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51. 发明授权

US08883373B2 Method for manufacturing photo mask, method for manufacturing semiconductor device, and program 有权
标题翻译：制造光掩模的方法，制造半导体器件的方法和程序
公开(公告)号：US08883373B2
公开(公告)日：2014-11-11
申请号：US13679396
申请日：2012-11-16
申请人： Akiko Mimotogi , Suigen Kyoh , Tetsuro Nakasugi
发明人： Akiko Mimotogi , Suigen Kyoh , Tetsuro Nakasugi
IPC分类号： G03F1/62 , G03F1/64
CPC分类号： G03F1/62
摘要： According to one embodiment, a method for manufacturing a photo mask, includes acquiring first data on respective shapes of a plurality of mask substrates, acquiring second data on respective shapes of a plurality of pellicles, and determining a combination of the mask substrate and the pellicle based on the first data and the second data.
摘要翻译：根据一个实施例，一种制造光掩模的方法包括：获取关于多个掩模基板的各个形状的第一数据，获取关于多个防护薄膜的各自形状的第二数据，以及确定掩模基板和防护薄膜组件的组合基于第一数据和第二数据。

52. 发明授权

US08815476B2 Pellicle membrane 有权
标题翻译：防护薄膜
公开(公告)号：US08815476B2
公开(公告)日：2014-08-26
申请号：US13805724
申请日：2011-06-29
申请人： Takashi Kozeki
发明人： Takashi Kozeki
IPC分类号： G03F1/62
CPC分类号： G03F1/62
摘要： The purpose of the present invention is to produce a pellicle film, which is suppressed in light deterioration or photodecomposition due to lithography light exposure, by simpler processes. Specifically disclosed is a pellicle film for lithography containing an amorphous fluoropolymer, which is characterized by containing 5-800 ppm by mass of a fluorine-based solvent. Also specifically disclosed is a method for producing a pellicle film, which comprises: a step A wherein a coating film of a solution that contains an amorphous fluoropolymer and a fluorine-based solvent is formed; and a step B wherein the fluorine-based solvent in the coating film is removed. The method for producing a pellicle film is characterized in that 5-800 ppm by mass of the fluorine-based solvent is caused to remain in the coating film in the step B.
摘要翻译：本发明的目的是通过更简单的工艺来制造防止由光刻曝光引起的光劣化或光分解的防护薄膜。具体公开了含有无定形含氟聚合物的光刻用防护薄膜，其特征在于含有5-800质量ppm的氟系溶剂。还具体公开了一种防护薄膜的制造方法，其特征在于，包括：形成含有无定形含氟聚合物和氟系溶剂的溶液的涂膜的工序A，以及除去涂膜中的氟系溶剂的工序B。防护薄膜的制造方法的特征在于，在步骤B中，将5-800质量ppm的氟系溶剂残留在涂膜中。

53. 发明申请

US20140147773A1 PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD 有权
标题翻译：胶版胶版胶版胶版曝光处理方法
公开(公告)号：US20140147773A1
公开(公告)日：2014-05-29
申请号：US14167210
申请日：2014-01-29
申请人： ASAHI GLASS COMPANY, LIMITED
发明人： Yoko TAKEBE
IPC分类号： G03F1/62
CPC分类号： G03F1/62 , G03F1/142
摘要： To provide a pellicle for lithography having a pellicle membrane excellent in light resistance against light with a wavelength of at most 250 nm, particularly at most 200 nm, a pellicle-mounted photomask using it, and an exposure treatment method. A pellicle for lithography having a multilayer pellicle membrane including a membrane made of a fluoropolymer (A) which contains, as the main component, repeating units obtained by cyclopolymerization of a pertluorodiene having one etheric oxygen atom, and a membrane made of a fluoropolymer (B) which has fluorinated alicyclic ring structures each containing, in the ring structure, two or three etheric oxygen atoms not being adjacent to one another, wherein the total thickness of the membrane made of the fluoropolymer (B) is at most 40% of the total thickness of the membrane made of the fluoropolymer (A).
摘要翻译：为了提供一种用于光刻的防护薄膜组件，其具有对波长为至多250nm，特别是至多200nm的光的耐光性优异的防护薄膜组件，使用该防护薄膜组件的光掩模和曝光处理方法。一种用于光刻的防护薄膜组件，其具有包含由含氟聚合物（A）制成的膜的多层防护薄膜，所述氟聚合物（A）含有通过使具有一个醚性氧原子的全氟二烯的环化聚合得到的重复单元和由含氟聚合物（B ），其具有在环结构中含有彼此不相邻的两个或三个醚性氧原子的氟化脂环族结构，其中由含氟聚合物（B）构成的膜的总厚度为总共的40％由含氟聚合物（A）制成的膜的厚度。

