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61. 发明申请

US20050099847A1 Nonvolatile semiconductor memory, fabrication method for the same, semiconductor integrated circuits and systems 有权
公开(公告)号：US20050099847A1
公开(公告)日：2005-05-12
申请号：US11008531
申请日：2004-12-10
申请人： Masayuki Ichige , Koji Hashimoto , Tatsuaki Kuji , Seiichi Mori , Riichiro Shirota , Yuji Takeuchi , Koji Sakui
发明人： Masayuki Ichige , Koji Hashimoto , Tatsuaki Kuji , Seiichi Mori , Riichiro Shirota , Yuji Takeuchi , Koji Sakui
IPC分类号： G11C16/00 , G06K17/00 , G06K19/077 , G11C11/34 , G11C14/00 , G11C16/02 , G11C16/04 , G11C16/06 , H01L21/82 , H01L21/8247 , H01L27/10 , H01L27/115 , H01L29/788 , H01L29/792
CPC分类号： H01L27/11521 , G11C16/0483 , H01L27/0207 , H01L27/115 , H01L27/11519 , H01L27/11524
摘要： A nonvolatile semiconductor memory which is configured to include a plurality of word lines disposed in a row direction; a plurality of bit lines disposed in a column direction perpendicular to the word lines; memory cell transistors having a charge storage layer, provided in the column direction and an electronic storage condition of the memory cell transistor configured to be controlled by one of the plurality of the word lines connected to the memory cell; a plurality of first select transistors, each including a gate electrode, selecting the memory cell transistors provided in the column direction, arranged in the column direction and adjacent to the memory cell transistors at a first end of the memory cell transistors; and a first select gate line connected to each of the gate electrodes of the first select transistors.

62. 发明申请

US20050095637A1 Nucleic acid detection sensor 失效
标题翻译：核酸检测传感器
公开(公告)号：US20050095637A1
公开(公告)日：2005-05-05
申请号：US10991427
申请日：2004-11-19
申请人： Koji Hashimoto , Hirohisa Miyamoto , Kazuhiro Itsumi , Kouhei Suzuki
发明人： Koji Hashimoto , Hirohisa Miyamoto , Kazuhiro Itsumi , Kouhei Suzuki
IPC分类号： C40B40/06 , G01N27/403 , C12Q1/68 , C12M1/34
CPC分类号： C12Q1/6825 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/0063 , B01J2219/00637 , B01J2219/00653 , B01J2219/00722 , C40B40/06 , G01N27/3276 , C12Q2565/607
摘要： A nucleic acid detection sensor comprises a plurality of nucleic acid chain fixed electrodes to which a probe nucleic acid chain is fixed, and a counter electrode which is arranged opposite to the nucleic acid chain fixed electrode, and a current flowing between the counter electrode and the nucleic acid chain fixed electrode.
摘要翻译：核酸检测传感器包括固定探针核酸链的多个核酸链固定电极和与核酸链固定电极相对配置的对电极和在对电极和对置电极之间流动的电流核酸链固定电极。

63. 发明申请

US20050003305A1 Photo mask, exposure method using the same, and method of generating data 失效
标题翻译：照片掩模，使用其的曝光方法以及生成数据的方法
公开(公告)号：US20050003305A1
公开(公告)日：2005-01-06
申请号：US10832995
申请日：2004-04-28
申请人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
发明人： Koji Hashimoto , Tadahito Fujisawa , Yuko Kono , Takashi Obara
IPC分类号： G03C5/00 , G03F1/32 , G03F1/36 , G03F1/76 , G03F7/20 , G06F17/50 , H01L21/027
CPC分类号： G03F1/36 , G03F1/30 , G03F1/32
摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
摘要翻译：一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。

