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51. 发明授权

US09127345B2 Methods for depositing an epitaxial silicon germanium layer having a germanium to silicon ratio greater than 1:1 using silylgermane and a diluent 有权
标题翻译：使用甲硅烷基锗烷和稀释剂沉积锗/硅比大于1:1的外延硅锗层的方法
公开(公告)号：US09127345B2
公开(公告)日：2015-09-08
申请号：US13413495
申请日：2012-03-06
申请人： Nyles W. Cody , Shawn G. Thomas
发明人： Nyles W. Cody , Shawn G. Thomas
IPC分类号： C30B25/16 , C23C16/02 , H01L21/02 , C30B29/52 , C23C16/42
CPC分类号： C23C16/0272 , C23C16/42 , C30B25/165 , C30B29/52 , H01L21/02381 , H01L21/0245 , H01L21/02532 , H01L21/0262
摘要： The present application relates to methods for depositing a smooth, germanium rich epitaxial film by introducing silylgermane as a source gas into a reactor at low temperatures. The epitaxial film can be strained and serve as an active layer, or relaxed and serve as a buffer layer. In addition to the silylgermane gas, a diluent is provided to modulate the percentage of germanium in a deposited germanium-containing film by varying the ratio of the silylgermane gas and the diluent. The ratios can be controlled by way of dilution levels in silylgermane storage containers and/or separate flow, and are selected to result in germanium concentration greater than 55 atomic % in deposited epitaxial silicon germanium films. The diluent can include a reducing gas such as hydrogen gas or an inert gas such as nitrogen gas. Reaction chambers are configured to introduce silylgermane and the diluent to deposit the silicon germanium epitaxial films.
摘要翻译：本申请涉及通过在低温下将作为源气体的甲硅烷基锗烷引入反应器中来沉积光滑的富锗外延膜的方法。外延膜可以被应变并用作活性层，或者松弛并用作缓冲层。除了甲硅烷基锗烷气体之外，提供稀释剂以通过改变甲硅烷基锗烷气体和稀释剂的比例来调节沉积的含锗膜中的锗的百分比。这些比例可以通过在甲硅烷基锗烷储存容器和/或单独流动中的稀释水平进行控制，并且被选择以在沉积的外延硅锗膜中导致大于55原子％的锗浓度。稀释剂可以包括还原气体如氢气或惰性气体如氮气。反应室被配置成引入甲硅烷基锗烷和稀释剂以沉积硅锗外延膜。

52. 发明授权

US09121090B2 Resin molded articles 有权
标题翻译：树脂成型品
公开(公告)号：US09121090B2
公开(公告)日：2015-09-01
申请号：US12735842
申请日：2009-02-19
申请人： Takeharu Suga , Masaharu Okamura , Hiroshi Ahagon , Hiroharu Kojima , Norio Nawachi , Akira Yamamoto
发明人： Takeharu Suga , Masaharu Okamura , Hiroshi Ahagon , Hiroharu Kojima , Norio Nawachi , Akira Yamamoto
IPC分类号： C23C16/02 , B32B27/06 , C23C16/30 , C23C16/505
CPC分类号： C23C16/0272 , B32B27/06 , C23C16/30 , C23C16/505 , Y10T428/265
摘要： In a resin molded article (M), a wear-resistant surface layer (2) is provided on a surface of a base (1) made of a thermoplastic resin with an undercoat layer (3) being interposed therebetween, and the surface layer (2) has a composition containing silicon, oxygen, carbon, and hydrogen, a thickness of 0.02 μm or greater and 0.48 μm or less, and a density of greater than 1.5 g/cm3 or a hardness of 1.5 GPa or greater.
摘要翻译：在树脂成型体（M）中，在由热塑性树脂制成的基材（1）的表面上设置有耐磨表面层（2），其中插入有底涂层（3），表面层 2）具有含有硅，氧，碳和氢的组合物，其厚度为0.02μm以上且0.48μm以下，密度大于1.5g / cm 3或硬度为1.5GPa以上。

