的蚀刻等离子体。我们已经发现，可以操作稳定的等离子体，其中一部分功率沉积到等离子体是电容性的，并且所沉积的功率的一部分是感应贡献。特别地，可以在两个工艺区域内获得稳定的等离子体。在第一区域中，电容性功率对施加到用于等离子体产生的电感耦合源的功率的梯度大于0.在第二区域中，等离子体稳定性受到控制，使得[∂Pcap/ ∠PRF]小于0，因此Pcap << PRF。通常，Pcap的幅度小于PRF大小的10％。此外，在具有双功率控制的等离子体处理装置中，在给予对等离子体发生源的功率施加时，通过增加蚀刻处理室中的压力来延长等离子体的稳定性。这使得能够使用较低功率应用进行等离子体生成的蚀刻工艺。将稳定的等离子体操作状态覆盖在其它工艺参数上以获得所需的蚀刻结果，以提供可靠的制造工艺。在稳定等离子体区域中的蚀刻工艺的操作使得能够使用定时蚀刻终点。例如，在蚀刻含硅层期间，可以使用蚀刻剂等离子体，其在蚀刻工艺的第一定时蚀刻部分期间相对于相邻层提供快速蚀刻和蚀刻选择性，以及在蚀刻过程中的不同蚀刻剂等离子体最终排放物监测到底层基板界面的蚀刻。此外，稳定的等离子体以基本上相同的速率帮助蚀刻掺杂和未掺杂的硅和多晶硅衬底，同时提供干净的蚀刻工艺。

72. 发明授权

US06253406B1 Combined toothbrush handle and stand 失效
标题翻译：组合牙刷手柄和支架
公开(公告)号：US06253406B1
公开(公告)日：2001-07-03
申请号：US09302538
申请日：1999-04-30
申请人： John Holland
发明人： John Holland
IPC分类号： A46B904
CPC分类号： A46B15/0097 , A46B5/00
摘要： Heretofore, the average commercially available toothbrush had to depend on surfaces not attached to the toothbrush itself in order for the toothbrush to be stored when not in use, either in a holder often of questionable hygiene attached to a wall, in a drinking glass or other makeshift storage position. The unique feature of the combined toothbrush handle and stand as described in this application provides for the efficient, hygienic storage in a single unit, permitting the toothbrush bristles to air dry in an upright position free from contact with any surface. This is created by flexible moveable shafts set into the handle which are easily extended or retracted by the toothbrush user with the aid of a moveable ring to which the shafts are attached, thus creating a fully deployable stand alone base.
摘要翻译：迄今为止，平均市售的牙刷必须依赖于未连接到牙刷本身的表面，以便在不使用时储存牙刷，无论是在通常具有怀疑的卫生保持附着在墙壁上的保持器，饮用玻璃或其他临时仓储位置。如本申请中描述的组合牙刷手柄和支架的独特特征提供了在单个单元中的有效，卫生的存储，允许牙刷刷毛直立空气干燥而不与任何表面接触。这是通过设置在手柄中的灵活的可移动轴产生的，这些可移动的轴借助于可移动的环容易地被牙刷使用者伸出或缩回，所述可移动的环被连接到轴上，从而形成完全展开的独立的底座。

73. 发明授权

US5589737A Plasma processor for large workpieces 失效
标题翻译：等离子处理器用于大型工件
公开(公告)号：US5589737A
公开(公告)日：1996-12-31
申请号：US354122
申请日：1994-12-06
申请人： Michael Barnes , Neil Benjamin , John Holland , Richard Beer , Robert Veltrop
发明人： Michael Barnes , Neil Benjamin , John Holland , Richard Beer , Robert Veltrop
IPC分类号： H05H1/46 , C23C16/507 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01J7/24
CPC分类号： H01J37/3222 , H01J37/321 , H01J37/32238
摘要： A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.
摘要翻译：用于大型工件的等离子体处理器包括具有多个单独支撑的电介质窗口的真空室，用于连接r.f。来自腔室外部的腔室进入腔室以激发等离子体。用于感应地导出场的平面线圈具有多个具有相同电长度的段，每个段具有与另一段的元件并联连接的元件。

74. 发明授权

US09978565B2 Systems for cooling RF heated chamber components 有权
公开(公告)号：US09978565B2
公开(公告)日：2018-05-22
申请号：US13292649
申请日：2011-11-09
申请人： Jon McChesney , Saravanapriyan Sriraman , Ricky Marsh , Alex Paterson , John Holland
发明人： Jon McChesney , Saravanapriyan Sriraman , Ricky Marsh , Alex Paterson , John Holland
IPC分类号： H01L21/3065 , H01J37/32
CPC分类号： H01J37/32522 , H01J37/32082 , H01J37/32119 , H01J37/32238
摘要： In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.

