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61. 发明授权

US07163872B2 Tunable-wavelength optical filter and method of manufacturing the same 有权
标题翻译：可调谐波长光学滤波器及其制造方法
公开(公告)号：US07163872B2
公开(公告)日：2007-01-16
申请号：US10671825
申请日：2003-09-25
申请人： Chang Auck Choi , Myung Lae Lee , Chang Kyu Kim , Chi Hoon Jun , Youn Tae Kim
发明人： Chang Auck Choi , Myung Lae Lee , Chang Kyu Kim , Chi Hoon Jun , Youn Tae Kim
IPC分类号： H01L21/00
CPC分类号： G02B26/001 , G01J3/26 , G02B5/0833 , G02B6/29361 , G02B6/29389 , G02B6/29395
摘要： An active type tunable wavelength optical filter having a Fabry-Perot structure is disclosed. A tunable wavelength optical filter which comprises a lower mirror in which silicon films and oxide films are sequentially laminated in a multi-layer and the silicon film is laminated on the highest portion; an upper mirror in which silicon films and oxide films are sequentially laminated in a multi-layer and the silicon film is laminated on the highest portion and which is spaced away from the lower mirror by a predetermined distance; a connecting means for connecting and supporting the lower mirror and the upper mirror to a semiconductor substrate; and electrode pads for controlling the gap between the lower mirror and the upper mirror by an electrostatic force and the method of manufacturing the same are provided. Thereby, by finely driving the upper and lower mirrors composed of a multi-layer structure of the silicon film and the oxide film by the electrostatic force, the wavelength of the transmitted light with respect to the incident light can be selectively sent.
摘要翻译：公开了一种具有法布里 - 珀罗结构的有源型可调谐波长滤光器。一种可调波长滤光器，包括下反射镜，其中硅膜和氧化物膜顺次层叠在多层中，并且硅膜层压在最高部分上; 其中硅膜和氧化物膜顺次层叠在多层中并且硅膜层压在最高部分上并且与下反射镜间隔预定距离的上反射镜; 用于将下反射镜和上反射镜连接和支撑到半导体基板的连接装置; 以及用于通过静电力控制下反射镜和上反射镜之间的间隙的电极焊盘及其制造方法。由此，通过利用静电力微细地驱动由硅膜和氧化膜构成的上反射镜和下反射镜，可以有选择地发射透射光相对于入射光的波长。

62. 发明授权

US06922270B2 Multi-step landing micro-mirror, method for manufacturing the same and multi-step landing micro-mirror array 有权
标题翻译：多步登陆微镜，制造相同和多步登陆微镜阵列的方法
公开(公告)号：US06922270B2
公开(公告)日：2005-07-26
申请号：US10735669
申请日：2003-12-16
申请人： Moon Youn Jung , Chi Hoon Jun , Chang Auck Choi , Yun Tae Kim
发明人： Moon Youn Jung , Chi Hoon Jun , Chang Auck Choi , Yun Tae Kim
IPC分类号： B81B3/00 , G02B26/08
CPC分类号： G02B26/0841 , B81B3/0062 , B81B2201/042 , Y10S359/904
摘要： A multi-step landing micro-mirror, a method for manufacturing the same, and a multi-step landing micro-mirror array are disclosed. The multi-step landing micro-mirror comprises a trench formed in a substrate and having N−1 steps in one side wall thereof; N plates rotated in or on the trench; and 2N springs for connecting the plates to each other; wherein the N plates are composed of an outermost first plate, a second plate connected with the first plate by the spring and located in the first plate, . . . , and a N-th plate connected with a (N−1)-th plate by the spring and located in the (N−1)-th plate, wherein when voltages are applied to the N plates and the trench, respectively, the first plate is subjected to a first landing with a predetermined rotation angle on a first step of the trench due to the constant voltage, the second plate is subjected to a second landing with the predetermined rotation angle on a second step of the trench, . . . , the N-th plate is subjected to a N-th landing with the predetermined rotation angle on the other side wall of the trench. Accordingly, the low voltage driving can be performed by performing the multi-step driving during the electrostatic force is applied, the elastic force of the spring for supporting the mirror can be enhanced, therefore the reliability of the optical switch can be improved.
摘要翻译：公开了一种多步着陆微镜，其制造方法以及多台阶着陆微镜阵列。多台阶着陆微反射镜包括形成在基板中并在其一个侧壁中具有N-1个台阶的沟槽; N个板在沟槽中或沟槽上旋转; 和2N弹簧，用于将板彼此连接; 其中所述N个板由最外面的第一板，通过弹簧与所述第一板连接并位于所述第一板中的第二板组成。。。以及通过弹簧与第（N-1）板连接并位于（N-1）板中的第N板，其中当分别向N个板和沟槽施加电压时，第一板由于恒定的电压在沟槽的第一台阶上以预定的旋转角度进行第一次着陆，第二板在沟槽的第二台阶上以预定的旋转角进行第二次着陆。。。第N个板在沟槽的另一个侧壁上以预定的旋转角进行第N次着陆。因此，通过在施加静电力的同时进行多级驱动，可以进行低压驱动，可以提高用于支撑反射镜的弹簧的弹力，从而可以提高光开关的可靠性。