53. 发明申请

US20150221408A1 GRAPHENE BASED HYBRID THIN FILMS AND THEIR APPLICATIONS 审中-公开
标题翻译：基于石墨的混合薄膜及其应用
公开(公告)号：US20150221408A1
公开(公告)日：2015-08-06
申请号：US14600982
申请日：2015-01-20
申请人： Samsung SDI Co., Ltd.
发明人： Kuanping Gong , Lijie Ci
IPC分类号： H01B1/04 , C23C16/44 , H01B13/00
CPC分类号： H01B1/04 , C23C16/0272 , C23C16/26 , Y10T428/31678
摘要： Graphene-based hybrid films are made by coating electrically conductive nanostructures (such as carbon nanotubes or conductive nanowires) onto a metal substrate, and growing a graphene layer between the nanostructures and the substrate. The nanostructure coating on the substrate yields nucleation sites for the growth of the graphene layer. The process provides hybrid films in which graphene domains are electrically connected by the nanotubes or nanowires. Integral bonds (e.g., chemical bonds) are produced between the nanostructures and the graphene to provide improved electrical conductivity, via contact in excess of van der Waals forces.
摘要翻译：基于石墨烯的杂化膜通过将导电纳米结构（例如碳纳米管或导电纳米线）涂覆到金属基底上并在纳米结构和基底之间生长石墨烯层而制成。衬底上的纳米结构涂层产生用于石墨烯层生长的成核位点。该方法提供了混合膜，其中石墨烯畴通过纳米管或纳米线电连接。在纳米结构和石墨烯之间产生积分键（例如，化学键），以通过超过范德华力的接触提供改善的导电性。

54. 发明申请

US20150217378A1 SURFACE COATED CUTTING TOOL 有权
标题翻译：表面涂层切割工具
公开(公告)号：US20150217378A1
公开(公告)日：2015-08-06
申请号：US14424237
申请日：2013-08-28
申请人： MITSUBISHI MATERIALS CORPORATION
发明人： Sho Tatsuoka , Naoyuki Iwasaki , Kenji Yamaguchi , Akira Osada
IPC分类号： B23B27/14
CPC分类号： B23B27/148 , B23B2200/08 , B23B2200/16 , B23B2222/28 , B23B2222/61 , B23B2224/00 , B23B2224/32 , B23B2226/125 , B23B2228/04 , B23B2228/44 , B23B2228/56 , C23C16/0272 , C23C16/34 , C23C16/36 , C23C28/042 , C23C28/044 , C23C28/42 , C23C30/005 , Y10T428/31678
摘要： A coated tool with a hard coating layer, which has an excellent hardness and heat insulating effect; and exhibits an excellent chipping resistance and an excellent fracturing resistance for a long-term usage, is provided. The hard coating layer included in the coated tool has a chemically vapor deposited alternate laminated structure, which is made of: a region A layer and a region B layer, each of which is expressed by the composition formula of (Ti1-xAlx)(CYN1-y); and has the average total layer thickness of 1-10 μm. In the region A layer, relationships, 0.70≦x≦0.80 and 0.0005≦y≦0.005, are satisfied; the average grain width W is 0.1 μm or less; and the average grain length L is 0.1 μm or less. In the region B layer, relationships, 0.85≦x≦0.95 and 0.0005≦y≦0.005, are satisfied; the average grain width W is 0.1-2.0 μm; and the average grain length L is 0.5-5.0 μm.
摘要翻译：具有硬涂层的涂层工具，具有优异的硬度和隔热效果; 并提供了优异的耐崩裂性和耐久性优异的耐断裂性。涂覆工具中包含的硬涂层具有化学气相沉积的交替层压结构，其由以下组成的区域A层和区域B层制成，每层由（Ti1-xAlx）（CYN1）的组成式表示 -y）; 平均总层厚度为1-10μm。在区域A层，满足关系，0.70＆nlE; x＆nlE; 0.80和0.0005＆nlE; y＆nlE; 0.005; 平均晶粒宽度W为0.1μm以下; 平均粒径L为0.1μm以下。在区域B层中，满足0.85＆nlE; x＆nlE; 0.95和0.0005＆nlE; y＆nlE; 0.005的关系; 平均晶粒宽度W为0.1〜2.0μm; 平均粒径L为0.5〜5.0μm。

