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61. 发明授权

US07138067B2 Methods and apparatus for tuning a set of plasma processing steps 有权
标题翻译：调整一组等离子体处理步骤的方法和装置
公开(公告)号：US07138067B2
公开(公告)日：2006-11-21
申请号：US10951552
申请日：2004-09-27
申请人： Vahid Vahedi , John Daugherty , Harmeet Singh , Anthony Chen
发明人： Vahid Vahedi , John Daugherty , Harmeet Singh , Anthony Chen
IPC分类号： B44C1/22 , H01L21/00
CPC分类号： C03C15/00 , C03C23/006 , H01J37/32623 , H01J37/32642 , H01L21/32136
摘要： In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.
摘要翻译：在等离子体处理系统中，公开了一组等离子体处理步骤的调谐方法。该方法包括在等离子体处理系统的等离子体反应器中击打包含中性粒子和离子的第一等离子体。该方法还包括在第一蚀刻步骤中蚀刻在衬底上的一组层; 将可移动均匀环定位在基底周围，其中均匀环的底表面与基底的顶表面大致相同的高度; 并且在等离子体处理系统的等离子体反应器中击打基本上由中性体组成的第二等离子体。该方法还包括在第二蚀刻步骤中蚀刻衬底上的这组层; 并且其中第一步骤中的蚀刻和第二步骤中的蚀刻基本上是均匀的。

62. 发明申请

US20060065628A1 Methods and apparatus for tuning a set of plasma processing steps 有权
公开(公告)号：US20060065628A1
公开(公告)日：2006-03-30
申请号：US10951552
申请日：2004-09-27
申请人： Vahid Vahedi , John Daugherty , Harmeet Singh , Anthony Chen
发明人： Vahid Vahedi , John Daugherty , Harmeet Singh , Anthony Chen
IPC分类号： C23F1/00 , B44C1/22
CPC分类号： C03C15/00 , C03C23/006 , H01J37/32623 , H01J37/32642 , H01L21/32136
摘要： In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.

63. 发明授权

US06931034B2 Feedback mechanisms for stabilizing a laser system 有权
标题翻译：用于稳定激光系统的反馈机制
公开(公告)号：US06931034B2
公开(公告)日：2005-08-16
申请号：US10642016
申请日：2003-08-15
申请人： Hamid R. Khazaei , Harmeet Singh , Emily M. Squires , David Kirk Lewis
发明人： Hamid R. Khazaei , Harmeet Singh , Emily M. Squires , David Kirk Lewis
IPC分类号： G02B6/34 , H01S20060101 , H01S3/067 , H01S3/08 , H01S3/10 , H01S3/13 , H01S3/137 , H01S3/23 , H01S3/30
CPC分类号： H01S3/067 , H01S3/08027 , H01S3/08086 , H01S3/10053 , H01S3/137 , H01S3/2383
摘要： An optical system has a transmission filter device, a feedback mechanism, and one or more radiation sources. Each radiation source generates an output signal with a predetermined wavelength band and polarization and is coupled to a separate input port of the transmission filter device. The transmission filter device, which is responsive to output signal from each radiation source, generates an output signal from at least one output port thereof. The feedback mechanism is coupled to at least one output port of the transmission filter device for providing a feedback signal that is directed back through the transmission filter device to each of the radiation sources for stabilizing each of the radiation sources. The apparatus is polarization maintaining wherein the one or more radiation sources, the transmission filter device, and the feedback mechanism are interconnected such that principle axes of polarization thereof are substantially aligned.
摘要翻译：光学系统具有透射滤光器装置，反馈机构和一个或多个辐射源。每个辐射源产生具有预定波长带和偏振的输出信号，并且耦合到传输滤波器装置的单独的输入端口。响应于来自每个辐射源的输出信号的传输滤波器装置从其至少一个输出端口产生输出信号。反馈机构耦合到传输滤波器装置的至少一个输出端口，用于提供反馈信号，反馈信号通过传输滤波器装置被引导回每个辐射源，用于稳定每个辐射源。该装置是偏振保持，其中一个或多个辐射源，透射滤光器装置和反馈机构相互连接，使得其主要极化轴基本上对准。

