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61. 发明申请

US20090133180A1 Sheet Processing Apparatus and Process of Producing Sheet 审中-公开
标题翻译：片材加工设备及其生产工艺
公开(公告)号：US20090133180A1
公开(公告)日：2009-05-28
申请号：US12085146
申请日：2006-10-27
申请人： Shinnosuke Morita , Kenji Ando
发明人： Shinnosuke Morita , Kenji Ando
IPC分类号： A41D1/06 , D06C3/06 , D06C3/02
CPC分类号： D06C3/00 , B29C55/06 , B29C55/18 , D04H1/70 , D04H1/72
摘要： Disclosed is a sheet processing apparatus 1 having a pair of rolls 2 and 3 with teeth on their periphery in engagement with each other. The rolls are adapted to have a sheet 10 introduced into the nip thereof while rotating to process the sheet 10. The teeth 20 (30) of the roll 2 (3) have a pitch of 1.0 to 5.0 mm, a tooth thickness of less than a half the pitch, and a tooth height equal to or more than the pitch. The depth of engagement between the teeth 20 of the roll 2 and the teeth 30 of the roll 3 is preferably 1.0 mm up to the tooth height.
摘要翻译：公开了一种片材处理装置1，其具有一对辊2和3，在它们的周边上具有彼此啮合的齿。这些辊适于在转动时将片材10引入其辊隙中以处理片材10.辊子2（3）的齿20（30）的间距为1.0至5.0mm，齿厚小于一半的间距，齿的高度等于或大于间距。辊2的齿20与辊3的齿30之间的接合深度优选为齿顶高度为1.0mm。

62. 发明申请

US20080249493A1 Absorbent Article 审中-公开
标题翻译：吸收性物品
公开(公告)号：US20080249493A1
公开(公告)日：2008-10-09
申请号：US11663504
申请日：2005-09-21
申请人： Kenji Kobayashi , Kenji Ando , Takuo Yanashima , Masanori Endo
发明人： Kenji Kobayashi , Kenji Ando , Takuo Yanashima , Masanori Endo
IPC分类号： A61F13/496 , A61F13/51 , B23P11/00 , B26D7/27
CPC分类号： A61F13/15756 , A61F13/15804 , A61F13/496 , A61F13/4963 , A61F13/565 , A61F13/622 , Y10T29/49826 , Y10T83/0448
摘要： An absorbent article 10 having an absorbent body 17 including a liquid permeable topsheet 15, a liquid impermeable leak-preventive sheet, and a liquid retentive absorbent member 16 and an exterior material 14 including a rear portion B, a front portion A, and a crotch portion C. The absorbent article 10 has both side edge portions 18b of the rear portion B and both side edge portions 18a of the front portion A joined via respective mechanical fasteners 13 to take on the shape of pants. The male member 19 is attached to the inner side of the side edge portion 18b of the rear portion B. The female member 20 is a strip-shaped sheet attached by its outer edge portion 20a to the inner side of the side edge portion 18a of the front portion A, with the portion inward of the outer edge portion 20a left free as a flap 20b. The male member 19 engages the flap 20b of the female member 20 to join each side edge portion 18b of the rear portion B and each side edge portion 18a of the front portion A.
摘要翻译：具有吸收体17的吸收性物品10，该吸收体17包括液体可透过的顶片15，液体不可渗透的防漏片和液体保持性吸收体16以及包括后部B，前部A和裆部吸收性物品10具有后部B的两个侧边缘部分18b，并且前部A的两个侧边缘部分18a通过相应的机械紧固件13接合以呈现裤子的形状。阳构件19附接到后部B的侧边缘部分18b的内侧。阴构件20是其外边缘部分20A连接到侧边缘部分的内侧的条状片前边部分A的内侧部分18a，外边缘部分20的内侧部分作为翼片20b自由。阳构件19接合阴构件20的翼片20b，以将后部B的每个侧边缘部分18b和前部A的每个侧边缘部分18a连接。

63. 发明授权

US07342715B2 Multilayer film reflector for soft X-rays and manufacturing method thereof 失效
标题翻译：用于软X射线的多层膜反射器及其制造方法
公开(公告)号：US07342715B2
公开(公告)日：2008-03-11
申请号：US11087679
申请日：2005-03-24
申请人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kazue Takata
发明人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kazue Takata
IPC分类号： G02B5/08 , G02B5/20
CPC分类号： B82Y10/00 , G02B5/0808 , G21K1/062 , G21K2201/067
摘要： A multilayer film reflector for X-rays has alternately stacked layers formed on a substrate and comprising a layer (high refractive index layer) comprising a material having a large difference between a refractive index to soft X-ray and a refractive index in vacuum, and a layer (low refractive index layer) comprising a material having a small difference between a refractive index to soft X-ray and a refractive index in vacuum, wherein at least one intermediate layer having a crystalline structure is provided between the low refractive index layer and the high refractive index layer. Thereby, the crystallization of the low refractive index layer is promoted, the refractive index of the low refractive index layer is lowered, so that the reflectance of the multilayer film reflector is improved.
摘要翻译：用于X射线的多层膜反射器具有形成在基板上的交替堆叠层，并且包括包括在折射率与软X射线之间的差异与真空中的折射率之间的大的材料的层（高折射率层），以及包括具有与软X射线的折射率与真空中的折射率之差小的材料的层（低折射率层），其中在低折射率层和低折射率层之间设置至少一个具有晶体结构的中间层高折射率层。由此，促进了低折射率层的结晶化，低折射率层的折射率降低，从而提高了多层膜反射体的反射率。

