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61. 发明申请

US20130028788A1 Method as well as apparatuses for testing at least one function of a medical functional device 有权
标题翻译：方法以及用于测试医疗功能装置的至少一个功能的装置
公开(公告)号：US20130028788A1
公开(公告)日：2013-01-31
申请号：US13559873
申请日：2012-07-27
申请人： Soeren Gronau , Joachim Manke , Ralf Mueller , Ingo SCHAEFER
发明人： Soeren Gronau , Joachim Manke , Ralf Mueller , Ingo SCHAEFER
IPC分类号： G01L27/00 , A61M1/34 , A61M1/14
CPC分类号： A61M1/1621 , A61M1/14 , A61M1/1605 , A61M1/34 , A61M1/3413 , A61M1/3434 , A61M1/3607 , A61M39/24 , A61M2205/12 , A61M2205/15 , A61M2205/18 , A61M2205/27 , A61M2205/3306 , A61M2205/3331 , A61M2205/3368 , A61M2205/50 , A61M2205/70
摘要： The invention relates to a method for testing at least one function of a medical functional device which is inserted in and connected and compressed with a medical treatment apparatus, and/or a function of this treatment apparatus, wherein between a hydraulic device or a pneumatic unit of the treatment apparatus and the functional device at least one fluid communication is established. It further relates to a detection device which is programmed and/or configured for executing the method according to the invention as well as a medical treatment apparatus which comprises at least one detection device and/or is in signal transmission or is connected for signal transmission with it, a digital storage medium, a computer program product as well as a computer program.
摘要翻译：本发明涉及一种用于测试插入并与医疗处理设备连接并压缩的医疗功能设备的至少一个功能的方法和/或该处理设备的功能，其中在液压设备或气动单元的治疗装置和功能装置建立至少一个流体连通。本发明还涉及一种被编程和/或配置用于执行根据本发明的方法的检测装置，以及包括至少一个检测装置和/或处于信号传输中或被连接用于信号传输的医疗处理装置，它，数字存储介质，计算机程序产品以及计算机程序。

62. 发明申请

US20110304926A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR 有权
标题翻译：投影曝光装置，投影曝光方法和镜像的目标投影目标
公开(公告)号：US20110304926A1
公开(公告)日：2011-12-15
申请号：US13217793
申请日：2011-08-25
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm
摘要翻译：投影物镜具有物体表面和图像表面。投影物镜包括沿着光轴布置的多个光学元件，并且被配置为使得在操作期间，投影物镜将布置在物体表面中的图案图像映像到图像表面上。光学元件包括凹面镜，第一偏转镜和第二偏转镜。第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1，使得在操作期间，第一偏转镜将波长λ的物体从物体表面偏转到凹面镜，或使光线偏转 λ从凹面镜朝向图像表面。第二偏转镜相对于光轴倾斜第二倾斜角t2，约为第二倾斜轴。对于包括具有45nm的线宽度和间距p的光栅的图案，投影物镜将图案图像到图像表面，使得对于图案的第一取向和图案的第二取向而言，Dgr; HV，对于100nm

63. 发明授权

US08027088B2 Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror 有权
标题翻译：反射折射投影物镜具有倾斜的偏转镜，投影曝光装置，投影曝光方法和反射镜
公开(公告)号：US08027088B2
公开(公告)日：2011-09-27
申请号：US11964527
申请日：2007-12-26
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B27/28 , G02B5/30
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective. The optical elements include a concave mirror, a first deflecting mirror tilted relative to the optical axis and a second deflecting mirror. The catadioptric projection objective can image patterns including sub-patterns oriented in various directions such that line width variations due to differences of orientation of sub-patterns are largely avoided.
摘要翻译：通常，一方面，本发明的特征在于一种反射折射投影物镜，其具有沿着光轴布置的多个光学元件，以将布置在投影物镜的物体表面中的图案成像到投影物镜的图像表面上。光学元件包括凹面镜，相对于光轴倾斜的第一偏转镜和第二偏转镜。反射折射投影物镜可以对包括在各个方向上取向的子图案的图案图案进行图像化，从而大大避免了由于子图案的取向差异引起的线宽变化。