64. 发明授权

US06892008B2 Planar star couplers with reduced insertion loss 有权
标题翻译：具有减少插入损耗的平面星形耦合器
公开(公告)号：US06892008B2
公开(公告)日：2005-05-10
申请号：US10367208
申请日：2003-02-14
申请人： Harmeet Singh , Hamid R. Khazaei
发明人： Harmeet Singh , Hamid R. Khazaei
IPC分类号： G02B6/12 , G02B6/28 , G02B6/30
CPC分类号： G02B6/2808 , G02B2006/121
摘要： In a star coupler, a Free Propagation Region (FPR) is bounded by a first interface and a second opposing interface, and guides an input signal launched from the first interface in a predetermined first plane while allowing the input signal to travel unguided in a predetermined second plane in the FPR which is orthogonal to the first plane. A plurality of output waveguides are formed in an array and terminate at the second interface of the FPR. The axis of each output waveguide at the second interface is separated from an axis of an adjacent output waveguide by a predetermined distance “t”. An input waveguide is split into a plurality of subsections which each terminate at the first interface of the FPR. The subsections of the input waveguide are arranged for simultaneously launching parts of the input signal into the FPR which diffracts and produces mode patterns at the second interface having a maximum intensity at inputs of each of the output waveguides, and a low intensity elsewhere.
摘要翻译：在星形耦合器中，自由传播区域（FPR）由第一接口和第二相对接口限制，并且在预定的第一平面中引导从第一接口发射的输入信号，同时允许输入信号以预定的方式行进 FPR中的第二平面与第一平面正交。阵列中形成多个输出波导，并终止于FPR的第二接口。第二界面处的每个输出波导的轴线与相邻输出波导的轴线分开预定的距离“t”。输入波导被分成多个子部分，每个子部分终止于FPR的第一界面处。输入波导的子部分被布置成同时将输入信号的部分发射到FPR中，FPR在第二接口处衍射和产生具有在每个输出波导的输入处的最大强度的模式图案，并且在其它地方产生低强度。

65. 发明授权

US06776851B1 In-situ cleaning of a polymer coated plasma processing chamber 有权
标题翻译：聚合物涂层等离子体处理室的原位清洗
公开(公告)号：US06776851B1
公开(公告)日：2004-08-17
申请号：US10186917
申请日：2002-06-28
申请人： Harmeet Singh , John E. Daugherty , Vahid Vahedi , Saurabh J. Ullal
发明人： Harmeet Singh , John E. Daugherty , Vahid Vahedi , Saurabh J. Ullal
IPC分类号： B08B300
CPC分类号： H01J37/32862 , C23C16/4404 , C23C16/4405 , H01J37/321 , Y10S134/902 , Y10S438/905
摘要： A method for removing chamber deposits in between process operations in a semiconductor process chamber is provided. The method initiates with depositing a fluorine containing polymer layer over an inner surface of a semiconductor process chamber where the semiconductor chamber is empty. Then, a wafer is introduced into the semiconductor process chamber after depositing the fluorine containing polymer layer. Next, a process operation is performed on the wafer. The process operation deposits a residue on the fluorine containing polymer layer covering the inner surface of the semiconductor process chamber. Then, the wafer is removed from the semiconductor process chamber. Next, an oxygen based cleaning operation is performed. The oxygen based cleaning operation liberates fluorine from the fluorine containing polymer layer to remove a silicon based residue. An apparatus configured to remove chamber deposits between process operations is also provided.
摘要翻译：提供了一种用于在半导体处理室中的处理操作之间去除室沉积物的方法。该方法通过在半导体处理室的内表面上沉积含氟聚合物层而开始，其中半导体室是空的。然后，在沉积含氟聚合物层之后将晶片引入半导体处理室。接下来，对晶片进行处理操作。处理操作在覆盖半导体处理室的内表面的含氟聚合物层上沉积残留物。然后，将晶片从半导体处理室中取出。接下来，进行氧气清洗操作。基于氧的清洗操作从含氟聚合物层中释放氟以除去硅基残渣。还提供了一种被配置为在处理操作之间去除室沉积物的装置。

66. 发明授权

US06272886B1 Incremental method of producing multiple UV-induced gratings on a single optical fiber 失效
标题翻译：在单根光纤上产生多个UV感应光栅的增量方法
公开(公告)号：US06272886B1
公开(公告)日：2001-08-14
申请号：US08735468
申请日：1996-10-23
申请人： James C. Novack , Bryon J. Cronk , Bruce A. Rabine , Gary A. Ball , Harmeet Singh , Paul E. Sanders
发明人： James C. Novack , Bryon J. Cronk , Bruce A. Rabine , Gary A. Ball , Harmeet Singh , Paul E. Sanders
IPC分类号： C03B3710
CPC分类号： G02B6/245 , G02B6/02123
摘要： The present invention is a process for manufacturing an optical fiber Bragg grating, which in a preferred embodiment includes the steps of: (a) removing at least a portion of a removable coating on an optical fiber element in at least one predetermined section to sufficiently expose the optical fiber in the section for a subsequent treatment by a source of optical radiation; (b) fixing the at least one section with respect to the source of optical radiation; (c) directing optical radiation from the source into the optical fiber to produce at least one Bragg grating in the at least one section; and (d) covering the at least one section. The present invention also extends to an apparatus for carrying out the process steps described above, which includes means for coating removal, means for fiber immobilization, means for writing a Bragg grating, and means for packaging.
摘要翻译：本发明是一种用于制造光纤布拉格光栅的方法，其在优选的实施方案中包括以下步骤：（a）在至少一个预定部分中去除光纤元件上至少一部分可移除涂层，以充分曝光该光纤在该部分用于随后由光辐射源处理; （b）相对于光辐射源固定该至少一个部分; （c）将来自所述源的光辐射引导到所述光纤中以在所述至少一个部分中产生至少一个布拉格光栅; 和（d）覆盖至少一个部分。本发明还延伸到用于执行上述工艺步骤的装置，其包括用于涂层去除的装置，用于固定纤维的装置，用于写入布拉格光栅的装置和用于包装的装置。