54. 发明授权

US08663756B2 Pellicle kit for manufacturing a pellicle 有权
标题翻译：用于制造防护薄膜的防护薄膜组件
公开(公告)号：US08663756B2
公开(公告)日：2014-03-04
申请号：US13367719
申请日：2012-02-07
申请人： Yuichi Hamada , Tatsuya Sema
发明人： Yuichi Hamada , Tatsuya Sema
IPC分类号： G03F1/14 , G03F1/00 , G03F1/62
CPC分类号： G03F1/64
摘要： There is provided a pellicle kit for manufacturing a pellicle which comprises a pellicle frame having a jig hole in the outer wall of its frame bar and a jig having a jig pin which is adjusted to enter the respective jig hole until the front end of the jig pin is abutted against the tapered bottom face of the jig hole to thereby fix said pellicle frame.
摘要翻译：提供了一种用于制造防护薄膜组件的防护薄膜组件，其包括防护薄膜组件框架，其具有在其框架杆的外壁中的夹具孔和具有夹具的夹具，该夹具被调节以进入相应的夹具孔直到夹具的前端销抵靠夹具孔的锥形底面，从而固定防护薄膜框架。

55. 发明申请

US20130130157A1 METHOD FOR MANUFACTURING PHOTO MASK, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM 有权
标题翻译：制造摄影胶片的方法，制造半导体器件的方法和程序
公开(公告)号：US20130130157A1
公开(公告)日：2013-05-23
申请号：US13679396
申请日：2012-11-16
申请人： Akiko Mimotogi , Suigen Kyoh , Tetsuro Nakasugi
发明人： Akiko Mimotogi , Suigen Kyoh , Tetsuro Nakasugi
IPC分类号： G03F1/62
CPC分类号： G03F1/62
摘要： According to one embodiment, a method for manufacturing a photo mask, includes acquiring first data on respective shapes of a plurality of mask substrates, acquiring second data on respective shapes of a plurality of pellicles, and determining a combination of the mask substrate and the pellicle based on the first data and the second data.
摘要翻译：根据一个实施例，一种制造光掩模的方法包括：获取关于多个掩模基板的各个形状的第一数据，获取关于多个防护薄膜的各自形状的第二数据，以及确定掩模基板和防护薄膜组件的组合基于第一数据和第二数据。

56. 发明授权

US08426083B2 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US08426083B2
公开(公告)日：2013-04-23
申请号：US12929554
申请日：2011-02-01
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/62 , G03F1/64
CPC分类号： G03F1/64
摘要： There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or smaller, and this is preferably accompanied by an improved flatness of mask-bonding adhesive layer (agglutinant layer), which can be 15 micrometers to 10 micrometers or even smaller.
摘要翻译：提供了一种防护薄膜组件，其中带有防护薄膜的粘合剂层被平坦地模制，使得膜上测量的薄膜的平坦度为10微米或更小，并且这优选伴随着掩模粘合粘合剂层的改善的平坦度（凝集层），其可以为15微米至10微米甚至更小。

