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51. 发明申请

US20050018169A1 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method 失效
标题翻译：基板保持装置，半导体制造装置及装置的制造方法
公开(公告)号：US20050018169A1
公开(公告)日：2005-01-27
申请号：US10931984
申请日：2004-09-02
申请人： Shin Matsui
发明人： Shin Matsui
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , H01L21/683 , H01L21/687 , G03B27/58 , G03B27/62
CPC分类号： H01L21/6875 , G03F7/707 , G03F7/70708 , G03F7/7075 , G03F7/70925 , H01L21/67265 , H01L21/67294 , H01L21/6831 , H01L21/6838 , H01L21/68714 , H01L21/68785 , H01L2223/54493
摘要： A substrate holding device has a base member which removably holds a plate having a contact member to come into contact with a substrate, a first attraction mechanism which attracts the substrate onto the plate, and a second attraction mechanism which attracts the plate onto the base member. In this arrangement, as the plate can be removed, time to remove contaminants is not required, and productivity can be improved. Further, as the plate on a flat plate can be attached/removed, plate exchange can be easily made.
摘要翻译：基板保持装置具有可拆卸地保持具有接触构件的板以与基板接触的基座构件，将基板吸引到板上的第一吸引机构和将板吸附到基座构件上的第二吸引机构。在这种布置中，由于可以移除板，因此不需要去除污染物的时间，并且可以提高生产率。此外，由于平板上的板可以安装/拆卸，所以可以容易地进行换板。

52. 发明申请

US20050012938A1 Apparatus and method for detecting wafer position 审中-公开
标题翻译：用于检测晶片位置的装置和方法
公开(公告)号：US20050012938A1
公开(公告)日：2005-01-20
申请号：US10621453
申请日：2003-07-18
申请人： Jun-Ming Chen , Li-Chun Wei
发明人： Jun-Ming Chen , Li-Chun Wei
IPC分类号： G01B11/14 , G03F7/20 , H01L21/00
CPC分类号： H01L21/67259 , G03F7/707 , G03F7/70708
摘要： Apparatus and method for detecting wafer position is described. The apparatus for detecting wafer position includes a first sensor group and a second sensor group. The first sensor group and the second sensor group both include at least one light emitter and at least one light receiver. In one case, the light emitter is at one side beside a wafer and the light receiver is at the same height with the light emitter at the opposing side beside the wafer. In the other case, the light emitter neighbors the light receiver vertically at the same side beside the wafer. When the apparatus for detecting wafer position is operating, the apparatus determines whether a wafer position is normal by the relative position between the wafer and the sensors (the first sensor group and the second sensor group). Once the wafer position is abnormal and the time interval between the trigger of the first sensor group and the trigger of the second sensor group deviates the predetermined time interval the apparatus for detecting wafer position reports the abnormal event to the equipment including the apparatus to stop the motion of the wafer lifter and the motion of the robot blade in the process chamber. At the same time, the equipment including the apparatus for detecting wafer position alarms people in the production to proceed with troubleshooting.
摘要翻译：描述了用于检测晶片位置的装置和方法。用于检测晶片位置的装置包括第一传感器组和第二传感器组。第一传感器组和第二传感器组都包括至少一个光发射器和至少一个光接收器。在一种情况下，光发射器在晶片旁边的一侧，并且光接收器与晶片旁边的相对侧处的光发射器处于相同的高度。在另一种情况下，光发射器在晶片旁边的同一侧垂直地邻近光接收器。当用于检测晶片位置的装置运行时，该装置通过晶片和传感器（第一传感器组和第二传感器组）之间的相对位置来确定晶片位置是否正常。一旦晶片位置异常，并且第一传感器组的触发与第二传感器组的触发之间的时间间隔偏离预定时间间隔，则用于检测晶片位置的装置将异常事件报告给包括该装置的设备以停止晶片升降器的运动和机器人叶片在处理室中的运动。同时，包括用于检测晶片位置的设备的设备会警告生产中的人员进行故障排除。

53. 发明授权

US06812045B1 Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation 失效
标题翻译：用于确定在离子注入之前，期间或之后的样品的特性的方法和系统
公开(公告)号：US06812045B1
公开(公告)日：2004-11-02
申请号：US09956842
申请日：2001-09-20
申请人： Mehrdad Nikoonahad , Ady Levy , Kyle A. Brown , Gary Bultman , Dan Wack , John Fielden
发明人： Mehrdad Nikoonahad , Ady Levy , Kyle A. Brown , Gary Bultman , Dan Wack , John Fielden
IPC分类号： H01L2166
CPC分类号： G03F7/70616 , G01N21/636 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/707 , G03F7/70708 , H01J2237/31701
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a characteristic of a specimen prior to, during, or subsequent to ion implantation. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，该系统可以被配置成确定样品的多个性质，包括但不限于在离子注入之前，期间或之后的样品的特性。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

