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71. 发明授权

US5946112A Image processing apparatus and method 失效
标题翻译：图像处理装置及方法
公开(公告)号：US5946112A
公开(公告)日：1999-08-31
申请号：US449573
申请日：1995-05-24
申请人： Noriyuki Kobayashi
发明人： Noriyuki Kobayashi
IPC分类号： B41J2/52 , B41J2/525 , G06T1/00 , G06T5/00 , H04N1/46 , H04N1/56 , H04N1/60
CPC分类号： H04N1/56 , H04N1/60
摘要： An image processing apparatus which provides image data to an image forming apparatus capable of forming an image by overlaying recording material of at least two colors separates color image data into at least two color component image data, and performs a first correction in consideration of a light-shielding effect and a second correction so as to maintain a density ratio of each color component image data. Then, in accordance with a density value of a second color component image data applied with the first correction, either a first corrected result or a second corrected result is selected. Thereby, decrease of a density value caused by the light-shielding effect is corrected, further correction for maintaining color balance can be performed.
摘要翻译：将图像数据提供给能够通过重叠至少两种颜色的记录材料形成图像的图像形成装置的图像处理装置将彩色图像数据分成至少两个颜色分量图像数据，并且考虑到光进行第一校正并且第二校正以保持每个颜色分量图像数据的密度比。然后，根据应用第一校正的第二颜色分量图像数据的浓度值，选择第一校正结果或第二校正结果。由此，校正了由遮光效果引起的浓度值的降低，可进行维持色彩平衡的进一步校正。

72. 发明授权

US5356085A Method and apparatus for treating package yarn end 失效
标题翻译：包装纱线端头处理方法及装置
公开(公告)号：US5356085A
公开(公告)日：1994-10-18
申请号：US22686
申请日：1993-03-01
申请人： Noriyuki Kobayashi , Masayuki Tamura
发明人： Noriyuki Kobayashi , Masayuki Tamura
IPC分类号： B65H65/00 , B65H67/08
CPC分类号： B65H65/005 , B65H67/086 , B65H2701/31
摘要： Method and apparatus for picking up an yarn end so as to fix the same on a yarn package comprising picking up an yarn end from a yarn package by a suction means so as to hold the yarn end therein in a drawn state, inserting an yarn end handling bar between the held yarn end and the package surface, revolving the yarn end handling bar along the package surface while maintaining the bar beneath an outermost layer yarn connected to the yarn end until a layered portion is formed, in which the end yarn held in a drawn state coincides with the outermost layer yarn, and ejecting a jet of pressurized fluid onto or in the vicinity of the layered portion so as to entangle the yarn end with the outermost layer yarn so that the yarn end is fixed on the package.Method and apparatus for treating a package end yarn when the yarn end is released from an entangled portion, in which the yarn end is entangled and fixed with an outermost yarn layer of a package comprising drawing the outermost yarn layer so as to float the same above the package surface with both ends thereof continuing to the package, severing the floating outermost layer yarn from the package at a portion on one side thereof, rotating the package in the unwinding direction so as to draw the other portion of the outermost yarn layer, severing the outermost yarn layer from the package at a portion on the other side thereof, and rotating the package in the winding direction so as to withdraw a fresh end yarn.
摘要翻译：用于拾取纱线端部以便将其固定在纱线卷装上的方法和装置，包括通过抽吸装置从纱线卷装中拾取纱线端部，以将纱线端部保持在拉伸状态，将纱线端部在保持纱线端部和包装表面之间的处理杆，使纱线端部处理杆沿着包装表面旋转，同时将杆保持在与纱线端部连接的最外层纱线下方，直到形成层叠部分，其中端部纱线保持在拉伸状态与最外层纱线一致，并且将加压流体喷射喷射到层叠部分上或附近，以使纱线端部与最外层纱线缠结，使得纱线端部固定在包装上。纱线末端由缠绕部分缠绕并用包装的最外面的纱线层固定的缠结部分处理包装端纱线的方法和装置，包括拉伸最外面的纱线层以使其漂浮在上面其包装表面的两端连续包装，在其一侧的一部分处将浮动的最外层纱线从包装件切断，使包装沿退绕方向旋转，以拉伸最外层纱线层的另一部分，切断最外层的纱线层从包装体的另一侧的一部分开始，使包装沿卷绕方向旋转，从而取出新鲜的端纱。