64. 发明授权

US07980730B2 Metal mesh, arrangement of a metal mesh and method for illumination 有权
标题翻译：金属网，金属网布置和照明方法
公开(公告)号：US07980730B2
公开(公告)日：2011-07-19
申请号：US11722564
申请日：2006-06-02
申请人： Ingo Kufferath-Kassner , Stephan Kufferath-Kassner , Christop Kronhagel , Ralf Mueller
发明人： Ingo Kufferath-Kassner , Stephan Kufferath-Kassner , Christop Kronhagel , Ralf Mueller
IPC分类号： F21V21/00
CPC分类号： E04F13/002 , D03D9/00 , D03D15/00 , D03D15/02 , D10B2101/20 , D10B2401/20 , F21S4/20 , F21S8/033 , F21V33/006 , F21W2131/107 , F21Y2115/10
摘要： An improved metal mesh with lights and an arrangement of such a mesh on a building are proposed. A light carrier receptacle is integrated in a mesh and thereby allow a light carrier to be removed from the mesh and reinserted without disintegrating the light carrier receptacle. Alternatively, a light carrier receptacle is attached to a mesh or other hanging, to which the light carrier is then attached. Clips can be preferably used.
摘要翻译：提出了一种改进的金属网，其具有灯和在建筑物上的这种网格的布置。光载体容器集成在网中，从而允许轻载体从网中移除并重新插入，而不会使轻载体容器分解。或者，光载体容器附接到网状物或其他悬挂物，然后将光载体附接到该网状物。可以优选使用夹子。

65. 发明申请

US20100277708A1 ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20100277708A1
公开(公告)日：2010-11-04
申请号：US12836436
申请日：2010-07-14
申请人： Damian Fiolka , Ralf Mueller , Andras G. Major
发明人： Damian Fiolka , Ralf Mueller , Andras G. Major
IPC分类号： G03B27/72
CPC分类号： G03F7/70208 , G03F7/70116
摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

66. 发明申请

US20100231888A1 OPTICAL SYSTEM 有权
标题翻译：光学系统
公开(公告)号：US20100231888A1
公开(公告)日：2010-09-16
申请号：US12782831
申请日：2010-05-19
申请人： Ralf Mueller , Toralf Gruner
发明人： Ralf Mueller , Toralf Gruner
IPC分类号： G03B27/72 , G02B27/28 , G03F7/20
CPC分类号： G02B5/3083 , G02B1/08 , G03F7/70141 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： The disclosure provides an optical system having an optical axis, where the optical system includes a polarization manipulator which includes first and second subelements. The first subelement has a non-planar, optically effective surface. For light passing through the first subelement, the first subelement causes a change in the polarization state. A maximum effective retardation introduced by the first subelement along the optical axis is less than a quarter of the working wavelength of the optical system. The first subelement and the second subelement have mutually facing surfaces which are mutually complementary. The optical system also includes a position manipulator to manipulate the relative position of the first and second subelements.
摘要翻译：本公开提供了一种具有光轴的光学系统，其中光学系统包括包括第一和第二子元件的偏振操纵器。第一个子元件具有非平面的光学有效表面。对于通过第一子元件的光，第一子元件导致极化状态的变化。由第一子元件沿着光轴引入的最大有效延迟小于光学系统的工作波长的四分之一。第一子元件和第二子元件具有相互互补的相互面对的表面。光学系统还包括位置操纵器来操纵第一和第二子元件的相对位置。

67. 发明申请

US20100097592A1 HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS 有权
标题翻译：高传输，高光电子投影预测目标和投影曝光装置
公开(公告)号：US20100097592A1
公开(公告)日：2010-04-22
申请号：US12580369
申请日：2009-10-16
申请人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
发明人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
IPC分类号： G03B27/54 , G02B27/18 , G02B17/08
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译：本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在投影物镜的物体表面。本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。

