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51. 发明授权

US6106994A Production process of polyphenol diesters, and positive photosensitive compositions 失效
标题翻译：多酚二酯的生产工艺和正性光敏组合物
公开(公告)号：US6106994A
公开(公告)日：2000-08-22
申请号：US210716
申请日：1998-12-14
申请人： Satoshi Niikura , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Satoshi Niikura , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： C07C303/28 , C07C309/76 , G03F7/022 , G03C1/492 , C07C50/08 , C07C303/00
CPC分类号： C07C303/28 , G03F7/022
摘要： A process for producing a polyphenol diester comprises esterifying a polyphenol compound and a naphthoquinone-1,2-diazidesulfonyl halide in the presence of for example monomethyldicyclohexylamine, and a positive photosensitive composition contains the resultant ester. According to this process, a diester of any polyphenol compound can be obtained with ease in a good yield, and a composition using the diester can achieve a high definition and a satisfactory exposure margin.
摘要翻译：一种生产多酚二酯的方法包括在例如单甲基二环己基胺的存在下酯化多酚化合物和萘醌-1,2-二氮杂磺酰卤，并且正性感光组合物含有所得的酯。根据该方法，可以容易地以良好的收率获得任何多酚化合物的二酯，并且使用二酯的组合物可以实现高清晰度和令人满意的曝光余量。

52. 发明授权

US6100004A Radiation-sensitive mixture and recording material made thereof for offset printing plates 失效
标题翻译：用于胶版印刷版的辐射敏感性混合物和由其制成的记录材料
公开(公告)号：US6100004A
公开(公告)日：2000-08-08
申请号：US38162
申请日：1998-03-11
申请人： Andreas Elsaesser , Otfried Gaschler , Helmut Haberhauer , Mathias Eichhorn , Fritz-Feo Grabley , Thomas Leichsenring , Gabor I. Koletar , Douglas A. Seeley
发明人： Andreas Elsaesser , Otfried Gaschler , Helmut Haberhauer , Mathias Eichhorn , Fritz-Feo Grabley , Thomas Leichsenring , Gabor I. Koletar , Douglas A. Seeley
IPC分类号： G03F7/004 , B41C1/10 , B41M5/46 , C09D11/00 , G03F7/00 , G03F7/021 , G03F7/022 , G03F7/32 , G03F7/30
CPC分类号： B41M5/465 , B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/24 , B41C2210/262
摘要： A positive-working or negative-working radiation-sensitive mixture includes as an IR absorbing component a carbon black pigment having a primary particle size smaller than 80 nm. The carbon black pigment is predispersed in a polymer containing acidic units having a pK.sub.a of less than 13. The radiation-sensitive component may include an ester of (i) a 1,2-naphthoquinone-2-diazide-4-sulfonic acid or a 1,2-naphthoquinone-2-diazide-5-sulfonic acid and (ii) a compound having at least one phenolic hydroxyl group, such as 3 to 6 phenolic hydroxyl groups. After imagewise radiation exposure, the recording material including the radiation-sensitive mixture can be developed without difficulties in an aqueous alkaline solution without leaving residual coating on the areas that became soluble or that remained soluble upon exposure.
摘要翻译：正性或负性辐射敏感性混合物包括作为IR吸收组分的一次粒径小于80nm的炭黑颜料。炭黑颜料预先分散在含有pKa小于13的酸性单元的聚合物中。辐射敏感组分可以包括（i）1,2-萘醌-2-二叠氮-4-磺酸或 1,2-萘醌-2-二叠氮-5-磺酸和（ii）具有至少一个酚羟基的化合物，例如3至6个酚羟基。在成像辐射曝光之后，包含辐射敏感性混合物的记录材料可以在碱性水溶液中无困难地显影，而不会在易溶的区域或暴露后保持溶解的区域留下残留涂层。