67. 发明授权

US6005999A Waveguide narrowband rejection filter 失效
标题翻译：波导窄带滤波器
公开(公告)号：US6005999A
公开(公告)日：1999-12-21
申请号：US975843
申请日：1997-11-21
申请人： Harmeet Singh , Charles W. Haggans , Wayne F. Varner
发明人： Harmeet Singh , Charles W. Haggans , Wayne F. Varner
IPC分类号： G02B6/02 , G02B6/036 , G02B6/34 , G02B6/22
CPC分类号： G02B6/03644 , G02B6/02119 , G02B6/03633
摘要： An optical fiber filter including a length of single mode fiber having an operating wavelength .lambda..sub.0. Fiber designs may include a depressed inner clad fiber, a photosensitive matched inner clad fiber or a photosensitive depressed inner clad fiber. The length of fiber includes a core, an inner cladding, an outer cladding and an azimuthally asymmetric grating. The core allows the existence of a LP.sub.01 core mode having an effective index of n.sub.eff,01 and the cladding allows the existence of a LP.sub.1m cladding mode, m.gtoreq.1. The core has an index of refraction n.sub.co and a radius A. The inner cladding has an index of refraction n.sub.ic, an inner radius A, an outer radius AB, a thickness W, where W=AB-A, and a refraction difference .DELTA.n-, where .DELTA.n- is the difference between n.sub.ic and n.sub.oc and n.sub.co >n.sub.oc >n.sub.ic. The inner cladding may be photosensitive to a radius R.sub.grat and have a fractional photosensitivity .gamma.. The outer cladding generally laterally surrounds the inner cladding and has an inner radius AB, an outer radius B, and an index of refraction n.sub.oc, where .DELTA.n.sub.+ is the difference between n.sub.co and n.sub.oc. The grating has an effective tilt angle .theta. and a period (.LAMBDA.), where .LAMBDA..ltoreq.(.lambda..sub.0 cos .theta.)/(2n.sub.eff,01), the maximum relative coupling coefficient for the cladding mode max(RCC.sub.1m) being greater or equal to 0.2 and the ratio of peak reflectivities for the cladding mode and the core mode RR being greater or equal to 1.
摘要翻译：包括具有工作波长λ0的单模光纤的长度的光纤滤波器。光纤设计可以包括凹陷内包层光纤，光敏匹配的内包层光纤或光敏凹陷的内包层光纤。纤维的长度包括芯，内包层，外包层和方位不对称光栅。核心允许存在具有有效指数为neff，01的LP01核心模式，并且包层允许存在LP1m包层模式，m> / = 1。芯具有折射率nco和半径A.内包层具有折射率nic，内半径A，外半径AB，厚度W，其中W = AB-A，折射差DELTA n - 其中，DELTA n-是nic和noc之间的差异，nco> noc> nic。内包层可以对半径Rgrat感光，并具有分数光敏度γ。外包层通常侧向包围内包层，并且具有内半径AB，外半径B和折射率noc，其中，ΔTAn +是nco和noc之间的差。光栅具有有效倾斜角θ和周期（LAMBDA），其中LAMBDA

68. 发明授权

US09368329B2 Methods and apparatus for synchronizing RF pulses in a plasma processing system 有权
标题翻译：用于在等离子体处理系统中同步RF脉冲的方法和装置
公开(公告)号：US09368329B2
公开(公告)日：2016-06-14
申请号：US13550719
申请日：2012-07-17
申请人： John C. Valcore, Jr. , Bradford J. Lyndaker , Harmeet Singh
发明人： John C. Valcore, Jr. , Bradford J. Lyndaker , Harmeet Singh
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J37/32146 , H01J37/32174
摘要： A synchronized pulsing arrangement for providing at least two synchronized pulsing RF signals to a plasma processing chamber of a plasma processing system is provided. The arrangement includes a first RF generator for providing a first RF signal. The first RF signal is provided to the plasma processing chamber to energize a plasma therein, the first RF signal representing a pulsing RF signal. The arrangement also includes a second RF generator for providing a second RF signal to the plasma processing chamber. The second RF generator has a sensor subsystem for detecting values of at least one parameter associated with the plasma processing chamber that reflects whether the first RF signal is pulsed high or pulsed low and a pulse controlling subsystem for pulsing the second RF signal responsive to the detecting the values of at least one parameter.
摘要翻译：提供了一种用于向等离子体处理系统的等离子体处理室提供至少两个同步脉冲RF信号的同步脉冲装置。该装置包括用于提供第一RF信号的第一RF发生器。第一RF信号被提供给等离子体处理室以激励其中的等离子体，第一RF信号表示脉冲RF信号。该装置还包括用于向等离子体处理室提供第二RF信号的第二RF发生器。第二RF发生器具有用于检测与等离子体处理室相关联的至少一个参数的值的传感器子系统，其反映第一RF信号是高电平脉冲还是脉冲低脉冲，以及响应于检测脉冲控制第二RF信号的脉冲控制子系统至少有一个参数的值。