54. 发明授权

US06809802B1 Substrate attracting and holding system for use in exposure apparatus 失效
标题翻译：用于曝光设备的基板吸引和保持系统
公开(公告)号：US06809802B1
公开(公告)日：2004-10-26
申请号：US09640724
申请日：2000-08-18
申请人： Izumi Tsukamoto , Itaru Fujita , Hideki Nogawa , Yukio Takabayashi
发明人： Izumi Tsukamoto , Itaru Fujita , Hideki Nogawa , Yukio Takabayashi
IPC分类号： G03B2758
CPC分类号： H01L21/6838 , G03F7/707 , G03F7/70708 , G03F9/7076
摘要： A substrate attracting and holding method includes steps of supporting a substrate by use of a protrusion provided on a holding table for holding the substrate and reducing pressure between the holding table and the substrate to attract and hold the substrate. The protrusion is disposed to be placed in a predetermined positional relation, with respect to a direction along the surface of the substrate, with (i) a position of an alignment mark to be used for processing the substrate or (ii) a position to with respect to which an alignment mark is to be produced. The method also includes attracting and holding the substrate.
摘要翻译：基板吸附保持方法包括以下步骤：通过使用设置在保持台上的用于保持基板并且减小保持台和基板之间的压力以吸引并保持基板的突起来支撑基板。突起被设置为相对于沿着基板的表面的方向以预定的位置关系放置，（i）用于处理基板的对准标记的位置或（ii）相对于要产生对准标记。该方法还包括吸引和保持基底。

55. 发明授权

US06782337B2 Methods and systems for determining a critical dimension an a presence of defects on a specimen 失效
标题翻译：用于确定临界尺寸的样品上存在缺陷的方法和系统
公开(公告)号：US06782337B2
公开(公告)日：2004-08-24
申请号：US09956848
申请日：2001-09-20
申请人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
发明人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
IPC分类号： G06F1900
CPC分类号： G03F7/70708 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/9501 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，系统可以被配置为确定样本的多个属性，包括但不限于临界尺寸和缺陷的存在。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

56. 发明授权

US06747282B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06747282B2
公开(公告)日：2004-06-08
申请号：US10164706
申请日：2002-06-10
申请人： Mark Kroon , Jan Evert Van Der Werf , Haico Victor Kok
发明人： Mark Kroon , Jan Evert Van Der Werf , Haico Victor Kok
IPC分类号： G03B2752
CPC分类号： G03F9/7088 , G03F7/706 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/7085
摘要： One example of a lithographic projection apparatus includes an image sensing device configured and arranged to measure a pattern in a patterned projection beam. The image sensing device includes a slab and a radiation-sensitive sensor that is sensitive to the radiation of the projection beam. The image sensing device also includes a film of a material that is non-transparent to the radiation of the projection beam. This film is provided over the sensor and includes one or more patterned segments to selectively pass radiation of the projection beam to the sensor. The apparatus also includes an intermediate plate made from a material having a thermal expansion coefficient below approximately 12×10−6K−1 and having a slab-bearing surface.
摘要翻译：光刻投影设备的一个示例包括被配置和布置为测量图案化投影光束中的图案的图像感测装置。图像感测装置包括对投影光束的辐射敏感的平板和辐射敏感传感器。图像感测装置还包括对投影光束的辐射不透明的材料的膜。该膜设置在传感器上方并且包括一个或多个图案化区段以选择性地将投影光束的辐射传递到传感器。该装置还包括由具有低于约12×10 -6 K -1的热膨胀系数的材料制成并具有承载板的表面的中间板。

57. 发明申请

US20040013956A1 System for correcting aberrations and distortions in EUV lithography 失效
标题翻译：用于校正EUV光刻中的像差和畸变的系统
公开(公告)号：US20040013956A1
公开(公告)日：2004-01-22
申请号：US10455254
申请日：2003-06-04
申请人： Nikon Corporation
发明人： Michael Sogard
IPC分类号： G03F007/20 , G03F007/207 , B32B003/10 , G03B027/68 , G03B027/34 , G03B027/40 , G03B027/32 , G03B027/62 , G21K005/00
CPC分类号： G03F7/70233 , G03F7/70258 , G03F7/70266 , G03F7/703 , G03F7/707 , G03F7/70708 , G03F7/70783 , G03F7/70875 , G03F7/70891 , Y10T428/24802
摘要： A system for correcting aberration and distortion in EUV lithography places a reticle on a deformable reticle chuck, and a reticle height sensor is used to measure the surface height of the reticle placed on the deformable reticle chuck. An optical system projects EUV radiation onto the reticle and collects and projects reflected EUV radiation from the reticle through its exit pupil onto a wafer placed on a wafer chuck. A deformable mirror disposed proximal to the exit pupil may also be controlled for this purpose. The deformable reticle chuck and the deformable mirror are controlled such that aberration and distortion of an image of the reticle formed on the wafer by the optical system are corrected based on the height measured by the reticle height sensor. The deformable reticle chuck includes a supporting structure, a deformable membrane disposed above and being comprised of a dielectric layer and a conductive layer, a voltage source connected to the conductive coating on the reticle and the conductive layer to generate an electrostatic attractive force between them, a plurality of actuator rods each connected to a corresponding one of actuators, and a coolant gas inside a chamber formed between the membrane and the top surface of the supporting structure. A deformable wafer chuck and wafer height sensor may be included to provide further correction of the image.
摘要翻译：用于校正EUV光刻中的像差和畸变的系统将光罩放置在可变形的光罩卡盘上，并且使用标线高度传感器来测量放置在可变形标线盘卡盘上的掩模版的表面高度。光学系统将EUV辐射投射到掩模版上，并将来自掩模版的反射EUV辐射通过其出射光瞳聚集并投射到放置在晶片卡盘上的晶片上。为了此目的也可以控制靠近出射光瞳设置的可变形反射镜。控制可变形的光罩卡盘和可变形反射镜，使得基于由光罩高度传感器测量的高度来校正通过光学系统在晶片上形成的掩模版图像的像差和畸变。可变形标线盘卡盘包括支撑结构，设置在电介质层和导电层之上并由导电层构成的可变形膜，连接到标线片上的导电涂层和导电层的电压源，以在它们之间产生静电引力，多个致动器杆，每个致动器杆连接到相应的一个致动器，以及在膜和支撑结构的顶表面之间形成的室内的冷却剂气体。可以包括可变形的晶片卡盘和晶片高度传感器以提供图像的进一步校正。