63. 发明授权

US06896780B2 Microelectrode, microelectrode array and method for manufacturing the microelectrode 有权
标题翻译：微电极，微电极阵列及微电极制造方法
公开(公告)号：US06896780B2
公开(公告)日：2005-05-24
申请号：US10020774
申请日：2001-12-11
申请人： Hae Sik Yang , Chi Hoon Jun , Chang Auck Choi , Youn Tae Kim
发明人： Hae Sik Yang , Chi Hoon Jun , Chang Auck Choi , Youn Tae Kim
IPC分类号： B81B7/04 , B01J19/00 , G01N27/403 , G01N27/28 , G01N27/327
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00822 , B01J2219/00853 , B01J2219/00873 , G01N27/403
摘要： The present invention relates to a microelectrode, a microelectrode array, and a method of manufacturing the microelectrode of which temperature can be controlled. The microelectrode comprises a sealed cavity formed in a silicon substrate for thermal isolation, a microheater formed on the sealed cavity, and an electrode heated indirectly by the microheater. According to the present invention, it is possible to manufacture with CMOS process the microelectrode and the microelectrode array which have excellent electric insulation and thermal isolation between a microheater and a silicon substrate, which has a small power consumption, which has high heating and cooling speed and which has no corrosion.
摘要翻译：本发明涉及一种微电极，微电极阵列，以及可以控制温度的微电极的制造方法。微电极包括形成在用于热隔离的硅衬底中的密封空腔，形成在密封空腔上的微加热器和由微加热器间接加热的电极。根据本发明，可以通过CMOS工艺制造微电极和微电极阵列，其在微加热器和硅基板之间具有优异的电绝缘和热隔离，其功耗小，具有高的加热和冷却速度没有腐蚀。

64. 发明授权

US06822776B2 Scanning micromirror for optical communication systems and method of manufacturing the same 有权
公开(公告)号：US06822776B2
公开(公告)日：2004-11-23
申请号：US10308137
申请日：2002-12-03
申请人： Doo-Young Hah , Ho-Jun Ryu , Chang-Auck Choi , Chi-Hoon Jun , Youn Tae Kim
发明人： Doo-Young Hah , Ho-Jun Ryu , Chang-Auck Choi , Chi-Hoon Jun , Youn Tae Kim
IPC分类号： G02B2608
CPC分类号： G02B6/3518 , G02B6/3556 , G02B6/357 , G02B6/3584 , G02B26/0841 , Y10S359/90
摘要： The present invention relates to a scanning micromirror for optical communications. The scanning micromirror comprises an outer frame having an aperture therein, an inner frame located within the aperture of the outer frame and having an aperture therein, an optical reflecting means located within the aperture of the inner frame, a plurality of first torsion springs connected between an inner wall of the outer frame and an outer wall of the inner frame, for supporting the inner frame, a plurality of second torsion springs connected between the inner wall of the inner frame and the optical reflecting means, for supporting the optical reflecting means, first comb-type electrostatic actuators for applying electrostatic torque by which the inner frame is rotated about an axis of the first torsion springs, and second comb-type electrostatic actuators for applying electrostatic torque by which the optical reflecting means is rotated about an axis of the second torsion springs. Therefore, as the present invention uses vertical comb-type electrostatic actuators, an available rotation angle can be made large compared to a conventional case using a parallel-plate type electrostatic actuator. As the vertical asymmetry of the fixed combs and the movable combs are large, a large rotation angle can be obtained in non-resonant mode as well as resonant mode.

