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    • 61. 发明授权
    • Method of forming a patterned metal layer
    • 形成图案化金属层的方法
    • US06933099B2
    • 2005-08-23
    • US10290283
    • 2002-11-08
    • James Francis O'SullivanStephen Robert Burgess
    • James Francis O'SullivanStephen Robert Burgess
    • H01L21/02H01L21/027H01L21/285H05K3/04G03C5/00C23C14/34
    • H01L21/0272H01L21/2855H05K3/048
    • A method of forming a patterned layer on a substrate including depositing a notched or undercut resist pattern to define at least one recess in the photoresist, with the notch or undercut circumjacent the base of the recess, sputtering a material into the recess and removing the resist and the material deposited on the resist characterised in that the aspect ratio of the recess and height of the mouth of the notch or undercut are such that the notch or undercut lies substantially in the shadow beneath the resist, the layer deposited upon it and the layer at the base of the recess in respect of any sputtered particle travelling in a straight line through the mouth of the recess such that material deposited on the walls of the recesses is not continuous with material deposited on the base of the recess.
    • 一种在衬底上形成图案层的方法,包括沉积缺口或底切抗蚀剂图案以限定光致抗蚀剂中的至少一个凹部,其中凹口或底切围绕凹部的底部,将材料溅射到凹部中并去除抗蚀剂 并且沉积在抗蚀剂上的材料的特征在于,凹口的纵横比和凹口或底切口的高度使得凹口或底切基本上位于抗蚀剂下面的阴影中,沉积在其上的层和层 相对于通过凹部的口直线行进的任何溅射的颗粒在凹部的底部,使得沉积在凹槽的壁上的材料与沉积在凹部的底部上的材料不连续。