55. 发明申请

US20150203953A1 DIAMOND-COATED SUBSTRATES 有权
标题翻译：金刚石衬底
公开(公告)号：US20150203953A1
公开(公告)日：2015-07-23
申请号：US14416388
申请日：2013-07-22
申请人： Technion Research & Development Foundation Limited
发明人： Alon Hoffman
IPC分类号： C23C14/02 , C23C14/06 , C23C8/24
CPC分类号： C23C14/025 , C23C8/24 , C23C14/0611 , C23C16/0272 , C23C16/271 , Y10T428/265
摘要： A composite structure, comprising a cemented carbide substrate (e.g., tungsten carbide substrate cemented with cobalt, such as WC—Co), a thin interlayer disposed over the substrate, and a contiguous diamond film disposed over the interlayer, as well as processes of preparing such a composite structure and uses thereof, are provided. The composite structure is characterized by at least one of a substrate binder concentration of at least 2 percents by weight, interlayer thickness less than 20 microns, a homogenous interlayer made substantially of crystalline chromium nitride, a low to null binder concentration in the interlayer, and a high co-adhesion of the diamond film to the interlayer and the interlayer to the substrate.
摘要翻译：一种复合结构，包括硬质合金基底（例如，与钴结合的碳化钨基底，例如WC-Co），设置在基底上的薄层，以及设置在中间层上的连续的金刚石膜，以及制备提供这种复合结构及其用途。所述复合结构的特征在于至少一种底物粘合剂浓度为至少2重量％，中间层厚度小于20微米，基本上由结晶氮化铬制成的均匀夹层，中间层中的低至无效粘合剂浓度，以及金刚石膜与中间层和中间层与基底的高共粘合。

56. 发明申请

US20150197918A1 THIN FILM COATING FOR LINKAGE PIN 审中-公开
标题翻译：用于链接PIN的薄膜涂层
公开(公告)号：US20150197918A1
公开(公告)日：2015-07-16
申请号：US14662374
申请日：2015-03-19
申请人： CATERPILLAR INC.
发明人： Bao FENG , Hyung YOON , Ronald Mark GINN
IPC分类号： E02F9/00 , C23C16/27 , C23C14/34
CPC分类号： E02F9/006 , C23C16/0272 , C23C16/26 , E02F9/2275 , F16C11/045 , F16C33/043 , F16C2202/04 , F16C2204/44 , F16C2223/60 , F16C2240/60 , F16C2350/26 , Y10T403/32951
摘要： A linkage pin joint assembly may include a portion of a first machine member having a first bore, a portion of a second machine member having a second bore, and a linkage pin pivotally interconnecting at least the first and second machine members. The linkage pin may extend between the first and second machine members, and be positioned at least partially within the first bore of the first machine member and the second bore of the second machine member. The linkage pin may extending at least partially through the first and second bores and pivotally support the first and second machine members relative to each other. The linkage pin may be coated with a diamond-like carbon (DLC) coating over at least a portion of an outer diameter surface of the linkage pin, the coating providing a contact layer between the outer diameter surface of the linkage pin and at least one of a mating inner diameter surface of a joint bushing positioned within one of the first and second bores through the first and second machine members and a mating inner diameter surface of one of the first and second bores.
摘要翻译：连杆销接头组件可以包括具有第一孔的第一机器构件的一部分，具有第二孔的第二机械构件的一部分以及至少第一和第二机械构件枢转地连接的连杆销。连接销可以在第一和第二机器构件之间延伸，并且至少部分地定位在第一机器构件的第一孔和第二机构构件的第二孔内。连接销可以至少部分地延伸穿过第一和第二孔，并且相对于彼此枢转地支撑第一和第二机器构件。连接销可以在连接销的外径表面的至少一部分上涂覆有类金刚石碳（DLC）涂层，涂层在连接销的外径表面和至少一个通过第一和第二机器构件定位在第一和第二孔之一内的接头套管的配合内径表面和第一和第二孔之一的配合内径表面。