65. 发明授权

US06806205B2 Stiction-free microstructure releasing method for fabricating MEMS device 有权
标题翻译：用于制造MEMS器件的无静电微结构释放方法
公开(公告)号：US06806205B2
公开(公告)日：2004-10-19
申请号：US09753065
申请日：2000-12-29
申请人： Won-Ick Jang , Chang-Auck Choi , Chi-Hoon Jun , Youn-Tae Kim , Myung-Lae Lee
发明人： Won-Ick Jang , Chang-Auck Choi , Chi-Hoon Jun , Youn-Tae Kim , Myung-Lae Lee
IPC分类号： H01L21302
CPC分类号： B81C1/00936 , H01L21/31111 , H01L21/31116
摘要： Disclosed is a a method of fabricating a MEMS device by means of surface micromachining without leaving any stiction or residues by etching silicon oxide of a sacrificial layer, which is an intermediate layer between a substrate and a microstructure, rather than by etching silicon oxide of a semiconductor device. The method according to the invention includes the steps of supplying alcohol vapor bubbled with anhydrous HF, maintaining a temperature of the supplying device and a moving path of the anhydrous HF and the alcohol to be higher than a boiling point of the alcohol, performing a vapor etching by controlling a temperature and a pressure to be within the vapor region of a phase equilibrium diagram of water, and removing silicon oxide of a sacrificial layer on a lower portion of the microstructure.
摘要翻译：公开了一种通过表面微机械加工制造MEMS器件的方法，而不通过蚀刻作为衬底和微结构之间的中间层的牺牲层的氧化硅而不留下任何残留物，而不是通过蚀刻半导体的氧化硅设备。根据本发明的方法包括以下步骤：提供用无水HF鼓泡的醇蒸汽，保持供料装置的温度和无水HF和醇的移动路径高于醇的沸点，进行蒸汽通过控制温度和压力在水的相平衡图的蒸汽区域内进行蚀刻，并且在微结构的下部去除牺牲层的氧化硅。

66. 发明授权

US06582987B2 Method of fabricating microchannel array structure embedded in silicon substrate 有权
标题翻译：制造嵌入硅衬底的微通道阵列结构的方法
公开(公告)号：US06582987B2
公开(公告)日：2003-06-24
申请号：US10022093
申请日：2001-12-14
申请人： Chi Hoon Jun , Chang Auck Choi , Youn Tae Kim
发明人： Chi Hoon Jun , Chang Auck Choi , Youn Tae Kim
IPC分类号： H01L2100
CPC分类号： B81C1/00119 , B81B2201/0214 , B81B2201/058
摘要： The present invention is disclosed a microchannel array structure embedded in a silicon substrate and a fabrication method thereof. The microchannel array structure of the present invention is formed deep inside the substrate and has high-density microscopic micro-channels. Besides, going through surface micromachining, physical and chemical properties of the silicon substrate are hardly influenced by the fabrication procedures. With microchannels buried in the substrate, the top of a microchannel array structure becomes flat, minimizing the effect of step height. That way, additional devices such as passive components, micro sensors, micro actuators and electronic devices can be easily integrated onto the microchannel array structure. The microchannel array structure of the present invention can be employed as a basic fluidic platform for miniaturizing and improving perfomances of electronic device coolers as well as such fluidic micro-electro-mechanical system (MEMS) devices as biochips, microfluidic components and chemical analyzers, lab-on-a-chips, polymerase chain reaction (PCR) amplifiers, micro reactors and drug delivery systems.
摘要翻译：本发明公开了一种嵌入硅衬底的微通道阵列结构及其制造方法。本发明的微通道阵列结构形成在衬底的内部，并且具有高密度微观微通道。此外，通过表面微加工，硅衬底的物理和化学性质几乎不受制造程序的影响。由于微通道埋在基板中，微通道阵列结构的顶部变得平坦，从而最小化台阶高度的影响。这样，诸如无源组件，微传感器，微执行器和电子设备的附加设备可以容易地集成到微通道阵列结构上。本发明的微通道阵列结构可用作电子装置冷却器的微型化和改进的基本流体平台，以及诸如生物芯片，微流体组件和化学分析仪的实验室的这种流体微机电系统（MEMS）装置 - 聚合酶链反应（PCR）放大器，微反应器和药物递送系统。

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