53. 发明授权

US06077942A Process of controlling particle size of naphthoquinone diazide esters 失效
标题翻译：控制萘醌二叠氮酯的粒度控制方法
公开(公告)号：US06077942A
公开(公告)日：2000-06-20
申请号：US995509
申请日：1997-12-22
申请人： Joseph E. Oberlander
发明人： Joseph E. Oberlander
IPC分类号： C07C303/44 , C07C309/76 , G03F7/022 , C07C245/00
CPC分类号： G03F7/022 , C07C303/44
摘要： A process for producing a naphthoquinone diazide ester of a phenolic compound that is useful in a photoresist composition, which process comprises providing a naphthoquinone diazide ester solution in an organic polar solvent; adding the resulting naphthoquinone diazide ester solution to a precipitation bath that is maintained at a temperature of from about 0.degree. C. to about -30.degree. C.; and filtering the resulting naphthoquinone diazide ester.
摘要翻译：一种可用于光致抗蚀剂组合物的酚类化合物的萘醌二叠氮化物酯的制造方法，该方法包括在有机极性溶剂中提供萘醌二叠氮酯溶液; 将所得的萘醌二叠氮化物酯溶液加入到保持在约0℃至约-30℃的温度的沉淀浴中; 并过滤得到的萘醌二叠氮化物酯。

54. 发明授权

US06066438A Method for fixing functional material and patterned functional material 失效
标题翻译：功能材料和图案化功能材料的固定方法
公开(公告)号：US06066438A
公开(公告)日：2000-05-23
申请号：US834545
申请日：1997-03-10
申请人： Dan V. Nicolau , Takahisa Taguchi , Susumu Yoshikawa
发明人： Dan V. Nicolau , Takahisa Taguchi , Susumu Yoshikawa
IPC分类号： H01L51/05 , B01J19/00 , G03F7/022 , G03F7/20 , H01L51/30 , H01L51/40 , A03F7/30 , G03F7/023
CPC分类号： G03F7/022 , B01J19/0046 , G03F7/2043 , B01J2219/00527
摘要： A method for fixing, on a substrate, functional material such as proteins, enzymes, polysaccharides, nucleic acids, microorganisms, viruses and cultured cells, includes the steps of (i) forming on the substrate a photosensitive layer containing DNQ, novolak, and optionally imidazole; (ii) applying onto the substrate functional material containing at least one amino group; (iii) before or after step (ii), irradiating in a pattern the photosensitive layer with light of appropriate wavelength(s) to convert DNQ to a ketene compound; and (iv) reacting the amino group with the ketene compound to fix via amido bonding the functional material to the substrate via the photosensitive layer along the pattern.
摘要翻译：在底物上固定蛋白质，酶，多糖，核酸，微生物，病毒和培养细胞等功能材料的方法包括以下步骤：（i）在基底上形成含有DNQ，酚醛清漆和任选的咪唑（ii）将至少含有一个氨基的基材功能材料涂布; （iii）在步骤（ii）之前或之后，用适当波长的光以图案照射感光层以将DNQ转化为烯酮化合物; 和（iv）使氨基与乙烯酮化合物反应，以通过沿着图案的光敏层通过酰胺键将功能材料固定到基底上。

55. 发明授权

US6042992A Bottom antireflective coatings through refractive index modification by anomalous dispersion 失效
$Bottom antireflective coatings through refractive index modification by anomalous dispersion$
标题翻译：底部抗反射涂层通过异常色散的折射率修饰
公开(公告)号：US6042992A
公开(公告)日：2000-03-28
申请号：US811806
申请日：1997-03-06
申请人： Ralph R. Dammel , Robert N. Norwood
发明人： Ralph R. Dammel , Robert N. Norwood
IPC分类号： H01L21/027 , G03F7/004 , G03F7/022 , G03F7/09 , G03F7/11 , G03F7/32 , G03F7/38 , G03F7/40 , G03F7/00
CPC分类号： G03F7/091
摘要： The invention provides a process for the generation of an antireflective bottom layer with effective reduction of substrate reflectivity and swing curve effects in lithographic applications. It involves the use of a suitably selected monomeric and/or polymeric dye which brings the real part of the refractive index into a range which is optimal for the suppression of reflection-related effects. The refractive index change is effected via anomalous dispersion, i.e., by utilizing changes in the real part of the refractive index caused by the bottom layer's absorption.
摘要翻译：本发明提供了一种用于产生抗反射底层的方法，其有效降低了光刻应用中的基板反射率和摆动曲线效应。它涉及使用适当选择的单体和/或聚合染料，其使折射率的实部成为抑制反射相关效应最佳的范围。折射率变化通过异常色散实现，即通过利用由底层吸收引起的折射率的实部的变化来实现。

