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    • 62. 发明授权
    • Thin film transistor
    • 薄膜晶体管
    • US06512246B1
    • 2003-01-28
    • US09656631
    • 2000-09-07
    • Hiroshi Tanabe
    • Hiroshi Tanabe
    • H01L2904
    • H01L29/66757G02F1/13454H01L27/1281H01L29/78603H01L29/78675
    • In a thin film transistor provided with a metallic layer with a light-shading property and a Si layer formed on an insulating layer, a dent for locally thinning the insulating layer is formed on a portion corresponding to a drain region. When the Si layer is recrystallized by means of a laser light irradiation, the dent serves as a crystalline nucleus formation region in order to recrystallize a particular portion earlier than other portions. Recrystallization of melted Si starts from a periphery of a bottom surface of the dent, hence a Si layer formed of a single crystal or uniformed crystal grains which serves as an active region of the TFT can be obtained.
    • 在设置有具有遮光性的金属层和形成在绝缘层上的Si层的薄膜晶体管中,在对应于漏极区域的部分上形成用于局部变薄绝缘层的凹坑。 当Si层通过激光照射而重结晶时,该凹痕用作结晶核形成区域,以使得比其它部分更早地重结晶特定部分。 熔融Si的再结晶从凹部的底面的周围开始,因此可以获得由作为TFT的有源区域的单晶或均匀晶粒形成的Si层。
    • 63. 发明授权
    • System and process for fabricating an organic electroluminescent display
device
    • 用于制造有机电致发光显示装置的系统和工艺
    • US6132280A
    • 2000-10-17
    • US427763
    • 1999-10-27
    • Hiroshi TanabeHiroshi YamamotoKengo FukuyuOsamu Onitsuka
    • Hiroshi TanabeHiroshi YamamotoKengo FukuyuOsamu Onitsuka
    • H01L21/00H01L21/677H01L51/40H01L51/50H01L51/52H01L51/56H05B33/10H05B33/12H05B33/14
    • H05B33/10H01L21/67167H01L21/67184H01L21/67772H01L51/0008H01L51/5237H01L51/56
    • The invention provides an organic EL display device fabrication system comprising a loading side normal-pressure delivery chamber 11 including a first substrate delivery means 61 for delivering a substrate with no film formed thereon, and a loading chamber 21 connected thereto for introducing the substrate from loading side normal-pressure delivery chamber 11 at normal pressure into a vacuum delivery chamber 31 at a vacuum. The vacuum delivery chamber 31 is connected to loading chamber 21 and includes a second substrate delivery means 62 for delivering the substrate in a vacuum, and has one or two or more film formation chambers 32 to 35 connected thereto. The system further comprises an unloading chamber 41 connected thereto for delivering the substrate out of vacuum delivery chamber 31 at a vacuum into an unloading side normal-pressure delivery chamber 51 at normal pressure. The unloading side normal-pressure delivery chamber 51 is connected to unloading chamber 41 and includes a third substrate delivery means 63 for delivering a substrate with films formed thereon. An inert gas atmosphere having a moisture content of up to 100 ppm is maintained in both unloading chamber 41 and unloading side normal-pressure delivery chamber 51 at normal pressure. The invention also provides an organic EL display device fabrication process using this fabrication system.
    • 本发明提供了一种有机EL显示装置制造系统,其包括装载侧常压输送室11,该装载侧常压输送室11包括用于输送基板而不形成膜的第一基板输送装置61和与其连接的装载室21, 侧正压输送室11在真空下进入真空输送室31。 真空输送室31连接到加载室21,并且包括用于在真空中输送基板的第二基板输送装置62,并且具有连接到其上的一个或两个或更多个成膜室32至35。 该系统还包括与其连接的卸载室41,用于将真空输送室31在真空下输送到常压下的卸载侧常压输送室51中。 卸载侧常压输送室51连接到卸载室41,并且包括第三基板输送装置63,用于在其上形成有膜的输送基板。 在常压下,卸载室41和卸载侧常压输送室51都保持水分含量高达100ppm的惰性气体气氛。 本发明还提供了一种使用该制造系统的有机EL显示装置制造工艺。