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51. 发明授权

US08355116B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08355116B2
公开(公告)日：2013-01-15
申请号：US12818644
申请日：2010-06-18
申请人： Go Ichinose
发明人： Go Ichinose
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70825 , G03F7/7085
摘要： Positional information of each of wafer stages during exposure and during alignment is measured directly under a projection optical system and directly under a primary alignment system, respectively, by a plurality of encoder heads, Z heads and the like, which a measurement bar placed below surface plates has, using gratings placed on the lower surfaces of fine movement stages. Consequently, high-precision measurement of the positional information of the wafer stages can be performed.
摘要翻译：在曝光和对准期间每个晶片台的位置信息直接在投影光学系统下直接测量，并且分别通过多个编码器头，Z头等在基本对准系统下面，测量棒放置在表面下方使用放置在精细运动级的下表面上的光栅，因此，可以进行晶片台的位置信息的高精度测量。

52. 发明授权

US08256735B2 Supporting device for supporting vibration sensitive components 有权
标题翻译：支持振动敏感元件的支撑装置
公开(公告)号：US08256735B2
公开(公告)日：2012-09-04
申请号：US11457582
申请日：2006-07-14
申请人： Peter Heiland
发明人： Peter Heiland
IPC分类号： F16M1/00
CPC分类号： F16F15/04 , F16F15/0275 , G03F7/70716 , G03F7/709
摘要： The invention is in particular a supporting device for relative supporting loads with respect to a base comprising a load side part, a base side part, and an intermediate part giving support to the load side part, and thus defining a supporting direction with reference to the base and the load side, including a pressure chamber bounded by chamber walls.
摘要翻译：本发明特别地涉及一种用于相对于基座的相对承载负载的支撑装置，该基座包括负载侧部分，基部侧部分和向负载侧部分提供支撑的中间部分，并且因此限定了支撑方向基座和负载侧，包括由室壁限定的压力室。

53. 发明授权

US08218125B2 Immersion lithographic apparatus with a projection system having an isolated or movable part 有权
标题翻译：浸没式光刻设备，其具有具有隔离或可移动部件的投影系统
公开(公告)号：US08218125B2
公开(公告)日：2012-07-10
申请号：US12340237
申请日：2008-12-19
申请人： Johannes Catharinus Hubertus Mulkens
发明人： Johannes Catharinus Hubertus Mulkens
IPC分类号： G03B27/68
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/709
摘要： A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
摘要翻译：公开了一种光刻投影装置，其中装置的投影系统和基板之间的至少一部分空间由液体供应系统填充液体。投影系统分为两个独立的物理部分。在投影系统的两个部分之间基本上没有直接连接的情况下，当基板相对于液体供应系统运动时，在两个部分中的第一部分中通过耦合通过填充空间的液体的力的振动基本上仅影响第一部分投影系统而不是其他第二部分。

54. 发明申请

US20120147355A1 Positioning System, Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：定位系统，平版印刷设备和器件制造方法
公开(公告)号：US20120147355A1
公开(公告)日：2012-06-14
申请号：US13398890
申请日：2012-02-17
申请人： Hans BUTLER , Martinus Agnes Willem CUIJPERS , Christiaan Alexander HOOGENDAM , Robertus Johannes Marinus DE JONGH , Michael Jozef Mathijs RENKENS , Marc Wilhelmus Maria VAN DER WIJST , Maurice Willem Jozef Etiënne WIJCKMANS , Robertus Leonardus TOUSAIN , Ronald Petrus Hendricus FAASSEN , Adrianus Hendrik KOEVOETS
发明人： Hans BUTLER , Martinus Agnes Willem CUIJPERS , Christiaan Alexander HOOGENDAM , Robertus Johannes Marinus DE JONGH , Michael Jozef Mathijs RENKENS , Marc Wilhelmus Maria VAN DER WIJST , Maurice Willem Jozef Etiënne WIJCKMANS , Robertus Leonardus TOUSAIN , Ronald Petrus Hendricus FAASSEN , Adrianus Hendrik KOEVOETS
IPC分类号： G03B27/58
CPC分类号： G03F7/709 , G03F7/70758 , G03F7/70766
摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.
摘要翻译：一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。第一执行器在桌子上施加致动力。第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第一致动器施加在平衡块上的致动力引起的扭矩。

55. 发明申请

US20120138401A1 DAMPING DEVICE 有权
标题翻译：阻尼装置
公开(公告)号：US20120138401A1
公开(公告)日：2012-06-07
申请号：US13185177
申请日：2011-07-18
申请人： Alexander Vogler , Klaus Rief , Andreas Frommeyer , Alan L. Brydon
发明人： Alexander Vogler , Klaus Rief , Andreas Frommeyer , Alan L. Brydon
IPC分类号： F16F7/10
CPC分类号： G02B7/00 , F16F7/104 , G02B7/02 , G03F7/70825 , G03F7/709
摘要： A hexapod system for aligning an optical element in semiconductor clean rooms or in a vacuum, particularly in an illumination device for a microlithographic EUV projection exposure apparatus, comprises six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106). Using a set of at least two replaceable spacer elements (94; 94′) having a different extent in at least one direction, at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. The latter is adapted so that a spacer element (94; 94′) can be removed or a spacer element (94; 94′) can be added while the coupling of the first coupling end (46; 46′) to the carrying structure (38; 38′) and the coupling of the second coupling end (54a; 54′) to the optical element (34; 34′) are maintained. As an alternative, a hexapod system having six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) is provided, in which each supporting structure (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) comprises at least one monolithic articulation (60, 76; 60′, 76′). By means of a set of at least two replaceable spacer elements (94), the working length of at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. A method for aligning an optical element in semiconductor clean rooms or in a vacuum by means of a hexapod system is furthermore provided.
摘要翻译：用于对准半导体洁净室或真空中的光学元件的六足系统，特别是用于微光刻EUV投影曝光设备的照明装置中，包括六个六足支撑结构（42,44,46,94; 42'，44'， 46'，94'，106）。使用一组至少两个在至少一个方向上具有不同程度的可替换间隔元件（94; 94'），所述六个支撑结构（42,44,46,94; 42'，44'，46）中的至少一个 '，94'，106）可以调整。后者适于使得可以移除间隔元件（94; 94'），或者可以在第一联接端（46; 46'）与承载结构（46; 94'）的连接 38; 38'），并且保持第二联接端（54a; 54'）与光学元件（34; 34'）的联接。作为替代方案，提供了具有六个六足支撑结构（42,44,46,94; 42'，44'，46'，94'，106）的六足系统，其中每个支撑结构（42,44,46， 94; 42'，44'，46'，94'，106）包括至少一个单片铰接（60,76; 60'，76'）。通过一组至少两个可更换的间隔元件（94），六个支撑结构（42,44,46,94; 42'，44'，46'，94'，106中的至少一个的工作长度）可以调整。还提供了一种通过六足系统将半导体洁净室或真空中的光学元件对准的方法。