73. 发明授权

US5326627A Polyolefin-based wrapping film 失效
标题翻译：聚烯烃类包装膜
公开(公告)号：US5326627A
公开(公告)日：1994-07-05
申请号：US963543
申请日：1992-10-20
申请人： Takao Yazaki , Masataka Noro , Takashi Matsui , Noriyuki Kobayashi , Hironari Sano , Koji Yamamoto
发明人： Takao Yazaki , Masataka Noro , Takashi Matsui , Noriyuki Kobayashi , Hironari Sano , Koji Yamamoto
IPC分类号： B29C47/88 , B29D7/01 , B32B27/32 , B65D65/40 , C08J5/18
CPC分类号： C08J5/18 , B29C47/0026 , B29C47/8805 , B29C47/8835 , B29D7/01 , B32B27/32 , B29C47/0023 , C08J2323/04 , Y10T428/24149 , Y10T428/259 , Y10T428/2826 , Y10T428/31801 , Y10T428/31913 , Y10T428/31928
摘要： A polyolefin-based wrapping film having one or more layers which satisfies the following conditions (1) to (4):(1) the film has a thickness ranging from 6 to 100 .mu.m;(2) the film has a birefringence .DELTA.n.sub.A of from 0.6.times.10.sup.-3 to 8.times.10.sup.-3 ;(3) the film has a ratio of percent heat shrinkage in MD to percent heat shrinkage in TD of from 0.65 to 1.50 in a silicon oil bath at 140.degree. C. for 3 minutes; and(4) the film has a strain recovery of at least 18 mm,which provides excellent performance properties in stretch wrapping, especially in the area of high deformation recover.
摘要翻译：一种具有满足以下条件（1）至（4）的一层或多层的聚烯烃类包装膜：（1）该膜具有6至100μm的厚度; （2）该膜具有0.6×10 -3至8×10 -3的双折射率△DTA nA; （3）在140℃的硅油浴中，该膜具有MD的热收缩率与TD的热收缩率的比例为0.65至1.50，持续3分钟; （4）薄膜的应变恢复至少为18mm，在拉伸包装中具有优异的性能，特别是在高变形恢复的区域。

74. 发明授权

US08843863B2 Apparatus, method and computer program for managing circuit optimization information 有权
标题翻译：用于管理电路优化信息的装置，方法和计算机程序
公开(公告)号：US08843863B2
公开(公告)日：2014-09-23
申请号：US12150566
申请日：2008-04-29
申请人： Noriyuki Kobayashi
发明人： Noriyuki Kobayashi
IPC分类号： G06F9/455 , G06F17/50
CPC分类号： G06F17/5036 , G06F17/5063 , G06F2217/08
摘要： A circuit optimization information management apparatus provides information to be used when a circuit parameter optimization program is executed to design an integrated circuit. The apparatus includes an accumulator for registering information relating to a candidate of a circuit type used in a design target circuit, a simulation test bench circuit corresponding to the circuit type, a simulation test input waveform and a circuit performance evaluation function for evaluating simulation results, and a feeder for selecting, in response to selection of the circuit type used in the design target circuit, information relating to the test bench circuit, the test input waveform and the performance evaluation function, corresponding to the selected circuit type registered in the accumulator and feeding the selected information to the circuit parameter optimization program.
摘要翻译：电路优化信息管理装置提供当执行电路参数优化程序以设计集成电路时要使用的信息。该装置包括用于登记与设计目标电路中使用的电路类型的候选相关的信息的累加器，对应于电路类型的仿真测试台电路，仿真测试输入波形和用于评估仿真结果的电路性能评估功能，以及馈线，用于响应于所述设计目标电路中使用的电路类型的选择，选择与所述选择的电路类型对应于所述测试台电路，所述测试输入波形和所述性能评估功能，将所选信息馈送到电路参数优化程序。