58. 发明申请

US20040012767A1 Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method 有权
标题翻译：卡盘，平版印刷设备，制造卡盘的方法和装置制造方法
公开(公告)号：US20040012767A1
公开(公告)日：2004-01-22
申请号：US10424978
申请日：2003-04-29
发明人： Jan Van Elp , Peter Giesen , Jacob Jan Van Der Velde
IPC分类号： G03B027/58
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/7095 , H01L21/6831
摘要： A lithographic projection apparatus with a chuck in which a dielectric element of the electrostatic chuck has a specific resistivity of at least 1016 SE cm so that once the potential difference between electrodes of the chuck is removed the force on the article to be clamped reduces below a predetermined minimum level quickly. The dielectric element also has a coefficient of thermal expansion of less than 0.02null10null6Knull1. A method of manufacturing a chuck includes joining a first glass ceramic element with a second glass element with an electrode therebetween in which a current is passed through the second glass element.
摘要翻译：一种具有卡盘的平版印刷设备，其中静电卡盘的电介质元件具有至少10 16 C厘米的电阻率，使得一旦卡盘的电极之间的电位差被去除，则制品上的力被夹紧快速降低到预定最小水平以下。电介质元件的热膨胀系数也小于0.02×10 -6 K -1。制造卡盘的方法包括：将第一玻璃陶瓷元件与第二玻璃元件接合，其中电流通过第二玻璃元件。

59. 发明授权

US06653639B1 Chuck for mounting reticle to a reticle stage 失效
标题翻译：夹具用于将掩模版安装在标线片平台上
公开(公告)号：US06653639B1
公开(公告)日：2003-11-25
申请号：US09691303
申请日：2000-10-17
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G01J100
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/707 , G03F7/70708 , H01J37/3174 , H01J2237/31794
摘要： A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.
摘要翻译：公开了一种用于处理衬底的光刻系统。光刻系统包括用于相对于光束移动衬底的台。光刻系统还包括用于在阶段运动期间牢固地保持衬底的卡盘。光刻系统还包括支撑组件，用于将卡盘保持在相对于载物台的固定位置，同时在加工期间容纳用于卡盘或台架中的变形，以便相对于载物台精确地定位基板并且减小外部应力导致基板失真。

60. 发明申请

US20030197848A1 Exposure apparatus, exposure method, and device manufacturing method 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20030197848A1
公开(公告)日：2003-10-23
申请号：US10443034
申请日：2003-05-22
申请人： Nikon Corporation
发明人： Naomasa Shiraishi
IPC分类号： G03B027/54 , G03B027/42
CPC分类号： G03F9/7026 , G03F7/70358 , G03F7/707 , G03F7/70708 , G03F7/70866 , G03F7/70983
摘要： In an exposure apparatus, a main controller calculates the thickness of a light transmitting protective member that protects a pattern surface of a mask, based on detection signals of a first and second reflection beams of a detection beam irradiated from an irradiation system, reflected off the front and back surfaces of the protective member, and received by a photodetection system. This makes exposure that takes into account the variation in the image forming state of the image pattern depending on the calculated thickness of the protective member possible. Accordingly, exposure with high precision is possible, without the difference in thickness of the protective member protecting the pattern surface of the mask affecting the exposure. In addition, when the incident angle of the detection beam is optimized, setting a detection offset in the photodetection system, or resetting the origin will not be necessary.
摘要翻译：在曝光装置中，主控制器基于从照射系统照射的检测光束的第一反射光束和第二反射光束的检测信号，计算保护掩模的图案表面的透光保护部件的厚度，保护构件的前表面和后表面，并由光电检测系统接收。这使得考虑到图像图案的图像形成状态的变化取决于所计算的保护构件的厚度的曝光。因此，可以高精度地曝光，而不影响保护罩的图案表面的保护构件的厚度差异，从而影响曝光。此外，当检测光束的入射角度被优化时，在光电检测系统中设置检测偏移或复位原点将是不必要的。

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