56. 发明申请

US20120105819A1 LITHOGRAPHIC APPARATUS FOR TRANSFERRING PATTERN FROM PATTERNING DEVICE ONTO SUBSTRATE, AND DAMPING METHOD 有权
标题翻译：用于将图案从图案设备传输到基板上的平面设备和阻尼方法
公开(公告)号：US20120105819A1
公开(公告)日：2012-05-03
申请号：US13281214
申请日：2011-10-25
申请人： Hans BUTLER , Marco Hendrikus Hermanus OUDE NIJHUIS
发明人： Hans BUTLER , Marco Hendrikus Hermanus OUDE NIJHUIS
IPC分类号： G03B27/58
CPC分类号： G03F7/709 , G03F7/70833 , G03F7/7085
摘要： A lithographic apparatus includes a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system arranged to apply a force between the first frame and the support frame, and a control system configured to provide a drive signal to the first actuator system based on the first sensor output.
摘要翻译：光刻设备包括：支撑框架，其经由隔振系统由基座支撑; 投影系统，布置成将图案从图案形成装置传送到基板上，其中所述投影系统包括由所述支撑框架弹簧支撑的第一框架; 以及主动阻尼系统，被配置为阻止所述第一框架的运动，所述主动阻尼系统包括：第一传感器系统，其被配置为提供表示所述第一框架的绝对运动的第一传感器输出;布置成在所述第一框架和支撑框架和被配置为基于第一传感器输出向第一致动器系统提供驱动信号的控制系统。

57. 发明授权

US08144310B2 Positioning system, lithographic apparatus and device manufacturing method 有权
标题翻译：定位系统，光刻设备及器件制造方法
公开(公告)号：US08144310B2
公开(公告)日：2012-03-27
申请号：US12409919
申请日：2009-03-24
申请人： Hans Butler , Martinus Agnes Willem Cuijpers , Christiaan Alexander Hoogendam , Robertus Johannes Marinus De Jongh , Michael Jozef Mathijs Renkens , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans , Robertus Leonardus Tousain , Ronald Petrus Hendricus Faassen , Adrianus Hendrik Koevoets
发明人： Hans Butler , Martinus Agnes Willem Cuijpers , Christiaan Alexander Hoogendam , Robertus Johannes Marinus De Jongh , Michael Jozef Mathijs Renkens , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans , Robertus Leonardus Tousain , Ronald Petrus Hendricus Faassen , Adrianus Hendrik Koevoets
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/709 , G03F7/70758 , G03F7/70766
摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.
摘要翻译：一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。第一执行器在桌子上施加致动力。第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第一致动器施加在平衡块上的致动力引起的扭矩。

58. 发明授权

US08072700B2 Optical apparatus for use in photolithography 有权
标题翻译：用于光刻的光学装置
公开(公告)号：US08072700B2
公开(公告)日：2011-12-06
申请号：US10595469
申请日：2003-12-18
申请人： Yim-Bun Patrick Kwan , Erik Loopstra
发明人： Yim-Bun Patrick Kwan , Erik Loopstra
IPC分类号： G02B7/02
CPC分类号： G03F7/70258 , G02B5/005 , G02B13/143 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要： An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.
摘要翻译：一种光学设备包括一个交换机构和一个照明系统或投影物镜的光学组件。光学组件的多个光学元件中的至少一个选自可从交换机构中选择的多个光学组件中的至少一个，其有助于在光束路径中彼此交换。为了减少振动从互换机构到光学组件的传播，互换机构安装在基本上与壳体动态分离的结构上，并且所选择的可选择的光学元件位于与该壳体分离的操作位置交换机制。

59. 发明授权

US08068210B2 Lithographic apparatus, device manufacturing method and computer program product 有权
标题翻译：平版印刷设备，设备制造方法和计算机程序产品
公开(公告)号：US08068210B2
公开(公告)日：2011-11-29
申请号：US12076306
申请日：2008-03-17
申请人： Johannes Wilhelmus De Klerk
发明人： Johannes Wilhelmus De Klerk
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/709
摘要： Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity.
摘要翻译：在基板曝光期间增加额外的振动，使得在基板上的多个区域的曝光期间发生的振动基本上是均匀的。这可能会提高CD的均匀性。

60. 发明申请

US20110273683A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110273683A1
公开(公告)日：2011-11-10
申请号：US13188026
申请日：2011-07-21
申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendman , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendman , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译：在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。可以使用致动器来改变衬底表面上方的液体供应系统的高度。控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

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