56. 发明授权

US6020104A Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent 失效
标题翻译：使用单一单羧酸酯溶剂的辐射敏感树脂组合物
公开(公告)号：US6020104A
公开(公告)日：2000-02-01
申请号：US237660
申请日：1999-01-27
申请人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
发明人： Yoshihiro Hosaka , Ikuo Nozue , Masashige Takatori , Yoshiyuki Harita
IPC分类号： G03C1/00 , C08K5/28 , C08L61/06 , G03C1/72 , G03F7/004 , G03F7/008 , G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/0048 , G03F7/0085
摘要： A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
摘要翻译：一种辐射敏感性树脂组合物，其包含碱溶性树脂和辐射敏感性化合物在包含单一单羧酸酯的溶剂中的溶液。该组合物具有高的储存稳定性（即，在储存期间形成非常少量的微粒），并且适合用作制造集成电路的抗蚀剂。

57. 发明授权

US5998084A Radiation-sensitive recording material for the production of planographic printing plates 失效
标题翻译：用于生产平版印刷版的辐射敏感记录材料
公开(公告)号：US5998084A
公开(公告)日：1999-12-07
申请号：US749854
申请日：1996-11-15
申请人： Andreas Elsaesser , Raimund Haas , Guenter Hultzsch , Peter Lehmann , Rudolf Neubauer , Rudolf Zertani
发明人： Andreas Elsaesser , Raimund Haas , Guenter Hultzsch , Peter Lehmann , Rudolf Neubauer , Rudolf Zertani
IPC分类号： G03F7/004 , B41N1/14 , B41N3/03 , G03F7/00 , G03F7/022 , G03F7/023 , G03F7/075 , G03F7/30
CPC分类号： B41N3/038 , G03F7/0226
摘要： A positive-working, radiation-sensitive recording material capable of being used for the production of planographic printing plates, comprising: an aluminum support and a radiation-sensitive layer coated thereon, whereinthe aluminum support has been grained in nitric acid, then cleaned in sulfuric acid, anodized in sulfuric acid, and subsequently hydrophilized with a compound comprising at least one unit with a phosphonic acid or phosphonate group; andthe radiation-sensitive layer comprisesa) a radiation-sensitive 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid ester of a polycondensate having phenolic hydroxy groups, said polycondensate being obtained by reacting a phenolic compound with an aldehyde or ketone,b) a novolak or a polycondensation product obtained by reacting a polyphenol with an aldehyde or ketone, as an alkali-soluble resin,c) a vinyl-type polymer comprising at least one unit having a lateral hydroxyphenyl group,d) a clathrate-forming compound,e) a low-molecular weight compound which comprises at least one acidic hydrogen atom, andf) silica gel particles having a maximum diameter of 15 .mu.m.
摘要翻译：能够用于生产平版印刷版的正面工作的辐射敏感记录材料，包括：铝载体和涂覆在其上的辐射敏感层，其中铝载体已经在硝酸中粒化，然后在硫酸，在硫酸中阳极氧化，随后用包含至少一个具有膦酸或膦酸酯基团的单元的化合物亲水化; 辐射敏感层包括a）具有酚羟基的缩聚物的辐射敏感的1,2-萘醌-2-二叠氮化物-4-或-5-磺酸酯，所述缩聚物是通过使酚类化合物与醛或酮，b）通过使多酚与醛或酮反应得到的酚醛清漆或缩聚产物作为碱溶性树脂，c）包含至少一个具有侧羟基苯基单元的乙烯基型聚合物，d ）包合物形成化合物，e）包含至少一个酸性氢原子的低分子量化合物，和f）最大直径为15μm的硅胶颗粒。

58. 发明授权

US5968712A Radiation sensitive compositions and methods 失效
公开(公告)号：US5968712A
公开(公告)日：1999-10-19
申请号：US152084
申请日：1993-11-12
申请人： James W. Thackeray , Angelo A. Lamola
发明人： James W. Thackeray , Angelo A. Lamola
IPC分类号： G03F7/004 , G03F7/022 , G03F7/028 , G03F7/032 , G03F7/038 , G03F7/039 , G03F7/30 , G03F7/38 , G03F7/40
CPC分类号： G03F7/0382 , G03F7/004 , G03F7/0045 , G03F7/0226 , G03F7/038 , G03F7/039 , G03F7/40 , G03F7/0392
摘要： The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.

