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1. 发明申请

US20180246415A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
公开(公告)号：US20180246415A1
公开(公告)日：2018-08-30
申请号：US15878747
申请日：2018-01-24
申请人： Carl Zeiss SMT GmbH
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G05B13/04 , G01B11/00 , G02B26/08 , G01N21/55 , G01M11/00 , G01B11/27
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

2. 发明申请

US20160266502A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20160266502A1
公开(公告)日：2016-09-15
申请号：US14969143
申请日：2015-12-15
申请人： Carl Zeiss SMT GmbH
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G01B11/27
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

3. 发明授权

US08842353B2 Microstructure and method of manufacturing the same 有权
标题翻译：微结构及其制造方法
公开(公告)号：US08842353B2
公开(公告)日：2014-09-23
申请号：US13047670
申请日：2011-03-14
申请人： Takahisa Kato
发明人： Takahisa Kato
IPC分类号： G02B26/08 , B81B3/00
CPC分类号： G02B26/0841 , B81B3/0037 , B81B2201/038 , B81B2203/0163 , B81B2203/053 , G02B26/085 , Y10S359/904
摘要： A microstructure includes a substrate, a fixed supporting portion fixed to the substrate, a first movable portion, a second movable portion enhancing the rigidity of the first movable portion, and an elastic supporting portion elastically interconnecting the first movable portion and the fixed supporting portion. The second movable portion is secured to the first movable portion with a gap interposed therebetween and in such a manner as to cover the elastic supporting portion and the fixed supporting portion. The first movable portion and the second movable portion are elastically supported by the elastic supporting portion in such a manner as to be displaceable together relative to the fixed supporting portion.
摘要翻译：微结构包括基板，固定在基板上的固定支撑部分，第一可移动部分，增强第一可动部分的刚性的第二可移动部分和弹性地互连第一可移动部分和固定支撑部分的弹性支撑部分。第二可移动部分以间隙插入第一可移动部分，并且以覆盖弹性支撑部分和固定支撑部分的方式固定。第一可动部和第二可动部由弹性支撑部弹性地支撑，以能够相对于固定支撑部一起移位。

4. 发明申请

US20140233006A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20140233006A1
公开(公告)日：2014-08-21
申请号：US14255302
申请日：2014-04-17
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Manfred Maul , Johannes Eisenmenger , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Damian Fiolka , Andras G. Major , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Manfred Maul , Johannes Eisenmenger , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Damian Fiolka , Andras G. Major , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G01N21/55
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

5. 发明申请

US20120293784A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于在微观投影曝光装置的照明系统中监测多个反射镜阵列的方法和装置
公开(公告)号：US20120293784A1
公开(公告)日：2012-11-22
申请号：US13556408
申请日：2012-07-24
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
摘要翻译：微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。每个元件基于施加到元件的控制信号偏离入射光束。该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

6. 发明授权

US08218216B2 Image projector 失效
标题翻译：图像投影仪
公开(公告)号：US08218216B2
公开(公告)日：2012-07-10
申请号：US12056564
申请日：2008-03-27
申请人： Kenji Konno , Kenji Mizumoto
发明人： Kenji Konno , Kenji Mizumoto
IPC分类号： G02B26/10
CPC分类号： G03B21/28 , F21S41/675 , G02B17/0621 , G02B26/105 , G02B27/0025 , H04N9/3129 , H04N9/3164 , H04N9/3185 , Y10S359/904
摘要： An object of the present invention is to provide an image projector capable of projecting a high-quality image while realizing small size. In the image projector, a light flux is deflected two-dimensionally by turning a reflector for reflecting a light flux emitted from a light source around a second axis almost orthogonal to a first axis as a center by resonant drive while turning the reflector around the first axis as a center by non-resonant drive. Shape of one or more optical surfaces of a projection optical system for projecting an image onto a projection plane by guiding light onto the projection plane includes a shape for performing a correction for maintaining scanning speed of the light flux along one scan direction on the projection plane almost constant and a shape for performing a correction for suppressing a distortion in an image along the other scan direction almost orthogonal to the one scan direction on the projection plane. By controlling turn of the reflector, at least one of a correction for maintaining scanning speed of the light flux along the other scan direction on the projection plane almost constant and a correction for suppressing a distortion in an image along the one scan direction on the projection plane is performed.
摘要翻译：本发明的目的是提供一种能够在实现小尺寸的同时投影高质量图像的图像投影仪。在图像投影仪中，通过转动反射器，通过转动反射器来反射光束，使反射器反射围绕围绕第一轴线的第二轴线的第一轴线的中心的反射器作为中心，同时使反射器围绕第一轴为非谐振驱动的中心。投影光学系统的一个或多个光学表面的形状，用于通过将光引导到投影平面上将图像投影到投影平面上的形状包括用于执行校正的形状，用于保持沿着投影平面上的一个扫描方向的光通量的扫描速度几乎恒定的形状和用于执行校正的形状，用于抑制沿着与投影平面上的一个扫描方向几乎正交的另一个扫描方向的图像中的失真。通过控制反射器的转动，使投影平面上沿着另一扫描方向的光束的扫描速度维持在几乎恒定的校正中的至少一个以及用于抑制沿投影的一个扫描方向的图像中的失真的校正飞机执行。