57. 发明申请

US20150171434A1 FUEL CELL SEPARATOR 有权
标题翻译：燃油电池分离器
公开(公告)号：US20150171434A1
公开(公告)日：2015-06-18
申请号：US14407221
申请日：2013-07-01
申请人： KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)
发明人： Jun Suzuki , Toshiki Sato , Satoru Takada
IPC分类号： H01M8/02 , B05D7/14 , B05D3/02
CPC分类号： H01M8/0228 , B05D3/0254 , B05D7/14 , C22C14/00 , C22F1/02 , C22F1/183 , C23C16/0272 , C23C16/26 , C23C24/082 , H01M8/0206 , H01M8/0213 , H01M8/0215 , H01M2008/1095 , Y02E60/50
摘要： A fuel cell separator (10) which comprises a base (1) constituted of titanium or a titanium alloy and a conductive carbon layer (2) that was formed by press-bonding a carbon powder to the base (1) and that covers the surface thereof; an interlayer (3) having been formed between the base (1) and the carbon layer (2). The interlayer (3) has been formed by a heat treatment in an atmosphere containing a slight amount of oxygen, contains titanium carbide yielded by the reaction of the Ti of the base (1) with the C of the carbon layer (2), and has an oxygen content of 0.1-40 at %.
摘要翻译：一种燃料电池分离器（10），其包括由钛或钛合金构成的基体（1）和通过将碳粉压接到所述基体（1）并且覆盖所述表面而形成的导电性碳层（2）的; 形成在基体（1）和碳层（2）之间的中间层（3）。中间层（3）通过在含有少量氧气的气氛中进行热处理而形成，包含由碱（1）的Ti与碳层（2）的反应产生的碳化钛，以及氧含量为0.1-40原子％。

58. 发明授权

US09044811B2 Surface coated cutting tool 有权
标题翻译：表面切割工具
公开(公告)号：US09044811B2
公开(公告)日：2015-06-02
申请号：US13820392
申请日：2011-07-05
申请人： Anongsack Paseuth , Minoru Itoh , Yoshio Okada , Hideaki Kanaoka , Chie Suzuki
发明人： Anongsack Paseuth , Minoru Itoh , Yoshio Okada , Hideaki Kanaoka , Chie Suzuki
IPC分类号： C23C16/40 , B23B27/14 , C23C16/02 , C23C16/36 , C23C16/56 , C23C28/04 , C23C30/00
CPC分类号： B23B27/14 , C23C16/0272 , C23C16/36 , C23C16/403 , C23C16/56 , C23C28/042 , C23C28/044 , C23C30/005 , Y10T428/265
摘要： A surface coated cutting tool with a high level of both wear resistance and defect resistance in balance is provided. The surface coated cutting tool of the present invention includes a base material, and a coat film formed on the base material. The coat film includes at least one titanium carbonitride layer. The titanium carbonitride layer has a maximum value for an orientational index TC (220) among texture coefficients TC (hkl). When an indentation hardness of a standard block for hardness is Hs and an indentation hardness of the titanium carbonitride layer is Ht, the average value of the relative hardness Ht/Hs for a plurality of times of measurement is greater than or equal to 3. The difference between the maximum value Htmax/Hs and minimum value Htmin/Hs of the relative hardness of the titanium carbonitride layer to the relative hardness Ht/Hs is less than or equal to 0.5.
摘要翻译：提供了具有高水平的耐磨性和耐缺陷性的表面涂层切削工具。本发明的表面覆盖切削工具包括基材和形成在基材上的涂膜。涂膜包括至少一个碳氮化钛层。碳氮化钛层在纹理系数TC（hk1）中具有取向指数TC（220）的最大值。当硬度标准块的压痕硬度为Hs，碳氮化钛层的压痕硬度为Ht时，多次测量时的相对硬度Ht / Hs的平均值大于或等于3. 碳氮化钛层的相对硬度的最大值Htmax / Hs和最小值Htmin / Hs之间的差异小于或等于0.5。