59. 发明授权

US5958646A Positive-working photosensitive composition and process for image formation 失效
标题翻译：正性感光组合物和成像方法
公开(公告)号：US5958646A
公开(公告)日：1999-09-28
申请号：US569316
申请日：1995-12-08
申请人： Koichi Kawamura , Satoshi Takita , Keiji Akiyama , Yoshitaka Kawamura
发明人： Koichi Kawamura , Satoshi Takita , Keiji Akiyama , Yoshitaka Kawamura
IPC分类号： G03F7/022 , G03F7/00 , G03F7/023 , G03F7/033 , G03F7/039 , G03F7/30 , H01L21/027 , G03C1/52
CPC分类号： G03F7/0233
摘要： Disclosed are (i) a positive-working photosensitive composition containing (a) a polymer having at least 60 mol % structural units represented by formula (1): ##STR1## wherein A represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms; X represents --CO-- or --SO.sub.2 --; Y represents --CO--R.sub.1 or --SO.sub.2 --R.sub.1, where R.sub.1 represents an alkyl group, a substituted alkyl group wherein the substituent on the substituted alkyl group is a halogen atom, an aryl group, an amido group, an alkoxy group or an alkoxycarbonyl group, an unsubstituted aromatic group, or a substituted aromatic group wherein the substituent on the substituted aromatic group is a halogen atom, an alkyl group, an alkoxy group having 1 to 10 carbon atoms, an amido group or an aryl group, provided that at least one of X and Y contains --SO.sub.2 --and (b) a o-naphthoquinone diazide, and (ii) a process for image formation which comprises image-wise exposing to light a photosensitive material having a photosensitive layer comprising the positive-working photosensitive composition and then developing the resulting photosensitive material with an aqueous alkali solution having a pH of 12.5 or below.
摘要翻译：公开了（i）正性光敏组合物，其含有（a）具有式（1）表示的至少60摩尔％结构单元的聚合物：其中A表示氢原子，卤素原子或具有1〜 4个碳原子; X表示-CO-或-SO 2 - ; Y表示-CO-R1或-SO2-R1，其中R1表示烷基，取代烷基上的取代基为卤素原子，芳基，酰胺基，烷氧基或烷氧基羰基的取代烷基基团，取代芳基或取代芳基，其中取代芳基上的取代基为卤素原子，烷基，具有1-10个碳原子的烷氧基，酰胺基或芳基，条件是在 X和Y中的至少一个含有-SO 2 - 和（b）邻萘醌二叠氮，以及（ii）图像形成方法，其包括使具有感光层的感光材料成像曝光于光敏层，所述光敏材料包含正性感光层然后用pH为12.5以下的碱性水溶液显影所得的感光材料。

60. 发明授权

US5861229A Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound 失效
标题翻译：包含1,2-醌二叠氮化合物，碱溶性树脂和多酚化合物的辐射敏感性正性抗蚀剂组合物
公开(公告)号：US5861229A
公开(公告)日：1999-01-19
申请号：US948466
申请日：1992-09-22
申请人： Haruyoshi Osaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
发明人： Haruyoshi Osaki , Fumio Oi , Yasunori Uetani , Makoto Hanabata , Takeshi Hioki
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/0236
摘要： A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:X--.alpha.--H (I)wherein x is a group of the formula: ##STR1## and .alpha. is a divalent group which comprises a repeating unit of the formula: ##STR2## in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.
摘要翻译：一种正性抗蚀剂组合物，其包含1,2-醌二叠氮化合物和含有下列通式的多酚化合物（I）的碱溶性树脂：X-α-H（I），其中x是下式的基团：并且α是包含下式的重复单元的二价基团：其中n是不小于1的数目：或 a，b，c，d，e和f相同或不同，数目为0-3，条件是d + f不小于1; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其抗蚀剂组成对辐射敏感，并具有良好的灵敏度，分辨能力和耐热性的平衡。

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