75. 发明申请

US20130323860A1 SUBSTRATE SUPPORT PROVIDING GAP HEIGHT AND PLANARIZATION ADJUSTMENT IN PLASMA PROCESSING CHAMBER 有权
标题翻译：基板支撑在等离子体加工室中提供缝隙高度和平面调整
公开(公告)号：US20130323860A1
公开(公告)日：2013-12-05
申请号：US13485166
申请日：2012-05-31
申请人： Jerrel Kent Antolik , Yen-kun Victor Wang , John Holland
发明人： Jerrel Kent Antolik , Yen-kun Victor Wang , John Holland
IPC分类号： H01L21/687 , C23C16/505 , H01L21/3065 , H01L21/66
CPC分类号： H01J37/32091 , H01J37/32568 , H01L21/67069 , H01L21/6719
摘要： A semiconductor substrate support for use in a plasma processing apparatus comprises a chuck body having a plenum and three radially extending bores extending between the plenum and an outer periphery of the chuck body, wherein the chuck body is sized to support a semiconductor substrate having a diameter of at least 450 mm. The semiconductor substrate support further comprises three tubular support arms which include a first section extending radially outward from the outer periphery of the chuck body, and a second section extending vertically from the first section. The tubular support arms provide a passage therethrough which communicates with a respective bore in the chuck body. The second section of each tubular support aim is configured to engage with a respective actuation mechanism outside the chamber operable to effect vertical translation and planarization of the chuck body in the interior of a plasma processing chamber.
摘要翻译：一种用于等离子体处理设备的半导体衬底支撑体包括具有增压室的卡盘体和在气室与吸盘主体的外周之间延伸的三个径向延伸的孔，其中卡盘体的尺寸设计成支撑具有直径至少450毫米。半导体衬底支撑件还包括三个管状支撑臂，其包括从卡盘主体的外周径向向外延伸的第一部分和从第一部分垂直延伸的第二部分。管状支撑臂提供穿过其中的通道，其与卡盘主体中的相应孔连通。每个管状支撑目标的第二部分构造成与腔室外部的相应致动机构接合，可操作以实现等离子体处理室内部的卡盘体的垂直平移和平坦化。

76. 发明申请

US20100095229A1 GRAPHICAL USER INTERFACE FOR GLUCOSE MONITORING SYSTEM 审中-公开
标题翻译：葡萄糖监测系统的图形用户界面
公开(公告)号：US20100095229A1
公开(公告)日：2010-04-15
申请号：US12233584
申请日：2008-09-18
申请人： Lynn Dixon , Jonathan Fern , Juli Goldstein , Nicole J. Walker , Samuel Mason Curry , William Matievich, Jr. , John Holland , Daniel Khalili
发明人： Lynn Dixon , Jonathan Fern , Juli Goldstein , Nicole J. Walker , Samuel Mason Curry , William Matievich, Jr. , John Holland , Daniel Khalili
IPC分类号： G06F3/048
CPC分类号： A61B5/157 , A61B5/14532 , A61B5/150022 , A61B5/150305 , A61B5/150358 , A61B5/150412 , A61B5/150503 , A61B5/150549 , A61B5/150618 , A61B5/150717 , A61B5/15146 , A61B5/15186 , A61B5/7435 , A61B2560/045 , G06F19/3456 , G16H40/63
摘要： Graphical user interfaces (GUIs) for a medical device such as a blood glucose meter, systems and methods are provided. Embodiments include GUIs in which a user may navigate between icons and select certain display outputs which summarize all or certain glucose data over particular time periods. In certain embodiments, animated icons and/or graphs and/or text summaries may be provided.
摘要翻译：提供了诸如血糖仪，系统和方法之类的医疗设备的图形用户界面（GUI）。实施例包括GUI，其中用户可以在图标之间导航并且选择在特定时间段内汇总全部或某些葡萄糖数据的某些显示输出。在某些实施例中，可以提供动画图标和/或图形和/或文本摘要。