69. 发明授权

US09177756B2 E-beam enhanced decoupled source for semiconductor processing 有权
标题翻译：用于半导体处理的电子束增强去耦源
公开(公告)号：US09177756B2
公开(公告)日：2015-11-03
申请号：US13357003
申请日：2012-01-24
申请人： John Patrick Holland , Peter L. G. Ventzek , Harmeet Singh , Jun Shinagawa , Akira Koshiishi
发明人： John Patrick Holland , Peter L. G. Ventzek , Harmeet Singh , Jun Shinagawa , Akira Koshiishi
IPC分类号： H01L21/3065 , C23F1/00 , H01J37/04 , H01J37/32
CPC分类号： H01J37/04 , H01J37/32018 , H01J37/32357 , H01J37/32596
摘要： A semiconductor substrate processing system includes a processing chamber and a substrate support defined to support a substrate in the processing chamber. The system also includes a plasma chamber defined separate from the processing chamber. The plasma chamber is defined to generate a plasma. The system also includes a plurality of fluid transmission pathways fluidly connecting the plasma chamber to the processing chamber. The plurality of fluid transmission pathways are defined to supply reactive constituents of the plasma from the plasma chamber to the processing chamber. The system further includes an electrode disposed within the processing chamber separate from the substrate support. The system also includes a power supply electrically connected to the electrode. The power supply is defined to supply electrical power to the electrode so as to liberate electrons from the electrode into the processing chamber.
摘要翻译：半导体基板处理系统包括处理室和限定为在处理室中支撑基板的基板支撑件。该系统还包括与处理室分开限定的等离子体室。等离子体室被定义为产生等离子体。该系统还包括将等离子体室流体连接到处理室的多个流体传输路径。多个流体传输路径被限定为将等离子体的反应性组分从等离子体室提供给处理室。该系统还包括设置在与衬底支撑件分开的处理室内的电极。该系统还包括电连接到电极的电源。电源被定义为向电极提供电力，以便将电子从电极释放到处理室中。

70. 发明授权

US09154631B2 Method and apparatus for identifying a conference call from an event record 有权
标题翻译：用于从事件记录识别电话会议的方法和装置
公开(公告)号：US09154631B2
公开(公告)日：2015-10-06
申请号：US13422767
申请日：2012-03-16
申请人： Joseph Patrick Thomas Goguen , Manish Sunder Punjabi , Carsten Michael Bergmann , Harmeet Singh , Christina Evelyn Lucey , Eric Reyes
发明人： Joseph Patrick Thomas Goguen , Manish Sunder Punjabi , Carsten Michael Bergmann , Harmeet Singh , Christina Evelyn Lucey , Eric Reyes
IPC分类号： H04L12/18 , H04M3/56 , H04N7/15
CPC分类号： H04M3/565 , H04M2203/2072
摘要： A method for identifying a conference call from a communication device, wherein the communication device includes a memory for storing a calendar event record. The method includes: parsing at least some of the calendar event record, wherein the parsing includes an automatic discovery feature; determining, based on the parsing, whether the calendar event record includes conference call scheduling information in relation to a scheduled conference call session; generating, based on the parsing, one or more identifiers for at least some of the conference call scheduling information; and storing in the memory the one or more identifiers. A host communication device and a non-host participant communication device can also be configured for performing the method.
摘要翻译：一种用于从通信设备识别电话会议的方法，其中所述通信设备包括用于存储日历事件记录的存储器。所述方法包括：解析所述日历事件记录中的至少一些，其中所述解析包括自动发现特征; 基于所述解析，确定所述日历事件记录是否包括关于调度的电话会议会话的电话会议调度信息; 基于所述解析生成用于所述电话会议调度信息中的至少一些的一个或多个标识符; 以及将所述一个或多个标识符存储在所述存储器中。还可以配置主机通信设备和非主机参与者通信设备来执行该方法。

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