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1. 发明申请

US20080158665A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR 有权
公开(公告)号：US20080158665A1
公开(公告)日：2008-07-03
申请号：US11964527
申请日：2007-12-26
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08 , G02B5/08 , G03B27/54 , G02B17/06
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective. The optical elements include a concave mirror; a first deflecting mirror tilted relative to the optical axis by a first tilt angle t1 about a first tilt axis to deflect light from the object surface towards the concave mirror or to deflect light from the concave mirror towards the image surface; and a second deflecting mirror tilted relative to the optical axis by a second tilt angle t2 about a second tilt axis. The first deflecting mirror has a first reflective coating with reflectivity Rs1(α1) for s-polarized light and a reflectivity Rp1(α1) for p-polarized light incident on the first deflecting mirror at first angles of incidence α1 from a first range of angles of incidence according to (t1−Δα1)≦α1≦(t1+Δα1). The second deflecting mirror has a second reflective coating with a reflectivity Rs2(α2) for s-polarized light and a reflectivity Rp2(α2) for p-polarized light incident on the second deflecting mirror at second angles of incidence α2 from a second range of angles of incidence according to (t2−Δα2)≦α2≦(t2+Δα2). A first reflectivity sum, RsPE, for s-polarized light of polar edge rays accumulated upon reflection on the first and second deflecting mirrors is substantially equal to a second reflectivity sum, RpE for p-polarized light of equatorial edge rays accumulated upon reflection on the first and second deflecting mirrors.

2. 发明申请

US20110304926A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR 有权
标题翻译：投影曝光装置，投影曝光方法和镜像的目标投影目标
公开(公告)号：US20110304926A1
公开(公告)日：2011-12-15
申请号：US13217793
申请日：2011-08-25
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm
摘要翻译：投影物镜具有物体表面和图像表面。投影物镜包括沿着光轴布置的多个光学元件，并且被配置为使得在操作期间，投影物镜将布置在物体表面中的图案图像映像到图像表面上。光学元件包括凹面镜，第一偏转镜和第二偏转镜。第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1，使得在操作期间，第一偏转镜将波长λ的物体从物体表面偏转到凹面镜，或使光线偏转 λ从凹面镜朝向图像表面。第二偏转镜相对于光轴倾斜第二倾斜角t2，约为第二倾斜轴。对于包括具有45nm的线宽度和间距p的光栅的图案，投影物镜将图案图像到图像表面，使得对于图案的第一取向和图案的第二取向而言，Dgr; HV，对于100nm

3. 发明授权

US08027088B2 Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror 有权
标题翻译：反射折射投影物镜具有倾斜的偏转镜，投影曝光装置，投影曝光方法和反射镜
公开(公告)号：US08027088B2
公开(公告)日：2011-09-27
申请号：US11964527
申请日：2007-12-26
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B27/28 , G02B5/30
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective. The optical elements include a concave mirror, a first deflecting mirror tilted relative to the optical axis and a second deflecting mirror. The catadioptric projection objective can image patterns including sub-patterns oriented in various directions such that line width variations due to differences of orientation of sub-patterns are largely avoided.
摘要翻译：通常，一方面，本发明的特征在于一种反射折射投影物镜，其具有沿着光轴布置的多个光学元件，以将布置在投影物镜的物体表面中的图案成像到投影物镜的图像表面上。光学元件包括凹面镜，相对于光轴倾斜的第一偏转镜和第二偏转镜。反射折射投影物镜可以对包括在各个方向上取向的子图案的图案图案进行图像化，从而大大避免了由于子图案的取向差异引起的线宽变化。