57. 发明授权

US08309279B2 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US08309279B2
公开(公告)日：2012-11-13
申请号：US12929555
申请日：2011-02-01
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/62 , G03F1/64
CPC分类号： G03F1/64
摘要： There is provided a pellicle in which the mask-bonding adhesive is formed to have a corner-rounded cross section in a shape akin to a trapezoid whose upper parallel side represents the face of the mask-bonding adhesive layer by which the adhesive layer is attached to the pellicle frame, and whose lower parallel side is not shorter than the upper parallel side, and the base angles of the trapezoid are 90 degrees or smaller but not smaller than 75 degrees, when the lower parallel side is assumed to be the base of the trapezoid.
摘要翻译：提供了防护薄膜组件，其中掩模粘合剂形成为具有与梯形类似的形状的角圆形横截面，其上平行侧表示粘附层附着的掩模粘合层的表面并且其下平行侧不比上平行侧短，并且梯形的底角为90度以下但不小于75度，当下平行侧被假定为梯形。

58. 发明授权

US08293433B2 Pellicle for lithography and a method for making the same 有权
标题翻译：光刻用薄膜及其制造方法
公开(公告)号：US08293433B2
公开(公告)日：2012-10-23
申请号：US12923629
申请日：2010-09-30
申请人： Junichi Tsukada , Toru Shirasaki
发明人： Junichi Tsukada , Toru Shirasaki
IPC分类号： G03F1/62
CPC分类号： G03F1/64 , G03F1/62
摘要： There is provided a method for manufacturing a pellicle in which the pellicle frame is prepared by being heated at a predetermined temperature while constricting the frame to some extent of flatness to achieve a desired flatness and future stability against heat.
摘要翻译：提供一种制造防护薄膜组件的方法，其中通过在预定温度下加热而制备防护薄膜组件框架，同时将框架限制在一定程度上的平坦度，以实现期望的平坦度和对热的未来稳定性。

59. 发明授权

US06974782B2 Reticle tracking and cleaning 有权
标题翻译：标线跟踪和清洁
公开(公告)号：US06974782B2
公开(公告)日：2005-12-13
申请号：US10635231
申请日：2003-08-06
申请人： Richard F. Foulke, Jr., legal representative
发明人： Richard F Foulke, deceased
IPC分类号： G03F1/38 , G03F1/62 , G03F1/66 , G03F1/82 , G03F7/20 , H01L21/00 , G03F1/00
CPC分类号： G03F1/38 , G03F1/62 , G03F1/66 , G03F1/82 , G03F7/70541 , G03F7/70741 , G03F7/7075 , G03F7/70808 , G03F7/70983
摘要： A reticle assembly includes a reticle with a reticle plate. A radio frequency device is positioned on the reticle for providing information regarding the reticle to a reader by radio frequency.
摘要翻译：光罩组件包括具有光罩板的光罩。射频设备位于光罩上，用于通过射频向阅读器提供关于掩模版的信息。

60. 发明授权

US06921613B2 Electrostatic pellicle system for a mask 失效
标题翻译：用于面罩的静电防护薄膜系统
公开(公告)号：US06921613B2
公开(公告)日：2005-07-26
申请号：US10806726
申请日：2004-03-22
申请人： Dan Enloe
发明人： Dan Enloe
IPC分类号： G03F1/24 , G03F1/62 , G03F9/00 , A47G1/12 , G03B27/62
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62
摘要： The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer.The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.
摘要翻译：本发明描述了一种包括掩模的装置; 防护膜隔离物，附着在掩模上的防护膜隔片; 和静电防护薄膜系统，静电防护薄膜系统附着在防护薄膜组件上。本发明还描述了一种在暴露期间将污染物远离掩模附近的污染物，污染物包括不带电荷或中性颗粒，带正电荷的颗粒或带负电荷的颗粒，包括：诱导正电荷或负电荷在不带电或中性粒子上; 用带负电荷的电场吸引带正电的粒子; 并用带正电荷的电场吸引带负电荷的粒子。

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