77. 外观设计

USD599417S1 Push-up exercise device 有权
公开(公告)号：USD599417S1
公开(公告)日：2009-09-01
申请号：US29337266
申请日：2009-05-18
申请人： Mark B. Friedman , Alden M. Mills , John Holland , Kevan Hollenback , Stephen G. Hauser
设计人： Mark B. Friedman , Alden M. Mills , John Holland , Kevan Hollenback , Stephen G. Hauser

78. 发明申请

US20080042391A1 INDEPENDENT SUSPENSION SYSTEM 审中-公开
标题翻译：独立悬挂系统
公开(公告)号：US20080042391A1
公开(公告)日：2008-02-21
申请号：US11697521
申请日：2007-04-06
申请人： John Holland , Tomas McCabe
发明人： John Holland , Tomas McCabe
IPC分类号： B60G9/00 , B60G11/00 , B60G7/00
CPC分类号： B60G3/20 , B60G7/02 , B60G11/16 , B60G2200/144 , B60G2204/1244 , B60G2206/0114 , B60G2206/50 , B60G2206/60
摘要： An independent suspension system for mounting on a vehicle chassis which includes a pair of spaced-apart longitudinal chassis rails has a U-shaped support frame for attachment to the vehicle chassis rails. The support frame has a pair of side frame members, upper ends of which are adapted for engagement with the chassis rails. Lower ends of the side frame members are interconnected by a pair of spaced-apart cross members which are demountably secured between the side frame members. Each cross member has an elongate tubular body with flanged ends having through holes for reception of mounting bolts to secure the cross member to the side frame members.
摘要翻译：用于安装在包括一对间隔开的纵向底盘轨道的车辆底盘上的独立悬架系统具有用于附接到车辆底盘轨道的U形支撑框架。支撑框架具有一对侧框架构件，其上端适于与底盘轨道接合。侧框架构件的下端通过一对间隔开的横向构件相互连接，该横向构件可拆卸地固定在侧框架构件之间。每个横向构件具有细长的管状体，其具有法兰端部，其具有用于接收安装螺栓以将横梁固定到侧框架构件的通孔。

79. 外观设计

USD559723S1 Watch fastener 有权
标题翻译：表扣紧固件
公开(公告)号：USD559723S1
公开(公告)日：2008-01-15
申请号：US29248660
申请日：2006-08-25
申请人： Stephanie Kraus , Chris Heatherly , Randal Ouye , Julie Nishioka , John Holland , Jeffrey Sand
设计人： Stephanie Kraus , Chris Heatherly , Randal Ouye , Julie Nishioka , John Holland , Jeffrey Sand

80. 发明申请

US20070256785A1 APPARATUS FOR ETCHING HIGH ASPECT RATIO FEATURES 有权
公开(公告)号：US20070256785A1
公开(公告)日：2007-11-08
申请号：US11381523
申请日：2006-05-03
申请人： Sharma Pamarthy , Huutri Dao , Xiaoping Zhou , Kelly McDonough , Jivko Dinev , Farid Abooameri , David Gutierrez , Jim He , Robert Clark , Dennis Koosau , Jeffrey Dietz , Declan Scanlan , Subhash Deshmukh , John Holland , Alexander Paterson
发明人： Sharma Pamarthy , Huutri Dao , Xiaoping Zhou , Kelly McDonough , Jivko Dinev , Farid Abooameri , David Gutierrez , Jim He , Robert Clark , Dennis Koosau , Jeffrey Dietz , Declan Scanlan , Subhash Deshmukh , John Holland , Alexander Paterson
IPC分类号： H01L21/306 , H01L21/302
CPC分类号： H01J37/3266 , H01J37/3244 , H01J37/32706 , H01J2237/3347
摘要： Embodiments of the invention provide a method and apparatus, such as a processing chamber, suitable for etching high aspect ratio features. Other embodiments include a showerhead assembly for use in the processing chamber. In one embodiment, a processing chamber includes a chamber body having a showerhead assembly and substrate support disposed therein. The showerhead assembly includes at least two fluidly isolated plenums, a region transmissive to an optical metrology signal, and a plurality of gas passages formed through the showerhead assembly fluidly coupling the plenums to the interior volume of the chamber body.

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