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    • 61. 发明申请
    • ARRANGEMENT FOR SWITCHING HIGH ELECTRIC CURRENTS BY A GAS DISCHARGE
    • 通过气体放电切换高电流的装置
    • US20080265779A1
    • 2008-10-30
    • US12041121
    • 2008-03-03
    • Vladimir KorobochkoAlexander KellerJuergen Kleinschmidt
    • Vladimir KorobochkoAlexander KellerJuergen Kleinschmidt
    • H05H1/00
    • H05G2/003H05H1/52
    • The present invention is directed to an arrangement for switching high electric currents by way of a gas discharge at high voltages or for generating gas discharge plasma emitting EUV radiation. It is the object of the invention to find a novel possibility for generating a hollow cathode plasma that permits a longer life of the cathodes of short wavelength-emitting gas discharge radiation sources and pseudospark switches, also in high-power operation. This object is met in that the metal wall between the hollow cathode space and the discharge space has a thickness on the order of the centimeter range so that the openings of the metal wall change into relatively long channels and in that substantially radially extending cooling channels are introduced in the metal wall to reduce the ion erosion of the metal wall of the hollow cathode through efficient cooling.
    • 本发明涉及一种用于通过高压气体放电或用于产生气体放电等离子体发射EUV辐射来切换高电流的装置。 本发明的目的是发现一种产生中空阴极等离子体的新颖可能性,其允许短波长发射气体放电辐射源和伪脉冲开关的阴极在大功率操作中寿命更长。 满足这个目的在于,中空阴极空间和放电空间之间的金属壁具有大约厘米范围的厚度,使得金属壁的开口变成相对较长的通道,并且基本上径向延伸的冷却通道是 引入金属壁,以通过有效的冷却来减少空心阴极的金属壁的离子侵蚀。
    • 62. 发明申请
    • METHOD AND ARRANGEMENT FOR STABILIZING THE AVERAGE EMITTED RADIATION OUTPUT OF A PULSED RADIATION SOURCE
    • 用于稳定脉冲辐射源的平均发射辐射输出的方法和装置
    • US20080143989A1
    • 2008-06-19
    • US11949924
    • 2007-12-04
    • JESKO BRUDERMANNJuergen Kleinschmidt
    • JESKO BRUDERMANNJuergen Kleinschmidt
    • G03B27/72G01J1/18
    • G03B27/72G01J1/18G01J1/4257G01J11/00G03F7/70041G03F7/70558
    • The invention is directed to a method and an arrangement for stabilizing the average emitted radiation output of a pulsed radiation source. It is the object of the invention to find a novel possibility for stabilizing the average emitted radiation output of a pulsed radiation source which enables a reliable regulation even when there is no sufficiently reliable manipulated variable for influencing the emitted pulse energy (Ei). According to the invention, this object is met in that the individual pulse energy (Ei) of the current radiation pulse is measured, the deviation of the current individual pulse energy (Ei) from a previously determined target value (E0) is determined, and the pulse interval (Δti+1) preceding the triggering of the next radiation pulse is controlled depending on the magnitude of the deviation between the current individual pulse energy (Ei) and the target value (E0) of the pulse energy.
    • 本发明涉及用于稳定脉冲辐射源的平均发射辐射输出的方法和装置。 本发明的目的是找到一种用于稳定脉冲辐射源的平均发射辐射输出的新颖可能性,即使当没有足够可靠的操纵变量来影响发射的脉冲能量时,其也可以进行可靠的调节(E i )。 根据本发明,满足目的在于测量当前辐射脉冲的单个脉冲能量(E SUB),当前个体脉冲能量的偏差(E 1 / SUB>)从先前确定的目标值(E 0)确定,并且控制下一个辐射脉冲触发之前的脉冲间隔(Deltat1 + 1 + 1) 取决于脉冲能量的当前单独脉冲能量(E SUB)与目标值(E SUB)之间的偏差的大小。
    • 63. 发明申请
    • ARRANGEMENT FOR THE GENERATION OF SHORT-WAVELENGTH RADIATION BASED ON A GAS DISCHARGE PLASMA AND METHOD FOR THE PRODUCTION OF COOLANT-CARRYING ELECTRODE HOUSING
    • 基于气体放电等离子体生成短波辐射的布置方法以及制造冷凝器电极壳体的方法
    • US20070114946A1
    • 2007-05-24
    • US11560118
    • 2006-11-15
    • SVEN GOETZEHarald EbelJuergen KleinschmidtImtiaz Ahmad
    • SVEN GOETZEHarald EbelJuergen KleinschmidtImtiaz Ahmad
    • H01J7/24
    • H01J17/28H01J7/26H05G2/003
    • The invention is directed to an arrangement for the generation of short-wavelength radiation based on a hot plasma generated by gas discharge and to a method for the production of coolant-carrying electrode housings. It is the object of the invention to find a novel possibility for gas discharge based short-wavelength radiation sources with high average radiation output in quasi-continuous discharge operation by which efficient cooling principles can be implemented using inexpensive and simple means in order to prevent a temporary melting of the electrode surfaces and, therefore, to ensure a long lifetime of the electrodes. According to the invention, this object is met in that special cooling channels for circulating coolant are integrated in electrode collars of the electrode housings. The cooling channels are advanced radially up to within a few millimeters of the highly thermally stressed surface regions and are connected by necked-down channel portions which are arranged coaxial to the axis of symmetry and which are provided with channel structures for increasing the inner surface and for increasing the flow rate of the coolant.