64. 发明授权

US06779167B2 Automated wiring pattern layout method 失效
标题翻译：自动布线图布局方法
公开(公告)号：US06779167B2
公开(公告)日：2004-08-17
申请号：US10133953
申请日：2002-04-26
申请人： Mutsunori Igarashi , Masaaki Yamada , Koji Hashimoto , Makoto Takashima , Atsuhiko Ikeuchi
发明人： Mutsunori Igarashi , Masaaki Yamada , Koji Hashimoto , Makoto Takashima , Atsuhiko Ikeuchi
IPC分类号： G06F1750
CPC分类号： G06F17/5077 , H01L23/5226 , H01L23/528 , H01L2924/0002 , H01L2924/0001 , H01L2924/00
摘要： An automated wiring pattern layout method is provided. With this method, a first wiring pattern is generated with width W and extending in a first direction, and a second wiring pattern is generated with width W and extending in a direction perpendicular to the first wiring pattern in a manner such that the end thereof ends at the end portion of the first wiring pattern. Moreover, an overlapping region is generated by bending an end of either one of the first or the second wiring pattern at a right angle to produce an L-shaped extension and overlaying the first and the second wiring pattern, and a rectangular-shaped VIA pattern is generated at the overlapping region.
摘要翻译：提供了一种自动布线图案布局方法。利用该方法，产生具有宽度W并沿第一方向延伸的第一布线图案，并且以宽度W产生第二布线图案并且沿垂直于第一布线图案的方向延伸，使得其端部结束在第一布线图案的端部。此外，通过将第一或第二布线图案中的任一个的端部以直角弯曲而产生重叠区域以产生L形延伸部并且覆盖第一和第二布线图案，并且形成矩形VIA图案在重叠区域产生。

65. 发明授权

US06487493B2 Navigation device having a platform-dependent part and a user-interface-dependent part for supplying navigation services 有权
标题翻译：具有平台相关部分和用于提供导航服务的与用户界面相关的部分的导航装置
公开(公告)号：US06487493B2
公开(公告)日：2002-11-26
申请号：US09725212
申请日：2000-11-29
申请人： Akio Uekawa , Yoshihiko Utsui , Akira Sugimoto , Koji Hashimoto , Toshiki Kusama , Hiroaki Ideno
发明人： Akio Uekawa , Yoshihiko Utsui , Akira Sugimoto , Koji Hashimoto , Toshiki Kusama , Hiroaki Ideno
IPC分类号： G01C2126
CPC分类号： G01C21/26
摘要： A navigation device includes a platform having hardware including at least a user operation unit and a map database, and basic functions to control the hardware. The navigation device also includes an application processing unit for providing navigation services using the basic functions of the platform, and a platform-dependent unit for, when transferring information from the platform to the application processing unit, transferring the information in a constant format, and for, when transferring information from the application processing unit to the platform, transferring it in a certain format which depends on the platform. The map database holds map data in a predetermined recording format. The navigation device can further include a map-database-dependent unit for receiving map data, which is read from the map database by the platform-dependent unit, and for supplying the received map data to the application processing unit in the constant format. The navigation device can also include a user-interface-dependent unit for receiving data corresponding to a user's operation, which is read from the user operation unit by the platform-dependent unit, and for supplying the received data to the application processing unit in the constant format.
摘要翻译：导航装置包括具有至少包括用户操作单元和地图数据库的硬件的平台以及用于控制硬件的基本功能。导航装置还包括使用平台的基本功能提供导航服务的应用处理单元，以及平台相关单元，用于当从平台向应用处理单元传送信息时，以恒定格式传送信息，以及因为当将信息从应用处理单元传送到平台时，以一定的格式将其传送到依赖于该平台的位置。地图数据库以预定的记录格式保存地图数据。导航装置还可以包括用于接收地图数据的地图数据库相关单元，该地图数据是由依赖于平台的单元从地图数据库读取的，并且以接收的地图数据以恒定格式提供给应用处理单元。导航装置还可以包括：用户接口依赖单元，用于接收与用户操作相对应的数据，该用户操作由平台相关单元从用户操作单元读取，并且用于将接收到的数据提供给应用处理单元常数格式。