75. 发明授权

US08790490B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US08790490B2
公开(公告)日：2014-07-29
申请号：US13396181
申请日：2012-02-14
申请人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
发明人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32091 , H01J37/32082 , H01J37/32174 , H01J37/32348 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01J37/32642 , H01J37/32706 , H01J37/32834 , H01J2237/3344 , H01L21/02126 , H01L21/02164 , H01L21/0217 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/67069
摘要： An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching.
摘要翻译：一种装置包括用于支撑在处理室内相对设置的晶片的上电极和下电极。被配置为施加具有相对较高频率的第一RF功率的第一RF电源连接到上电极。配置为施加具有相对较低频率的第二RF功率的第二RF电源连接到下电极。可变直流电源连接到上电极。将处理气体供给到处理室中，同时控制来自可变直流电源到上部电极的施加电压，施加电流和施加电力中的任何一个，以产生处理气体的等离子体，以进行等离子体蚀刻。

76. 发明授权

US08642760B2 Low hygroscopic aripiprazole drug substance and processes for the preparation thereof 有权
标题翻译：低吸湿性阿立哌唑药物及其制备方法
公开(公告)号：US08642760B2
公开(公告)日：2014-02-04
申请号：US13067750
申请日：2011-06-23
申请人： Takuji Bando , Satoshi Aoki , Junichi Kawasaki , Makoto Ishigami , Youichi Taniguchi , Tsuyoshi Yabuuchi , Kiyoshi Fujimoto , Yoshihiro Nishioka , Noriyuki Kobayashi , Tsutomu Fujimura , Masanori Takahashi , Kaoru Abe , Tomonori Nakagawa , Koichi Shinhama , Naoto Utsumi , Michiaki Tominaga , Yoshihiro Ooi , Shohei Yamada , Kenji Tomikawa
发明人： Takuji Bando , Satoshi Aoki , Junichi Kawasaki , Makoto Ishigami , Youichi Taniguchi , Tsuyoshi Yabuuchi , Kiyoshi Fujimoto , Yoshihiro Nishioka , Noriyuki Kobayashi , Tsutomu Fujimura , Masanori Takahashi , Kaoru Abe , Tomonori Nakagawa , Koichi Shinhama , Naoto Utsumi , Michiaki Tominaga , Yoshihiro Ooi , Shohei Yamada , Kenji Tomikawa
IPC分类号： C07D401/12
CPC分类号： C07D215/227 , C07B2200/13 , C07D215/22 , Y10T428/2982
摘要： The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period.
摘要翻译：本发明提供低吸湿形式的阿立哌唑及其制备方法，即使当含有无水阿立哌唑晶体的药物制剂长时间储存时，其也不会转化为水合物或丧失其原始溶解度。

77. 发明授权

US08432559B2 Image processing apparatus, image processing method, program and storage medium 有权
标题翻译：图像处理装置，图像处理方法，程序和存储介质
公开(公告)号：US08432559B2
公开(公告)日：2013-04-30
申请号：US12054295
申请日：2008-03-24
申请人： Noriyuki Kobayashi
发明人： Noriyuki Kobayashi
IPC分类号： G06K15/00
CPC分类号： H04N1/00843 , H04N1/00864 , H04N1/00875 , H04N2201/0094
摘要： An image processing apparatus capable of outputting image data by a plurality of output methods includes storing image data, managing output restriction information corresponding to a predetermined region of the stored image data, executing output restriction processing of the image data corresponding to the predetermined region based on the output restriction information of one of the plurality of output methods, selecting one of the plurality of output methods when the image data is output, and outputting the image data on which the output restriction processing is executed by the selected output method.
摘要翻译：能够通过多种输出方式输出图像数据的图像处理装置包括：存储图像数据，管理与所存储的图像数据的预定区域相对应的输出限制信息，对基于预定区域的图像数据执行输出限制处理，基于多个输出方法之一的输出限制信息，当输出图像数据时选择多个输出方法中的一个输出，并通过所选择的输出方法输出执行了输出限制处理的图像数据。

