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    • 65. 发明授权
    • Process for producing dispersion of hollow fine SiO2 particles, coating composition and substrate with antireflection coating film
    • 中空微细SiO 2颗粒分散体,涂料组合物和基材与防反射涂膜的制备方法
    • US08623312B2
    • 2014-01-07
    • US11939880
    • 2007-11-14
    • Kawai YoheiYoneda Takashige
    • Kawai YoheiYoneda Takashige
    • C01B33/12
    • B82Y30/00C01B33/14C01B33/18C01P2004/34C01P2004/62C01P2004/64C09C1/0081C09C1/043C09C1/30G02B1/111G02B1/113Y10T428/24421Y10T428/2982Y10T428/2991
    • To provide a process for producing a dispersion of hollow fine SiO2 particles which contains no residual core fine particles, generates no uncontrollable agglomerates, and is easy to filtrate.A process for producing a dispersion of hollow fine SiO2 particles having hollow fine SiO2 particles dispersed in a dispersion medium, which comprises at least the following steps (a), (b) and (c): (a) a step of reacting a precursor of SiO2 at a pH higher than 8 in the presence of fine ZnO particles constituting the core in the dispersion medium to form SiO2, thereby to obtain a dispersion of fine particles comprising the fine ZnO particles covered with the formed SiO2; (b) a step of mixing an acidic cation exchange resin with the dispersion of fine particles obtained in the above step (a) to bring them into contact with each other, to dissolve the fine ZnO particles as the core at a pH within a range of from 2 to 8; and (c) a step of separating the acidic cation exchange resin by solid-liquid separation after the fine ZnO particles are completely dissolved, to obtain the dispersion of hollow fine SiO2 particles.
    • 为了提供不含有残留的核心微粒的中空微细SiO 2粒子的分散液的制造方法,不产生不可控的附聚物,容易滤液。 一种制备分散在分散介质中的中空微细SiO 2颗粒的中空微细SiO 2分散体的方法,其至少包括以下步骤(a),(b)和(c):(a)使前体 的SiO 2在pH高于8的情况下,在构成分散介质中的核的细ZnO颗粒存在下形成SiO 2,从而获得包含被形成的SiO 2覆盖的ZnO微粒的细颗粒的分散体; (b)将酸性阳离子交换树脂与上述步骤(a)中得到的细颗粒分散体混合以使其彼此接触的步骤,将作为核的细ZnO颗粒溶解在一定范围内的pH 从2到8; 和(c)在完全溶解ZnO微粒子之后通过固液分离来分离酸性阳离子交换树脂的步骤,以获得中空微细SiO 2颗粒的分散体。
    • 67. 发明授权
    • Colloidal silica containing silica secondary particles having bent structure and/or branched structure, and method for producing same
    • 含有具有弯曲结构和/或支化结构的二氧化硅二次粒子的胶体二氧化硅及其制造方法
    • US08529787B2
    • 2013-09-10
    • US12998096
    • 2009-09-01
    • Kazuaki HiguchiHideki Otsuki
    • Kazuaki HiguchiHideki Otsuki
    • C09K13/00
    • C09K3/1409C01B33/14C01B33/18C01B2202/02C01B2202/36
    • This invention provides a dense, high-purity colloidal silica containing silica secondary particles having a branched and/or bent structure, and a production method thereof. Specifically, this invention provides a method for producing a colloidal silica, comprising the steps of 1) preparing a mother liquid containing an alkali catalyst and water, and having a pH of 9 to 12; and 2) adding a hydrolysis liquid obtained by hydrolysis of an alkyl silicate to the mother liquid, wherein the step of adding the hydrolysis liquid to the mother liquid sequentially comprises A) step 1 of adding the hydrolysis liquid until the pH of the resulting liquid mixture becomes less than 7; B) step 2 of adding an aqueous alkali solution until the pH of the liquid mixture becomes 7 or more; and C) step 3 of adding the hydrolysis liquid while maintaining the pH of the liquid mixture at 7 or more, and a colloidal silica containing silica secondary particles having a branched and/or bent structure, obtained by this method.
    • 本发明提供一种含有分支和/或弯曲结构的二氧化硅二次颗粒的致密的高纯度胶体二氧化硅及其制备方法。 具体而言,本发明提供一种胶体二氧化硅的制造方法,其特征在于,包括以下步骤:1)制备含有碱催化剂和水的母液,pH为9〜12; 和2)将通过水解硅酸烷基酯获得的水解液加入到母液中,其中依次将水解液加到母液中的步骤包括:A)加入水解液直到所得液体混合物的pH 变得小于7; B)添加碱性水溶液直至液体混合物的pH变为7以上为止的步骤2; 和C)在将液体混合物的pH保持在7以上的同时添加水解液的步骤3和通过该方法获得的含有分支和/或弯曲结构的二氧化硅二次粒子的胶体二氧化硅。