66. 发明授权

US06351560B1 Apparatus, method, and program for locating an objective on a form and a recording medium for recording the program for locating the objective on the form 失效
标题翻译：用于在表格上定位物镜的装置，方法和程序，以及用于记录用于在物体上定位物镜的程序的记录介质
公开(公告)号：US06351560B1
公开(公告)日：2002-02-26
申请号：US09006200
申请日：1998-01-13
申请人： Koji Hashimoto
发明人： Koji Hashimoto
IPC分类号： G06K900
CPC分类号： G06K9/2054 , G06K2209/01
摘要： An apparatus, a method, and a program locate an objective on a form without a black background function or specific marks irrespective of whether or not there are ruled lines on the form. The apparatus, method, and program select a predetermined number of small reference areas in an image of a learning sheet, store data about the small reference areas in a memory, retrieve equivalent small areas corresponding to the small reference areas from an image of an input sheet, and locate a position in the image of the input sheet corresponding to a given position on the learning sheet, according to relationships between the small reference areas and the equivalent small areas. The program is stored in a recording medium that is readable by computer.
摘要翻译：设备，方法和程序在没有黑色背景功能或特定标记的表单上定位目标，而不管在表格上是否有划线。设备，方法和程序选择预定数量的小参考在学习纸张的图像中的区域中，存储关于存储器中的小参考区域的数据，从输入纸张的图像中检索与小参考区域相对应的等同的小区域，并且将对应于输入纸张的图像中的位置根据小参考区域和等效小区域之间的关系，在学习页面上给定位置。该程序存储在计算机可读的记录介质中。

67. 发明授权

US06284174B1 Melt spinning pack and synthetic fiber manufacturing method 失效
标题翻译：熔纺丝包和合成纤维制造方法
公开(公告)号：US06284174B1
公开(公告)日：2001-09-04
申请号：US09424954
申请日：1999-12-06
申请人： Kunihiko Ueda , Toshio Nishitani , Hiroki Furuta , Teruaki Saijo , Kanji Saito , Hiroshi Kato , Hiroshi Ohtani , Shinji Shimizu , Koji Hashimoto
发明人： Kunihiko Ueda , Toshio Nishitani , Hiroki Furuta , Teruaki Saijo , Kanji Saito , Hiroshi Kato , Hiroshi Ohtani , Shinji Shimizu , Koji Hashimoto
IPC分类号： D01D110
CPC分类号： D01D4/00 , D01D4/02 , D01D4/06
摘要： A melt spinning pack, including a pack case, a spinneret having many spinning holes positioned at the bottom of the case, a pack cap having a polymer introducing hole at the center positioned at the top of the case, and a flow arranging plate having many flow arranging holes with restricted portions reduced in cross sectional area compared to the inlets of the holes positioned between the spinneret and the pack cap, satisfying the requirement that the contraction percentage R be 50% or less, respectively contained in the case.
摘要翻译：一种熔融纺丝组件，包括一个包装盒，一个具有位于壳体底部的许多纺丝孔的喷丝头，一个在壳体顶部位于中心位置处具有聚合物引入孔的包装盖，以及具有许多与位于喷丝头和包装盖之间的孔的入口相比，具有限制部分的横截面积减小的流动分配孔满足分别包含在壳体中的收缩百分比R为50％或更小的要求。

68. 发明授权

US06247241B1 Ball diameter automatic measurement device and method 有权
标题翻译：球直径自动测量装置及方法
公开(公告)号：US06247241B1
公开(公告)日：2001-06-19
申请号：US09244102
申请日：1999-02-04
申请人： Koji Hashimoto
发明人： Koji Hashimoto
IPC分类号： G01B300
CPC分类号： A63B47/008 , F16C33/32 , G01B5/08 , G01B7/286 , G01D3/028
摘要： The ball diameter automatic measurement device according to the present invention preferably comprises a displacement sensor, a dividing plate, a slider and a measurement controller. The displacement sensor measures the diameter of a ball positioned in a measurement position. The dividing plate holds a ball to be measured and reciprocates the same between a predetermined position and the measurement position. The slider rotates the ball in the predetermined position by a predetermined angle when the dividing plate is moved. The measurement controller stores and outputs measured values obtained by repeated measurement and measurement after the rotation of the predetermined angle. According to the device, it is possible to measure a ball diameter accurately without being influenced by body temperature, air temperature and individual workmanship when the diameter of a ball is measured.
摘要翻译：根据本发明的球直径自动测量装置优选地包括位移传感器，分隔板，滑块和测量控制器。位移传感器测量位于测量位置的球的直径。分隔板保持要测量的球并在预定位置和测量位置之间往复运动。当分隔板移动时，滑块将球在预定位置旋转预定角度。测量控制器存储并输出在预定角度的旋转之后通过重复测量和测量获得的测量值。根据该装置，可以在不测量球的直径的情况下，不受体温，空气温度和个体做工的影响而精确地测量球直径。