78. 发明申请

US20120309203A1 PLASMA ETCHING METHOD AND STORAGE MEDIUM 审中-公开
标题翻译：等离子体蚀刻方法和储存介质
公开(公告)号：US20120309203A1
公开(公告)日：2012-12-06
申请号：US13584327
申请日：2012-08-13
申请人： Naotsugu HOSHI , Noriyuki Kobayashi
发明人： Naotsugu HOSHI , Noriyuki Kobayashi
IPC分类号： H01L21/3065
CPC分类号： H01L21/76813 , H01J37/32091 , H01J37/32926 , H01L21/31116 , H01L21/31138 , H01L21/76807 , H01L21/76814
摘要： A plasma etching method that can increase the selection ratio of a stop layer to an interlayer insulation film. The plasma etching method is carried out on a substrate that has the interlayer insulation film formed of CwFx (x and w are predetermined natural numbers) and a stop layer that stops etching and is exposed at the bottom of a hole or a trench formed in the interlayer insulation film. The interlayer insulation film and the stop layer are exposed at the same time to plasma generated from CyFz (y and z are predetermined natural numbers) gas and hydrogen-containing gas.
摘要翻译：能够提高阻挡层与层间绝缘膜的选择比的等离子体蚀刻方法。等离子体蚀刻方法是在具有由CwFx（x和w是预定的自然数）形成的层间绝缘膜的基板上进行的，停止层停止蚀刻并露出在形成于其中的孔或沟槽的底部层间绝缘膜。层间绝缘膜和停止层同时暴露于由CyFz（y和z是预定的自然数）产生的等离子体气体和含氢气体。

79. 发明授权

US08161734B2 Exhaust gas purification device 失效
标题翻译：废气净化装置
公开(公告)号：US08161734B2
公开(公告)日：2012-04-24
申请号：US12464293
申请日：2009-05-12
申请人： Hideto Takeda , Akihiro Matsuyama , Noriyuki Kobayashi , Yugo Osaka
发明人： Hideto Takeda , Akihiro Matsuyama , Noriyuki Kobayashi , Yugo Osaka
IPC分类号： F01N3/00
CPC分类号： F01N3/0871 , B01D53/949 , B01D2253/112 , B01D2255/1021 , B01D2255/2073 , B01D2257/302 , B01D2258/012 , B01D2258/014 , F01N3/0842 , F01N3/085 , F01N3/0878 , F01N3/2026 , F01N13/009 , F01N13/0093 , F01N13/011 , F01N2370/02 , F01N2560/027 , F01N2560/06 , Y02A50/2348 , Y02T10/26
摘要： An exhaust gas purification device includes an exhaust pipe defining an exhaust passage, a first SOX adsorption portion having a first SOX adsorption material provided in the exhaust passage, a second SOX adsorption portion having a second SOX adsorption material provided in the exhaust passage, and a NOX catalyst provided downstream of the first SOX adsorption portion and the second SOX adsorption portion in the exhaust passage. The first SOX adsorption material is configured to adsorb SOX in the combustion gas at a temperature lower than a first set temperature. The second SOX adsorption material is configured to store SOX in the combustion gas at a temperature equal to or higher than a second set temperature, and the stored SOX can be kept at a temperature lower than the second set temperature. Therefore, the exhaust gas purification device can adsorb SOX in the exhaust gas with high efficiency.
摘要翻译：一种排气净化装置，具备排气通路的排气管，排气通路上设置有第一SO x吸附材料的第一SO X吸附部，设置在排气通路内的第二SO X吸附材料的第二SO X吸附部， NO x催化剂设置在排气通道中的第一SO x吸附部分和第二SO X吸附部分的下游。第一SO x吸附材料构造成在低于第一设定温度的温度下吸附燃烧气体中的SO x。第二SO x吸附材料构造成在等于或高于第二设定温度的温度下将SOX储存在燃烧气体中，并且所储存的SOX可以保持在低于第二设定温度的温度。因此，排气净化装置能够高效率地吸附废气中的SO x。

80. 发明授权

US07951262B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US07951262B2
公开(公告)日：2011-05-31
申请号：US11156561
申请日：2005-06-21
申请人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa , Hidetoshi Hanaoka , Toshihiro Hayami , Hiroki Yamazaki , Manabu Sato
发明人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa , Hidetoshi Hanaoka , Toshihiro Hayami , Hiroki Yamazaki , Manabu Sato
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/32091 , H01J37/32082 , H01J37/32174 , H01J37/3244 , H01J37/32697 , H01J37/32706 , H01J2237/334 , H01L21/3065
摘要： An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.
摘要翻译：一种装置包括用于支撑在处理室内相对设置的晶片的上电极和下电极。被配置为施加具有相对较高频率的第一RF功率的第一RF电源和被配置为施加具有相对较低频率的第二RF功率的第二RF电源连接到下电极。可变直流电源连接到上电极。将工艺气体供应到处理室中以产生处理气体的等离子体，以进行等离子体蚀刻。

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