7. 发明授权

US08162494B2 Surface deformation actuation structure 有权
标题翻译：表面变形致动结构
公开(公告)号：US08162494B2
公开(公告)日：2012-04-24
申请号：US10578805
申请日：2003-11-21
申请人： Roger Franciscus Mattheus Maria Hamelinck , Petrus Carolus Johannes Nicolaas Rosielle , Jakobus Pieter Kappelhof
发明人： Roger Franciscus Mattheus Maria Hamelinck , Petrus Carolus Johannes Nicolaas Rosielle , Jakobus Pieter Kappelhof
IPC分类号： G02B7/188 , G02B26/08
CPC分类号： G02B26/06 , G02B26/0825 , Y10S359/903 , Y10S359/904
摘要： A structure such as an electronically deformable mirror contains a deformable membrane, an array of actuators located facing the membrane, each actuator being arranged to actuate local displacement of the membrane perpendicular to its surface. The actuators and the membrane are connected via an array of actuating connections. The actuating connections substantially transmit movement perpendicular to the second surface, but leave planar displacement and/or local rotation of the second surface substantially free. Preferably, the actuators contain an array of soft magnetic islands on a soft magnetic base plane, with actuator coils running around the islands and a system of sort magnetic walls on the base plane to separate the coils. The walls support a soft magnetic resilient surface that extend over of the islands and serve to drive the actuating connections. Preferably the base plane is supported on an array of rod shaped connection elements, leaving space to permit air to circulate between the support structures and the support plate.
摘要翻译：诸如电子可变形反射镜的结构包含可变形膜，面对膜的致动器阵列，每个致动器布置成致动膜垂直于其表面的局部位移。致动器和膜通过一系列致动连接连接。致动连接件基本上传递垂直于第二表面的运动，但是使第二表面的平面位移和/或局部旋转基本上是空闲的。优选地，致动器在软磁性基面上包含软磁岛阵列，其中致动器线圈围绕岛运行，并且在基座平面上具有分类磁壁的系统以分离线圈。墙壁支撑柔性磁性弹性表面，其在岛上延伸并用于驱动致动连接。优选地，基面支撑在杆形连接元件的阵列上，留下空间以允许空气在支撑结构和支撑板之间循环。

8. 发明申请

US20100302609A1 MEMS DEVICE HAVING REDUCED DEFORMATIONS 有权
标题翻译：具有减少变形的MEMS器件
公开(公告)号：US20100302609A1
公开(公告)日：2010-12-02
申请号：US12530095
申请日：2008-02-08
申请人： Avigdor Huber , Moshe Medina
发明人： Avigdor Huber , Moshe Medina
IPC分类号： G02B26/10 , H01L21/302
CPC分类号： G02B26/0841 , B81B2201/042 , B81C1/00142 , Y10S359/904
摘要： A MEMS apparatus is provided for scanning an optical beam. The MEMS apparatus is formed out of a pre-fabricated multi-layer device and comprises at least one tilting micro-mirror formed in a first active layer of that pre-fabricated multi-layer device and a support structure formed in a second layer of the pre-fabricated multi-layer device, and wherein the support structure is preferably formed by etching parts of the second layer to obtain a pre-determined shape of the supporting structure.
摘要翻译：提供了用于扫描光束的MEMS装置。 MEMS装置由预制的多层装置形成，并且包括形成在该预制多层装置的第一有源层中的至少一个倾斜微镜和形成在第二层中的支撑结构预制多层器件，并且其中优选通过蚀刻第二层的部分来形成支撑结构，以获得支撑结构的预定形状。