59. 发明授权

US08993454B2 Ultra high selectivity doped amorphous carbon strippable hardmask development and integration 有权
标题翻译：超高选择性掺杂无定形碳可剥离硬掩模开发和集成
公开(公告)号：US08993454B2
公开(公告)日：2015-03-31
申请号：US14028025
申请日：2013-09-16
申请人： Applied Materials, Inc.
发明人： Martin Jay Seamons , Sudha Rathi , Kwangduk Douglas Lee , Deenesh Padhi , Bok Hoen Kim , Chiu Chan
IPC分类号： H01L21/64 , C23C16/02 , C23C16/26 , H01L21/02 , H01L21/311
CPC分类号： H01L21/64 , C23C16/0272 , C23C16/26 , H01L21/02115 , H01L21/02274 , H01L21/31144
摘要： Embodiments of the present invention generally relate to the fabrication of integrated circuits and particularly to the deposition of a boron containing amorphous carbon layer on a semiconductor substrate. In one embodiment, a boron-containing amorphous carbon film is disclosed. The boron-containing amorphous carbon film comprises from about 10 to 60 atomic percentage of boron, from about 20 to about 50 atomic percentage of carbon, and from about 10 to about 30 atomic percentage of hydrogen.
摘要翻译：本发明的实施例一般涉及集成电路的制造，特别涉及在半导体衬底上沉积含硼无定形碳层。在一个实施方案中，公开了含硼无定形碳膜。含硼无定形碳膜包含约10至60原子百分数的硼，约20至约50原子百分比的碳和约10至约30原子百分比的氢。

60. 发明申请

US20150079785A1 PLATING METHOD, PLATING SYSTEM AND STORAGE MEDIUM 有权
标题翻译：涂层方法，镀层系统和储存介质
公开(公告)号：US20150079785A1
公开(公告)日：2015-03-19
申请号：US14384861
申请日：2013-02-22
申请人： Tokyo Electron Limited
发明人： Nobutaka Mizutani , Takashi Tanaka , Yuichiro Inatomi , Yusuke Saito , Mitsuaki Iwashita
IPC分类号： H01L21/768 , C23C18/16 , C23C14/24
CPC分类号： H01L21/76867 , C23C14/024 , C23C14/046 , C23C14/24 , C23C16/0272 , C23C16/045 , C23C18/1619 , C23C18/1632 , C23C18/165 , C23C18/1651 , C23C18/1653 , C23C18/1692 , C23C18/1694 , C23C18/1844 , C23C18/1893 , C23C18/38 , C23C28/322 , C23C28/34 , H01L21/288 , H01L21/76841 , H01L21/76843 , H01L21/76873 , H01L21/76874 , H01L21/76898
摘要： A plating method can improve adhesivity with a substrate. The plating method of performing a plating process on the substrate includes forming a vacuum-deposited layer 2A on the substrate 2 by performing a vacuum deposition process on the substrate 2; forming an adhesion layer 21 and a catalyst adsorption layer 22 on the vacuum-deposited layer 2A of the substrate 2; and forming a plating layer stacked body 23 having a first plating layer 23a and a second plating layer 23b which function as a barrier film on the catalyst adsorption layer 22 of the substrate 2. By forming the vacuum-deposited layer 2A, a surface of the substrate 2 can be smoothened, so that the vacuum-deposited layer 2A serving as an underlying layer can improve the adhesivity.
摘要翻译：电镀方法可以改善与基材的粘合性。对基板进行电镀处理的电镀方法包括通过在基板2上进行真空蒸镀工序，在基板2上形成真空蒸镀层2A，在基板2的真空蒸镀层2A上形成粘接层21和催化剂吸附层22; 并且在基板2的催化剂吸附层22上形成具有作为阻挡膜的第一镀层23a和第二镀层23b的镀层层叠体23.通过形成真空蒸镀层2A，基板2可以被平滑化，使得用作下层的真空沉积层2A可以改善粘合性。

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