4. 发明授权

US08411356B2 Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror 有权
标题翻译：反射折射投影物镜具有倾斜的偏转镜，投影曝光装置，投影曝光方法和反射镜
公开(公告)号：US08411356B2
公开(公告)日：2013-04-02
申请号：US13217793
申请日：2011-08-25
申请人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
发明人： Ralf Mueller , Aksel Goehnermeier , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B27/286 , G03F7/70225 , G03F7/70566
摘要： A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm
摘要翻译：投影物镜具有物体表面和图像表面。投影物镜包括沿着光轴布置的多个光学元件，并且被配置为使得在操作期间，投影物镜将布置在物体表面中的图案图像映像到图像表面上。光学元件包括凹面镜，第一偏转镜和第二偏转镜。第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1，使得在操作期间，第一偏转镜将波长λ的物体从物体表面偏转到凹面镜，或使光线偏转 λ从凹面镜朝向图像表面。第二偏转镜相对于光轴倾斜第二倾斜角t2，约为第二倾斜轴。对于包括具有45nm的线宽度和间距p的光栅的图案，投影物镜将图案图像到图像表面，使得对于图案的第一取向和图案的第二取向而言，Dgr; HV，对于100nm

5. 发明申请

US20090073398A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20090073398A1
公开(公告)日：2009-03-19
申请号：US12210514
申请日：2008-09-15
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03B27/52 , G03B27/72
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面中修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

6. 发明授权

US08982325B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08982325B2
公开(公告)日：2015-03-17
申请号：US13333350
申请日：2011-12-21
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03F7/20
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

7. 发明申请

US20120092637A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20120092637A1
公开(公告)日：2012-04-19
申请号：US13333350
申请日：2011-12-21
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

8. 发明授权

US08107054B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08107054B2
公开(公告)日：2012-01-31
申请号：US12210514
申请日：2008-09-15
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03B27/72 , G03B27/68 , G03B27/42 , G03B27/52 , G03B27/54 , G03B27/32
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

9. 发明授权

US09606339B2 Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus 有权
公开(公告)号：US09606339B2
公开(公告)日：2017-03-28
申请号：US13367116
申请日：2012-02-06
申请人： Jochen Hetzler , Ralf Mueller , Wolfgang Singer
发明人： Jochen Hetzler , Ralf Mueller , Wolfgang Singer
IPC分类号： G01B9/02 , G02B17/06 , G02B13/14 , G03F7/20
CPC分类号： G02B17/0647 , G02B13/143 , G03F7/70233 , G03F7/70958
摘要： A mirror (M) of a projection exposure apparatus for microlithography configured for structured exposure of a light-sensitive material and a method for producing a mirror (M). The mirror (M) has a substrate body (B), a first mirror surface (S) and a second mirror surface (S′). The first mirror surface (S) is formed on a first side (VS) of the substrate body (B). The second mirror surface (S′) is formed on a second side (RS) of the substrate body (B), the second side being different from the first side of the substrate body (B). The mirror (M) may be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.

10. 发明授权

US09155728B2 Methods and materials for treating orthostatic hypotension or postural tachycardia syndrome 有权
标题翻译：用于治疗体位性低血压或姿势性心动过速综合征的方法和材料
公开(公告)号：US09155728B2
公开(公告)日：2015-10-13
申请号：US12875220
申请日：2010-09-03
申请人： Wolfgang Singer
发明人： Wolfgang Singer
IPC分类号： A61K31/44
CPC分类号： A61K31/505 , A61K31/197 , A61K31/44 , A61K31/4425 , A61K2300/00
摘要： This document provides methods and materials related to treating orthostatic hypotension and/or postural tachycardia syndrome. For example, methods and materials for using a composition containing 3,4-diaminopyridine, 4-aminopyridine, or both to treat patients with orthostatic hypotension, postural tachycardia syndrome, or both orthostatic hypotension and postural tachycardia syndrome are provided.
摘要翻译：本文件提供与治疗直立性低血压和/或姿势性心动过速综合征相关的方法和材料。例如，提供了使用含有3,4-二氨基吡啶，4-氨基吡啶或两者的组合物来治疗患有直立性低血压，姿势性心动过速综合征或两者的直立性低血压和姿势性心动过速综合征的方法和材料。

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