64. 发明授权

US07229532B2 Sputtering apparatus 有权
标题翻译：溅射装置
公开(公告)号：US07229532B2
公开(公告)日：2007-06-12
申请号：US10795315
申请日：2004-03-09
申请人： Kenji Ando , Hidehiro Kanazawa
发明人： Kenji Ando , Hidehiro Kanazawa
IPC分类号： C23C14/35
CPC分类号： C23C14/225 , C23C14/3464 , C23C14/505 , H01J2237/202
摘要： A sputtering apparatus for forming a film by a physical gas-phase growth on a substrate having a irregular or flat shape is provided including three or more axes for independently varying a relative positional relationship between a substrate and a cathode in the course of film formation.
摘要翻译：提供了一种用于在具有不规则或平坦形状的基板上通过物理气相生长形成膜的溅射装置，其包括三个或更多个轴，用于在成膜过程中独立地改变基板和阴极之间的相对位置关系。

65. 发明授权

US07162009B2 X-ray multi-layer mirror and x-ray exposure apparatus 失效
标题翻译： X射线多层镜和X射线曝光装置
公开(公告)号：US07162009B2
公开(公告)日：2007-01-09
申请号：US10902149
申请日：2004-07-30
申请人： Hidehiro Kanazawa , Kenji Ando , Kyoko Imai
发明人： Hidehiro Kanazawa , Kenji Ando , Kyoko Imai
IPC分类号： G21K23/201 , G21K5/00
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70316 , G03F7/70958 , G21K1/062
摘要： An X-ray multi-layer mirror having a reflection characteristic with a wider incident angle range is realized by conducting optimization processing on an Mo/Si alternate layer having a constant thickness. Film thickness distributions of Si layers and Mo layers in the Mo/Si alternate layer are determined by optimization processing for widening the angle reflection characteristic of the Mo/Si alternate layer having the constant thickness, which is a fundamental structure.
摘要翻译：通过对具有恒定厚度的Mo / Si交替层进行优化处理，实现具有较宽入射角范围的反射特性的X射线多层反射镜。 Mo / Si交替层中的Si层和Mo层的膜厚分布由用作加宽作为基本结构的恒定厚度的Mo / Si交替层的角度反射特性的优化处理来确定。

66. 发明申请

US20060221474A1 Optical thin film and mirror using the same 失效
标题翻译：光学薄膜和镜面使用相同
公开(公告)号：US20060221474A1
公开(公告)日：2006-10-05
申请号：US10546517
申请日：2004-09-07
申请人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa
发明人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa
IPC分类号： G02B5/08
CPC分类号： G21K1/062 , B82Y10/00 , G02B5/0891 , G02B5/283 , G03F7/70891 , G03F7/70958 , G03F7/70983 , G21K2201/065
摘要： To provide an optical thin film structure capable of efficiently dissipating heat in an optical thin film which is generated upon irradiating a surface of an X-ray mirror made up of the optical thin film with an X-ray. The optical thin film having an isotope purity higher than a natural isotope abundance ratio is formed on a mirror to increase heat conductivity of the optical thin film itself and quickly dissipate heat accumulated in the thin film to the outside of an optical system. Consequently, the mirror having high reflectively can be obtained, in which a fine structure of the optical thin film is by no means broken.
摘要翻译：提供能够在用X射线照射由该光学薄膜构成的X射线镜的表面上产生的光学薄膜中有效散发热的光学薄膜结构。在反射镜上形成具有高于天然同位素丰度比的同位素纯度的光学薄膜，以提高光学薄膜本身的导热性，并将薄膜中累积的热量迅速地散发到光学系统的外部。因此，可以获得高反射率的反射镜，其中光学薄膜的精细结构绝不破裂。

67. 发明申请

US20060109545A1 Optical element with antireflection film 有权
公开(公告)号：US20060109545A1
公开(公告)日：2006-05-25
申请号：US11329135
申请日：2006-01-11
申请人： Hidehiro Kanazawa , Kenji Ando , Koji Teranishi
发明人： Hidehiro Kanazawa , Kenji Ando , Koji Teranishi
IPC分类号： F21V9/04 , G02B1/10 , G02B5/20 , G02B5/08 , F21V9/06
CPC分类号： G02B1/115
摘要： An antireflection film includes alternately deposited high-refractive-index layers and low-refractive-index layers. The refractive indexes and extinction coefficients of the layers are such that the antireflection film exhibits sufficient antireflection characteristics even if the geometrical thickness thereof is small. An optical element having the antireflection film on a substrate exhibits high transmittance and has excellent optical characteristics.

