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    • 64. 发明授权
    • Methods for fabricating integrated circuit capacitor electrodes using first and second insulating layers and a buffer layer
    • 使用第一和第二绝缘层和缓冲层制造集成电路电容器电极的方法
    • US06171926B2
    • 2001-01-09
    • US09289364
    • 1999-04-09
    • Kwang-Youl ChunYoung-Woo ParkYong-Jin Kim
    • Kwang-Youl ChunYoung-Woo ParkYong-Jin Kim
    • H01L2120
    • H01L28/92H01L27/10814H01L28/60H01L28/84
    • Integrated circuit capacitor lower electrodes are fabricated by forming a plurality of spaced-apart contact pads on an integrated circuit substrate. A first insulating layer is formed on the integrated circuit substrate including on the contact pads. A plurality of spaced-apart conductive lines is formed on the first insulating layer that are laterally offset from the plurality of spaced-apart contact pads. A second insulating layer is formed on the first insulating layer including on the conductive lines. A buffer layer comprising material that is different from the second insulating layer, is formed on the second insulating layer. Openings are formed that extend through the buffer layer, through the second insulating layer and into the first insulating layer between the conductive lines to expose the contact pads. A conductive layer is formed in the openings and on the buffer layer. The conductive layer is etched between the openings to form the capacitor lower electrodes. The buffer layer preferably comprises material that has lower reflectivity than that of the second insulating layer and also preferably comprises material that has an etch rate for a predetermined etchant, that is intermediate that of the second insulating layer and the conductive layer. The first and second insulating layers preferably comprise silicon dioxide, the buffer layer preferably comprises at least one of silicon nitride and silicon oxynitride and the conductive layer preferably comprises polysilicon. During etching, a polymer preferably is formed on the capacitor lower electrode sidewalls adjacent the buffer layer. The etchant preferably is a plasma etchant including sulfur hexafluoride, chlorine and/or nitrogen gases.
    • 集成电路电容器下电极通过在集成电路基板上形成多个间隔开的接触焊盘来制造。 在包括接触焊盘的集成电路基板上形成第一绝缘层。 在第一绝缘层上形成多个间隔开的导电线,其横向偏离多个间隔开的接触焊盘。 在包括导电线的第一绝缘层上形成第二绝缘层。 包含与第二绝缘层不同的材料的缓冲层形成在第二绝缘层上。 形成开口,其延伸穿过缓冲层,穿过第二绝缘层并进入导线之间的第一绝缘层,以露出接触焊盘。 在开口和缓冲层上形成导电层。 在开口之间蚀刻导电层以形成电容器下电极。 缓冲层优选地包括具有比第二绝缘层低的反射率的材料,并且还优选地包括具有预定蚀刻剂的蚀刻速率的材料,其与第二绝缘层和导电层的蚀刻速率相等。 第一绝缘层和第二绝缘层优选地包括二氧化硅,缓冲层优选地包括氮化硅和氮氧化硅中的至少一种,并且导电层优选地包括多晶硅。 在蚀刻期间,优选在与缓冲层相邻的电容器下电极侧壁上形成聚合物。 蚀刻剂优选是等离子体蚀刻剂,包括六氟化硫,氯和/或氮气。
    • 66. 发明授权
    • Method for measuring radical species distribution in plasma and an
apparatus therefor
    • 用于测量血浆中自由基物质分布的方法及其装置
    • US5627640A
    • 1997-05-06
    • US588308
    • 1996-01-18
    • Hong-Young ChangPyung-Woo LeeYong-Jin Kim
    • Hong-Young ChangPyung-Woo LeeYong-Jin Kim
    • G01N21/73G01J3/30
    • G01N21/73
    • The present invention relates to a method for measuring radical species distribution in plasma by determining the intensity of the light emitted from the radical species and plasma parameters in plasma with the aid of optical and electrostatic probes, and an apparatus for measuring the radical species distribution. The method of the invention comprises the steps of: (i) measuring integral light intensity in a vacuum container by an optical probe inserted to the vacuum container; (ii) determining light intensity at each point of the vacuum container by differentiating the integral light intensity; (iii) measuring current and voltage applied to the electrostatic probe in the vacuum container; (iv) determining plasma parameters from the measured current and voltage; and, (v) measuring distribution of radical species from the light intensity and plasma parameters.
    • 本发明涉及通过使用光学和静电探针来测定从自由基物质发射的光的强度和等离子体中的等离子体参数以及用于测量自由基物质分布的装置来测量等离子体中的自由基物质分布的方法。 本发明的方法包括以下步骤:(i)通过插入真空容器的光学探针测量真空容器中的积分光强度; (ii)通过微分积分光强度来确定真空容器的每个点处的光强度; (iii)测量施加到真空容器中的静电探针的电流和电压; (iv)从所测量的电流和电压确定等离子体参数; 和(v)从光强度和等离子体参数测量自由基物质的分布。
    • 70. 发明申请
    • MOUNTING STRUCTURE OF THREE-CYLINDER ENGINE
    • 三缸发动机安装结构
    • US20130161111A1
    • 2013-06-27
    • US13614392
    • 2012-09-13
    • Yong-Joo KimMin-Sup LeeYong-Jin Kim
    • Yong-Joo KimMin-Sup LeeYong-Jin Kim
    • B60K5/12B60K17/00
    • B60K5/04B60K5/1216
    • A mounting structure of a three-cylinder engine is mounted in a car body transversely but is installed on engine and transmission mounts built on opposing sides in the width direction of the vehicle so that its weight can be supported, wherein a roll mount controls roll moment. The center of mass of the engine and the transmission is the center of rotation where a longitudinal pitch axis, a lateral roll axis and a vertical yaw axis all cross each other, but the roll mount is combined with the engine or the transmission so that the combination point lies on the yaw axis. The mounting structure can improve the NVH performance by suppressing the pitch moment and inducing the yaw moment and by more efficiently insulating the vibration caused by the yaw moment while maintaining the common platform.
    • 三缸发动机的安装结构横向地安装在车身中,但安装在内置在车辆宽度方向的相对侧上的发动机和变速器架上,使其重量可以被支撑,其中辊安装件控制辊矩 。 发动机和变速器的质量中心是旋转中心,其中纵向俯仰轴线,横向侧倾轴线和垂直偏转轴线都彼此交叉,但是辊架与发动机或变速器组合,使得 组合点位于偏航轴上。 安装结构可以通过抑制俯仰力矩并引起横摆力矩并且通过更有效地隔离由偏转力矩引起的振动同时保持公共平台来提高NVH性能。