9. 发明授权

US07841727B2 Projection optical system having a light blocker 有权
标题翻译：具有遮光器的投影光学系统
公开(公告)号：US07841727B2
公开(公告)日：2010-11-30
申请号：US12040826
申请日：2008-02-29
申请人： Ming-Te Lin , Wen-Pin Yeh
发明人： Ming-Te Lin , Wen-Pin Yeh
IPC分类号： G03B21/14 , G03B21/28 , G03B21/22 , G03B9/02 , G02B9/08 , H04N5/74
CPC分类号： G03B21/008 , G03B21/2066 , G03B21/208 , Y10S359/904
摘要： A projection optical system includes a digital micro-mirror device and a light blocker disposed along the light path of the digital micro-mirror device. The digital micro-mirror device includes a base having a plurality of outer pads, a micro-mirror array disposed on the base, and a plurality of bonding wires. The bonding wires are electrically connecting the outer pads with the corresponding micro-mirror array. The light blocker is configured for blocking the light incident to the bonding wires and the light reflected by the bonding wires.
摘要翻译：投影光学系统包括沿着数字微镜装置的光路布置的数字微镜装置和光阻挡器。数字微镜装置包括具有多个外部焊盘的基座，设置在基座上的微反射镜阵列和多个接合线。接合线将外部焊盘与相应的微反射镜阵列电连接。遮光器被配置为阻挡入射到接合线的光和由接合线反射的光。

10. 发明授权

US07782161B2 Magnetically actuated microelectromechanical systems actuator 有权
标题翻译：磁致动微机电系统执行器
公开(公告)号：US07782161B2
公开(公告)日：2010-08-24
申请号：US11695342
申请日：2007-04-02
申请人： Jeremy A. Levitan , Michael J. Sinclair
发明人： Jeremy A. Levitan , Michael J. Sinclair
IPC分类号： H01H51/22
CPC分类号： H01H50/005 , B81B3/0021 , B81B2201/042 , B81B2203/058 , G02B6/3518 , G02B6/3572 , G02B6/358 , G02B6/3584 , G02B26/085 , G02B26/101 , H01F7/066 , H01F7/08 , H01F7/14 , H01F21/04 , H01F2005/006 , H01F2007/068 , H02K41/0356 , Y10S359/904
摘要： A microelectrical mechanical system (MEMS) actuator having electrically conductive coils that create first magnetic fields that are opposed by a second magnetic field is disclosed. The actuator includes two coils having dual, interspersed Archimedean spirals. Within an actuator, one coil is arranged with spirals that proceed clockwise, while the other coil is provided with spirals that proceed counterclockwise. An electrically conductive bridge mechanically couples the two coils of each actuator to a mirror. Opposing magnetic fields are created to provide a force that urges the coils to expand so that the outermost portions of the coil extend upward, away from the substrate, and lift the bridge and mirror. Control current may then be modulated to increase and decrease the coil's magnetic field strength thereby increasing and decreasing the coil's extension to raise and lower relative to the substrate.
摘要翻译：公开了一种具有产生与第二磁场相对的第一磁场的导电线圈的微电机械系统（MEMS）致动器。致动器包括具有双重散布的阿基米德螺旋线的两个线圈。在致动器内，一个线圈被布置成具有顺时针方向的螺旋线，而另一个线圈设置有沿逆时针方向进行的螺旋。导电桥将每个致动器的两个线圈机械地耦合到反射镜。产生相反的磁场以提供促使线圈膨胀的力，使得线圈的最外部分向上延伸，远离基板，并提升桥和反射镜。然后可以调节控制电流以增加和减少线圈的磁场强度，从而增加和减少线圈的延伸以相对于衬底升高和降低。

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