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    • 62. 发明授权
    • Focusing lens for LED
    • 聚焦镜头用于LED
    • US07411742B1
    • 2008-08-12
    • US11690866
    • 2007-03-26
    • Jin-Ho KimShung-Hoon HwangHee-Joong Lee
    • Jin-Ho KimShung-Hoon HwangHee-Joong Lee
    • G02B13/18G02B3/00
    • F21V5/04F21Y2115/10G02B3/02G02B19/0028G02B19/0061H01L33/58H01L33/60
    • A focusing lens for an LED is provided. The focusing lens for an LED, which concentrates light emitted from the LED so as to have directionality parallel to an optic axis, comprises: a transparent body; a first lens part formed in the body; and a second lens part covering the first lens, and wherein the first lens comprises: first and second aspheric lens surfaces which are convex in different sizes and are formed on planes being symmetric to each other; and wherein the second lens comprise: a plane of incidence formed to protrude from an outer circumference of the second aspheric lens surfaces, the plane of incidence into which the LED is inserted and which is configured to allow the light emitted from the LED to be incident and refracted; a plane of reflection formed to have a convex curved surface which extend and slopes to be progressive wider from the plane of incidence towards the second aspheric lens surface, the plane of reflection which is configured to allow the light emitted from the LED to be totally reflected; and a plane of emission formed to have a concave curved surface which extends and slopes from the plane of reflection towards the second aspheric lens surface, the plane of emission which is configured to allow the light emitted from the LED to be refracted and emitted as light being parallel to the optic axis. The focusing lens minimizes a loss of the light emitted from the LED and maximally reduces an angle of the emitted light, to effectively illuminate a local region at a long distance.
    • 提供了一种用于LED的聚焦透镜。 用于LED的聚焦透镜,其聚集从LED发射的光以具有平行于光轴的方向性,包括:透明体; 形成在体内的第一透镜部分; 以及覆盖所述第一透镜的第二透镜部,并且其中所述第一透镜包括:第一和第二非球面透镜表面,其以不同的大小凸出并形成在彼此对称的平面上; 并且其中所述第二透镜包括:入射平面,其形成为从所述第二非球面透镜表面的外周突出,所述入射平面被入射到所述LED中,并且被配置为允许从所述LED发射的光入射 并折射; 反射平面被形成为具有从入射平面朝向第二非球面透镜表面延伸和倾斜的渐进的较宽的凸曲面,被配置为允许从LED发射的光被完全反射的反射平面 ; 以及形成为具有从反射平面向第二非球面透镜表面延伸并倾斜的凹曲面的发射平面,被配置为允许从LED发射的光被折射并作为光发射的发射平面 平行于光轴。 聚焦透镜最大限度地减少从LED发射的光的损失,并最大限度地减少发射的光的角度,以有效地照亮远距离的局部区域。
    • 64. 发明授权
    • Semiconductor device having LDD-type source/drain regions and fabrication method thereof
    • 具有LDD型源极/漏极区域的半导体器件及其制造方法
    • US07388264B2
    • 2008-06-17
    • US10948883
    • 2004-09-24
    • Do-Hyung KimJin-Ho KimByung-Jun Hwang
    • Do-Hyung KimJin-Ho KimByung-Jun Hwang
    • H01L29/06
    • H01L29/6653H01L21/76801H01L21/76832H01L21/76837H01L21/76895H01L21/823425H01L29/6659
    • A semiconductor device having LDD-type source/drain regions and a method of fabricating the same are provided. The semiconductor device includes at least a pair of gate patterns disposed on a semiconductor substrate and LDD-type source/drain regions disposed at both sides of the gate patterns. The substrate having the gate patterns and the LDD-type source/drain regions is covered with a conformal etch stop layer. The etch stop layer is covered with an interlayer insulating layer. The LDD-type source/drain region is exposed by a contact hole that penetrates the interlayer insulating layer and the etch stop layer. The method of forming the LDD-type source/drain regions and the etch stop layer includes forming low-concentration source/drain regions at both sides of the gate patterns and forming the conformal etch stop layer on the substrate having the low-concentration source/drain regions. Gate spacers are then formed on the sidewalls of the gate patterns. Using the gate patterns and the gate spacers as implantation masks, impurity ions are implanted into the semiconductor substrate to form high-concentration source/drain regions. The spacers are then selectively removed. An interlayer insulating layer is formed on the substrate where the spacers are removed.
    • 提供具有LDD型源极/漏极区域的半导体器件及其制造方法。 半导体器件包括设置在半导体衬底上的至少一对栅极图案和设置在栅极图案两侧的LDD型源极/漏极区域。 具有栅极图案和LDD型源极/漏极区域的衬底被保形蚀刻停止层覆盖。 蚀刻停止层被层间绝缘层覆盖。 LDD型源极/漏极区域通过穿透层间绝缘层和蚀刻停止层的接触孔露出。 形成LDD型源极/漏极区域和蚀刻停止层的方法包括在栅极图案的两侧形成低浓度源极/漏极区域,并在具有低浓度源/漏极区域的衬底上形成保形蚀刻停止层, 漏区。 然后在栅极图案的侧壁上形成栅极间隔物。 使用栅极图案和栅极间隔物作为注入掩模,将杂质离子注入到半导体衬底中以形成高浓度源极/漏极区域。 然后选择性地去除间隔物。 在基板上形成层间绝缘层,其中隔离物被去除。
    • 65. 发明申请
    • Liquid Crystal Display Device and Method for Fabricating the Same
    • 液晶显示装置及其制造方法
    • US20080001883A1
    • 2008-01-03
    • US11618664
    • 2006-12-29
    • Jin-Ho KimByoung-Ho LimBo-Ram Kim
    • Jin-Ho KimByoung-Ho LimBo-Ram Kim
    • G09G3/36
    • G02F1/134363G02F2001/134318G02F2001/13629
    • A liquid crystal display (LCD) device includes an array substrate; a gate line formed on the array substrate; a data line formed on the array substrate crossing the gate lines; a thin film transistor formed on the array substrate, the thin film transistor being formed at an intersection between the gate line and the data line; a pixel electrode formed on the array substrate and connected to the thin film transistor; an insulating interlayer formed on an entire surface of the array substrate; a common electrode formed on the insulating interlayer and having a plurality of slits; a metal line formed on the insulating interlayer overlapping the data line and the common electrode; a color filter substrate attached to the array substrate; and a liquid crystal layer formed between the array substrate and the color filter substrate.
    • 液晶显示器(LCD)装置包括阵列基板; 形成在阵列基板上的栅极线; 形成在与栅极线交叉的阵列基板上的数据线; 形成在所述阵列基板上的薄膜晶体管,所述薄膜晶体管形成在所述栅极线与所述数据线之间的交点处; 形成在阵列基板上并连接到薄膜晶体管的像素电极; 形成在所述阵列基板的整个表面上的绝缘夹层; 形成在所述绝缘中间层上并具有多个狭缝的公共电极; 形成在绝缘层上的与数据线和公共电极重叠的金属线; 附着到阵列基板的滤色器基板; 以及形成在阵列基板和滤色器基板之间的液晶层。