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51. 发明授权

US08708507B2 Optical apparatus for magnifying a view of an object at a distance 有权
标题翻译：用于放大距离物体的视图的光学装置
公开(公告)号：US08708507B2
公开(公告)日：2014-04-29
申请号：US12928647
申请日：2010-12-16
申请人： Masataka Shirasaki
发明人： Masataka Shirasaki
IPC分类号： G02B5/08 , G02B5/10
CPC分类号： G02B17/002 , G02B17/0808 , G02B17/0812 , G02B17/086 , G02B25/007 , G02B27/10 , G02C7/08
摘要： The magnifying apparatus is based on two dimensional arrays of micro magnifying modules (MMMs) positioned along a plane perpendicular to the axis of the magnifying apparatus. In addition, the structure may include a two dimensional array of micro beam multipliers (MBMs) to improve the quality of the magnified image. The micro beam multipliers are positioned along a plane parallel to the array of micro magnifying modules. The structure also may include a two dimensional array of ray angle adjusters (RAAs) to extend the view angle. The ray angle adjusters are positioned along a plane parallel to the array of micro magnifying modules. The array of micro magnifying modules, with or without the micro beam multipliers and/or ray angle adjusters, may be constructed as a thin plate with a thickness of a few millimeters, through which the object is viewed. An object at a distance appears in the magnifying apparatus as a magnified image and the magnifying apparatus can be used for viewing an object at a distance in a way similar to the use of a conventional magnifier for viewing an object in a short distance.
摘要翻译：放大装置基于沿着垂直于放大装置的轴的平面定位的微放大模块（MMM）的二维阵列。此外，该结构可以包括用于改善放大图像的质量的微束乘法器（MBM）的二维阵列。微波束乘法器沿着平行于微放大模块阵列的平面定位。该结构还可以包括用于延伸视角的射线角度调节器（RAA）的二维阵列。射线角度调节器沿着平行于微放大模块阵列的平面定位。具有或不具有微光束乘法器和/或光线角度调节器的微放大模块阵列可以被构造为厚度为几毫米的薄板，通过该薄板观察物体。远距离的物体作为放大图像出现在放大装置中，并且放大装置可以用于以与使用常规放大镜相似的距离观看物体，以便在短距离内观看物体。

52. 发明申请

US20140111787A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20140111787A1
公开(公告)日：2014-04-24
申请号：US14143060
申请日：2013-12-30
申请人： Carl Zeiss SMT GmbH
发明人： David R. Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

53. 发明授权

US08416490B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08416490B2
公开(公告)日：2013-04-09
申请号：US12816863
申请日：2010-06-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

54. 发明授权

US08300210B2 Optical projection system 有权
标题翻译：光学投影系统
公开(公告)号：US08300210B2
公开(公告)日：2012-10-30
申请号：US11664896
申请日：2005-10-01
申请人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
发明人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
IPC分类号： G03B27/54 , G03B27/42 , G02B7/02
CPC分类号： G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
摘要翻译：提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。此外，第一壳体轴线与第二光轴基本共线。

55. 发明授权

US08289619B2 Catadioptric projection objective 有权
公开(公告)号：US08289619B2
公开(公告)日：2012-10-16
申请号：US13153544
申请日：2011-06-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

56. 发明授权

US08208198B2 Catadioptric projection objective 有权
公开(公告)号：US08208198B2
公开(公告)日：2012-06-26
申请号：US11653366
申请日：2007-01-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

57. 发明申请

US20110235167A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110235167A1
公开(公告)日：2011-09-29
申请号：US13153544
申请日：2011-06-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

58. 发明申请

US20110164235A1 PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 有权
标题翻译：投影目标和投影曝光装置的微观算法
公开(公告)号：US20110164235A1
公开(公告)日：2011-07-07
申请号：US13050346
申请日：2011-03-17
申请人： Ralf Mueller
发明人： Ralf Mueller
IPC分类号： G03B27/54 , G02B17/08
CPC分类号： G02B17/0812 , G02B13/143 , G02B17/0892 , G03F7/70225 , G03F7/70891
摘要： Projection objectives, projection exposure apparatuses and related systems and components are disclosed.
摘要翻译：投影目标，投影曝光装置及相关系统和组件被公开。

59. 发明授权

US07929115B2 Projection objective and projection exposure apparatus for microlithography 有权
标题翻译：用于微光刻的投影物镜和投影曝光装置
公开(公告)号：US07929115B2
公开(公告)日：2011-04-19
申请号：US12129161
申请日：2008-05-29
申请人： Ralf Mueller
发明人： Ralf Mueller
IPC分类号： G03B27/54 , G03B27/68 , G03B27/42 , G03B27/72
CPC分类号： G02B17/0812 , G02B13/143 , G02B17/0892 , G03F7/70225 , G03F7/70891
摘要： Projection objective, projection exposure apparatuses and related systems and components are disclosed.
摘要翻译：投影目标，投影曝光装置及相关系统和组件被公开。

60. 发明授权

US07679842B2 High performance catadioptric imaging system 有权
标题翻译：高性能反射折射成像系统
公开(公告)号：US07679842B2
公开(公告)日：2010-03-16
申请号：US11543519
申请日：2006-10-04
申请人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
发明人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
IPC分类号： G02B9/00
CPC分类号： G02B17/0892 , G02B17/0812 , G02B17/0856 , G02B21/04 , G03F7/70225 , G03F7/70341
摘要： A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 mm in diameter. The objective comprises a focusing lens group configured to receive the light energy, at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy for transmission to a specimen. The Mangin mirror arrangement imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90, and the design may be employed in various environments.
摘要翻译：公开了一种减小尺寸的反射折射物镜和系统。该目的可以通过红外光范围具有在约190纳米范围内的波长的光能。元件的直径小于100毫米。该目的包括被配置为接收光能的聚焦透镜组，至少一个取向为从聚焦透镜组接收聚焦光能并提供中间光能的场透镜，以及设置成接收来自光源的中间光能并且形成用于传输到样本的受控光能。芒格镜配置赋予数值孔径超过0.65并且高达约0.90的受控光能，并且该设计可以用于各种环境中。

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