68. 发明申请

US20050213199A1 Multilayer film reflector for soft X-rays and manufacturing method thereof 失效
标题翻译：用于软X射线的多层膜反射器及其制造方法
公开(公告)号：US20050213199A1
公开(公告)日：2005-09-29
申请号：US11087679
申请日：2005-03-24
申请人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kazue Takata
发明人： Kyoko Imai , Kenji Ando , Hidehiro Kanazawa , Koji Teranishi , Takayuki Miura , Kazue Takata
IPC分类号： G02B5/08 , G02B5/20 , G21K1/06 , H01L21/027
CPC分类号： B82Y10/00 , G02B5/0808 , G21K1/062 , G21K2201/067
摘要： A multilayer film reflector for X-rays has alternately stacked layers formed on a substrate and comprising a layer (high refractive index layer) comprising a material having a large difference between a refractive index to soft X-ray and a refractive index in vacuum, and a layer (low refractive index layer) comprising a material having a small difference between a refractive index to soft X-ray and a refractive index in vacuum, wherein at least one intermediate layer having a crystalline structure is provided between the low refractive index layer and the high refractive index layer. Thereby, the crystallization of the low refractive index layer is promoted, the refractive index of the low refractive index layer is lowered, so that the reflectance of the multilayer film reflector is improved.
摘要翻译：用于X射线的多层膜反射器具有形成在基板上的交替堆叠层，并且包括包括在折射率与软X射线之间的差异与真空中的折射率之间的大的材料的层（高折射率层），以及包括具有与软X射线的折射率与真空中的折射率之差小的材料的层（低折射率层），其中在低折射率层和低折射率层之间设置至少一个具有晶体结构的中间层高折射率层。由此，促进了低折射率层的结晶化，低折射率层的折射率降低，从而提高了多层膜反射体的反射率。

69. 发明申请

US20050031071A1 X-ray multi-layer mirror and x-ray exposure apparatus 失效
标题翻译： X射线多层镜和X射线曝光装置
公开(公告)号：US20050031071A1
公开(公告)日：2005-02-10
申请号：US10902149
申请日：2004-07-30
申请人： Hidehiro Kanazawa , Kenji Ando , Kyoko Imai
发明人： Hidehiro Kanazawa , Kenji Ando , Kyoko Imai
IPC分类号： G03F7/20 , G21K1/06 , H01L21/027 , G03F9/00 , F21V9/04 , F21V9/06 , G02B5/08 , G02B5/20 , G02B5/26 , G21K5/00
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70316 , G03F7/70958 , G21K1/062
摘要： An X-ray multi-layer mirror having a reflection characteristic with a wider incident angle range is realized by conducting optimization processing on an Mo/Si alternate layer having a constant thickness. Film thickness distributions of Si layers and Mo layers in the Mo/Si alternate layer are determined by optimization processing for widening the angle reflection characteristic of the Mo/Si alternate layer having the constant thickness, which is a fundamental structure.
摘要翻译：通过对具有恒定厚度的Mo / Si交替层进行优化处理，实现具有较宽入射角范围的反射特性的X射线多层反射镜。 Mo / Si交替层中的Si层和Mo层的膜厚分布由用作加宽作为基本结构的恒定厚度的Mo / Si交替层的角度反射特性的优化处理来确定。

70. 发明授权

US06261696B1 Optical element with substrate containing fluorite as main ingredient, and method and apparatus for producing the optical element 失效
标题翻译：具有含萤石作为主要成分的基材的光学元件以及光学元件的制造方法和装置
公开(公告)号：US06261696B1
公开(公告)日：2001-07-17
申请号：US08819817
申请日：1997-03-18
申请人： Ryuji Biro , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Hidehiro Kanazawa
发明人： Ryuji Biro , Minoru Otani , Kenji Ando , Yasuyuki Suzuki , Hidehiro Kanazawa
IPC分类号： B32B900
CPC分类号： G02B1/115
摘要： A film formation method of forming at least one layered film on a substrate containing fluorite as a main ingredient by using a film formation apparatus which emits electrons or ions, which comprises the step of forming, as a first layered film counted from the side of the substrate, a film having a thickness of 30 nm or less and comprising at least one selected from the group consisting of SiO2, BeO, MgO, and MgF2.
摘要翻译：一种通过使用发射电子或离子的成膜装置，在含有萤石作为主要成分的基材上形成至少一层层状膜的成膜方法，其特征在于，包括以下步骤：形成作为从基板，厚度为30nm以下的膜，并且包括选自由SiO 2，BeO，MgO和MgF 2组成的组中的至少一种。

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