68. 发明申请

US20100022980A1 WRAPPER SEALING PROCESS AND ARTICLE 有权
标题翻译：包装密封工艺和文章
公开(公告)号：US20100022980A1
公开(公告)日：2010-01-28
申请号：US12444656
申请日：2007-10-12
申请人： Joseph Junio , David L. Kimball , Ralf Mueller , Tony Ng
发明人： Joseph Junio , David L. Kimball , Ralf Mueller , Tony Ng
IPC分类号： A61F13/20 , B65B11/56
CPC分类号： A61F13/2085 , A61F13/55175 , A61F15/003 , Y10S604/904
摘要： A process for overwrapping a catamenial device such as a tampon includes the steps of providing a substantially cylindrical overwrapper material, inserting a catamenial device into the overwrap material, and closing the open end of the overwrapper material. The overwrapper material has an open end, a closed end, and a first length. The catamenial device has a tapered insertion end, a longitudinal axis, and a length less than the first length, such that the open end of the overwrapper material extends beyond the insertion end of the inserted catamenial device. Concave clamping jaws are applied to the open end of the overwrapper material to urge it toward the longitudinal axis of the catamenial device; to conform portions of the overwrapper material to the insertion end of the catamenial device; and to fold overwrapper material between adjacent clamping jaws to form fins extending outwardly from the conformed portions.
摘要翻译：用于包装月经装置（例如卫生棉条）的方法包括以下步骤：提供基本上圆柱形的外包装材料，将月经装置插入外包装材料中，以及封闭外包装材料的开口端。外包装材料具有开口端，封闭端和第一长度。月经装置具有锥形插入端，纵向轴线和小于第一长度的长度，使得外包裹材料的开口端延伸超过插入的月经装置的插入端。凹面夹钳被施加到外包装材料的开口端以将其推向月经装置的纵向轴线; 将外包装材料的一部分配合到月经装置的插入端; 并且在相邻夹爪之间折叠外包装材料以形成从配合部分向外延伸的翅片。

69. 发明申请

US20090306921A1 SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS 有权
标题翻译：通过使用定向ZERNIKE POLYNOMIALS的光学系统的规格，优化和匹配
公开(公告)号：US20090306921A1
公开(公告)日：2009-12-10
申请号：US12421996
申请日：2009-04-10
申请人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
发明人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
IPC分类号： G01M11/02 , G06F19/00
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译：本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

70. 发明申请

US20090033706A1 MEASURING METHOD AND ARRANGEMENT TO DETERMINE THE PLAY OF AN INK JET CARTRIDGE PIVOT UNIT 有权
标题翻译：测量方法和装置，以确定喷墨喷头单元的播放
公开(公告)号：US20090033706A1
公开(公告)日：2009-02-05
申请号：US12182215
申请日：2008-07-30
申请人： Rainer Ehresmann , Ralf Mueller , Wolfgang Muhl , Sabine Roth
发明人： Rainer Ehresmann , Ralf Mueller , Wolfgang Muhl , Sabine Roth
IPC分类号： B41J29/393
CPC分类号： B41J2/16588 , B41J25/308
摘要： A measuring arrangement and measurement method determine the play of a cartridge pivot unit of an inkjet printing system that has at least one stop for the cartridge pivot unit. The cartridge pivot unit is driven by a first motor via a gear train and is equipped with a first movement sensor to establish a movement of the cartridge pivot unit upon leaving the stop. The cartridge pivot unit moves only when the play of the gear train is overcome. The stop for the cartridge pivot unit is formed by a mobile cleaning and sealing station. A counter is provided to count pulses, the count being representative of the play of the gear train of the cartridge pivot unit counting begins with leaving the mobile stop and continues until the movement of the cartridge pivot unit upon leaving the stop again ensues in conformity with the actuation by the first motor.
摘要翻译：测量装置和测量方法确定喷墨打印系统的盒枢轴单元的播放，其具有至少一个用于盒枢轴单元的止动件。盒枢轴单元由第一电动机经由齿轮系驱动，并且配备有第一运动传感器，以在离开止动件时建立盒枢转单元的运动。只有当克服了齿轮系的弹奏时，盒枢轴单元才移动。墨盒枢轴单元的止动件由移动清洁和密封站形成。提供计数器来计数脉冲，代表盒枢轴单元计数的齿轮系的游隙的计数开始于离开移动停止并继续直到在再次离开停止位置时盒枢轴单元的移动符合由第一马达驱动。

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