    • 本发明涉及一种用于产生基于由气体放电产生的热等离子体的短波长辐射的装置以及用于制造承载冷却剂的电极壳体的方法。 本发明的目的是在准连续放电操作中找到具有高平均辐射输出的基于气体放电的短波长辐射源的新颖可能性,通过该方法可以使用廉价和简单的方法来实现有效的冷却原理,以便防止 暂时熔化电极表面,因此确保电极寿命长。 根据本发明,由于用于循环冷却剂的特殊冷却通道集成在电极壳体的电极环中,所以满足了该目的。 冷却通道从高度受热应力的表面区域径向推进到几毫米以内,并且通过与对称轴线同轴设置的颈缩通道部分连接,并且设置有用于增加内表面的通道结构, 以增加冷却剂的流量。
    • 65. 发明申请
    • ARRANGEMENT FOR THE SUPPRESSION OF UNWANTED SPECTRAL COMPONENTS IN A PLASMA-BASED EUV RADIATION SOURCE
    • 在基于等离子体的EUV辐射源中抑制无源光谱成分的布置
    • US20070080307A1
    • 2007-04-12
    • US11539342
    • 2006-10-06
    • RENE BRUIJNChinh Duc TranBjoern MaderJesko BrudermannJuergen Kleinschmidt
    • RENE BRUIJNChinh Duc TranBjoern MaderJesko BrudermannJuergen Kleinschmidt
    • G01J3/10
    • G03F7/70933B82Y10/00G03F7/70033G03F7/70191G03F7/70575G03F7/70908G03F7/70916G03F7/70991G21K1/10H05G2/001
    • The invention is directed to an arrangement for the suppression of unwanted spectral components (‘out-of-band’ radiation, as it is called) in a plasma-based radiation source. The object of the invention is to find a novel possibility for the suppression of unwanted spectral components in radiation exiting from a plasma-based EUV radiation source which permits a simple suppression of out-of-band radiation outside the desired EUV range without requiring costly manufacturing and adjustment of diffraction gratings. This object is met according to the invention in that a filter unit is provided between the plasma and an application location of the EUV radiation, which filter unit has at least one gas curtain comprising at least one rapidly flowing gas whose molecules have no absorption maxima for the desired EUV radiation and intensive absorption maxima for other, unwanted wavelengths that are emitted, at least in the IR region. For the purpose of generating the gas curtain, at least one slit nozzle and an efficient gas sink are arranged laterally opposite one another with respect to an optical axis of the beam bundle in order to limit the gas curtain in a spatially defined manner and to remove it again from the vacuum chambers as completely as possible.
    • 本发明涉及一种用于在基于等离子体的辐射源中抑制不想要的光谱分量(如所谓的“带外”辐射)的布置。 本发明的目的是找到一种新颖的可能性,用于抑制从基于等离子体的EUV辐射源射出的辐射中的不需要的光谱分量,其允许在期望的EUV范围之外简单地抑制带外辐射,而不需要昂贵的制造 和衍射光栅的调整。 根据本发明满足本发明的目的在于,在等离子体和EUV辐射的施加位置之间提供过滤器单元,该过滤器单元具有至少一个气幕,其包括至少一个快速流动的气体,其分子对于 至少在IR区域发射的其他不需要的波长的期望的EUV辐射和强吸收最大值。 为了产生气幕,至少有一个狭缝喷嘴和有效的气体槽相对于束束的光轴横向相对布置,以便以空间限定的方式限制气幕并且移除 再次从真空室中尽可能完全地完成。
    • 70. 发明授权
    • Method for the stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation
    • 用于在脉冲操作中稳定气体放电耦合辐射源的辐射输出的方法
    • US06829261B2
    • 2004-12-07
    • US10425301
    • 2003-04-29
    • Juergen Kleinschmidt
    • Juergen Kleinschmidt
    • H01S310
    • H05G2/003B82Y10/00G03F7/70033G03F7/70041H05B41/34
    • A method is disclosed for stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation, particularly of an EUV source based on a gas discharge. The object of the disclosed invention is to find a novel possibility for stabilizing the radiation output of a gas discharge-coupled radiation source in pulsed operation which allows the pulse energy to be regulated on the basis of pulse energy fluctuations of the radiation emission detected through measurements without requiring regular calibration measurements of the E(U) curve in the stationary operating regime with continuous pulse sequences. According to the invention, this object is met in that continuous measurements of the pulse energy and at least one influencing variable are carried out for every radiation pulse of the EUV source, time averages of the pulse energy and influencing variable are formed, and the deviation of the actual measurement values from the average values are determined, so that a proportionality factor dE/dU determined by statistical analysis is available for PI regulation in the operating point of the averaged pulse energy.
    • 公开了一种用于在脉冲操作中稳定气体放电耦合辐射源的辐射输出的方法,特别是基于气体放电的EUV源。 所公开的发明的目的是找到在脉冲操作中稳定气体放电耦合辐射源的辐射输出的新颖可能性,其允许基于通过测量检测到的辐射发射的脉冲能量波动来调节脉冲能量 而不需要在具有连续脉冲序列的固定操作状态下对E(U)曲线进行常规校准测量。 根据本发明,满足这个目的在于对EUV源的每个辐射脉冲执行脉冲能量和至少一个影响变量的连续测量,形成脉冲能量和影响变量的时间平均值,并且偏差 确定来自平均值的实际测量值,使得通过统计分析确定的比例因子dE / dU可用于平均脉冲能量的操作点中的PI调节。