69. 发明授权

US06243855B1 Mask data design method 有权
标题翻译：进行自动校正处理
公开(公告)号：US06243855B1
公开(公告)日：2001-06-05
申请号：US09161959
申请日：1998-09-29
申请人： Sachiko Kobayashi , Taiga Uno , Kazuko Yamamoto , Koji Hashimoto
发明人： Sachiko Kobayashi , Taiga Uno , Kazuko Yamamoto , Koji Hashimoto
IPC分类号： G06F760
CPC分类号： G03F7/70441 , G03F1/36
摘要： A correction target segment extracted from the design pattern is divided into lengths suited for correction. If the arrangement of the divided segments is a one-dimensional pattern, a correction value is obtained by conducting a one-dimensional process simulation to an arrangement within a predetermined distance from a divided segment in perpendicular direction. If the arrangement of the divided segments is a two-dimensional pattern, a correction value is obtained by two-dimensionally extracting a pattern included in a rectangular region having a predetermined distance from one point on the divided segment in perpendicular and horizontal directions and by conducting a two-dimensional process simulation to the extracted pattern.
摘要翻译：从设计图案提取的校正目标片段被划分为适合于校正的长度。如果分割段的排列是一维图案，则通过对垂直方向上的分割段的预定距离内的排列进行一维处理模拟来获得校正值。如果分割的片段的排列是二维图案，则通过二维地提取包括在具有预定距离的矩形区域中的图案，从而在垂直和水平方向上分割片段上的一个点，并且通过导线对提取的图案进行二维过程模拟。

70. 发明授权

US6060368A Mask pattern correction method 失效
标题翻译：掩模图案校正方法和系统
公开(公告)号：US6060368A
公开(公告)日：2000-05-09
申请号：US206364
申请日：1998-12-07
申请人： Koji Hashimoto , Hisako Aoyama , Soichi Inoue , Kazuko Yamamoto , Sachiko Kobayashi
发明人： Koji Hashimoto , Hisako Aoyama , Soichi Inoue , Kazuko Yamamoto , Sachiko Kobayashi
IPC分类号： G03F1/36 , G03F1/72 , G03F7/20 , H01L21/027 , H01L21/76
CPC分类号： G03F7/70441 , G03F1/36
摘要： This invention is provided to eliminate the optical proximity effect which will occur because of different rates of dimensional change between before and after etching when a plurality of gate materials are etched in a single device. After a to-be-corrected region is extracted, an n.sup.+ -type polysilicon gate layer is extracted. Then, the distance is calculated from the n.sup.+ -type polysilicon gate layer to a pattern adjacent thereto which can be a p.sup.+ -type polysilicon gate layer, thereby correcting the size of the n.sup.+ -type polysilicon gate layer with reference to a correction table for the pattern adjacent to the n.sup.+ -type polysilicon gate layer. After that, a p.sup.+ -type polysilicon gate layer is extracted. Then, the distance is calculated from the p.sup.+ -type polysilicon gate layer to a pattern adjacent thereto which can be an n.sup.+ -type polysilicon gate layer, thereby correcting the size of the p.sup.+ -type polysilicon gate layer with reference to a correction table for the pattern adjacent to the p.sup.+ -type polysilicon gate layer.
摘要翻译：提供本发明以消除当在单个器件中蚀刻多个栅极材料时在蚀刻之前和之后不同的尺寸变化率而将发生的光学邻近效应。在提取待校正区域之后，提取n +型多晶硅栅极层。然后，从n +型多晶硅栅极层到可以是p +型多晶硅栅极层的与其相邻的图案计算距离，从而参照n +型多晶硅栅极层的校正表来校正n +型多晶硅栅极层的尺寸图案与n +型多晶硅栅极层相邻。之后，提取p +型多晶硅栅极层。然后，从p +型多晶硅栅极层到与其相邻的图案，其可以是n +型多晶硅栅极层，从而根据用于的p +型多晶硅栅极层的校正表来校正p +型多晶硅栅极层的尺寸，图案与p +型多晶硅栅极层相邻。

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